Method for polishing a semiconductor wafer on both sides

Abstract

Semiconductor wafers are polished on both sides between polishing pads of a Shore A hardness of at least 80 and a compressibility of less than 3%, attached to upper and lower polishing plates, the polishing pads attached to the upper and lower polishing plates by bonding the polishing pads to the plates, and positioning an intermediate pad having a compressibility of at least 3% between the two bonded polishing pads as an intermediate layer and then pressing together the two polishing pads with the intermediate pad situated therebetween for a period of time.

Claims

1. A method for polishing a semiconductor wafer on both sides, comprising polishing both sides of the wafer simultaneously between polishing pads having a room temperature Shore A hardness of at least 80 and a room temperature compressibility of less than 3% attached to upper and lower polishing plates, wherein the polishing pads are attached to the upper and lower polishing plates by bonding the polishing pads to the upper and lower polishing plates, and positioning an intermediate pad having a compressibility at room temperature of at least 3% between the two bonded polishing pads as an intermediate layer and then pressing the two polishing pads together with the intermediate pad situated therebetween for a period of time.

2. The method of claim 1, wherein the polishing pads are foamed pads based on polyurethane.

3. The method of claim 1, wherein the polishing pads have a room temperature Shore A hardness of from 80 to 100.

4. The method of claim 1, wherein the room temperature compressibility of the polishing pad is less than 2.5%.

5. The method of claim 1, wherein the intermediate pad has a room temperature compressibility of 3.2-7.6%.

6. The method as claimed of claim 1, wherein the intermediate pad comprises felt or a fibrous substrate.

7. The method of claim 6, wherein the intermediate pad comprises polyurethane elastomer fibers.

8. The method of claim 1, wherein the intermediate pad comprises two pads bonded together.

9. The method of claim 1, wherein the polishing pads have a thickness of from 0.75 to 1.1 mm.

10. The method of claim 1, wherein the intermediate pad has a thickness of from 1.5 to 2.6 mm.

Description

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

(1) According to the invention, an intermediate pad layer is provided between upper and lower polishing pads during pad pressing. The upper and the lower polishing pad are hard and barely compressible. The pad used as intermediate layer is more compressible than the polishing pads.

(2) The compressibility of a material describes what pressure change on all sides is required for bringing about a certain volume change. Compressibility is determined analogously to JIS L-1096 (Testing Methods for Woven Fabrics).

(3) The pad used as the intermediate layer is only used during the pad pressing. After the pad pressing, it is removed from the polishing system.

(4) Both foamed polishing pads (foamed pads) and polishing pads having a fibrous structure (nonwoven pads) are suitable as polishing pads having a high pad hardness and a low pad compressibility.

(5) In one embodiment, polishing pads having a Shore A hardness of from 80 to 100 (DIN EN ISO 868) at room temperature (23° C.±2° C.) are used.

(6) Preference is given to the use of polishing pads having a low or very low compressibility. Preferably, the compressibility of the polishing pad is less than 2.5%. More preferably, the compressibility of the polishing pad is less than 2.2%, and most preferably, the compressibility of the polishing pad is less than 2.0%. The stated compressibilities should be determined at room temperature (23° C.±2° C.).

(7) In one embodiment, the polishing pads or the working surfaces thereof consist of a thermoplastic or heat-curable polymer and have a porous matrix (foamed pad).

(8) A multiplicity of materials are possible as materials for the polishing pads, for example polyurethane, polycarbonate, polyimide, polyacrylate, polyester, etc.

(9) In one embodiment, the polishing pads or the working surfaces thereof consist of solid microporous polyurethane.

(10) In another embodiment, the polishing pads consist of foamed plates or felt substrates or fibrous substrates that are impregnated with polymers (nonwoven pad).

(11) The thickness of the polishing pads can be from 0.7 to 1.5 mm. In one embodiment, the thickness of the polishing pads is from 0.7 to 1.3 mm, more preferably from 0.75 to 1.1 mm.

(12) In the context of the invention, it has become apparent that, especially in the case of hard foamed polishing pads, sufficient adhesion to the polishing plates can only be ensured when a compressible intermediate layer is positioned during the pad pressing between the two pads to be pressed.

(13) In one embodiment, the pad used as an intermediate layer consists of felt or a fibrous substrate, i.e., of a nonwoven textile.

(14) The felt can be generated from chemical fibers or natural fibers of plant or animal origin.

(15) In one embodiment, it is felt produced from PU elastomer fibers.

(16) The thickness of the intermediate layer can be from 1.0 to 3.0 mm. In one embodiment, the thickness of the intermediate layer is from 1.5 to 2.6 mm.

