A DEVELOPING DEVICE AND A DEVELOPING METHOD OF SUBSTRATE

20210356808 ยท 2021-11-18

    Inventors

    Cpc classification

    International classification

    Abstract

    A developing device and a developing method of substrate are provided. The developing device comprises: a conveying platform and a spraying mechanism disposed above the conveying platform; the spraying mechanism comprising a spraying pipe; a plurality of first nozzles and a plurality of second nozzles disposed on the spraying pipe. The conveying platform is used for conveying a substrate, and tilting the substrate with respect to the horizontal direction during a conveying process. The first nozzles are used for spraying a chemical solution onto the substrate continuously; the second nozzles are used for starting or ending spraying the chemical solution onto the substrate according to a predetermined spray density.

    Claims

    1. A developing device, comprising: a conveying platform and a spraying mechanism disposed above the conveying platform; the spraying mechanism comprising a spraying pipe; a plurality of first nozzles and a plurality of second nozzles disposed on the spraying pipe; the conveying platform used for conveying a substrate, and tilting the substrate with respect to the horizontal direction during a conveying process; the first nozzles used for spraying a chemical solution onto the substrate continuously; the second nozzles used for starting or ending spraying the chemical solution onto the substrate according to a predetermined spray density.

    2. The developing device as claimed in claim 1, wherein a plurality of guide rolls inclined with respect to a horizontal direction are provided in the conveying platform.

    3. The developing device as claimed in claim 1, wherein the substrate is inclined at an angle 5 degrees with respect to the horizontal direction.

    4. The developing device as claimed in claim 1, wherein each of the second nozzles has a thread therein, and the second nozzle can be closed by matching a T-shaped nut and the thread.

    5. The developing device as claimed in claim 1, wherein the plurality of second nozzles are respectively disposed between each adjacent two of the first nozzles.

    6. A substrate developing method comprises the steps of: Step 1, providing a developing device; the developing device comprises: a conveying platform and a spraying mechanism disposed above the conveying platform; the spraying mechanism comprises a spraying pipe and a plurality of first nozzles and a plurality of second nozzles disposed on the spraying pipe; Step 2, the conveying platform conveys the substrate, and tilts the substrate with respect to a horizontal direction during a conveying process; Step 3, the first nozzle continuously sprays a chemical solution onto the substrate; the second nozzle starts or ends spraying the chemical solution onto the substrate according to a predetermined spray density.

    7. The substrate developing method as claimed in claim 6, wherein the conveying platform is provided with a plurality of guide rolls inclined with respect to the horizontal direction.

    8. The substrate developing method as claimed in claim 6, wherein the substrate is inclined at an angle 5 degrees with respect to the horizontal direction.

    9. The substrate developing method as claimed in claim 6, wherein each of the second nozzles has a thread therein, and the second nozzle can be closed by matching a T-shaped nut and the thread during the Step 3.

    10. The substrate developing method as claimed in claim 6, wherein the plurality of second nozzles are respectively disposed between each adjacent two of the first nozzles.

    Description

    DESCRIPTION OF DRAWINGS

    [0024] In order to further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings regarding the present invention, the drawings are only used for providing reference and description instead of limiting the present invention.

    [0025] FIG. 1 is a schematic structural diagram of a developing device according to the present invention;

    [0026] FIG. 2 is a flow chart of a substrate developing method according to the present invention.

    DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

    [0027] In order to further clarify the technical means and effects of the present invention, the following detailed description will be made in conjunction with the preferred embodiments of the invention and the accompanying drawings.

    [0028] Referring to FIG. 1, the present invention provides a developing device, comprising: a conveying platform 10 and a spraying mechanism 20 disposed above the conveying platform 10; the spraying mechanism 20 comprising a spraying pipe 21; a plurality of first nozzles 22 and a plurality of second nozzles 23 disposed on the spraying pipe 21.

