SCHOTTKY DIODE WITH BURIED LAYER REGION

Abstract

Described examples include an integrated circuit having a semiconductor substrate having an epitaxial layer located thereon, the epitaxial layer having a surface. The integrated circuit also has a buried layer formed in the semiconductor substrate, the epitaxial layer located between the buried layer and the surface. The integrated circuit also has a Schottky contact and an ohmic contact formed on the surface. The integrated circuit also has a Pdrift region in the epitaxial layer located between the ohmic contact and the Schottky contact.

Claims

1. An integrated circuit comprising: a semiconductor substrate having an epitaxial layer located thereon, the epitaxial layer having a surface; a buried layer formed in the semiconductor substrate, the epitaxial layer located between the buried layer and the surface; a Schottky contact and an ohmic contact formed on the surface; and a Pdrift region in the epitaxial layer located between the ohmic contact and the Schottky contact.

2. The integrated circuit of claim 1, wherein the epitaxial layer is lightly doped (N) and the Schottky contact includes a metal silicide in contact with the epitaxial layer.

3. The integrated circuit of claim 1, further comprising a heavily doped p-type region that intersects the surface between the Pdrift region and the Schottky contact.

4. The integrated circuit of claim 3, further comprising a field plate that extends over the Pdrift region and ends over the heavily doped p-type region.

5. The integrated circuit of claim 1, further including a dielectric isolation layer on the surface of the semiconductor substrate between the ohmic contact and the Schottky contact.

6. The integrated circuit of claim 1, wherein the epitaxial layer and the buried layer are n-type.

7. The integrated circuit of claim 1, wherein the Pdrift region has a second conductivity type opposite to a first conductivity type of the epitaxial layer.

8. The integrated circuit of claim 1, further comprising a field plate located over the Pdrift region.

9. The integrated circuit of claim 1, further including an isolation region extending from the surface to the semiconductor substrate, the isolation region surrounding the ohmic contact and the Schottky contact.

10. The integrated circuit of claim 1, further comprising a gate layer over the Pdrift region, and a lateral diffused metal-oxide semiconductor (LDMOS) transistor formed in or over the semiconductor substrate, the LDMOS transistor including a gate formed from a same material layer as the gate layer.

11. An integrated circuit comprising: a semiconductor substrate; an n-type epitaxial layer over the semiconductor substrate having a surface; a heavily doped n-type buried layer formed between the semiconductor substrate and the n-type epitaxial layer; first and second p-type regions located at the surface of the n-type epitaxial layer; and a metal silicide formed on the surface of the n-type epitaxial layer between the first and second p-type regions.

12. The integrated circuit of claim 11, wherein the n-type epitaxial layer is lightly doped.

13. The integrated circuit of claim 11, further comprising first and second heavily doped n-type regions at the surface of the n-type epitaxial layer, the first and second p-type regions and the metal silicide being located between the first and second heavily doped n-type regions.

14. The integrated circuit of claim 11, further including first and second dielectric isolation layers located over the n-type epitaxial layer, the first dielectric isolation layer extending over the first p-type region, and the second dielectric isolation layer extending over the second p-type region.

15. The integrated circuit of claim 11, further comprising a first heavily doped p-type region and a second heavily doped p-type region located at the surface, a first interface between the first p-type region and the n-type epitaxial layer ending at the first heavily doped p-type region, and a second interface between the second p-type region and the n-type epitaxial layer ending at the second heavily doped p-type region.

16. The integrated circuit of claim 15, further comprising a first polysilicon plate located over the first p-type region and ending over the first heavily doped p-type region, and a second polysilicon plate located over the second p-type region and ending over the second heavily doped p-type region.

17. The integrated circuit of claim 16, further comprising first and second dielectric isolation layers located over the n-type epitaxial layer, the first dielectric isolation layer extending over the first p-type region, and the second dielectric isolation layer extending over the second p-type region, wherein the first polysilicon plate ends over the first dielectric isolation layer and the second polysilicon plate ends over the second dielectric isolation layer.

