Substrate processing method

Abstract

A substrate having a first surface with at least one division line and an opposite second surface is processed by attaching a protective sheeting to the first surface and applying a laser beam to the protective sheeting to form a plurality of alignment marks in the protective sheeting. The substrate has a backside layer on the second surface. A laser beam is applied to the substrate from the side of the first surface. The substrate is transparent to the laser beam and the focal point of the laser beam is located inside the substrate which is closer to the second surface than to the first surface, to form a plurality of alignment marks in the backside layer. Substrate material is removed along the division line from the side of the second surface. The alignment marks are used for aligning the substrate material removing means relative to the division line.

Claims

1. A method of processing a substrate having a first surface with at least one division line formed thereon and a second surface opposite the first surface, the method comprising: attaching a protective sheeting to the first surface, applying a laser beam to the protective sheeting so as to form a plurality of alignment marks in the protective sheeting, and removing substrate material along the at least one division line from the side of the second surface by using a substrate material removing means, wherein the alignment marks are used for aligning the substrate material removing means relative to the at least one division line.

2. The method according to claim 1, wherein a portion of the protective sheeting laterally extends beyond the first surface, and at least one of the alignment marks is formed in the portion of the protective sheeting laterally extending beyond the first surface.

3. The method according to claim 2, wherein the portion of the protective sheeting laterally extending beyond the first surface extends along a thickness direction of the substrate from the first surface towards the second surface, and at least one of the alignment marks is formed in the portion of the protective sheeting laterally extending beyond the first surface in a position which is closer to the second surface than to the first surface.

4. The method according to claim 1, wherein a backside layer, in particular, a metal layer, is formed on the second surface.

5. The method according to claim 1, wherein the protective sheeting is made of a material which is transparent to the laser beam.

6. A method of processing a substrate, having a first surface with at least one division line formed thereon and a second surface opposite the first surface, wherein a backside layer is formed on the second surface and the method comprises: applying a laser beam to the substrate from the side of the first surface, wherein the substrate is made of a material which is transparent to the laser beam and the laser beam is applied to the substrate in a condition where a focal point of the laser beam is located at a position inside the substrate which is closer to the second surface than to the first surface, so as to form a plurality of alignment marks in the backside layer and/or in a region of the second surface in which the backside layer is not present, and removing substrate material along the at least one division line from the side of the second surface by using a substrate material removing means, wherein the alignment marks are used for aligning the substrate material removing means relative to the at least one division line.

7. The method according to claim 6, wherein the backside layer is a metal layer.

8. The method according to claim 7, further comprising attaching a protective sheeting to the first surface, wherein the protective sheeting is made of a material which is transparent to the laser beam, and the laser beam is applied to the substrate through the protective sheeting.

9. The method according to claim 1, further comprising applying a laser beam to the substrate from the side of the first surface, wherein the substrate is made of a material which is transparent to the laser beam and the laser beam is applied to the substrate at least in a plurality of positions along the at least one division line so as to form a plurality of modified regions in the substrate.

10. The method according to claim 1, wherein the substrate material is mechanically removed along the at least one division line, in particular, by mechanically cutting the substrate along the at least one division line.

11. The method according to claim 1, wherein the substrate material is removed along the at least one division line by laser cutting, in particular, by laser ablation.

12. The method according to claim 1, wherein the substrate material is removed along only a part of the thickness, in the direction from the second surface towards the first surface, of the substrate.

13. The method according to claim 1, further comprising applying an external force to the substrate after removing substrate material along the at least one division line so as to divide the substrate along the at least one division line.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) Hereinafter, non-limiting examples of the invention are explained with reference to the drawings, in which:

(2) FIG. 1 is a cross-sectional view showing a wafer as a substrate to be processed by embodiments of the methods of the present invention;

(3) FIG. 2 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to a first embodiment of the method of the present invention;

(4) FIG. 3 is a cross-sectional view showing the outcome of the step of applying the laser beam to the substrate illustrated in FIG. 2;

(5) FIG. 4 is a cross-sectional view showing the outcome of a step of attaching the substrate to a sheeting according to the first embodiment of the method of the present invention;

(6) FIG. 5 is a cross-sectional view illustrating a step of cutting the substrate according to the first embodiment of the method of the present invention;

(7) FIG. 6 is a cross-sectional view showing the outcome of the step of cutting the substrate illustrated in FIG. 5;

(8) FIG. 7 is a cross-sectional view showing the outcome of a step of applying an external force to the substrate according to the first embodiment of the method of the present invention;

(9) FIG. 8 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to a second embodiment of the method of the present invention;

(10) FIG. 9 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to a modification of the second embodiment of the method of the present invention;