    [0029] The conveying platform 10 is used for conveying a substrate 30, and tilting the substrate 30 with respect to the horizontal direction during the conveying process;

    [0030] The first nozzles 22 are used for spraying a chemical solution onto the substrate 30 continuously;

    [0031] The second nozzles 23 are used for starting or ending spraying the chemical solution onto the substrate 30 according to a predetermined spray density.

    [0032] To be noted, the present invention tilts the substrate 30 with respect to the horizontal direction during the process of conveying the substrate 30 by the conveying platform 10 so that the flow direction of the chemical solution is relatively consistent, and the possibility that Mura occurs on the substrate 30 is reduced; the capability to control over regional concentration is relatively good because the replacement rate of old and new chemical solution is relatively high; the blowing force required during the drying process is relatively small, when the substrate 30 is subsequently dried by blowing, only a relatively small blowing force is required to dry the substrate 30 so that the possibility that Mura occurs on the substrate 30 is reduced. The present invention further provides the plurality of second nozzles 23 disposed on the spraying pipe 21. The second nozzle 23 starts or ends spraying the chemical solution onto the substrate 30 according to a predetermined spray density. In the actual development process, when it is necessary to increase or decrease the amount of the chemical solution on a certain area on the substrate 30, the amount of the chemical solution in a certain area on the substrate 30 can be correspondingly increased or decreased by the opening or closing of the second nozzle 23, thereby preventing the chemical solution on the substrate 30 from occurring concentration gradient, and improving the consistency of the distribution of the chemical solution, and further improving the consistency of the CD in the substrate 30. In addition, since the second nozzle 23 is provided, the conveying platform 10 is not required to be too long so that the cost of the developing device is reduced.

    [0033] Specifically, the conveying platform 10 is provided with a plurality of guide rollers 11 inclined with respect to the horizontal direction, and the guide rollers 11 conveys the substrate 30 and tilts the substrate 30 with respect to the horizontal direction during the conveying process. During the developing process, the guide roller 11 is gradually worn, an inclination angle of the substrate 30 also changes along with it. The second nozzle 23 can be opened or closed in the present invention according to the inclination angle after the change without frequently adjusting the inclination angle of the guide roller 11, thereby improving the consistency of the distribution of the chemical solution, and avoiding the risk of fragmentation of the substrate 30. In addition, the spraying pipe 21 is parallel to the substrate 30, that is, the angle at which the spraying pipe 21 is inclined is the same as the angle at which the substrate 30 is inclined, so as to better spray the chemical solution onto the substrate 30.

    [0034] Specifically, the angle at which the substrate 30 is inclined with respect to the horizontal direction is 5 degrees. When the chemical solution flows from one end of the substrate 30 to the other end, the possibility that Mura occurs on the substrate 30 is relatively small.

    [0035] Specifically, Each of the second nozzles 23 has a thread therein, and the second nozzle 23 can be closed by matching a T-shaped nut and the thread.

    [0036] Specifically, the plurality of second nozzles 23 are respectively disposed between each adjacent two of the first nozzles 22 to better adjust the spray density.

    [0037] Referring to FIG. 2, based on the above developing device, the present invention also provides a substrate developing method, comprising the following steps:

    [0038] Step 1, providing a developing device; the developing device comprises: a conveying platform 10 and a spraying mechanism 20 disposed above the conveying platform 10; the spraying mechanism 20 includes a spraying pipe 21 and a plurality of first nozzles 22 and a plurality of second nozzles 23 disposed on the spraying pipe 21;

    [0039] Step 2, the conveying platform 10 conveys a substrate 30, and tilts the substrate 30 with respect to the horizontal direction during a conveying process;

    [0040] Step 3, the first nozzle 22 continuously sprays the chemical solution onto the substrate 30; the second nozzle 23 starts or ends spraying the chemical solution onto the substrate according to a predetermined spray density.