(17) In one embodiment, the compressibility of the pad used as an intermediate layer is 3-10%. More preferably, a compressibility of the pad used as an intermediate layer is 3.2-7.6%. The stated compressibilities should be determined at room temperature (23° C.±2° C.).

(18) If, by contrast, pads having a compressibility of less than 3% or more than 10% are used as an intermediate layer, uniform adhesion of the polishing pads to the polishing plates is generally not achieved.

(19) In a preferred embodiment, the pad used as an intermediate layer comprises two pad layers bonded together. According to a preferred embodiment, the thickness of one pad layer is from 0.7 to 1.3 mm.

(20) A double-sided adhesive film, for example, is suitable for attaching the two pad layers.

(21) The use of such an intermediate layer in the pad pressing compensates for local unevennesses and achieves uniform adhesion over the entire polishing plate.

(22) Before the pad-pressing operation, the polishing pads are bonded to the respective polishing plates of the polishing machine.

(23) To this end, in one embodiment of the method, the polishing pads each have an adhesive film on their reverse side. Commercially available double-sided adhesive films, which are applied to the reverse side of the polishing pads, are suitable for example.

(24) In a further embodiment, the polishing plates are heated before the bonding of the polishing pads. For example, the polishing plates can be heated to a temperature of 40-50° C. As a result, there is a decrease in the viscosity of the adhesive film with simultaneous improvement in its adhesiveness.

(25) After the bonding of the polishing pads, the polishing plates are, if necessary, cooled. In one embodiment, the polishing plates are cooled to the desired polishing temperature, which is generally between 10 and 50° C.

(26) The heating and the cooling of the polishing plates before and after the bonding of the polishing pads is preferably achieved by means of an internal temperature-control element of the polishing plates.

(27) In a preferred embodiment, the polishing plates are cooled over a period from one up to several hours.

(28) In a further embodiment, the polishing plates are cooled during the pad pressing, which will be described in more detail below.

(29) In one embodiment, what takes place is the pressing operation in which the two barely compressible polishing pads are pressed together with the more compressible pad situated therebetween for a certain period of time.

(30) Preferably, the pad pressing is done at a pressure of at least 11,000 Pa.

(31) In one embodiment, the pressing operation takes place for the duration of one or more hours.

(32) The pressing operation preferably takes place at the bonding temperature recommended by the manufacturer of the polishing pads.

(33) In one embodiment, the pressing operation takes place at room temperature.

(34) In the prior art, an intermediate layer between the polishing pads when pressing together the polishing pads has not been envisaged to date. The polishing pads were bonded to the polishing plates and then pressed together. In the case of relatively soft pads, this was also possible without impairing the quality of the polished semiconductor wafers. However, in the case of hard polishing pads, a soft, compressible felt pad, for example, as intermediate layer is necessary in order to meet the requirements for the quality of the polished semiconductor wafers.

(35) When using hard pads without an intermediate layer, it was in some cases already noticeable after the pressing operation that the pads in the inner region were insufficiently pressed, i.e., the pads had insufficient adhesion to the polishing plate.

(36) By contrast, in the case of inventive use of an intermediate layer, the polishing pads are fully pressed on after the pressing operation, achieving a better and more homogeneous adhesion of the polishing pad, leading to a better quality of the polished semiconductor wafers.

(37) In one embodiment of the invention, a so-called pad dressing is carried out before the two-sided polishing of a semiconductor wafer between the polishing pads attached to the polishing plates in such a manner. In this connection, the polishing pads bonded to the polishing plates are adapted before the polishing operation to the particular individual plate shape of the polishing machine. Relevant methods are known in principle from the prior art and described, for example, in the documents EP 2 345 505 A2 or U.S. Pat. No. 6,682,405 B2.

(38) The pad dressing is advantageous, since a polishing plate can usually exhibit differences in the local evenness of up to ±50 μm. The purpose thereof is, by mechanical processing of the polishing pad situated on the polishing plate by means of suitable tools generally containing diamond abrasives, to set both a desired geometry of the polishing pad and thus a desired geometry of the polishing gap, and the desired properties of the pad surface (working surface) of the polishing pad. The polishing pad situated on the polishing plate is optimized each time for a certain polishing machine and a polishing gap.

(39) In one embodiment, the pad dressing of the two polishing pads, i.e., the processing of the working surfaces of the polishing pads, is carried out such that a polishing gap, which is formed by the semiconductor wafer to be polished with in each case the polishing-pad surface coming into contact with the semiconductor wafer and which extends from an inner edge up to an outer edge of the polishing pad, has a differing height at the inner edge and at the outer edge of the polishing pad. In other words, the polishing pad has a different pad thickness at the center than at the outer edge.

