Device for electrical measurement and electrical measurement apparatus
10830685 ยท 2020-11-10
Assignee
Inventors
- Yoshinobu Baba (Aichi, JP)
- Noritada Kaji (Aichi, JP)
- Takao Yasui (Aichi, JP)
- Tomoji Kawai (Osaka, JP)
- Takeshi Yanagida (Osaka, JP)
Cpc classification
G01N33/48721
PHYSICS
G01N15/0656
PHYSICS
International classification
G01N15/12
PHYSICS
Abstract
Provided is a device for electrical measurement designed to be able to perform high sensitivity detection by reading not only changes in steady-state current, but also the occurrence of transient current, and an electrical measurement apparatus including the device for electrical measurement. The device for electrical measurement includes a substrate on which are formed at least a sample separation channel and a sample migration channel, as well as a sample measuring unit, with one end of the sample separation channel formed to connect to one end of the sample migration channel, and the sample measuring unit including a first measuring unit connected to the sample migration channel, and a second measuring unit connected to the sample migration channel from the reverse side to the first measuring unit.
Claims
1. An electrical measurement apparatus, comprising: a device for electrical measurement; a drive circuit; and a measuring circuit, wherein: the device for electrical measurement comprises a substrate including: a sample migration channel thorough which a sample moves and a sample measuring unit formed on the substrate, a sample input channel disposed on an upstream side of the sample migration channel, and a sample recovery channel disposed on a downstream side of the sample migration channel, a width of the sample migration channel is constant, the sample measuring unit comprises a first measuring unit connected to the sample migration channel at a first point of the sample migration channel, and a second measuring unit connected to the sample migration channel at a second point of the sample migration channel downstream of the first point, the drive circuit comprises a first electrode placed in the sample input channel and a second electrode placed in the sample recovery channel, and is configured to apply a potential difference between the first electrode and the second electrode such that an ionic current flows through the sample migration channel, the measuring circuit is configured to measure a change in the ionic current when the sample moves in the sample migration channel sandwiched between the first electrode and the second electrode, the first measuring unit and the second measuring unit are connected to the sample migration channel between the first electrode and the second electrode, the first measuring unit includes a third electrode and the second measuring unit includes a fourth electrode, the measuring circuit is coupled to the third electrode and the fourth electrode, the measuring circuit further comprises: a variable resistor; and a resistance element sandwiched between the first measuring unit and the second measuring unit, and a potential difference between both ends of the resistance element is adjusted by operating the variable resistor.
2. The electrical measurement apparatus of claim 1, wherein the first point is located on a first side of the sample migration channel and the second point is located on a second side of the sample migration channel opposite to the first side.
3. The electrical measurement apparatus of claim 1, wherein: the device for electrical measurement further comprises a sample separation channel disposed between the sample input channel and the sample migration channel.
4. The electrical measurement apparatus of claim 3, wherein pillars are formed in the sample separation channel.
5. The electrical measurement apparatus of claim 3, wherein: the device for electrical measurement further comprises a separated sample discharge channel for discharging separated and removed elements in the sample, and the separated sample discharge channel is connected to the sample separation channel.
6. The electrical measurement apparatus of claim 1, wherein the device for electrical measurement further comprises a sample collecting apparatus for collecting samples.
7. The electrical measurement apparatus of claim 6, wherein the sample collecting apparatus includes an inclined sample collecting unit, and a sample input hole formed on the top part of the inclined sample collecting unit, for inputting collected samples into the sample input channel.
8. The electrical measurement apparatus of claim 7, wherein cones are formed on the inclined sample collecting unit.
9. The electrical measurement apparatus of claim 7, wherein nanowires are formed on the inclined sample collecting unit.
10. The electrical measurement apparatus of claim 1, wherein the measuring circuit measures a transient current and steady-state current changes.
