POWER MODULE HAVING INTERCONNECTED BASE PLATE WITH MOLDED METAL AND METHOD OF MAKING THE SAME
20210175155 · 2021-06-10
Assignee
Inventors
- Zhiqiang Niu (Santa Clara, CA, US)
- Bum-Seok Suh (Seongnam-City, KR)
- Long-Ching Wang (Cupertino, CA, US)
- Son Tran (San Jose, CA)
- Junho Lee (Yeongtong-gu Suwon-si, KR)
- Yueh-Se Ho (Sunnyvale, CA, US)
Cpc classification
H01L21/768
ELECTRICITY
H01L21/78
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L23/28
ELECTRICITY
H01L2224/29101
ELECTRICITY
H01L24/42
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2224/92247
ELECTRICITY
H01L2224/32225
ELECTRICITY
H01L23/49861
ELECTRICITY
H01L21/563
ELECTRICITY
H01L2224/0603
ELECTRICITY
H01L23/24
ELECTRICITY
H01L2224/32225
ELECTRICITY
H01L2224/29101
ELECTRICITY
H01L2224/8385
ELECTRICITY
H01L23/49811
ELECTRICITY
H01L23/053
ELECTRICITY
H01L2224/8385
ELECTRICITY
H01L23/16
ELECTRICITY
H01L2224/48137
ELECTRICITY
H01L24/73
ELECTRICITY
H01L21/4846
ELECTRICITY
H01L23/3735
ELECTRICITY
International classification
H01L21/768
ELECTRICITY
H01L21/78
ELECTRICITY
H01L23/16
ELECTRICITY
Abstract
An interconnected base plate comprises a metal layer, a plurality of metal pads, and a molding encapsulation. The mold compound layer encloses a majority portion of the plurality of metal pads 240. A respective top surface of each of the plurality of metal pads is exposed from a top surface of the molding encapsulation. The respective top surface of said each of the first plurality of metal pads and the top surface of the mold compound layer are co-planar. A power module comprises the interconnected base plate, a plurality of chips, a plurality of bonding wires, a plurality of terminals, a plastic case, and a module-level molding encapsulation. A method, for fabricating an interconnected base plate, comprises the steps of forming a plurality of metal pads; loading a metal layer; forming a molding encapsulation; and applying a singulation process.
Claims
1. A semiconductor module package comprising: an interconnected base plate; a plastic case comprising a plurality of sidewalls disposed on a periphery of the interconnected base plate; and a plurality of terminals disposed along the plurality of sidewalls extending away from the interconnected base plate; wherein the interconnected base plate comprises: a bottom metal plate; a mold compound layer overlaying at least a central portion of the bottom metal plate; a first plurality of metal pads embedded in the mold compound layer; and a second plurality of metal pads embedded in the mold compound layer electrically connected to the plurality of terminals; wherein the mold compound layer enclosing a bottom and edge faces of the first plurality of metal pads; and wherein bottom surfaces of the first plurality of the metal pads are separated from the bottom metal plate by a thickness of the mold compound layer.
2. The semiconductor module package of claim 1, wherein the bottom metal plate extends to an entire area of the interconnected base plate.
3. The semiconductor module package of claim 2, wherein a bottom surface of the mold compound layer is directly attached to a top surface of the bottom metal plate; and wherein the mold compound layer extends an entire central area of the bottom metal plate terminating at the sidewalls of the plastic case.
4. The semiconductor module package of claim 3, wherein a respective top surface of each of the first plurality of metal pads is exposed from a top surface of the mold compound layer; and wherein the respective top surface of said each of the first plurality of metal pads and the top surface of the mold compound layer are co-planar.
5. The semiconductor module package of claim 1, wherein the bottom metal plate is made of a first copper material; wherein the mold compound layer is of a single-piece construction; wherein the mold compound layer is made of a resin; and wherein the first plurality of metal pads and the second plurality of metal pads are made of a second copper material.
6. The semiconductor module package of claim 1, wherein the mold compound layer is made of a resin containing one or more filler materials selected from the group consisting of silicon oxide, aluminum oxide, and aluminum nitride; and wherein a percentage of filling of the one or more filler materials is in a range from eighty percent to ninety percent.
7. The semiconductor module package of claim 1, wherein a thickness of the bottom metal plate is in a range from five hundred microns to eight hundred microns.
8. The semiconductor module package of claim 1, wherein a thermal conductivity of the mold compound layer is in a range from five watt per meter kelvin to ten watt per meter kelvin.
9. The semiconductor module package of claim 1, wherein the second plurality of metal pads are electrically connected to the plurality of terminals by a plurality of bonding wires.
10. The semiconductor module package of claim 1, wherein the second plurality of metal pads are electrically connected to the plurality of terminals by a plurality of conductive plates.
11. The semiconductor module package of claim 10, wherein each of the second plurality of metal pads, a respective conductive plate of the plurality of conductive plates, and a respective terminal of the plurality of terminals are of a single-piece construction.