18. The integrated circuit of claim 16, further comprising a first gate dielectric layer between the first polysilicon plate and the first p-type region, and a second gate dielectric layer between the second polysilicon plate and the second p-type region.

19. A method comprising: forming a buried layer in a semiconductor substrate, the buried layer separated from a surface of the semiconductor substrate; forming a Schottky barrier to the surface of the semiconductor substrate; forming an ohmic contact to the semiconductor substrate; and forming a Pdrift region in the semiconductor substrate between the Schottky barrier and the ohmic contact.

20. The method of claim 19, further comprising forming an insulating layer on the surface between the Schottky barrier and the ohmic contact, and wherein the Pdrift region is formed below the insulating layer.

21. The method of claim 20, wherein the ohmic contact includes a doped region formed in the semiconductor substrate, the doped region having a first conductivity type and the semiconductor substrate having the first conductivity type.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0004] FIG. 1 is a schematic sectional representation of an example Schottky diode.

[0005] FIG. 2 is a plan view of an example Schottky diode, e.g. the Schottky diode of FIG. 1.

[0006] FIG. 3 is a flow diagram of an example process.

[0007] FIGS. 4A-4I (collectively FIG. 4) illustrate the steps of the process of FIG. 3.

DETAILED DESCRIPTION

[0008] Corresponding numerals and symbols in the different figures generally refer to corresponding parts unless otherwise indicated. The figures are not necessarily drawn to scale.

[0009] The term coupled may include connections made with intervening elements, and additional elements and various connections may exist between any elements that are coupled. Also, in this description, the terms on and over may include layers or other elements where intervening or additional elements are between an element and the element that it is on or over. The term directly on with respect a first layer over a second layer means the first layer touches the second layer.

[0010] Examples described hereinbelow provide a Schottky diode with high-voltage capability using a lateral diffused metal-oxide semiconductor (LDMOS) manufacturing process by modifying the position and size of elements fabricated using that LDMOS process. In an example, an integrated circuit has a semiconductor substrate having an epitaxial layer located thereon, the epitaxial layer having a surface. The integrated circuit also has a buried layer formed in the semiconductor substrate, the epitaxial layer located between the buried layer and the surface. The integrated circuit also has a Schottky contact and an ohmic contact formed on the surface. The integrated circuit also has a Pdrift region in the epitaxial layer located between the ohmic contact and the Schottky contact.

[0011] FIG. 1 is a schematic representation of an example Schottky diode 100. Heavily doped N-type buried layer 104 is over p-type substrate 102. Epitaxial layer 106 is over buried layer 104. In this example, epitaxial layer 106 is lightly doped and has n-conductivity type, and buried layer 104 is heavily doped and has an n-type conductivity. Isolation region 108 protects Schottky diode 100 from unwanted interactions with other elements formed in epitaxial layer 106 elsewhere in the wafer. In this example, isolation region 108 is a doped region of opposite conductivity type to epitaxial layer 106, e.g. p-type. Other examples may use other types of isolation, such as deep trench isolation or shallow trench isolation. Cathode contacts 138 are conductive contacts that connect to cathode contact regions 131. Cathode contact regions 131 are heavily doped n-type regions. Cathode contact regions 131 provide an ohmic contact to n-type epitaxial layer 106. Anode contact 144 contacts epitaxial layer 106 via an unreferenced metal silicide layer. Because the silicide of anode contact 144 contacts lightly doped n-type epitaxial layer 106, a Schottky barrier 146 forms between the silicide of anode contact 144 and n-epitaxial layer 106. In this example, anode contact 144 is titanium-tungsten (TiW). In other examples, anode contact comprises aluminum, titanium or other conductive materials that form a Schottky barrier to lightly doped n-type epitaxial layer 106. In another example, a silicide of tungsten, titanium, cobalt, nickel or other metal is formed at Schottky barrier 146 and the Schottky barrier is between the silicide and epitaxial layer 106.

