Chip-integrated Titanium:Sapphire Laser

Abstract

An integrated Ti:Sapphire laser device includes a substrate [100], a first waveguide resonator [102] composed of a gain medium integrated onto the substrate in a planar technology configuration, a frequency doubler [104] composed of a second order nonlinear material integrated onto the substrate in a planar technology configuration, and a second waveguide resonator [106] composed of a titanium doped sapphire gain medium integrated onto the substrate in a planar technology configuration.

Claims

1. A Ti:Sapphire laser device comprising: a substrate; a first waveguide resonator composed of a gain medium integrated onto the substrate in a planar technology configuration; a frequency doubler composed of a second order nonlinear material integrated onto the substrate in a planar technology configuration; a second waveguide resonator composed of a titanium doped sapphire gain medium integrated onto the substrate in a planar technology configuration; wherein the first waveguide resonator is optically coupled to the frequency doubler and is capable of producing laser radiation from pump diode light input to the Ti:Sapphire laser device; wherein the frequency doubler is optically coupled to the second waveguide resonator and is capable of producing frequency doubled radiation from the laser radiation.

2. The Ti:Sapphire laser device of claim 1 wherein the first waveguide resonator is a Nd:YVO.sub.4 resonator or Nd:YAG resonator.

3. The Ti:Sapphire laser device of claim 1 wherein the frequency doubler comprises a SiC ring resonator that frequency doubles the laser radiation via a doubly resonant second-harmonic generation process.

4. The Ti:Sapphire laser device of claim 1 wherein the frequency doubler comprises a thin film lithium niobite resonator.

5. The Ti:Sapphire laser device of claim 1 wherein the second waveguide resonator includes dispersion-engineered laser cavity mirrors.

6. The Ti:Sapphire laser device of claim 1 wherein the second waveguide resonator includes a low-loss Kerr nonlinear mirror and one broadband linear mirror.

7. The Ti:Sapphire laser device of claim 1 wherein the substrate is SiO.sub.2 and the Ti:Sapphire laser has a device layer stack comprising YVO on SiO.sub.2 on SiC on SiO.sub.2 on Ti:Sapphire on the substrate.

8. The Ti:Sapphire laser device of claim 1 wherein the substrate is quartz, glass, or sapphire.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0013] FIG. 1A: Schematic diagram illustrating the main components and structure of an integrated Ti:Sapphire laser device according to an embodiment of the invention.

[0014] FIG. 1B: Conceptual figure representing on chip integrated Ti:Sapphire laser of size on the order of 100 μm. Combined with a commercial diode pump, its volume is smaller than one cubic centimeter—many orders of magnitude smaller than the state of the art.

[0015] FIG. 1C: Conceptual figure representing Ti:Sapphire laser cavity including a Kerr nonlinear mirror.

[0016] FIG. 2: A process flow for fabricating thin film Silicon Carbide on Insulator. This same approach can be used to transfer thin YVO films onto insulator, and thin Ti:Sapphire films onto insulator, thereby implementing the whole proposed circuit from FIG. 1.

[0017] FIG. 3: etched Sapphire waveguide showcasing low-pressure, low-roughness reactive ion etching method used to produce integrated sapphire photonic structures.

DETAILED DESCRIPTION

[0018] As illustrated in FIG. 1A, an embodiment of the Ti:Sapphire laser device includes a substrate 100, a first waveguide resonator 102 composed of a gain medium integrated onto the substrate in a planar technology configuration, a frequency doubler 104 composed of a second order nonlinear material integrated onto the substrate in a planar technology configuration, and a second waveguide resonator 106 composed of a titanium doped sapphire gain medium integrated onto the substrate in a planar technology configuration. The first waveguide resonator 102 is optically coupled to the frequency doubler 104 and is capable of producing laser radiation from pump diode light 108 input to the Ti:Sapphire laser device. The frequency doubler 104 is optically coupled to the second waveguide resonator 106 and is capable of producing frequency doubled radiation from the laser radiation. The Ti:Sapphire laser device outputs laser light 110 from the second waveguide resonator 106.

