Method of manufacturing a diffractive grating

Abstract

The invention relates to a method of manufacturing a diffractive grating. The method comprises providing a first substrate and manufacturing onto the first substrate a first surface profile using temporary grating material. Next, the first surface profile is covered entirely by a layer of final grating material and a second substrate is bonded onto the final grating material. Finally, the first substrate and the temporary grating material are removed for producing on the final grating material a second surface profile, which is a negative of the first surface profile. The invention allows for conveniently producing high quality gratings using e.g. inorganic materials and height and/or fill factor modulation for diffraction efficiency control.

Claims

1. A method of manufacturing a diffractive grating, comprising: providing a first substrate, manufacturing onto the first substrate a first surface profile using temporary grating material, covering the first surface profile entirely by a layer of final grating material, bonding a second substrate onto the layer of final grating material, removing the first substrate, and removing the temporary grating material for producing on the final grating material a second surface profile which is a negative of the first surface profile.

2. The method according to claim 1, wherein the first and second surface profile comprise features of different heights for manufacturing a height modulated diffractive grating.

3. The method according to claim 1, wherein the first and second surface profile comprise features of different widths for manufacturing a fill factor modulated diffractive grating.

4. The method according to claim 1, further comprising manufacturing the first surface profile using nanoimprint lithography, electron beam lithography or optical lithography.

5. The method according to claim 1, further comprising applying the grating material using atomic layer deposition, chemical vapor deposition, physical vapor deposition, spin coating, spraying, or inkjet printing or a variant thereof.

6. The method according to claim 1, wherein said layer of grating material has an even free surface after deposition, onto which the second substrate is bonded.

7. The method according to claim 1, wherein the grating material comprises an inorganic material, such as Si.sub.3N.sub.4, TiO.sub.2, SiO.sub.2, HfO.sub.2.

8. The method according to claim 1, further comprising bonding the second substrate to the grating material using an adhesive layer.

9. The method according to claim 8, wherein the adhesive layer has an index of refraction which deviates not more than 10% from the index of refraction of second substrate.

10. The method according to claim 1, further comprising bonding the second substrate to the grating material using physical or chemical bonding.

11. The method according to claim 1, wherein the final grating material has an index of refraction which deviates not more than 10% from the index of refraction of the second substrate.

12. The method according claim 1, wherein the final grating material has an index of refraction which is at least 10% higher than the index of refraction of the second substrate.

13. The method according to claim 1, wherein the second substrate is a waveguide or the method further comprises bonding the second substrate onto a waveguide.

14. The method according to claim 13, wherein the waveguide is a waveguide display element of a near-to-eye display.

15. Use of a method of manufacturing a diffractive grating for manufacturing an in-coupling grating, exit pupil expander grating or out-coupling grating of a diffractive waveguide display, wherein the method of manufacturing a diffractive grating comprises: providing a first substrate, manufacturing onto the first substrate a first surface profile using temporary grating material, covering the first surface profile entirely by a layer of final grating material, bonding a second substrate onto the layer of final grating material, removing the first substrate, and removing the temporary grating material for producing on the final grating material a second surface profile which is a negative of the first surface profile.

16. The method according to claim 1, wherein the final grating material has an index of refraction which is 10-30% higher than the index of refraction of the second substrate.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIGS. 1A-1E illustrate, step by step, in cross-sectional views a structure produced with an exemplary method according to one embodiment of the invention.

(2) FIG. 2A shows an example how diffraction efficiency of the first transmission order of a binary 1D grating changes as a function of the grating height.

(3) FIG. 2B shows an example how diffraction efficiency of the first transmission order of a 1D grating changes as a function of the grating fill-factor.

DETAILED DESCRIPTION OF EMBODIMENTS

(4) An exemplary method is described herein that provides feasible means to fabricate micro- and nanostructures with varying structure height (and line width or fill factor) using any desired material that is compliant with the chosen deposition method. In summary, the method comprises filling a mould with possibly varying structure heights and line widths fabricated in or replicated to a sacrificial material. This sacrificial mould is typically on a first substrate, such as a support wafer or a plate. The filling is carried out by vapor deposition using one or more desired materials. The structure with the first substrate is laminated to a second substrate, such as a support plate by e.g. adhesive, physical, or chemical bonding. Next, the original support plate is exfoliated revealing the sacrificial layer. The sacrificial layer is then removed by wet or dry etching method. This results in a negative copy of the original structure in a desired material.

(5) In more detail, FIG. 1A shows the first substrate 10 comprising a patterned sacrificial layer 12, which comprises features of different heights and/or widths that form a non-even surface profile to the structure. Herein, the features are rectangular in cross section, but also profiles having non-rectangular angles can be manufacturing using the present method. For example, if a one-dimensional grating is desired, the features can be straight lines having a rectangular or triangular cross section in a plane perpendicular to the line length.

(6) The substrate can be a wafer or any other plate of film structure capable of carrying the sacrificial layer and being separated from the topping layers at a later stage of the process.

(7) The sacrificial layer 12 is manufactured using a temporary grating material, which is also removed in a later stage of the process. The material can be e.g. a resist, polymer, or other patternable and removable thin film material. Patterning can be carried out using nanoimprint lithography, electron beam lithography, optical lithography or embossing, to mention some examples.

(8) In the illustrated example, the first substrate 10 is visible between the protruding features of the sacrificial layer 12, i.e. forms the bottom of the gaps between the features. However, application and patterning of the sacrificial layer can be carried also such that the whole substrate 10 is covered.