    [0041] To be noted, the present invention tilts the substrate 30 with respect to the horizontal direction during the process of conveying the substrate 30 by the conveying platform 10 so that the flow direction of the chemical solution is relatively consistent, and the possibility that Mura occurs on the substrate 30 is reduced; the replacement rate of old and new chemical solution is higher, which is beneficial to the control of regional concentration. When the substrate 30 is subsequently dried by blowing, only a relatively small blowing force is required to dry the substrate 30, thereby reducing the possibility that Mura occurs on the substrate 30. The present invention further provides a plurality of second the nozzles 23 disposed on the spraying pipe 21. The second 23 starts or ends spraying the chemical solution onto the substrate 30 according to a predetermined spray density. In the actual development process, when it is necessary to increase or decrease the amount of the chemical solution on a certain area on the substrate 30, the amount of the chemical solution in a certain area on the substrate 30 can be correspondingly increased or decreased by the opening or closing of the second nozzle 23, thereby preventing the chemical solution on the substrate 30 from occurring concentration gradient, and improving the consistency of the distribution of the chemical solution, and further improving the consistency of the CD in the substrate 30. In addition, since the second nozzle 23 is provided, the conveying platform 10 is not required to be too long so that the cost of the developing device is reduced.

    [0042] Specifically, the conveying platform 10 is provided with a plurality of guide rollers 11 inclined with respect to the horizontal direction, and the guide rollers 11 convey the substrate 30 and can tilt the substrate 30 with respect to the horizontal direction during the conveying process. During the developing process, the guide roller 11 is gradually worn, an inclination angle of substrate 30 also changes along with it. In the present invention, the second nozzle 23 can be opened or closed according to the inclination angle after the change to improve the consistency of the distribution of the chemical solution, without frequently adjusting the inclination angle of the guide roller 11, thereby avoiding the risk of fragmentation of the substrate 30. In addition, the spraying pipe 21 is parallel to the substrate 30, that is, the angle at which the spraying pipe 21 is inclined is the same as the angle at which the substrate 30 is inclined, which is beneficial to spray the chemical solution onto the substrate 30.

    [0043] Specifically, the angle at which the substrate 30 is inclined with respect to the horizontal direction is 5 degrees. When the chemical solution flows from one end of the substrate 30 to the other end, the possibility that Mura occurs on the substrate 30 is relatively small.

    [0044] Specifically, Each of the second nozzles 23 has a thread therein, and the second nozzle 23 can be closed by matching a T-shaped nut and the thread during the Step 3.

    [0045] Specifically, the plurality of second nozzles 23 are respectively disposed between each adjacent two of the first nozzles 22 to better adjust the spray density.

    [0046] In summary, The developing device of the present invention comprises: a conveying platform and a spraying mechanism disposed above the conveying platform; the spraying mechanism comprising a spraying pipe and a plurality of first nozzles and a plurality of second nozzles on the spraying pipe; the conveying platform is used for conveying a substrate, and tilting the substrate with respect to the horizontal direction during the conveying process so that the flow direction of a chemical solution is relatively consistent, and the possibility that Mura occurs on the substrate is reduced; The capability to control over regional concentration is relatively good because the replacement rate of old and new chemical solution is relatively high, further reducing the possibility that Mura occurs on the substrate. The first nozzles are used for spraying the chemical solution onto the substrate continuously. The second nozzles are used for starting or ending spraying the chemical solution onto the substrate according to a predetermined spray density, which can prevent the chemical solution distributed on the substrate from occurring concentration gradient, and improve the consistency of the chemical solution distributed on the substrate, and further improve the consistency of the CD in the substrate. The substrate developing method of the present invention can prevent the chemical solution distributed on the substrate from occurring concentration gradient, and improve the consistency of the chemical solution distributed on the substrate, and further improve the consistency of the CD in the substrate.

    [0047] In summary, various other corresponding changes and modifications can be made by those skilled in the art according to the technical solutions and technical ideas of the present invention, and all such changes and modifications are intended to fall within the scope of the appended claims.