Ethylene sensor and method of making same

Abstract

The ethylene sensor is formed from a substrate with a gold thin film layer formed thereon. The substrate may be formed from soda-lime glass with a thickness of approximately 1.0 mm. Correspondingly, the gold layer may have a thickness of approximately 200 nm. The gold layer is divided into first and second regions or electrodes by a variable impedance channel containing K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68 as an ethylene selective material. The channel may be configured such that first and second sets of interdigitated gold fingers are defined in the first and second regions or electrodes, respectively. An ohmmeter is connected to the first and second regions to measure a resistance therebetween. A reference resistance is initially measured that is indicative of an absence of ethylene. Subsequent measurements of the resistance are compared against this reference resistance, with variations in the measured resistance indicating the presence of ethylene.

Claims

1. An ethylene sensor, comprising: a substrate; a gold layer formed on the substrate, the gold layer being divided into first and second regions by a channel containing an ethylene selective material, the ethylene selective material having an elemental composition of K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68; and an ohmmeter connected to the first and second regions to measure resistance between the regions, a variation in the measured resistance indicating presence of ethylene gas varying impedance of the channel.

2. The ethylene sensor as recited in claim 1, wherein the substrate comprises soda-lime glass.

3. The ethylene sensor as recited in claim 1, wherein the substrate has a thickness of 1.0 mm.

4. The ethylene sensor as recited in claim 3, wherein the gold layer has a thickness of 200 nm.

5. The ethylene sensor as recited in claim 1, wherein the channel defines first and second sets of interdigitated gold fingers in the first and second regions, respectively.

6. A method of making an ethylene sensor, comprising the steps of: depositing a 200 nm thick gold layer on a 1.0 mm thick soda-lime glass substrate; etching a channel in the gold layer and the soda-lime glass substrate using a carbon dioxide laser to divide the gold layer into first and second electrodes, the channel having varying resistance in the presence of ethylene gas, the etched channel having an elemental composition of K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68; and connecting an ohmmeter to the first and second electrodes to measure resistance between the electrodes; wherein the carbon dioxide laser has a power output between 10.0 W and 11.0 W; wherein the step of etching the channel comprises moving a beam generated by the carbon dioxide laser at an etching speed between 100 mm/s and 120 mm/s; wherein a beam generated by the carbon dioxide laser has a wavelength of 10.6 μm.

7. The method of making an ethylene sensor as recited in claim 6, wherein the step of depositing the gold layer on the substrate comprises depositing the gold layer on the substrate using thin film physical vapor deposition.

8. The method of making an ethylene sensor as recited in claim 7, wherein the step of depositing the gold layer on the substrate comprises depositing the gold layer on the substrate using DC sputtering deposition.

9. The method of making an ethylene sensor as recited in claim 6, wherein the step of etching the channel comprises moving a beam generated by the carbon dioxide laser such that the channel defines first and second sets of interdigitated gold fingers in the first and second electrodes, respectively.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a top view of an ethylene sensor.

(2) FIGS. 2A, 2B, 2C and 2D are perspective views sequentially illustrate the method of making the ethylene sensor of FIG. 1, including FIG. 2A: an unplated substrate; Fig. B: the substrate plated with a thin gold film; FIG. 2C: etching serpentine interdigitated electrodes with a laser; FIG. 2D: a single completed sensor etched on the substrate.

(3) FIG. 3 is a top view of an alternative embodiment of the ethylene sensor.

(4) FIG. 4 is a plot of a measured resistance signal as a function of time produced by the ethylene sensor in the presence of ethylene.

(5) FIG. 5 is an energy dispersive X-ray spectroscopy (EDX) spectrum of results for ethylene selective material formed during laser etching in the method of making the ethylene sensor.

(6) Similar reference characters denote corresponding features consistently throughout the attached drawings.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

(7) As shown in FIGS. 1 and 2B-2D, the ethylene sensor 10 is formed from a substrate 12 with a gold thin film layer 14 formed thereon. For example, the substrate 12 may be formed from soda-lime glass. As a further example, the substrate 12 may have a thickness of approximately 1.0 mm, and the gold layer 14 may have a thickness of approximately 200 nm. As shown in FIGS. 1 and 2D, the gold layer 14 is divided into first and second regions 14A, 14B or electrodes, respectively, by a channel 16 containing K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68 as an ethylene selective material 18 having variable impedance.

(8) As shown in FIG. 1, the channel 16 may be shaped such that first and second sets of interdigitated gold fingers 22, 24 are defined in the first and second regions or electrodes 14A, 14B, respectively. It should be understood that the square-wave pattern shown in FIG. 1 is illustrated for exemplary purposes only, and that the channel 16 may have any suitable configuration and relative dimensions. An ohmmeter R.sub.m is connected to the first and second regions r electrodes 14A, 14B to measure a resistance therebetween. A reference resistance is initially measured that is indicative of an absence of ethylene. Subsequent measurements of the resistance are compared against this reference resistance. Variations in the measured resistance indicate the presence of ethylene.