12. The semiconductor module package of claim 1 further comprising: a plurality of semiconductor chips, each of the plurality of semiconductor chips being attached to a respective metal pad of the first plurality of metal pads by a respective conductive material of a plurality of conductive materials; a plurality of bonding wires; and a molding encapsulation enclosing the plurality of chips, the plurality of bonding wires, a portion of the plurality of terminals, and a portion of the plastic case.
13. A method for fabricating an interconnected base plate, the method comprising the steps of: providing a removable carrier; attaching a tape layer to the removable carrier; attaching a metal sheet to the tape layer; attaching a dry film to the metal sheet; etching the dry film so as to form a plurality of etched dry films; etching the metal sheet so as to form a plurality of metal pads; removing the plurality of etched dry films so as to form a pre-molded intermediate element; loading a metal plate and the pre-molded intermediate element to a molding chase, the metal pads facing the metal plate with a preset space therebetween; forming a molded interconnected base plate assembly by injecting a mold compound layer filling space between the metal plate, the plurality of metal pads and the tape layer, the mold compound layer enclosing a majority portion of the plurality of metal pads; and removing the tape layer, and the removable carrier after the molded interconnected base plate assembly removed from the molding chase.
14. The method of claim 13 further comprising a step of applying a singulation process separating the interconnected base plate from adjacent interconnected base plate after removing the tape layer and the removable carrier.
15. The method of claim 13, wherein the metal plate is made of a first copper material; wherein the mold compound layer is made of a resin; and wherein the plurality of metal pads are made of a second copper material.
16. The method of claim 13, wherein the mold compound layer is made of a resin containing one or more filler materials selected from the group consisting of silicon oxide, aluminum oxide, and aluminum nitride; and wherein a percentage of filling of the one or more filler materials is in a range from eighty percent to ninety percent.
17. The method of claim 13, wherein a thickness of each of the plurality of metal pads is less than a thickness of the mold compound layer.
18. The method of claim 13, wherein a thickness of the metal plate is in a range from five hundred microns to eight hundred microns.
19. The method of claim 13, wherein a thermal conductivity of the mold compound layer is in a range from five watt per meter kelvin to ten watt per meter kelvin.
20. The method of claim 13, after the step of removing the tape layer and the removable carrier, a respective top surface of each of the plurality of metal pads is exposed from a top surface of the mold compound layer; and wherein the respective top surface of said each of the plurality of metal pads and the top surface of the mold compound layer are co-planar.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0006]
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DETAILED DESCRIPTION OF THE INVENTION
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[0014]
[0015] The interconnected base plate 220 comprises a bottom metal plate 230 extending through the entire interconnected base plate 220, a plurality of metal traces 241, a first plurality of metal pads 240 in a central area, and a second plurality of metal pads 250 in edge areas embedded in a mold compound layer 260 overlaying the metal layer 230. In examples of the present disclosure, the bottom metal plate 230 is of a rectangular prism shape. The mold compound layer 260 is of a rectangular prism shape. The second plurality of metal pads 250 are electrically connected to plurality of terminals 292. The mold compound layer 260 encloses a majority portion of the first plurality of metal pads 240 and a majority portion of the plurality of metal traces 241. The mold compound layer 260 encloses a majority portion of the second plurality of metal pads 250. An entire bottom surface 262 of the mold compound layer 260 is directly attached to a top surface 232 of the metal layer 230. The mold compound layer covers an entire central area of the bottom metal plate and extends to reach sidewalls of the plastic case 294. Edges of the mold compound layer 260 are substantially aligned to the interior sidewalls of the plastic case 294 to provide the benefit of self-fit-in while assembling the plastic case 294 to the interconnected base plate 220. A respective top surface 242 of each of the first plurality of metal pads 240 is exposed from a top surface 264 of the mold compound layer 260. The respective top surface 242 of said each of the first plurality of metal pads 240 and the top surface 264 of the mold compound layer 260 are co-planar. The metal traces 241, the first plurality of metal pads 240 and the second plurality of metal pads 250 preferably have a same thickness between 100 to 800 microns, with a minimum space of 400 microns between adjacent metal pads or traces filed with the mold compound layer 260. A thickness of mold compound layer 260 below the metal traces 241, the first plurality of metal pads 240 and the second plurality of metal pads 250 is preferably between 100 to 500 microns to provide insulation from the bottom metal plate 230. A length (along X-direction) of the mold compound layer 260 is shorter than a length (along X-direction) of the metal layer 230. A width (along Y-direction) of the mold compound layer 260 is shorter than a width (along Y-direction) of the metal layer 230.
[0016] Each of the plurality of chips 280 is attached to a respective metal pad of the first plurality of metal pads 240 by a respective conductive material of a plurality of conductive materials 282. In one example, the plurality of conductive materials 282 are solder pastes. In another example, the plurality of conductive materials 282 are conductive adhesives. The module-level molding encapsulation 296 encloses the plurality of chips 280, the first plurality of bonding wires 290, the second plurality of bonding wires 291, a portion of the plurality of terminals 292, and an interior portion of the plastic case 294. A bottom surface 293 of each of the plurality of terminals 292 is directly attached to the plastic case 294. The top surface 264 of the mold compound layer 260 is directly attached to the plastic case 294.