(11) FIG. 10 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to a third embodiment of the method of the present invention;

(12) FIG. 11 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to a modification of the third embodiment of the method of the present invention;

(13) FIG. 12 is a cross-sectional view showing the outcome of a step of attaching a protective sheeting to the substrate according to a fourth embodiment of the method of the present invention;

(14) FIG. 13 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to the fourth embodiment of the method of the present invention;

(15) FIG. 14 is a cross-sectional view showing the outcome of a step of attaching the substrate to a sheeting and illustrating a step of cutting the substrate according to the fourth embodiment of the method of the present invention;

(16) FIG. 15 is a cross-sectional view showing the outcome of a step of attaching a protective sheeting to the substrate according to a modification of the fourth embodiment of the method of the present invention;

(17) FIG. 16 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to the modification of the fourth embodiment of the method of the present invention;

(18) FIG. 17 is a cross-sectional view illustrating a step of cutting the substrate according to the modification of the fourth embodiment of the method of the present invention;

(19) FIG. 18 is a cross-sectional view showing the outcome of a step of attaching a protective sheeting to the substrate according to a fifth embodiment of the method of the present invention;

(20) FIG. 19 is a cross-sectional view illustrating a step of applying a laser beam to the substrate according to the fifth embodiment of the method of the present invention; and

(21) FIG. 20 is a cross-sectional view illustrating a step of cutting the substrate according to the fifth embodiment of the method of the present invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

(22) Preferred embodiments of the present invention will now be described with reference to the accompanying drawings. The preferred embodiments relate to methods of processing a wafer as a substrate.

(23) FIG. 1 is a cross-sectional view of a substrate 2 to be processed by the embodiments of the methods of the present invention. The substrate 2 is a semiconductor wafer, in particular, an SiC wafer. However, different types of substrate and, in particular, different substrate materials may be used, as has been detailed above.

(24) As is shown in FIG. 1, the substrate 2 has a first surface 4 and a second surface 6 opposite the first surface 4. The first surface 4 and the second surface 6 are substantially parallel to each other. On the first surface 4, a device area 8 with a plurality of devices 10 is formed. The devices 10 are partitioned by a plurality of division lines 12 which are also formed on the first surface 4. The division lines 12 are substantially arranged in a lattice pattern. The devices 10 may comprise or be, for example, transistors, such as MOSFETs or insulated-gate bipolar transistors (IGBTs), or diodes, e.g., Schottky barrier diodes.

(25) A backside layer 14 is formed on the second surface 6. The backside layer 14 is a metal layer which is at least substantially opaque to light in the visible and infrared (IR) ranges. The backside layer 14 covers almost the entire second surface 6 with the exception of a small peripheral portion of the second surface 6 (see FIG. 1).

(26) In the following, a first embodiment of the method of the present invention will be described with reference to FIGS. 2 to 7.

(27) A pulsed laser beam LB is applied to the substrate 2 from the side of the first surface 4, as is indicated by an arrow in FIG. 2. The pulsed laser beam LB may have a pulse width, for example, in the range of 1 fs to 300 ns. The material of the substrate 2, in particular, SiC, is transparent to the pulsed laser beam LB so that the pulsed laser beam LB is transmitted through the substrate 2. The pulsed laser beam LB is applied to the substrate 2 in a condition where a focal point of the pulsed laser beam LB is located at a position which is, at least substantially, arranged at an interface between the second surface 6 of the substrate 2 and the backside layer 14. This arrangement of the focal point is not illustrated in FIG. 2. By locating the focal point at least substantially at the interface between the second surface 6 of the substrate 2 and the backside layer 14, a considerable portion of the pulsed laser beam LB is absorbed at this interface, thereby at least partially melting the backside layer 14. In this way, an alignment mark 16 is formed in the backside layer 14 (see FIG. 2). Subsequently, the focal point of the pulsed laser beam LB is moved in the lateral direction of the substrate 2 so as to form further alignment marks 16 at different positions in the backside layer 14. By using the pulsed laser beam LB in this manner, a plurality of alignment marks 16 can be formed in the backside layer 14 in an efficient manner and with a high degree of accuracy, in particular, so as to be clearly visible from the side of the second surface 6.

(28) For example, the pulsed laser beam LB applied to the substrate 2 for forming the plurality of alignment marks 16 may have the following properties: Wavelength: 300 to 1100 nm, Pulse width: 10 to 100 ns, Pulse energy: 1 to 10 μJ, Pulse pitch (centre to centre): 0.5 to 4 μm.