11. The electrical measurement apparatus of claim 1, further comprising a fluorescence microscope.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DESCRIPTION OF THE PREFERRED EMBODIMENTS
(30) The following is a detailed explanation of the device for electrical measurement and the electrical measurement apparatus of the present embodiment. First, in the present specification, steady-state current means ion current flowing based on the electrical resistance value of the drive circuit and the measuring circuit, and is current flowing when a sample is not introduced in the sample migration channel, with a constant value that does not change. Also, a change in steady-state current means the change in the ion current value obtained by large changes in the circuit resistance value when a sample is introduced in the sample migration channel, and the sample reaches the part sandwiched between the first measuring unit and the second measuring unit in the sample migration channel. Also, transient current means ion current that flows momentarily in the measuring circuit.
(31)
(32) The width and depth of the sample migration channel 3 is not particularly limited as long as they are larger than the size of the sample, but to improve the measurement sensitivity, it is preferable so suitably adjust to not be too much larger than the size of the sample. For example, the diameter of PM2.5 in air is approximately 2.5 m, so it is acceptable if the width and depth of the sample migration channel 3 is approximately 3 m. Also, the diameter of cedar pollen is said to be approximately 20 to 40 m, and of cypress pollen to be approximately 28 m to 45 m, so the width and depth are acceptable at approximately 50 m. As shall be apparent, the abovementioned numerical values are guidelines, and when the sample is even larger, the width and depth can be made larger according to the size of the sample, such as 100 m, 150 m, 200 m, etc. For the lower limit of the width and depth, with the current fine processing technology, the limit is approximately 4 nm, but with advances in technology, this can be made even smaller. The device for electrical measurement 1 of the present embodiment can be designed to be different from the fine pores of the prior art, with the sample migration channel 3 made long, and it is possible to produce a stretched state of the sample inside the sample migration channel 3 and measure biomolecules of nucleic acid, protein, etc.
(33) For the sample input channel 4 and the sample recovery channel 5, size and shape are not particularly limited provided the size allows electrodes of the sample drive circuit to be input, and liquid containing the sample (hereafter, liquid containing the sample may be noted as sample liquid) can be input and recovered, but it is preferable that the depth be made the same as that of the sample migration channel 3. To make it possible for the sample to flow into the sample separation channel 11 efficiently, the sample input channel 4 can have a tapered shape with the width narrowing facing the sample separation channel 15. The sample recovery channel 5 can also have a tapered shape with the width expanding from the sample migration circuit 3.
(34) The first measuring unit 6 and the second measuring unit 7 configure the measuring circuit, and are used to measure steady-state current changes and transient current (hereafter, measuring steady-state current changes and transient current may be noted as measurement of current changes). The first measuring unit 6 and the second measuring unit 7 can be formed by forming a channel connected to the sample migration channel 3, and inputting electrodes inside the channel. Configuration is also possible with the electrodes contacting the sample migration channel 3.
(35) When the first measuring unit 6 and the second measuring unit 7 are formed by channels, the size and shape of the channels are not particularly limited as long as the size allows the sample measuring circuit electrodes to be input, but to increase the measurement sensitivity, it is preferable to lower the resistance. The resistance value of the channel filled with sample liquid is a value of the product of the sample liquid resistivity and the channel length, divided by the cross section area of the channel. Therefore, the area becomes larger as the channel width increases, and the resistance can be lowered. Therefore, the width of the first measuring unit 6 and the second measuring unit 7 is preferably longer than the length L of the part connected with the sample migration channel 3 in accordance with separation from the sample migration channel 3. The shape of the first measuring unit 6 and the second measuring unit 7 can be the same or different, but if the shape of the first measuring unit 6 and the second measuring unit 7 is different, the signals obtained with measurement will also be asymmetrical. Therefore, when doing higher precision measurement of the shape, etc., of items from the measured signal, it is preferable to have the same shape for the first measuring unit 6 and the second measuring unit 7.
(36) In
(37) The depth of the first measuring unit 6 and the second measuring unit 7 can be the same as the depth of the sample migration channel 3. Also, since sensitivity is better the shorter that length L is, it should be made short to the degree that production is possible with fine processing technology. On the other hand, when the length L is too long, there is the risk of the sample flowing into the first measuring unit 6 or the second measuring unit 7 from the sample migration channel 3, so it is preferable that the length L be shorter than the width of the sample migration channel 3, and more preferable that it be shorter than the size of the sample subject to measurement.