[0012] Pdrift regions 115 are formed from one or more implants producing at least one lightly doped region having a conductivity type opposite to the conductivity type of epitaxial layer 106, e.g. p-type regions, thus providing additional p-n junction surface area. The p-n junction may distribute the electric field applied between anode contact 144 and cathode contacts 138 when Schottky diode 100 is reverse biased. Gate layer 122 is formed on a dielectric isolation layer such as first insulating layer 116 and a second insulating layer 117, e.g. a gate dielectric layer. Gate layer 122 may partially overlap a heavily doped p-type region like p+ region 129. In an example, gate layer 122 is a polysilicon plate and the polysilicon plate ends above first insulating layer 116. The p+ regions 129 may each be located partially within corresponding Pdrift regions 115 and partially within the epitaxial layer 106 (e.g. at the interface between the Pdrift regions 115 and the epitaxial layer 106), such that a p-n junction is formed between each p+ region 129 and the epitaxial layer 106 on a side of the p+ region 129 opposite the surface of the epitaxial layer 106. Thus, each p+ region 129 is located between a corresponding one of the gate layers 122 and the Schottky barrier 146, and between a corresponding one of the Pdrift regions 115 and the Schottky barrier 146. In an example, gate layer 122 is coupled to a reference potential such as ground (via an unseen connection), forming a field plate proximate to the Pdrift region 115. The gate layer 122 may thereby affect more of the electric field between anode contact 144 and cathode contact 138 in conjunction with the p-n junction between Pdrift regions 115 and n-epitaxial layer 106, and thus away from the Schottky barrier 146. This arrangement may reduce leakage at the perimeter that might otherwise occur due to high electric field. More specifically, the gate layers 122, p+ regions 129 and Pdrift regions 115 may cooperate to produce a depletion region between the Pdrift regions 115 extending into the epitaxial layer 106. The depletion region may have the effect of reducing the electrical field strength near the Schottky barrier 146, which could otherwise cause unacceptable leakage at the Schottky barrier 146. The epitaxial layer 106 outside the depletion region and between the cathode contact regions 131 and Schottky barrier 146 may function as an n-type drift region for carriers (electrons) during operation of Schottky diode 100.

[0013] FIG. 2 is a layout diagram (top view) of an example Schottky diode, e.g. the Schottky diode 100 of FIG. 1. Cut lines indicate the plane of view of FIG. 1. The view of FIG. 2 shows anode contact 144, cathode contacts 138, Pdrift region 115, and isolation region 108. Isolation region 108 surrounds the internal geometry of Schottky diode 100. The cathode contacts 138 and anode contact 144 are shown as linear rectangular features, with the Pdrift region 115 forming an annular ring around the anode contact 144. The layout of FIG. 2 is but one of many possible layouts that may conform to the relationships of features shown in the sectional view of FIG. 1.

[0014] FIG. 3 is a flow diagram of an example process 300, e.g. for forming a Schottky diode concurrently with forming an LDMOS transistor. FIGS. 4A-4I (collectively FIG. 4) illustrate the steps of process 300 and are described concurrently with the description of FIG. 3. In each of FIGS. 4A-4I, a leftmost figure depicts a portion of a Schottky diode 400 that corresponds to the outlined portion of FIG. 1, while a rightmost figure depicts a representative LDMOS transistor 401 that may be formed concurrently on a same substrate. In this example, the substrate is crystalline silicon, but can be other types of materials, e.g. Ge or GaAs. Isolation regions (not shown) surrounding Schottky diode 400 and transistor 401 are omitted for clarity of the drawing. Step 302 includes forming a lightly doped n-type epitaxial layer 406, over a n+ buried layer on a p-semiconductor substrate 402 using epitaxial deposition as shown in FIG. 4A. Epitaxial layer 406 serves as the subsequent substrate for forming Schottky diode 400 and transistor 401. Also, in this example, the epitaxial layer 406 is n-type and the buried layer 404 is n-type.