(29) In the first embodiment, the alignment marks 16 are provided so that at least one alignment mark 16 is arranged substantially at the widthwise center of each division line (see FIG. 3). The alignment marks 16 may be, for example, in the form of one or more dots or one or more lines. However, the shapes and the arrangement of the alignment marks 16 are not particularly limited, as has been detailed above.

(30) After forming the alignment marks 16 in the backside layer 14, the pulsed laser beam LB is applied to the substrate 2 from the side of the first surface 4 in a plurality of positions along each division line 12 so as to form a plurality of modified regions 18 in the substrate 2 (see FIGS. 2 and 3). The pulsed laser beam LB applied to the substrate 2 so as to form the plurality of modified regions 18 may be the same as the pulsed laser beam LB applied to the substrate 2 so as to form the plurality of alignment marks 16. Alternatively, two different laser beams may be used for these purposes.

(31) For example, the pulsed laser beam LB applied to the substrate 2 for forming the plurality of modified regions 18 may have the following properties: Wavelength: 300 to 1100 nm, Pulse width: 10 to 100 ns, Pulse energy: 5 to 40 μJ, Pulse pitch (centre to centre): 6 to 24 μm.

(32) By forming the modified regions 18 after forming the alignment marks 16, it can be ensured that the alignment marks 16 are formed with a particularly high degree of accuracy. In particular, it can be reliably avoided that the modified regions 18 interfere with the process of applying the pulsed laser beam LB for forming the alignment marks 16.

(33) The modified regions 18 are regions of the substrate 2 which have been modified by the application of the pulsed laser beam LB. For example, the modified regions 18 may comprise or be amorphous regions and/or regions in which cracks are formed. The cracks may have dimensions, e.g., lengths and/or widths, in the μm range, as has been detailed above.

(34) In the present embodiment, each modified region 18 is arranged entirely within the bulk of the substrate 2, as is shown in FIGS. 2 and 3. Thus, each modified region 18 extends along only a part of the thickness, in the direction from the first surface 4 towards the second surface 6, of the substrate 2. The amount of extension of the modified regions 18 along the substrate thickness and the position of the modified regions 18 along the substrate thickness can be accurately controlled, for example, by locating the focal point of the pulsed laser beam LB at an appropriate distance from the first surface 4.

(35) As is shown in FIGS. 2 and 3, in each of the plurality of positions along the division lines 12, a plurality of, namely three, modified regions 18 are formed and the modified regions 18 are arranged next to one another along the thickness direction of the substrate 2. In this way, plural layers of modified regions 18 are formed which are stacked along the substrate thickness. However, the number, arrangement, extensions and shapes of the modified regions 18 are not particularly limited.

(36) The formation of the modified regions 18 in the substrate 2 reduces the strength of the substrate 2 in the areas where the modified regions 18 are formed. Hence, the removal of substrate material along the division lines 12, which will be described in detail below, can be considerably facilitated. In particular, the mechanical removal of substrate material, such as the mechanical cutting of the substrate 2, along the division lines 12 can be performed in a more efficient manner, e.g., with an increased processing speed. For the case of a blade or saw dicing process, the blade or saw dicing speed can be significantly increased.

(37) In the present embodiment, while all of the modified regions 18 are arranged entirely inside the substrate 2, cracks 20 are extending from the modified regions 18, in particular, towards the first surface 4. As is shown in FIGS. 2 and 3, optionally, the cracks 20 may extend all the way to the first surface 4. These cracks 20 in the substrate 2 are caused by the modification of the substrate material in the modified regions 18. The presence of the cracks 20 helps to further facilitate the process of dividing the substrate 2 along the division lines 12, as will be detailed below.

(38) After all of the alignment marks 16 and modified regions 18 have been formed (see FIG. 3), the substrate 2 is attached to a sheeting 22. Specifically, the first surface 4 of the substrate 2 is attached to the sheeting 22 so that the sheeting 22 covers the devices 10 formed in the device area 8 (see FIG. 4). The sheeting 22 may be a conventional dicing tape or the protective sheeting described in detail above. For example, the sheeting 22 may comprise or consist of a protective film and/or a cushioning layer and/or a base sheet as detailed above. The sheeting 22 is supported at a peripheral portion thereof by an annular frame 24, so as to close an inner opening of the annular frame 24 by the sheeting 22.

(39) The sheeting 22 may be provided with an adhesive layer (not shown) for attaching the sheeting 22 to the first surface 4 of the substrate 2. The adhesive layer may be arranged only in a peripheral area of the front surface of the sheeting 22.