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(39) As the electrode material, known electrically conductive metals such as aluminum, copper, platinum, gold, silver, titanium, etc., can be used. Also, the electrodes can be produced by masking the substrate 2 and doing vapor deposition of the material. Compared to the mode of forming the first measuring unit 6 and the second measuring unit 7 with channels and inserting the electrodes, it is possible to have less resistance by forming the first measuring unit 6 and the second measuring unit 7 with electrodes. Thus, it is possible to have less voltage applied to the sample migration channel 3. The length of the connecting part between the sample migration channel 3 and the electrodes can be handled the same as noted above. It is also preferable to make the shape of the facing electrodes be the same. In the case of electrodes as noted above, since it is possible to have less resistance, the width of the first measuring unit 6 and the second measuring unit 7 can be longer as it separates from the sample migration channel 3 as shown in
(40) With the embodiments shown in
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(43) Other than being formed to cut across the sample migration channel 3, the electrodes of the embodiment shown in
(44) The sample separation channel 11 is formed between the sample input channel 4 and the sample migration channel 3, and is formed to remove items not subject to analysis in the sample liquid. For example, large size microparticles such as PM10, etc., in the atmosphere are removed and PM2.5 is analyzed, microbes etc. in the sample are removed and only the effluent is analyzed, specific components such as protein, etc. in the biological sample are removed and the nucleic acid is analyzed, etc., and this is not particularly limited provided that items not subject to analysis can be removed from the input sample. For example, when removing large size particles in the sample, examples include forming a size separation filter on the sample separation channel 11, forming a filter by forming nanowires in a densely packed state, forming pillars for performing size separation using the flow of liquid, etc. Also, when removing specific components such as protein, etc., in the sample, for example, a filter on which antibodies are supported, nanowires, pillars, etc. can be formed on the sample separation channel 11.
(45) Items available on the market can be used for the sample separation filter.
(46) For nanowires, particles for nanowire formation or a catalyst are coated on the sample separation channel 11, and the nanowire can be grown using a known method. As the particles for nanowire formation, an example is ZnO. The nanowire using ZnO microparticles can be produced using the hydrothermal synthesis method. In specific terms, first, ZnO particles are coated on the sample separation channel 11.
(47) Next, by immersing the heated substrate in a precursor solution for which zinc nitrate hexahydrate (Zn(NO.sub.3).sub.2.6H.sub.2O) and hexamethylene tetramine (C.sub.6H.sub.12N.sub.4) are dissolved in deionized water, it is possible to grow ZnO nanowire.
(48) As the catalyst for producing a nanowire, examples include gold, platinum, aluminum, copper, iron, cobalt, silver, tin, indium, zinc, gallium, chrome, titanium, etc. Nanowire using the catalyst can be produced using the following procedure.
(49) (a) The catalyst is deposited on the sample separation channel 11.
(50) (b) Using a material such as SiO.sub.2, Li.sub.2O, MgO, A1.sub.2O.sub.3, CaO, TiO.sub.2, Mn.sub.2O.sub.3, Fe.sub.2O.sub.3, CoO, NiO, CuO, ZnO, Ga.sub.2O.sub.3, SrO, In.sub.2O.sub.3, SnO.sub.2, Sm.sub.2O.sub.3, EuO, etc., core nanowire is formed using a physical vapor deposition method such as pulse laser deposition, VLS (Vapor-Liquid-Solid) method, etc.
(51) (c) Using SiO.sub.2, TiO.sub.2, etc., which are materials for which crushed and extracted nucleic acid is not easily absorbed using electrostatic interaction, using a typical vapor deposition method such as sputtering, electron beam (EB) vapor deposition, physical vapor deposition (PVD), atomic layer deposition (ALD), etc., a coating layer is formed surrounding the core nanowire. The nanowire produced using the catalyst can be nanowire that does not have a branched chain, and can also be a nanowire that does have a branched chain.
(52) Pillars can be produced simultaneously with other channels such as the sample input channel 4, etc., using a manufacturing method that uses etching described later. When forming pillars by etching, it is possible to control the pillar diameter and arrangement, etc.