(40) In one embodiment of the method, the height of the polishing gap, i.e., the particular distance between the upper and lower polishing pad, is lower at the outer edge than at the inner edge of the polishing pad.

(41) For the polishing, the semiconductor wafers are placed into a suitably dimensioned slot of a carrier. Preferably, a liquid is fed during the polishing into the working gap formed between the working layers of the polishing pads. Said liquid is preferably a polishing agent suspension. Particular preference is given to the use of colloidal-dispersion silica, optionally with additives such as, for example, sodium carbonate (Na.sub.2CO.sub.3), potassium carbonate (K.sub.2CO.sub.3), sodium hydroxide (NaOH), potassium hydroxide (KOH), ammonium hydroxide (NH.sub.4OH), tetramethylammonium hydroxide (TMAH), as polishing agent suspensions. In the simultaneous polishing of the front side and the reverse side of the semiconductor wafer, there is preferably a surface removal of less than or equal to 15 μm per side, more preferably from 5 μm to 12 μm per side.

(42) The advantages of the invention are elucidated below on the basis of examples and comparative examples.

(43) Unless otherwise specified, all the parameters stated earlier and in the following examples and comparative examples were determined at a pressure of the ambient atmosphere, i.e., at about 1000 hPa, and at a relative air humidity of 50%.

(44) Shore A hardness is determined in accordance with DIN EN ISO 868. A type A durometer is used (Zwick 3130 hardness tester). The tip of the hardened steel rod penetrates the material. The penetration depth is measured on a scale of 0-100. The steel rod has the geometry of a truncated cone. Five measurements are performed in each case, from which the median value is specified. The measurement time is 15 s, the material to be tested was stored for 1 h under standard climatic conditions (23° C., 50% air humidity). The applied weight of the durometer is 12.5 N±0.5.

COMPARATIVE EXAMPLES

Comparative Example 1

(45) Polishing pads composed of felt (PU), Shore A hardness 60 at 23° C., compressibility 9.4% at 23° C., thickness 1.27 mm

(46) Pad pressing without intermediate layer, pressure 11,000 Pa, 2 hours

(47) After the pad pressing, there is good adhesion of the polishing pads to the polishing plates.

Comparative Example 2

(48) Polishing pads composed of felt (composed of PU elastomer fibers), Shore A hardness 84 at 23° C., compressibility 2.6% at 23° C., thickness 1.27 mm Pad pressing without intermediate layer, pressure 11,000 Pa, 2 hours

(49) After the pad pressing, there is poor adhesion of the inner region of the polishing pads to the polishing plates. This would inevitably lead to quality deficiencies in the polishing of the semiconductor wafers.

Comparative Example 3

(50) Foamed polishing pads (PU), Shore A hardness 93 at 23° C., compressibility 2.5% at 23° C., thickness 1.06 mm

(51) Pad pressing without intermediate layer, pressure 11,000 Pa, 2 hours

(52) After the pad pressing, there is poor adhesion of the inner region of the polishing pads to the polishing plates. This would inevitably lead to quality deficiencies in the polishing of the semiconductor wafers.

Example 1

(53) Polishing pads composed of felt (composed of PU elastomer fibers), Shore A hardness 84 at 23° C., compressibility 2.6% at 23° C., thickness 1.27 mm Use of an intermediate layer in the pad pressing (pressure 11,000 Pa, 2 hours) Intermediate layer: double-layer PU felt, thickness of one layer 1.27 mm, compressibility 3.3% at 23° C., Shore A hardness 83 at 23° C.

(54) After the pad pressing, there is excellent adhesion of the polishing pads to the polishing plates.

Example 2

(55) Foamed polishing pads (PU), Shore A hardness 84 at 23° C., compressibility 2.1% at 23° C., thickness 0.86 mm

(56) Use of an intermediate layer in the pad pressing (pressure 11,000 Pa, 2 hours)

(57) Intermediate layer: double-layer PU felt, thickness of one layer 1.27 mm, compressibility 3.3% at 23° C., Shore A hardness 83 at 23° C.

(58) After the pad pressing, there is excellent adhesion of the polishing pads to the polishing plates.

(59) The above description of illustrative embodiments is to be understood as being exemplary. The disclosure made thereby enables a person skilled in the art to understand the present invention and the advantages associated therewith and also comprehends alterations and modifications to the described structures and processes that are obvious to a person skilled in the art. All such alterations and modifications and also equivalents shall therefore be covered by the scope of protection of the claims.