[0017] In examples of the present disclosure, the bottom metal plate 230 is made of a first copper material. The first plurality of metal pads 240 and the second plurality of metal pads 250 are made of a second copper material. In one example, the first copper material and the second copper material are the same copper material. In another example, the first copper material and the second copper material are different copper alloys.
[0018] In examples of the present disclosure, the mold compound layer 260 is of a single-piece construction that is formed in a single molding process as shown in
[0019] In examples of the present disclosure, the mold compound layer 260 is made of a resin containing one or more filler materials selected from the group consisting of silicon oxide (SiO2), aluminum oxide (Al2O3), and aluminum nitride (AlN). In examples of the present disclosure, a percentage of filling of the one or more filler materials is in a range from eighty percent to ninety percent. In a first example, the mold compound layer 260 contains 80% silicon oxide fillers. In a second example, the mold compound layer 260 contains 85% aluminum oxide fillers. In a third example, the mold compound layer 260 contains 90% aluminum nitride fillers. In a fourth example, the mold compound layer 260 contains 20% silicon oxide fillers, 30% aluminum oxide fillers, and 40% aluminum nitride fillers. In examples of the present disclosure, the percentage of the fillers and the type of the fillers are determined to adjust the coefficient of thermal expansion (CTE) of the mold compound layer 260. In one example, the CTE of mold compound layer 260 with fillers is in a range from 99% to 101% of the CTE of the metal layer 230. In another example, the CTE of mold compound layer 260 with fillers is in a range from 97% to 103% of the CTE of the metal layer 230. In still another example, the CTE of mold compound layer 260 with fillers is in a range from 95% to 105% of the CTE of the metal layer 230.
[0020] In examples of the present disclosure, a thickness of each of the first plurality of metal pads 240 is less than a thickness of the mold compound layer 260. A thickness of each of the second plurality of metal pads 250 is less than the thickness of the mold compound layer 260.
[0021] In examples of the present disclosure, a thickness of the bottom metal plate 230 is in a range from five hundred microns (0.5 mm) to eight hundred microns (0.8 mm).
[0022] In examples of the present disclosure, a thermal conductivity of the mold compound layer 260 is in a range from 5 watt per meter kelvin to 10 watt per meter kelvin.
[0023] In examples of the present disclosure, the second plurality of metal pads 250 are electrically connected to the plurality of terminals 292 by the second plurality of bonding wires 291.
[0024]
[0025] The interconnected base plate 220 comprises a metal layer 230, a first plurality of metal pads 240, a second plurality of metal pads 250, and a mold compound layer 260. In examples of the present disclosure, the bottom metal plate 230 is of a rectangular prism shape. The mold compound layer 260 is of a rectangular prism shape. The second plurality of metal pads 250 are electrically connected to plurality of terminals 292. The mold compound layer 260 encloses a majority portion of the first plurality of metal pads 240. A bottom surface 262 of the mold compound layer 260 is parallel and is directly attached to a top surface 232 of the metal layer 230. A respective top surface 242 of each of the first plurality of metal pads 240 is exposed from a top surface 264 of the mold compound layer 260. The respective top surface 242 of said each of the first plurality of metal pads 240 and the top surface 264 of the mold compound layer 260 are co-planar. A length (along X-direction) of the mold compound layer 260 is shorter than a length (along X-direction) of the metal layer 230. A width (along Y-direction) of the mold compound layer 260 is shorter than a width (along Y-direction) of the metal layer 230.
[0026] In examples of the present disclosure, the second plurality of metal pads 250 are electrically connected to the plurality of terminals 292 by a plurality of conductive plates 491. In one example, each of the second plurality of metal pads 250, a respective conductive plate of the plurality of conductive plates 491, and a respective terminal of the plurality of terminals 292 are of a single-piece construction (made in a same metal forming process). In another example, each of the second plurality of metal pads 250, a respective conductive plate of the plurality of conductive plates 491, and a respective terminal of the plurality of terminals 292 are of a three-piece construction (made in three separated metal forming processes and then attached to one another).
[0027]
[0028] In block 502, referring now to
[0029] In block 504, referring now to
[0030] In block 506, referring now to
[0031] In block 508, referring now to
[0032] In block 510, referring now to
[0033] In block 512, referring now to
[0034] In block 514, referring now to
[0035] In block 516, referring now to
[0036] In block 518, referring now to
[0037] In block 520, referring now to
[0038] In block 522, a singulation process 691 separates the interconnected base plate 699 of
[0039]
[0040] In block 702, a plurality of chips 280 of
[0041] In block 704, a plastic case 294 of
[0042] In block 706, a plurality of terminals 292 of
[0043] In block 708, a first plurality of bonding wires 290 of
[0044] In block 710, a module-level molding encapsulation 296 of
[0045] Those of ordinary skill in the art may recognize that modifications of the embodiments disclosed herein are possible. For example, a number of the plurality of terminals 292 may vary. Other modifications may occur to those of ordinary skill in this art, and all such modifications are deemed to fall within the purview of the present invention, as defined by the claims.