(53) When separating microparticles using pillars 12, as shown in
(54) The device for electrical measurement 1 can be manufactured using fine processing technology.
(55) (1) An etchable material 8 is coated using chemical vapor deposition on the substrate 2.
(56) (2) A positive photoresist 9 is coated using a spin coater.
(57) (3) To irradiate light on locations at which the channels are formed, exposure and developing processes are done using a photomask, and the positive photoresist 9 of the part forming the channels is removed.
(58) (4) The material 8 at the locations for forming channels is etched, and channels are formed on the substrate 2.
(59) (5) The positive photoresist 9 is removed, and filters or nanowires are formed on the sample separation channel 11 part.
(60) The substrate 2 is not particularly limited provided it is a material typically used in the field of semiconductor manufacturing technology. As the material of the substrate 2, examples include silica glass, Si, Ge, Se, Te, GaAs, GaP, GaN, InSb, InP, etc.
(61) The positive photoresist 9 is not limited provided it is an item typically used in the field semiconductor manufacturing particularly, such as TSMR V50, PMER, etc. It is also possible to use a negative photoresist instead of a positive type, and this is not particularly limited provided it is an item typically used in the semiconductor manufacturing field, such as SU-8, KMPR, etc. The photoresist removal liquid is not particularly limited provided it is a removal liquid typically used in the semiconductor field, such as dimethylformamide, acetone, etc.
(62) The material 8 for depositing on the substrate 2 to form channels and other than channels is not particularly limited provided it is an insulating material, and examples include SiO.sub.2, Si.sub.3N.sub.4, BPSG, SiON, etc. With the manufacturing steps shown in
(63)
(64) (1) By changing the shape of the photomask, a convex part 8 that forms the channel after transfer is formed on the substrate, and the casting mold is produced.
(65) (2) The casting mold is transferred to the material 21 for transfer.
(66) (3) The casting mold is peeled off, and filters and nanowires are formed on the sample separation channel 11 part, producing the substrate 2.
(67) Examples of the material 21 for transferring the casting mold include insulating materials such as plastics made of polydimethyl siloxane (PDMS), polymethyl methacrylate (PMMA), polycarbonate (PC), hard polyethylene, etc. The transferred and produced device for electrical measurement 1 can also be pasted to an auxiliary substrate of glass, plastic, etc. to improve handling convenience.
(68) Also, in the case of the embodiment shown in
(69) (1) The positive photoresist 9 is coated on the seal material 22 using a spin coater.
(70) (2) To irradiate light on the locations for forming the first measuring unit 6 and/or the second measuring unit 7, exposure and development processes are done using a photomask, and the positive photoresist 9 of the part for forming the first measuring unit 6 and/or the second measuring unit 7 is removed. In addition to the first measuring unit 6 and/or the second measuring unit 7, it is also possible to form electrodes 31, 32 as necessary to configure the sample drive circuit described later.
(71) (3) Material for forming electrodes is deposited on the part at which the positive photoresist 9 was removed in (2) noted above.
(72) (4) The positive photoresist 9 is removed.
(73) Next, the substrate 2 is produced. Other than using a photomask of a shape by which it is possible to form the sample migration channel 3, the sample input channel 4, the sample recovery channel 5, and the sample separation channel 11, the substrate 2 can be produced using the same procedure and material as in
(74) With the embodiment shown in
(75) Also, with the embodiment shown in
(76) When measuring using the device for electrical measurement 1 of the present embodiment, when observing using a fluorescence microscope, it is preferable that the substrate 2, the material 8, the material 21 for transferring the casting mold, the auxiliary substrate, and the seal material 22 be formed using a light transmitting material.
(77) Also, the device for electrical measurement 1 can also be formed as an integrated unit with the photomask on which the various channel and pillar arrangement is designed made to cover the substrate 2 made of silicon, etc., using a method such as plasma etching, etc.
(78) The device for electrical measurement 1 can also undergo hydrophilic treatment to make the sample liquid flow more easily. Examples of the hydrophilic treatment method include plasma treatment, surfactant treatment, PVP (polyvinyl pyrrolidone) treatment, a photo catalyst, etc., and by doing plasma treatment for 10 to 30 seconds on the surface on which the channels of the device for electrical measurement 1 are formed, for example, it possible to introduce a hydroxyl group to the surface.