(40) In this case, in a central area of the front surface of the sheeting 22, the front surface of the sheeting 22 and the first surface 4 are in direct contact with each other. Thus, the risk of a possible contamination of or damage to the first surface 4, in particular, the devices 10, e.g., due to the adhesive force of the adhesive layer or adhesive residues on the substrate 2, can be significantly reduced or even eliminated.

(41) After attaching the substrate 2 to the sheeting 22, substrate material is removed along the division lines 12 from the side of the second surface 6 of the substrate 2, as is illustrated in FIG. 5. The substrate material is removed by mechanically cutting the substrate 2 along the division lines 12, using a dicing blade 26 as a substrate material removing means. Alternatively, for example, the substrate material may be removed by laser cutting, in particular, by laser ablation, using a laser cutting means as the substrate material removing means. The substrate 2 is cut along the division lines 12 through the backside layer 14 (see FIG. 5). Thus, the alignment marks 16 are removed in the cutting process.

(42) The substrate 2 may be cut by a single cut or a step cut, e.g., using a combination of different cutting processes, such as cutting steps employing dicing blades with different cutting widths. The process of cutting the substrate 2 is greatly facilitated by the presence of the modified regions 18, as has been detailed above.

(43) The alignment marks 16 formed in the backside layer 14 are used for aligning the dicing blade 26 relative to the division lines 12 to be cut. Hence, the dicing blade 26 can be aligned relative to the division lines 12 with enhanced alignment accuracy, allowing for the substrate cutting process to be performed with a high degree of precision. Therefore, the width of the division lines 12 can be reduced, enabling the accommodation of an increased number of devices 10 on the first surface 4. In this way, the production efficiency is significantly enhanced and the waste of substrate material is avoided. This is particularly advantageous for the case of expensive substrate materials, such as SiC and GaAs.

(44) As is shown in FIG. 5, the substrate 2 is cut along only a part of the thickness of the substrate 2. In particular, the substrate 2 is cut along the entire extension, in the direction from the second surface 6 towards the first surface 4, of the modified regions 18. In this way, the modified regions 18 are removed in the substrate cutting process. Hence, the die strength of the dies to be obtained from the substrate 2 (see FIG. 7) can be further increased.

(45) A force applied to the substrate 2 by the dicing blade 26 in the substrate cutting process may enhance the propagation of the cracks 20. For example, this force may cause some of the cracks 20 to extend all the way to the first surface 4. In this way, the process of dividing the substrate 2 along the division lines 12 can be further facilitated.

(46) After the substrate 2 has been cut along all of the division lines 12, as is shown in FIG. 6, the sheeting 22 is radially expanded, e.g., by using an expansion drum or the like. In this way, a radial external force is applied to the substrate 2 so as to divide the substrate 2 along the division lines 12 into individual dies 28 (see FIG. 7). Specifically, the substrate 2 is divided along the division lines 12 where the strength of the substrate 2 is reduced by the presence of the partial cuts formed in the substrate cutting step. The process of dividing the substrate 2 is facilitated even more if the substrate 2 is further weakened along the division lines 12 by cracks 20 extending towards the first surface 4, in particular, all the way to the first surface 4.

(47) After fully dividing the substrate 2 in this manner, the individual dies 28 can be picked up from the sheeting 22, e.g., by using a pick up device (not shown).

(48) Since, in the method of the present embodiment, the substrate 2 is cut along only a part of its thickness and fully divided by applying an external force thereto, the widths of the division lines 12 can be reduced even further. In particular, these widths can be chosen so as to be smaller than the cutting width of the dicing blade 26. For example, the division line widths may be 30 μm or less, preferably 20 μm or less.

(49) In the following, a second embodiment of the method of the present invention will be described with reference to FIGS. 8 and 9.

(50) The method of the second embodiment differs from the method of the first embodiment only in that a protective sheeting 30 (see FIGS. 8 and 9) is attached to the first surface 4 of the substrate 2 before applying the pulsed laser beam LB to the substrate 2.

(51) The pulsed laser beam LB is applied to the substrate 2, so as to form the alignment marks 16 and the modified regions 18, substantially in the same manner as in the method of the first embodiment (see FIG. 8). However, the pulsed laser beam LB is applied through the protective sheeting 30. The protective sheeting 30 may be made of a material which is transparent to the pulsed laser beam LB so that the pulsed laser beam LB is transmitted through the protective sheeting 30. Alternatively, the pulsed laser beam LB may cut through the protective sheeting 30 so as to reach the first substrate surface 4.

(52) The protective sheeting 30 is attached to the first surface 4 so as to cover the devices 10 formed in the device area 8.

(53) Thus, the devices 10 are reliably protected by the protective sheeting 30 against contamination, e.g., by debris, dust particles or the like, and damage.