[0015] Step 304 includes forming Pdrift region 412 under a gate region (e.g. the channel region) in transistor 401 and forming a Pdrift region 415 in Schottky diode 400 as shown in FIG. 4B. In this example, a sequential chain ion implantation of boron atoms at a density of 110.sup.11 to 310.sup.12 atoms/cm.sup.2 with energies of 30-1600 keV using first mask 410 forms p-doped, e.g. boron doped, Pdrift regions 412 and 415.

[0016] Step 305 includes forming n-well 408 in transistor 401, but not in the Schottky diode 400, as shown in FIG. 4C. Ion implantation of phosphorus atoms at a density of 110.sup.13 to 310.sup.14 atoms/cm.sup.2 with an energy of 50-500 keV using second mask 411 forms N-well 408.

[0017] Step 306 includes forming a first insulating layer 416 as shown in FIG. 4D. In the Schottky diode 400 the first insulation layer serves as an insulator above the drift region of the Schottky diode 400 (e.g. the portion of epitaxial layer 406 between the later-formed anode and cathode). In the transistor 401 the first insulating layer 416 serves as a gate insulator. A mask 414 defines first insulating layer 416, and a portion partially covers Pdrift regions 412 and 415. In this example, local oxidation of silicon (LOCOS) or shallow trench isolation (STI) forms first insulating layer 416. With LOCOS, an oxidizing environment such as steam oxidizes the exposed portions of epitaxial layer 406, N-well 408, Pdrift region 412, and Pdrift region 415 not covered by mask 414 to form a silicon dioxide layer to a thickness of 200 nm to 600 nm, such as first insulating layer 416. With STI, an anisotropic etch such as plasma etching using carbon tetrafluoride or similar chemistry etches the exposed portions of epitaxial layer 406, N-well 408, Pdrift region 412, and Pdrift region 415 not covered by mask 414 to form a shallow trench. Selective deposition of silicon dioxide or another suitable insulator then fills the shallow trench to a thickness of 200 nm to 600 nm to form first insulating layer 416. After forming first insulating layer 416, mask 414 is removed to expose surfaces of epitaxial layer 406, N-well 408, Pdrift region 412, and Pdrift region 415 that were covered by mask 414. These surfaces are then exposed to an oxidizing environment to form a second insulating layer, not shown, to a thickness of 20 nm to 50 nm by thermal oxidation.

[0018] Step 308 includes forming field plate 422D and gate 422T as shown in FIG. 4E. Depositing polycrystalline silicon and etching the deposited polycrystalline silicon using a photolithographic mask forms patterned field plate 422D and the gate 422T above both first insulating layer 416 and gate oxide layers 417D and 417T formed from the second insulating layer. In this example, polycrystalline silicon forms the field plate 422D and the gate 422T. In other examples, silicon chromium (SiCr), nickel chromium (NiCr), and tantalum nitride (TaN) may form the field plate 422D and the gate 422T. Thus, in this example field plate 422D in Schottky diode 400 and gate 422T in LDMOS transistor 401 are formed of a same material layer. After forming the field plate 422D and gate 422T, a conformal dielectric layer, e.g. comprising an oxide layer, is formed over the field plate 422D and gate 422T. The conformal dielectric layer may then be etched back to remove this layer from most of the surface, leaving unreferenced sidewall spacers. The etch-back also has the effect of removing the second insulating layer from portions of the surface not protected by the field plate 422D, the gate 422T, and their associated sidewall spacers, thus forming the gate oxide layers 417D and 417T.