(9) It should be understood that the ohmmeter R.sub.m may be any suitable type of ohmmeter or resistance sensor. For example, as shown in FIG. 3, ohmmeter R.sub.m may have a conventional ohmmeter circuit formed from a voltmeter 20 for measuring potential across a resistor R having a known resistance, where the resistor R is in series with the sensor 10 (across regions 14A, 14B and channel 16) and a DC voltage source (e.g., a 9 V battery). The voltmeter 20 may be a voltage divider-based voltmeter or the like, as is conventionally known.

(10) In experiments, an ethylene sensor 10 with an ohmmeter R.sub.m constructed as illustrated in FIG. 3 was used to detect the ethylene produced from ripening bananas. The measured resistance signal is displayed in FIG. 4, where the on-off/peak-valley signal pattern is indicative of the presence of ethylene. The signal of FIG. 4 was measured at room temperature with an ethylene concentration of about 0.3 ppm. This data may be used to calibrate the sensor 10, allowing the sensor to be used for both detection and measurement of ethylene concentration based on the measured peak resistance. In the absence of ethylene, the signal will be flat with a constant measured resistance. It is further noted that the resistance has also been found to vary depending on variations in ambient humidity. Thus, the sensor 10 may also be used as a humidity sensor.

(11) As illustrated in FIGS. 2A-2D, in order to make the ethylene sensor 10, the gold layer 14 is first deposited on the substrate 12. It should be understood that the gold layer 14 may be deposited on the substrate 12 using any suitable deposition method, such as thin film physical vapor deposition (PVD). An example of PVD is direct current (DC) sputtering deposition. Following formation of the gold thin film layer 14, the channel 16 is etched into the gold layer 14 using a carbon dioxide laser, as illustrated in FIG. 2C. The carbon dioxide laser produces a laser beam B in the infrared range. For example, the beam B may have a wavelength of 10.6 μm. The etching of the gold layer 14 on the soda-lime glass 12 produces the K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68 ethylene selective material 18 having an impedance varying with the presence of ethylene vapor in the vicinity of the channel 16.

(12) It should be understood that the carbon dioxide laser may be operated at any suitable output power to produce the K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68 ethylene selective material 18 in the etched channel 16. For example, the carbon dioxide laser may have a power output between 10.0 W and 11.0 W. Similarly, it should be understood that the beam B produced by the carbon dioxide laser may be moved relative to the gold layer 14 at any suitable speed for etching the channel 16 in the desired configuration for generating the ethylene selective material 18. For example, the beam B may be moved relative to the gold layer 14 at an etching speed between 100 mm/s and 120 mm/s. Following etching and formation of the ethylene selective layer 18, the ohmmeter R.sub.m is connected to the first and second regions or electrodes 14A, 14B to measure the resistance between the regions or electrodes 14A, 14B, as illustrated in FIG. 1.

(13) In experiments, a gold target with a purity of 99.999% was attached to the DC-magnetron of a DC sputtering system for DC sputtering on a soda-lime glass slide with a thickness of 1.0 mm. A 200 nm gold thin film layer was formed on the soda-lime glass slide using DC sputtering at 35 W at a pressure of 6×10.sup.−3 mbar in an argon atmosphere. The substrate was held at room temperature. Interdigitated electrodes, such as those shown in FIG. 1, were then formed in the gold layer using a carbon dioxide etching laser under the control of pattern-forming software. Etching was performed using a laser beam with a wavelength of 10.6 μm at a power of between 10.0 W and 11.0 W, and at an etching speed between 100 mm/s and 120 mm/s. Etching was performed in ambient air. The material contained within the etched channel was brown in color and analyzed using energy dispersive X-ray spectroscopy (EDX). The EDX results are shown in FIG. 5 and indicate that the material formed in the channel is K.sub.0.003Au.sub.0.008Mg.sub.0.009Ca.sub.0.015Si.sub.0.11Na.sub.0.175O.sub.0.68. To exfoliate the synthesized layer from the substrate, the entire sensor was ultrasonicated in deionized water and the suspended layer was deposited on a copper substrate for performing the EDX analysis.

(14) It is to be understood that the ethylene sensor and method of making same is not limited to the specific embodiments described above, but encompasses any and all embodiments within the scope of the generic language of the following claims enabled by the embodiments described herein, or otherwise shown in the drawings or described above in terms sufficient to enable one of ordinary skill in the art to make and use the claimed subject matter.