(54) The protective sheeting 30 may have the features, properties and characteristics described in detail above. In particular, the protective sheeting 30 may comprise or consist of a protective film and/or a cushioning layer and/or a base sheet as described above.

(55) The protective sheeting 30 may be provided with an adhesive layer (not shown) for attaching the protective sheeting 30 to the first surface 4 of the substrate 2. The adhesive layer may be arranged only in a peripheral area of the front surface of the protective sheeting 30. In this case, in a central area of the front surface of the protective sheeting 30, the front surface of the protective sheeting 30 and the first surface 4 are in direct contact with each other. Thus, the risk of a possible contamination of or damage to the first surface 4, in particular, the devices 10, e.g., due to the adhesive force of the adhesive layer or adhesive residues on the substrate 2, can be significantly reduced or even eliminated.

(56) Alternatively, the protective sheeting 30 may be applied to the first surface 4 so that an entire front surface of the protective sheeting 30 is in direct contact with the first surface 4. In this case, no material, in particular, no adhesive, is present between the front surface of the protective sheeting 30 and the first surface 4. Hence, the risk of a possible contamination of or damage to the first surface 4 can be reliably eliminated.

(57) A modification of the second embodiment of the method of the present invention is shown in FIG. 9. In this modification, the second embodiment is modified by supporting a peripheral portion of the protective sheeting 30 by an annular frame 32 (see FIG. 9), so as to close an inner opening of the annular frame 32 by the protective sheeting 30. Also in the modification of the second embodiment, the pulsed laser beam LB is applied to the substrate 2, so as to form the alignment marks 16 and the modified regions 18, substantially in the same manner as in the method of the first embodiment (see FIG. 9).

(58) By providing the annular frame 32, handling of the substrate 2 in the substrate processing steps can be further facilitated and rendered even more efficient. In particular, in this way, the step of attaching the substrate 2 to the sheeting 22 (see FIG. 4) before cutting the substrate 2 can be eliminated.

(59) In the second embodiment and the modification thereof, the subsequent steps of cutting and dividing the substrate 2 along the division lines 12 are performed substantially in the same manner as in the first embodiment (see FIGS. 5, 6 and 7). In particular, in the modification of the second embodiment, the protective sheeting 30 is radially expanded, e.g., by using an expansion drum or the like. In this way, a radial external force is applied to the substrate 2 so as to divide the substrate 2 along the division lines 12 into the individual dies 28 (see FIG. 7).

(60) After fully dividing the substrate 2 in this manner, the individual dies 28 can be picked up, e.g., by using a pick up device (not shown).

(61) In the following, a third embodiment of the method of the present invention will be described with reference to FIGS. 10 and 11.

(62) The method of the third embodiment differs from the method of the first embodiment in that the alignment marks 16 are formed in a region of the second surface 6 in which the backside layer 14 is not present (see FIGS. 10 and 11).

(63) As is shown in FIG. 10, the backside layer 14 covers only a part of the second surface 6 of the substrate 2. In particular, the backside layer 14 is only provided in a central portion of the second surface 6. Thus, the backside layer 14 is not present in a peripheral portion 34 of the second surface 6 which surrounds the central portion of the second surface 6. The peripheral portion 34 may have an at least substantially annular shape. The peripheral portion 34 may have a width, e.g., a ring width, in the range of 0.1 mm to 3 mm. In the present embodiment, the backside layer 14 substantially is present only in an area of the second surface 6 which corresponds to the device area 8 formed on the first surface 4.

(64) In the method of the third embodiment, all of the alignment marks 16 are formed in the peripheral portion 34 of the second surface 6 in which the backside layer 14 is not present (see FIG. 10). In particular, the alignment marks 16 are formed by locating the focal point of the pulsed laser beam LB at a position which is, at least substantially, arranged at the second surface 6 in the peripheral portion 34 thereof (see FIG. 10). By locating the focal point at least substantially at the second surface 6, a considerable portion of the pulsed laser beam LB is absorbed at this surface, thereby forming alignment marks 16 in the peripheral portion 34 which are clearly visible from the side of the second surface 6.

(65) By using these alignment marks 16, the dicing blade 26 can be reliably and accurately aligned relative to the division lines 12 for the subsequent step of cutting the substrate 2 along the division lines 12.

(66) In the method of the third embodiment, the modified regions 18 are formed in the substrate 2 in the same manner as in the method of the first embodiment. The pulsed laser beam LB applied to the substrate 2 so as to form the plurality of modified regions 18 may be the same as the pulsed laser beam LB applied to the substrate 2 so as to form the plurality of alignment marks 16. Alternatively, two different laser beams may be used for these purposes.