[0019] Step 310 includes forming double-diffused well (d-well) 424 in transistor 401 as shown in FIG. 4F. Schottky diode 400 is masked (not shown) and d-well 424 is not formed in Schottky diode 400. D-well 424 is a double-diffused well that includes both n-type and p-type dopant atoms. For example, implantation of dopant atoms such as boron or indium provides the p-type dopant of d-well 424. An example is implanting of boron with an energy of 20 keV at a dose of 810.sup.13 to 3.010.sup.4 atoms/cm.sup.2. Other examples use indium (In) because it is a relatively heavy atom that has a low diffusion coefficient relative to boron, which may be advantageous in some examples. Implantation of an n-type dopant such as arsenic and or phosphorus provides the n-type dopant of d-well 424. An example is implanting arsenic with a density of 510.sup.13 to 1.210.sup.15 atoms/cm.sup.2 at an energy 10 to 30 keV. The selection of the angles and energies of implantation for d-well 424 determines, in part, the threshold voltage of the transistor 401.

[0020] Step 312 includes forming Pdrift region ohmic p+ contact 429, and LDMOS body ohmic p+ region 430, n+ cathode ohmic region 431, n+ source 426 and drain n+ 428 as shown in FIG. 4G. Each of these doped regions intersects the surface of the epitaxial layer 406. Photolithographic masks (not shown) align n+ source 426 with gate 422T and aligns Pdrift region ohmic contact 429 to the field plate 422D and the edge of Pdrift region 415. First insulating layer 416 also serves as a mask element, defining more accurately drain 428 and cathode ohmic region 431. An example implantation for forming Pdrift region ohmic contact 429 and LDMOS body ohmic P+ region 430 is implanting boron at 510.sup.15 atoms/cm.sup.2 at an energy of 10-30 keV. N+ cathode ohmic region 431, source 426 and drain 428 are formed by implanting arsenic with a density of 510.sup.15 atoms/cm.sup.2 at an energy of 10 keV to 30 keV.

[0021] Step 314 includes forming a thin metal silicide, in this example a silicide of cobalt, titanium, nickel, or similar metals as shown in FIG. 4H. The silicide may be formed on the Pdrift region ohmic contact 429, the epitaxial layer 406 adjacent the Pdrift region ohmic contact 429, and cathode ohmic region 431. Similar silicide regions form ohmic contacts to the LDMOS body ohmic region 430, source 426 and drain 428, respectively. In addition, a silicide layer (not shown) is formed on the field plate 422D and the gate 422T. The silicide on the exposed portion of the n-epitaxial layer 406 is designated silicide 448, and creates a Schottky barrier with the epitaxial layer 406.

[0022] After silicide formation, step 316 includes forming a first level metal insulator 436 as shown in FIG. 4I. First level metal insulator is formed by, for example, chemical vapor deposition of silicon dioxide using tetraethyl orthosilicate (TEOS) and/or plasma enhanced CVD of silane to a thickness of 1 m to 2 m followed by chemical-mechanical polishing (CMP). Using a mask (not shown), etching of first level metal insulator 436 provides via openings over the silicide 448, cathode ohmic region 431, LDMOS body ohmic region 430, source 426 and drain 428, respectively. Step 318 includes forming interconnection metallization, which includes first conductive contact 438 to drain 428; forming second conductive contact 442 to gate 422T; forming third conductive contact 444 to source 426 and LDMOS body ohmic P+ region 430; forming fourth conductive contact 445 to cathode ohmic region 431; and fifth conductive contact 446, which connects the Schottky anode formed by silicide 448 in contact with epitaxial layer 406. A conductor such as tungsten (W) fills the via openings, with optional barrier metals sputtered before depositing the conductor. A planarization, such as CMP, removes any conductor from the surface of first level metal insulator 436 leaving a top surface of the tungsten vias nearly flush with the surface of first level metal insulator 436. In other examples, other conductive materials fill the via, such as aluminum, titanium, metal silicides and others. A first level metal, such as aluminum is deposited and patterned by etching using a photolithographic mask (not shown) to complete first conductive contact 438, second conductive contact 442, third conductive contact 444, and fourth conductive contact 445 and fifth conductive contact 446.

[0023] Modifications are possible in the described examples, and other examples are possible, within the scope of the claims.