(79) The device for electrical measurement 1 of the present embodiment can also be provided with sample collecting apparatus for collecting samples.
(80) The sample collecting apparatus 50 can be produced using an insulating material such as a plastic, etc., made of polydimethyl siloxane (PDMS), polymethyl methacrylate (PMMA), polycarbonate (PC), hard polyethylene, etc. Examples of the production method include machining or 3D printing. The produced sample collecting apparatus 50 can also undergo hydrophilic treatment or hydrophobic treatment as necessary. For example, when analyzing a sample contained in water such a rain or waste water, etc., it is possible to make water flow more easily by doing hydrophobic treatment at least on the inclined sample collecting unit 51. Conversely, when collecting moisture contained in the atmosphere, when analyzing samples contained in the collected moisture, to make collecting of the moisture in the atmosphere easier, hydrophilic treatment can be done on the sample collecting unit 51.
(81) Examples of hydrophobic treatment include fluorine treatment, plasma treatment, plasma polymerization, surface chemical modification, graft polymerization of a hydrophobic compound on the surface, coating of a hydrophobic polymer, a metal oxide film (using ALD), etc. Also, the hydrophilic treatment can be performed in the same manner as the abovementioned plasma treatment, surfactant treatment, PVP (polyvinyl pyrrolidone) treatment, metal oxide film, photocatalyst, etc. In all cases, the treatment can be performed using a known method.
(82) When collecting samples in air as the sample, by increasing the surface area of the sample collecting unit 51, collecting moisture in air becomes easier.
(83) Furthermore, after forming the cones 53 shown in
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(85) The drive circuit 30 includes a first electrode 31 inserted in the sample input channel 4 and a second electrode 32 inserted in the sample recovery channel 5, and a voltage application means 33. The first electrode 31 and the second electrode 32 are not particularly restricted provided they are a material that electricity passes through, and for example, known electrically conductive metals such as aluminum, copper, platinum, gold, silver, titanium, etc., can be used. With the example shown in
(86) With the embodiment shown in
(87) When forming the first measuring unit 6 and the second measuring unit 7 with channels, the measuring circuit 40 includes at least a third electrode 41 inserted in the first measuring unit 6, a fourth electrode 42 inserted in the second measuring unit 7, and an ammeter 43, with the current from the third electrode 41 and the fourth electrode 42 measured using the ammeter 43.
(88) Also, when performing high sensitivity detection by having the voltage of the drive circuit 30 and the measuring circuit 40 in a balanced state, and detecting the difference in current from the balanced state, by including in the measuring circuit 40 a voltage application means 44, a variable resistor 45, a resistance element 46 with a set resistance value, and also an amplification means as necessary, it is possible to measure only the current difference. More specifically, by operating the resistance value of the variable resistor 45 under a fixed voltage, it is possible to change each potential difference of the resistance element 46 and the variable resistor 45. By having the potential difference of the part sandwiched by the first measuring unit 6 and the second measuring unit 7 in the sample migration channel 3 and the potential difference of the resistance element 46 be balanced, based on Kirchhoff's law, a state is produced in which current does not flow to the part sandwiched between the first measuring unit 6 and the second measuring unit 7 in the sample migration channel 3, and the circuit including the resistance element 46, the first measuring unit 6, and the second measuring unit 7. When the sample flows in in this state, it is possible to measure the changes in current due to sample inflow as the difference from the state in which current does not flow.
(89) The third electrode 41 and the fourth electrode 42 can be produced using the same material as the first electrode 31 and the second electrode 32, and they can be formed on the first measuring unit (channel) 6 and the second measuring unit (channel) 7 and connected with electric wire. The voltage application means 44, the same as with the voltage application means 33, is not particularly limited provided DC current flows to the measuring circuit 40, and a battery box, etc., can be used. For the ammeter 43 as well, a typically used ammeter can be used. For the amplification means as well, a typically used amp can be used. When forming the first measuring unit 6 and the second measuring unit 7 with electrodes, the third electrode 41 and the fourth electrode 42 are not required, and the electric wire connected to the ammeter 43 can be connected to the electrodes.