(67) A modification of the third embodiment of the method of the present invention is shown in FIG. 11. In this modification, the third embodiment is modified by attaching the second surface 6 of the substrate 2 to a sheeting 36 (see FIG. 11). A peripheral portion of the sheeting 36 is supported by an annular frame 38 (see FIG. 11), so as to close an inner opening of the annular frame 38 by the sheeting 36.

(68) The sheeting 36 may be a conventional dicing tape or a protective sheeting, such as the protective sheeting 30 described above.

(69) By attaching the second surface 6 of the substrate 2 to the sheeting 36 supported by the annular frame 38, handling of the substrate 2 in the substrate processing steps can be further facilitated and rendered even more efficient.

(70) In the third embodiment and the modification thereof, the subsequent steps of cutting and dividing the substrate 2 along the division lines 12 are performed substantially in the same manner as in the first embodiment (see FIGS. 5, 6 and 7).

(71) After fully dividing the substrate 2 in this way, the individual dies 28 can be picked up, e.g., by using a pick up device (not shown).

(72) In the following, a fourth embodiment of the method of the present invention will be described with reference to FIGS. 12 to 17.

(73) The method of the fourth embodiment differs from the method of the first embodiment substantially in that the alignment marks 16 are formed in a protective sheeting.

(74) In the method of the fourth embodiment, before applying the pulsed laser beam LB to the substrate 2, a protective sheeting is attached to the first surface 4 of the substrate 2. In the present embodiment, the protective sheeting is the protective sheeting 30 and may have the features, properties and characteristics described above. In particular, the protective sheeting 30 may be attached to the first surface 4 with or without an adhesive layer (not shown), as has been detailed above.

(75) The protective sheeting 30 is attached to the first surface 4 so as to cover the devices 10 formed in the device area 8. The protective sheeting 30 protects the first surface 4, in particular, the devices 10, against contamination and damage.

(76) As is shown in FIG. 12, a portion 40 of the protective sheeting 30 laterally extends beyond the first surface 4. The portion 40 of the protective sheeting 30 surrounds the first surface 4. The portion 40 may have a substantially annular shape. In other embodiments, for example, for the case of a substrate with a rectangular or square shape, the portion 40, at least substantially, may have an open rectangular shape or an open square shape, i.e., a rectangular or square shape, respectively, with an opening in the centre thereof.

(77) After attaching the protective sheeting 30 to the first surface 4, modified regions 18 are formed in the substrate 2 and alignment marks 16 are formed in the protective sheeting 30, as is illustrated in FIG. 13. The order of these two steps is not particularly limited. For example, the modified regions 18 may be formed before the alignment marks 16. Alternatively, the alignment marks 16 may be formed before the modified regions 18.

(78) The pulsed laser beam LB is applied to the substrate 2 so as to form the modified regions 18 in the substrate 2 substantially in the same manner as in the method of the second embodiment (see FIGS. 8 and 13). In particular, the pulsed laser beam LB is applied through the protective sheeting 30. The protective sheeting 30 may be made of a material which is transparent to the pulsed laser beam LB so that the pulsed laser beam LB is transmitted through the protective sheeting 30. Alternatively, the pulsed laser beam LB may cut through the protective sheeting 30 so as to reach the first substrate surface 4.

(79) The pulsed laser beam LB is applied to the protective sheeting 30 so as to form the alignment marks 16 in the protective sheeting 30. In particular, the alignment marks 16 are formed in the protective sheeting 30 by locating the focal point of the pulsed laser beam LB at positions in the protective sheeting 30 where the alignment marks 16 are to be formed. All of the alignment marks 16 are formed in the portion 40 of the protective sheeting 30 which laterally extends beyond the first surface 4 (see FIG. 13). In this way, the dicing blade 26 can be aligned relative to the division lines 12 with particularly high alignment accuracy, allowing for the substrate cutting process (see FIG. 14) to be performed with an especially high degree of precision.

(80) In the present embodiment, the pulsed laser beam LB applied to the substrate 2 for forming the modified regions 18 may be the same as the pulsed laser beam LB applied to the protective sheeting 30 for forming the alignment marks 16. Alternatively, two different laser beams may be used for these purposes.

(81) After all of the alignment marks 16 and modified regions 18 have been formed, the substrate 2 is attached to a further sheeting 42 (see FIG. 14). Specifically, the first surface 4 of the substrate 2, having the protective sheeting 30 provided thereon, is attached to the sheeting 42. The sheeting 42 may be a conventional dicing tape. The sheeting 42 is supported at a peripheral portion thereof by an annular frame 44, so as to close an inner opening of the annular frame 44 by the sheeting 42, as is shown in FIG. 14. In this way, handling of the substrate 2 in the substrate processing steps can be further facilitated.