[0019] This embodiment may be realized using various different material systems and resonator configurations. For example, the first waveguide resonator 102 may be a Nd:YVO.sub.4 resonator or Nd:YAG resonator. The frequency doubler 104 may be a SiC ring resonator that frequency doubles the laser radiation via a doubly resonant second-harmonic generation process. The second waveguide resonator 106 preferably includes dispersion-engineered laser cavity mirrors.

[0020] In one example shown in FIG. 1B, light 128 generated from an infrared diode (not shown) is input to the device and pumps an integrated Nd:YVO.sub.4 ring resonator 122, which produces narrow-band laser light at 1064 nm. The 1064 nm emission is routed onto a SiC ring resonator 124, which frequency-doubles it to 532 nm via doubly resonant efficient second harmonic generation process. The 532 nm light is routed to the Ti:Sapphire resonator 126. The device outputs pulsed light 130. Combined with a commercial diode pump, the volume of the system is smaller than one cubic centimeter-many orders of magnitude smaller than the state of the art.

[0021] In one realization of the Ti:Sapphire laser device, the substrate is SiO.sub.2 and the Ti:Sapphire laser has a device layer stack comprising YVO on SiO.sub.2 on SiC on SiO.sub.2 on Ti:Sapphire on the substrate. A technique for fabricating Silicon Carbide on Insulator devices has been disclosed in U.S. patent application Ser. No. 16/805,073, hereby incorporated by reference in its entirety. The process flow for fabricating Silicon Carbide on Insulator is shown in FIG. 2, and the process for YVO and Ti:Sapphire follow a very similar process. The techniques to implement thin film silicon carbide on insulator may be adapted to transfer thin YVO films onto insulator, and thin Ti:Sapphire films onto insulator. The process, as shown in FIG. 2, begins with a substrate 202, 204 and bulk active material 200 (YVO or Ti:Sapphire). The substrate and active material are fusion bonded 206 to each other at a bond interface to form material 208. Then, precision grinding 210 thins the material 212 down to thickness approximately 1 micron greater than target device thickness. Finally, chemical-mechanical polishing 214 removes the last several microns of material, simultaneously producing a surface with roughness better than 3 Angstroms RMS. The result is layered material 216.

[0022] The modification of the technique for fabricating Silicon Carbide on Insulator devices disclosed in U.S. patent application Ser. No. 16/805,073 enabling the extension of the technique to Sapphire is the use of a substrate with a matched thermal expansion coefficient: Fabrication of Ti:Sapphire on insulator with a Sapphire handle is used to prevent strain build-up that would result in cracking of the film during thinning and polishing. The versatility of this method enables the stacking of arbitrary layers of highly-pure crystalline materials. This is important for the implementation of on-chip Ti:Sapphire laser. The device layer stack for Ti:Sapphire laser in one embodiment is YVO on SiO.sub.2, SiC on SiO.sub.2, and Ti:Sapphire on SiO.sub.2. The integration of these materials together can be done via bonding them side by side on a chip and using low-loss vertically coupled waveguide interconnects to route light between the different stages of the device.

[0023] Sapphire is one of the most difficult dielectric materials to process for patterning nanostructures. We developed a fabrication technique based on photolithography and reactive-ion-etching for low-roughness sapphire etching with good selectivity against photoresist, to enable fabrication of high quality structures in Sapphire. The fabrication is done via utilizing inductively coupled plasma (ICP). In particular, we utilize chemically reactive ions for sapphire, such as BCl.sub.3 and/or Cl.sub.2, which helps to provide fast and smooth etch. Furthermore, utilizing etch operation under low pressure (e.g., 0.1-0.5 mTorr) condition with high bias (e.g., 400-800 V) and Ar ions, we are also combining ion-induced etching, which further improves etching conditions. With such etching technique, we are able to define waveguide and resonator structures in sapphire simultaneously maintaining a selectivity of 0.3 against photoresist while minimizing redeposition during etch. Redeposition during etching is particularly harmful to low-roughness sidewalls. Finally, partial etching into sapphire, thereby not exposing SiO.sub.2 underlayer, allows removal of redeposition via dilute Hydrofluoric acid, producing photonic structures entirely without etch redeposition, shown in FIG. 3.