(9) In the next step illustrated by FIG. 1B, the surface profile of FIG. 1A is covered with a layer 14 of desired final grating material, such as an inorganic transparent material. Examples include Si.sub.3N.sub.4, TiO.sub.2, SiO.sub.2 and HfO.sub.2. Covering preferably comprises at least filling the grooves of the profile up to the level of the highest feature. Typically the profile is overfilled such the all features of the profile are completely embedded in the layer of final grating material. Preferably, the top surface of the layer is essentially even after this stage.

(10) Atomic layer deposition (ALD), chemical vapor deposition (CVD) or physical vapor deposition (PVD) are all suitable methods for applying the final grating material. UV or heat curable high refractive index polymer materials can be applied by spin coating, spraying or inkjet printing.

(11) After filling the temporary grating structure with the final grating material layer 14, any remaining unevenness of the surface can be polished away using mechanical or chemical polishing or their combination. This ensures good bonding of the grating layer to the second substrate provided in the next step.

(12) Next, as illustrated in FIG. 1C, a second substrate 18 is attached to the free surface of the final grating layer 14. An adhesive layer or other intermediate layer 16 can be used to ensure bonding of the layers. However, depending on material properties, the layers can also be bonded directly using a suitable physical or chemical bonding method, for example using heat and/or pressure and/or radiation.

(13) Evenness of the top surface of the grating layer 14 ensures good bonding of the second substrate 18 thereto and optical coupling of the layers.

(14) Thus, the second substrate 18, and optionally the adhesive layer 16, are preferably made of transparent materials.

(15) It should be noted that if an adhesive is used, the adhesive material preferably has the same refractive index as the waveguide to improve the optical performance. In near-to-the-eye applications the second substrate can be a high-refractive index material and may act as a waveguide layer. It should also be noted that the final grating material can be chosen such that it has a same refractive index with the second substrate which acts as a waveguide layer, enabling interaction of light incident from the waveguide layer with the modulated layer regardless of any bias layer thickness, i.e. the thickness of any unmodulated layer between the waveguide layer and the modulated grating layer.

(16) As shown in FIG. 1D, the first substrate 10 is then removed, i.e. exfoliated, from the stack. Consequently, the temporary grating layer 12, and optionally also the final grating layer 14 between the sacrificial material features, is revealed. Depending on the material properties and bonding between the layers, the removal may comprise mechanical, physical or chemical material removal.

(17) Finally, the sacrificial material is removed from the side of the removed first substrate. This results in a negative copy of the original surface profile in the final grating material layer 14 on the second substrate 18. Chemical or physical etching method, which is selective for the sacrificial material can be used.

General Considerations and Variations

(18) The final material may be inorganic transparent material, in particular a metal compound, such as metal oxide or metal nitride. In particular, the final material may comprise material whose index of refraction is 2.0 more, such as 2.2 or more. The material can be e.g. example TiO.sub.2, SiO.sub.2, Si.sub.3N.sub.4 or HfO.sub.2.

(19) The second substrate 18, like the optional adhesive layer 16 too, is preferably optically transparent, such as a glass substrate or polymer substrate. Transparent herein means transmittance higher than 50%, in particular higher than 95%. For display applications it is preferred that the substrate is capable of serving as a waveguide for visible optical wavelengths (i.e. as a light guide). The substrate can be planar or curved.

(20) In typical embodiments, the final grating material has an index of refraction higher than that of the second substrate material. This allows for the light travelling in the substrate via total internal reflections to exit the substrate at the location of the grating and the diffraction to take place. For example the, index of refraction of the substrate can be less than 2.0 and the index of refraction of the grating material more than 2.0.

(21) The present invention can be used to manufacture gratings for display applications, such as wearable display applications, for example virtual reality or augmented reality glasses. In these applications, the area of the grating manufactured is typically at least 1 cm.sup.2, such as 2-500 cm.sup.2.

(22) The diffractive grating may be e.g. an out-coupling grating, an in-coupling grating or an exit pupil expander (EPE) of a near-to-eye display (NED) or head-up display (HUD).

(23) The period of the pattern is typically 10 μm or less, in particular 1 μm or less, such as 200-800 nm. It should be noted that in addition to constant-period gratings, the invention can also be used to produce period modulated gratings. That is, the period does not need to be constant in the lateral dimension of the grating.

(24) If needed, the grating can be embedded in an optical structure, i.e. covered or coated with one or more additional layers.

(25) FIGS. 2A and 2B show how the diffraction efficiency of the first transmission order of a dielectric binary grating can be modulated using height and fill-factor modulation. Numerical results were obtained with the Fourier modal method (also known as rigorous coupled wave analysis). The binary grating resides on an interface between air and a glass substrate having refractive index of 2.0, the grating period is 500 nm, fill factor 0.5, and the grating is made of the same material as the substrate. The grating is illuminated with a plane wave with 450 nm free space wavelength at normal incidence. Results are shown for both transverse electric (TE) and transverse magnetic polarizations (TM). In FIG. 2A, the grating fill factor is 0.5 and in FIG. 2B, the grating height is 250 nm.

CITATIONS LIST

Non-Patent Literature

(26) C. David, “Fabrication of stair-case profiles with high aspect ratios for blazed diffractive optical elements”, Microelectronic Engineering, 53 (2000).