(82) After attaching the substrate 2 to the sheeting 42, the substrate 2 is cut along the division lines 12 from the side of the second surface 6 by using the dicing blade 26 (see FIG. 14) substantially in the same manner as in the method of the first embodiment. In particular, the substrate 2 is cut along the division lines 12 through the backside layer 14.

(83) The alignment marks 16 formed in the portion 40 of the protective sheeting 30, which are clearly visible from the side of the second surface 6 (see FIG. 14), are used for aligning the dicing blade 26 relative to the division lines 12 to be cut. Hence, the dicing blade 26 can be aligned relative to the division lines 12 with enhanced alignment accuracy, allowing for the substrate cutting process to be performed with a high degree of precision. Therefore, the width of the division lines 12 can be reduced, enabling the accommodation of an increased number of devices 10 on the first surface 4. In this way, the production efficiency is significantly enhanced and the waste of substrate material is avoided.

(84) After the substrate 2 has been cut along all of the division lines 12, the sheeting 42 is radially expanded, e.g., by using an expansion drum or the like. In this way, a radial external force is applied to the substrate 2 so as to divide the substrate 2 along the division lines 12 into the individual dies 28, substantially in the same manner as in the method of the first embodiment (see FIG. 7).

(85) After fully dividing the substrate 2 in this manner, the individual dies 28 can be picked up, e.g., by using a pick up device (not shown).

(86) A modification of the fourth embodiment of the method of the present invention is shown in FIGS. 15 to 17. In this modification, the fourth embodiment is modified by using a protective sheeting 30 which laterally extends further beyond the first surface 4 than the protective sheeting 30 of the fourth embodiment and by attaching a laterally outermost portion of the protective sheeting 30 to an annular frame 46 (see FIG. 15). The protective sheeting 30 is attached to the annular frame 46 so as to close an inner opening of the annular frame 46 by the protective sheeting 30.

(87) By providing the annular frame 46 in this manner, handling of the substrate 2 in the substrate processing steps can be further facilitated and rendered even more efficient. In particular, in this way, the step of attaching the substrate 2 to the sheeting 42 (see FIG. 14) before cutting the substrate 2 can be eliminated.

(88) After attaching the protective sheeting 30 to the first surface 4, modified regions 18 are formed in the substrate 2 and alignment marks 16 are formed in the protective sheeting 30, in substantially the same manner as in the method of the fourth embodiment (see FIGS. 13 and 16).

(89) After all of the alignment marks 16 and modified regions 18 have been formed, the substrate 2 is cut along the division lines 12 from the side of the second surface 6 by using the dicing blade 26, substantially in the same manner as in the method of the fourth embodiment (see FIGS. 14 and 17).

(90) Subsequently, after the substrate 2 has been cut along all of the division lines 12, the protective sheeting 30 is radially expanded, e.g., by using an expansion drum or the like. In this way, a radial external force is applied to the substrate 2 so as to divide the substrate 2 along the division lines 12 into the individual dies 28 (see FIG. 7). In the method of the modification of the fourth embodiment, only a single sheeting, namely the protective sheeting 30, is attached to the first surface 4 of the substrate 2. Hence, the process of dividing the substrate 2 can be performed in a particularly efficient and reliable manner, by radially expanding the protective sheeting 30.

(91) After fully dividing the substrate 2 in this manner, the individual dies 28 can be picked up, e.g., by using a pick up device (not shown).

(92) In the following, a fifth embodiment of the method of the present invention will be described with reference to FIGS. 18 to 20.

(93) The method of the fifth embodiment differs from the method of the modification of the fourth embodiment in the configuration of the protective sheeting 30.

(94) In particular, in the method of the fifth embodiment, the protective sheeting 30 comprises a base sheet 48 and a cushioning layer 50 (see FIG. 18). The cushioning layer 50 is attached to the first surface 4. Further, a protective film (not shown) is provided so as to be arranged between the first surface 4 and the cushioning layer 50, as has been detailed above. Moreover, the protective film is arranged between side walls of the substrate 2 and the cushioning layer 50. By providing the protective film, the possibility of a contamination of the substrate 2 by the material of the cushioning layer 50 is reliably prevented. The protective film may be attached to the first surface 4 with or without an adhesive layer, as has been described in detail above.

(95) Substantially the entire substrate 2 is embedded in the cushioning layer 50. However, a back surface 52 of the backside layer 14 is exposed, i.e., not covered by the cushioning layer 50 (see FIG. 18). The cushioning layer 50 may have a thickness which is substantially the same as the thickness of the substrate 2, e.g., 100 to 150 μm.

