Method for offset calibration of a yaw rate sensor signal of a yaw rate sensor, system and computer program
11333678 · 2022-05-17
Assignee
Inventors
Cpc classification
G06F17/18
PHYSICS
G01D1/18
PHYSICS
G01C19/5776
PHYSICS
G01C25/005
PHYSICS
H03H17/045
ELECTRICITY
G01D1/16
PHYSICS
G06Q10/04
PHYSICS
H03H17/0664
ELECTRICITY
International classification
G01D1/16
PHYSICS
G06F17/17
PHYSICS
G01D1/18
PHYSICS
G06F17/18
PHYSICS
H04B1/00
ELECTRICITY
G06Q10/04
PHYSICS
Abstract
A method for offset calibration of a rotation rate sensor signal of a rotation rate sensor. In a first step, an ascertainment is made that the rotation rate sensor is in an idle state. In a second step, after the first step, a filter parameter is determined as a function of the measured rotation rate sensor values, measured in the idle state, of the rotation rate sensor. In a third step, after the second step, a filtered measured rotation rate sensor value is determined with the aid of the filter parameter. An offset is determined with the aid of the filtered measured rotation rate sensor value.
Claims
1. A rotation rate sensor comprising a micro-electro-mechanical system (MEMS) device and a processor configured to cause the rotation rate sensor to output sensor readings due to and representing effects of rotation states on the MEMS device of the rotation rate sensor, wherein: a correspondence of the output sensor readings to reactions of the MEMS device to the rotation states changes over time due to a continual self-calibration of the rotation rate sensor that changes an offset applied to signals produced as the reactions of the MEMS device to the rotation states; the continual self-calibration is performed by the rotation rate sensor using the processor to: in a first step, ascertain that the rotation rate sensor is in an idle state; and conditional upon that the rotation rate sensor has been determined in the first step to be in the idle state, update the offset by which the rotation rate sensor outputs the sensor readings in response to subsequent effects of the rotation states on the MEMS device, the update including, while the rotation rate sensor in in the ascertained idle state: in a second step, after the first step, determining a filter parameter as a function of the signals produced by the MEMS device in the idle state of the rotation rate sensor; in a third step, applying the filter parameter determined in the second step to obtain a filtered version of the signals produced by the MEMS device in the idle state; and determining an updated value of the offset from the filtered version of the signals produced by the MEMS device in the idle state; and at least one of the following: (a) the determining of the filter parameter in the second step includes categorizing a degree of idleness of the rotation rate sensor during the idle state into one of a plurality of predefined idleness categories based on the signals produced by the MEMS device during the idle state and setting the filter parameter to a value that depends on the one of the plurality of predefined idleness categories into which the degree of idleness has been categorized; and (b) the applying of the filter parameter in the third step includes applying the filter parameter on an individual basis to a single one of the signals produced by the MEMS device during the idle state.
2. The rotation rate sensor as recited in claim 1, wherein the filter parameter is determined in the third step on a condition that no signal used for the filter parameter determination has been produced by the MEMS device in a non-idle state one of the rotation rate sensor.
3. The rotation rate sensor as recited in claim 1, wherein the third step is performed as a function of a previous filtered one of the signals produced by the MEMS device and of an instantaneous one of the signals produced by the MEMS device, using an exponential smoothing.
4. The rotation rate sensor as recited in claim 1, wherein in a fourth step, after the third step and prior to the determining of the updated value of the offset, an output rate at which the signals are obtained for the determining of the update value of the offset is reduced using a decimator device, thereby reducing a number of the signals that are used for the determining of the updated value.
5. The rotation rate sensor as recited in claim 4, wherein the determining of the updated value of the offset is performed by applying a smoothing filter to output of the decimator device.
6. The rotation rate sensor as recited in claim 1, wherein the determining of the filter parameter in the second step includes the categorizing the degree of idleness of the rotation rate sensor during the idle state into one of the plurality of predefined idleness categories based on the signals produced by the MEMS device during the idle state and the setting the filter parameter to the value that depends on the one of the plurality of predefined idleness categories into which the degree of idleness has been categorized.
7. The rotation rate sensor as recited in claim 1, wherein the applying of the filter parameter in the third step includes the applying of the filter parameter on an individual basis to the single one of the signals produced by the MEMS device during the idle state.
8. The rotation rate sensor as recited in claim 7, wherein the applying of the filter parameter on an individual basis to the single one of the signals includes multiplying the single one of the signals by the filter parameter.
9. The rotation rate sensor as recited in claim 8, wherein: the filter parameter is applied by determining
10. A rotation rate sensor comprising a micro-electro-mechanical system (MEMS) device and a processor configured to cause the rotation rate sensor to output sensor readings due to and representing effects of rotation states on the MEMS device of the rotation rate sensor, wherein: a correspondence of the output sensor readings to reactions of the MEMS device to the rotation states changes over time due to a continual self-calibration of the rotation rate sensor that changes an offset applied to signals produced as the reactions of the MEMS device to the rotation states; the continual self-calibration is performed by the rotation rate sensor using the processor to: in a first step, ascertain that the rotation rate sensor is in an idle state; and conditional upon that the rotation rate sensor has been determined in the first step to be in the idle state, update the offset by which the rotation rate sensor outputs the sensor readings in response to subsequent effects of the rotation states on the MEMS device, the update including, while the rotation rate sensor in in the ascertained idle state: in a second step, after the first step, determining a filter parameter as a function of the signals produced by the MEMS device in the idle state of the rotation rate sensor; in a third step, applying the filter parameter determined in the second step to obtain a filtered version of the signals produced by the MEMS device in the idle state; and determining an updated value of the offset from the filtered version of the signals produced by the MEMS device in the idle state; the filter parameter is determined in the second step as a function of a first intermediate parameter and of a second intermediate parameter; the first intermediate parameter is proportional to a reciprocal of a number of the signals produced by the MEMS device in the idle state; and the second intermediate parameter is a function of a fluctuation of values of the signals produced by the MEMS device in the idle state.
11. The rotation rate sensor as recited in claim 10, wherein the filter parameter corresponds to a maximum of the first intermediate parameter and the second intermediate parameter.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
(3) In the various Figures, identical parts are always labeled with the same reference characters and are therefore as a rule also each mentioned or named only once.
(4)
(5)
(6) In a third portion 17′″ of filter parameter device 17, filter parameter a is then ascertained from first and second intermediate parameters a1, a2 and is selected in particular as a=max(a1, a2). It is possible in general for first, second, and third portions 17′, 17″, 17′″ to be capable of being implemented as one shared functionality. The ascertained filter parameter a can then be made available to adaptive filter device 18. Filtered measured rotation rate sensor value
where
(7) With the aid of the example embodiment described in
an offset 40 being determined with the aid of filtered measured rotation rate sensor value
(8) It is advantageously possible for offset 40 to be used subsequently for offset correction or offset calibration of rotation rate sensor signal 11.