(90) With the present embodiment, by using the variable resistor 45 and the resistance element 46, with the potential difference of the part sandwiched by the first measuring unit 6 and the second measuring unit 7 in the sample migration channel 3 and the potential different of the resistance element 46 in a balanced state, it is possible to measure the occurrence of transient current and changes in the steady-state current when the sample enters the sample migration channel 3 as displacement from the balanced state, so it is possible to increase the detection sensitivity. For the variable resistor 45 and the resistance element 46 used with the present embodiment, items available on the market can be used.
(91)
(92) As shown in
(93) Also, the particle diameter and shape of the sample can be measured by the size of changes in steady-state current during the time the sample goes from the connecting part of the first measuring unit 6 and the sample migration channel 3 to the connecting part of the second measuring unit 7 and the sample migration channel 3 (b to c in
(94) As noted above, the electrical measurement apparatus 10 of the present embodiment measures changes in steady-state current while the sample passes through the sample migration channel 3, and specifically, measures changes of larger steady-state current when the sample is moving between the first measuring unit 6 and the second measuring unit 7. Therefore, the first measuring unit 6 and the second measuring unit 7 can be formed at asymmetrical positions near both ends of the sample migration channel 3, but in that case, as shown by the embodiment described hereafter, since the waveform during the peak is linear, it is preferable to reduce the displacement of the positions at which the first measuring unit 6 and the second measuring unit 7 are formed. In the present specification, displacement of the position means the midpoint of the connecting part of the first measuring unit 6 and the sample migration channel 3 and the midpoint of the connecting part of the second measuring unit 7 and the sample migration channel 3 (white bidirectional arrow in
(95)
(96) A plurality of channels can also be formed only for one of the sample input channel 4 or the sample recovery channel 5. When using a plurality of channels only for the sample input channel 4, it is possible to consecutively analyze different sample liquids.
(97) Also, when samples with different surface charges are contained in the sample liquid, the movement speed of the sample flowing in the sample migration channel 3 is different. Therefore, by forming a plurality of channels for only the sample recovery channel 5, and switching the electrodes inserted in each channel, it is possible to do separation and recovery of different samples in the sample liquid, and possible to be used for yet another analysis.
(98) Using the working examples below, specific examples of the present embodiment are explained, but these working examples are simply for describing the present embodiment, and are provided as reference for specific modes. These examples are for describing particular specific modes, but do not limit or express restriction of the scope of the invention disclosed in the application.
WORKING EXAMPLES
(99) Production of Device for Electrical Measurement With Different Gaps for the First Measuring Unit 6 and the Second Measuring Unit 7
Working Example 1
(100) First, to check the changes in measurement values of steady-state current and transient current due to differences in the gaps of the first measuring unit 6 and the second measuring unit 7, the device for electrical measurement was produced using the following procedure. In working examples 5 to 7 described hereafter, to study the changes in measurement values due to differences in gaps of the first measuring unit 6 and the second measuring unit 7, it is necessary to inflow samples into the sample migration channel 3 in the same state. Also, in working examples 9 and 10 described hereafter, to make it clear that it is possible to detect samples of different particle diameters using the device for electrical measurement of the present embodiment, it is necessary to inflow mixed samples of different particle diameters into the sample migration channel 3. Thus, since the sample separation channel is unnecessary, the sample separation channel was not formed on the device for electrical measurement of the working examples 1 to 3.
(101) (1) A 600 m thick silicon substrate 2 (made by Ferrotec Corp., 76 mm diameter) was prepared.
(102) (2) Negative photoresist SU-8 3005 (made by Micro Chem Corp.) was coated using a spin coater.
(103) (3) Using photolithography, to irradiate light on locations for forming channels, exposure was done using a photomask. After exposure, the resist was developed using SU-8 Developer (made by Micro Chem Corp.). After developing, rinsing was done using ultra pure water, moisture was sprayed off using a spin dryer to dry, and the casting mold was produced.