(96) The portion 40 of the protective sheeting 30 laterally extending beyond the first surface 4, which is to a substantive extent formed by the cushioning layer 50, extends from the first surface 4 towards the second surface 6 along substantially the entire thickness of the substrate 2 (see FIG. 18).

(97) The protective sheeting 30, comprising the base sheet 48, the cushioning layer 50 and the protective film, serves as a particularly reliable carrier for supporting the substrate 2 during the substrate cutting and dividing processes. Any undesired shift of the substrate 2 or the resulting dies 28 (see FIG. 7) can be reliably avoided.

(98) A front surface of the base sheet 48 is in contact with a back surface of the cushioning layer 50. A back surface of the base sheet 48 opposite to the front surface thereof may be substantially parallel to the second surface 6 of the substrate. Thus, when cutting the substrate 2 along the division lines 12 from the side of the second surface 6 by using the dicing blade 26, a suitable counter pressure can be applied to the back surface of the base sheet 48, e.g., by placing this back surface on a chuck table (not shown).

(99) The material of the base sheet is not particularly limited. For example, the base sheet may be made of a polymer material, e.g., polyvinyl chloride (PVC), ethylene vinyl acetate (EVA) or a polyolefin.

(100) The material of the cushioning layer is not particularly limited. For example, the cushioning layer may be formed of a resin, an adhesive, a gel or the like.

(101) The material of the protective film is not particularly limited. For example, the protective film may be made of a plastic material, such as a polymer, e.g., a polyolefin. In particular, the protective film may be made of polyethylene (PE), polypropylene (PP) or polybutylene (PB).

(102) The base sheet 48, the cushioning layer 50 and the protective film are made of materials which are transparent to the pulsed laser beam LB so that the pulsed laser beam LB is transmitted through the base sheet 48, the cushioning layer 50 and the protective film.

(103) After attaching the protective sheeting 30 to the first surface 4, modified regions 18 are formed in the substrate 2 and alignment marks 16 are formed in the protective sheeting 30, as is illustrated in FIG. 19. The order of these two steps is not particularly limited. For example, the modified regions 18 may be formed before the alignment marks 16. Alternatively, the alignment marks 16 may be formed before the modified regions 18.

(104) The pulsed laser beam LB is applied to the substrate 2 so as to form the modified regions 18 in the substrate 2 substantially in the same manner as in the method of the second embodiment (see FIGS. 8 and 19). In particular, the pulsed laser beam LB is applied through the protective sheeting 30 which is transparent to the pulsed laser beam LB.

(105) The pulsed laser beam LB is applied to the protective sheeting 30 so as to form the alignment marks 16 in the protective sheeting 30. All of the alignment marks 16 are formed in the portion 40 of the protective sheeting 30 which laterally extends beyond the first surface 4. Specifically, all of the alignment marks 16 are formed in the cushioning layer 50 in a position which is, at least substantially, arranged at the second surface 6 of the substrate 2 (see FIG. 19). In this way, the alignment accuracy with which the dicing blade 26 can be aligned relative to the division lines 12 (see FIG. 20) can be enhanced even further.

(106) In the present embodiment, the pulsed laser beam LB applied to the substrate 2 for forming the modified regions 18 may be the same as the pulsed laser beam LB applied to the protective sheeting 30 for forming the alignment marks 16. Alternatively, two different laser beams may be used for these purposes.

(107) After all of the alignment marks 16 and modified regions 18 have been formed, the substrate 2 is cut along the division lines 12 from the side of the second surface 6 by using the dicing blade 26 (see FIG. 20) substantially in the same manner as in the method of the first embodiment. In particular, the substrate 2 is cut along the division lines 12 through the backside layer 14.

(108) The alignment marks 16 formed in the cushioning layer 50 of the protective sheeting 30, which are particularly clearly visible from the side of the second surface 6 (see FIG. 20), are used for aligning the dicing blade 26 relative to the division lines 12 to be cut. Hence, the dicing blade 26 can be aligned relative to the division lines 12 with yet further enhanced alignment accuracy, allowing for the substrate cutting process to be performed with an especially high degree of precision.

(109) After the substrate 2 has been cut along all of the division lines 12, the protective sheeting 30 is radially expanded, e.g., by using an expansion drum or the like. In this way, a radial external force is applied to the substrate 2 so as to divide the substrate 2 along the division lines 12 into the individual dies 28, substantially in the same manner as in the method of the first embodiment (see FIG. 7).

(110) After fully dividing the substrate 2 in this manner, the individual dies 28 can be picked up, e.g., by using a pick up device (not shown).