[0024] The Ti:Sapphire laser device preferably includes dispersion-engineered laser cavity mirrors in the second waveguide resonator. This can be done via a traditional ring resonator approach (e.g., Nature Photonics, 10, 316-320 (2016)), or via dispersion engineered reflectors The cavity dispersion is one of key parameters that determine temporal width and spectral shape of the pulsed laser output. Precise fabrication technique (FIGS. 2 and 3) and various photonic designs enable broadband dispersion control. Such dispersion engineering techniques (e.g., see Optics Letters 19, 3, 201-203 (1994)) may be implemented in this laser device and provide a key role to generate broad bandwidth pulse. Photonic inverse design methods may be used to implement optimal dispersion engineering. Spectral bandwidth of pulse laser is important key metric for microscopy, spectroscopy, optical clock, and particle accelerator applications.

[0025] In one embodiment, shown in FIG. 1C, the Ti:Sapphire laser device includes low-loss Kerr nonlinear mirror 154 in the second waveguide resonator. The second waveguide resonator is formed using the Kerr nonlinear mirror 154 and one traditional mirror 152. A mode locked laser generally requires a device that provides higher gain for short pulses and enable a self-starting laser (turnkey operation). Free-space mode-locked laser uses semiconductor saturable absorber, Kerr lens, polarization rotator, and many more (e.g., see IEEE Journal of Selected Topics in Quantum Electronics, 6, 6, 1173-1185 (2000)). However, traditional devices are either non-integrable or cause high loss, low damage threshold, and narrow operation bandwidth. The Kerr nonlinear mirror has a broadband linear waveguide mirror 156 and microring resonator 158. The ring resonator is placed next to the waveguide mirror (e.g., see Nature Photonics, 14, 369-374 (2020)). Alternatives of the ring resonator would be photonic crystal resonator or another waveguide resonator. The integrated Kerr nonlinear mirror shows higher reflectivity for short pulses with low insertion loss, broad operation bandwidth, and high damage threshold. The device is implemented in this laser device (Ti:Sapphire second waveguide resonator) and enables a self-starting operation of mode-locked laser. Low-loss operation of the Kerr nonlinear mirror enables high peak power of pulsed laser.

[0026] The miniaturized and inexpensive Ti:Sapphire laser provided by the present invention may be integrated with on chip photonics and has many applications, such as the following.

[0027] 1) A low-cost, compact, integratable solution for two-photon microscopy in medical research and neuroscience.

[0028] 2) LIDAR systems where a pulsed Ti:Sapphire source could also be integrated with beam-steering photonics on a single chip, thereby reducing the cost and size and enabling integration with other car sensors.

[0029] 3) Optical clocks of unprecedented precision, where frequency-stabilized Ti:Sapphire laser would synthesize a microwave clock signal from atomic or ion transition frequency in an optical trap.

[0030] 4) Dual-comb spectroscopy—a monolithically integrated, short-acquisition-time solution for high spectral resolution spectroscopy, fully miniaturized.

[0031] 5) Ultrastable terahertz- and radio-frequency signal generation where Ti:Sapphire mode-locked laser could be used to produce a spectrally pure micro- or terahertz-signal at the frequency of pulse repetition rate, with spectroscopy and imaging applications.

[0032] 6) Laser-driven dielectric particle accelerators on chip, which are crucial building blocks of on chip X-ray sources which would revolutionize medical applications.

[0033] 7) Integrated quantum photonics devices. Currently, on-chip quantum photonic devices being developed for quantum computation and quantum repeaters employ large scale Ti:Sapphire lasers to pump the quantum emitters with ultra-fast pulses. Generation of high purity single or entangled photon states for quantum information processing in a compact platform thus requires a compact ultra-fast source.