(104) (4) Polydimethyl siloxane (PDMS: made by Toray Corp., SILPOT184) was flowed into the produced casting mold, and hardened.
(105) (5) The hardened PDMS was removed from the casting mold, and next a cover glass available on the market (thickness: 0.17 mm) was adhered to the PDMS, to produce the device for electrical measurement 1.
(106)
Working Example 2
(107) Other than changing the shape of the photomask of working example 1, and making the displacement of the first measuring unit 6 and the second measuring unit 7 be 5 m, the device for electrical measurement 1 was produced using the same procedure as working example 1.
Working Example 3
(108) Other than changing the shape of the photomask of working example 1, and forming the first measuring unit 6 and the second measuring unit 7 at symmetrical positions flanking the sample migration channel 3, the device for electrical measurement 1 was produced using the same procedure as working example 1.
(109) Producing the Electrical Measurement Apparatus 10
Working Example 4
(110) (1) Producing the Drive Circuit 30
(111) The first electrode 31 and the second electrode 32 were produced by peeling the skin of an electric wire (FTVS-408, made by Oyaide Electric Co.) and exposing the metal part. A battery box (made by Seinan Industries Co.) was used for the voltage application means 33.
(112) (2) Producing the Measuring Circuit 40
(113) The third electrode 41 and the fourth electrode 42 were produced by peeling the skin of an electric wire (FTVS-408, made by Oyaide Electric Co.) and exposing the metal part. For the amplifying means, a variable gain low noise current amplifier made by FEMTO Co. was used. A battery box (made by Seinan Industries Co.) was used for the voltage application means 44. A precision potentiometer made by BI Technologies Co. was used for the variable resistor 45. For the ammeter 43, a signal amplified by the amplification means was converted to electrical signals for PC using a USB-DAQ (made by National Instruments Corp.), and this was read by software created using Lab View (made by National Instruments Corp.). For the resistance element 46, a metal film resistor (1 k, made by Panasonic) was used.
(114) (3) By inserting the first electrode 31 into the sample input channel 4, the second electrode 32 into the sample recovery channel 5, the third electrode 41 into the first measuring unit 6, and the fourth electrode 42 into the second measuring unit 7 of the device for electrical measurement 1 produced with working example 1, the electrical measurement apparatus 10 of the present embodiment was produced.
(115) Measuring Using the Electrical Measurement Apparatus 10
Working Example 5
(116) The sample liquid was produced by dispersing fluorescent microbeads (Fluoresbrite made by Polyscience Co.) as the sample in ultra pure water. Next, a 5TBE buffer was introduced in the channel by the capillary phenomenon, 30 l of the produced sample liquid was input to the sample input channel 4, and a 53 V voltage was applied to the drive circuit 30. Also, an 18 V voltage was applied to the measuring circuit 40. The variable resistor 45 was operated, putting the apparent resistance of the drive circuit 30 and the measuring circuit 40 in a balanced state. The changes in steady-state current and occurrence of transient current when the sample flowed in the sample migration channel 3 was measured.
Working Example 6
(117) Other than using the device for electrical measurement 1 that was produced with working example 2, measurement was performed with the same procedure as working example 5.
Working Example 7
(118) Other than using the device for electrical measurement 1 produced with working example 3, measurement was performed using the same procedure as working example 5.
(119) As shown in
(120) Also, when using the device for electrical measurement 1 of working example 1, as shown in
(121) On the other hand, as shown in
(122) Furthermore, when using the device for electrical measurement 1 of working example 3, two peaks were measured as shown in
(123) (1) The first measuring unit 6 and the second measuring unit 7 are arranged in a symmetrical positional relationship, so it is easy for current of the measuring circuit 40 to flow compared with the arrangements of working example 1 and working example 2,
(124) (2) the change in the steady-state current was measured when the sample flowed out to the end of the first measuring unit 6 and the second measuring unit 7, but as noted above, since it is easy for electricity to flow with the device for electrical measurement 1 of the working example 3, the steady-state current value when the sample comes to the middle of the connecting part with the sample migration channel 3 returns to a value close to the base value,
(125) (3) and when the sample flows out from the connecting part, changes in the steady-state current value was measured.
(126) From the results above, the first measuring unit 6 and the second measuring unit 7 are preferably formed at asymmetrical positions flanking the sample migration channel 3, and are preferably arranged with a displacement to the degree that the peak value will not be a linear value according to the sample size (the end parts of the first measuring unit 6 and the second measuring unit 7 are at positions where they do not overlap flanking the sample migration channel 3, and are not too far apart).
(127) Measurement Using the Electrical Measurement Apparatus 10 and a Fluorescence Microscope
Working Example 8
(128) Other than using fluorescent microbeads (Fluoresbrite made by Polyscience Co.) as the sample, and measuring fluorescence intensity with a fluorescence microscope (TE300 made by Nikon Corp.) arranged to be able to observe between the first measuring unit 6 and the second measuring unit 7 of the device for electrical measurement 1, measurement was performed with the same procedure as working example 5.
Working Example 9
(129) Other than using fluorescent microbeads (Fluoresbrite made by Polyscience Co.) of particle diameters of approximately 3.1 m, 2.08 m, and 1 m as the sample, measurement was performed using the same procedure as working example 8.
(130) Relationship Between the Particle Diameter and Steady-State Current Value
Working Example 10
(131) Using fluorescent microbeads (Fluoresbrite made by Polyscience Co.) of particle diameters of approximately 3.1 m, 2.08 m, 1.75 m, 1.1 m, 1 m, and 0.75 m as the samples, measurement was performed using the same procedure as working example 9.
(132) Relationship Between Applied Voltage, Signal Intensity, and Passage Time
Working Example 11
(133) Other than measuring the three voltages of 53 V, 32 V, and 12 V for the voltage of the drive circuit 30 in working example 5, measurement was performed with the same procedure as with working example 5.
(134) In the present embodiment, the length of the sample migration channel 3, and the gap of the first measuring unit 6 and the second measuring unit 7 can be set freely. Therefore, even if the voltage of the drive circuit 30 is made high, it is possible to set the length of the sample migration channel 3 as well as the first measuring unit 6 and the second measuring unit 7 so that the shortest time required to read the steady-state current changes is set, and possible to perform high sensitivity detection in a short time.
(135) Producing the Device for Electrical Measurement Including the Sample Separation Channel
Working Example 12
(136) (1) A 380 m thick silicon substrate (76 mm diameter, made by Ferrotec Corp.) was prepared.
(137) (2) A mask was produced using OFPR8600 to make a shape that can be etched for the various channels including the sample separation channel, as well as the parts other than the pillars inside the sample separation channel.
(138) (3) Next, by dry etching using an ICP etching device (made by Samco Inc.), the device for electrical measurement 1 was produced.
(139)
(140) Producing the Device for Electrical Measurement With Electrodes Formed to Cut Across the Sample Migration Channel 3
Working Example 13
(141) First, the seal member 22 on which electrodes are formed (the first measuring unit 6 and the second measuring unit 7) was produced using the following procedure.
(142) (1) OAP which becomes an adhesive layer (made by Tokyo Ohka Kogyo Co.) was coated on silica glass (made by Crystal Base Co.), and positive photoresist OFPR8600 (Tokyo Ohka Kogyo Co.) was coated using a spin coater.
(143) (2) Using photolithography, a photomask was used and exposure was done so that light would irradiate on locations for forming the first measuring unit 6 and the second measuring unit 7. After exposure, the resist was developed using NMD-3. After developing, rinsing was done using ultra pure water.
(144) (3) The seal material 22 was produced by depositing Ti at 10 nm and Pt at 120 nm on the part at which the positive photoresist 9 was removed using a sputtering device (made by Sanyu Electron).
(145) Next, using the same procedure as working example 12, the substrate 2 on which pillars are formed in the sample separation channel 11 was produced, and the substrate 2 and the seal material 22 were adhered together so that the electrodes formed on the seal material 22 (the first measuring unit 6 and the second measuring unit 7) cut across the sample migration channel 3.
(146) Electrical Measurement Apparatus 10 Production and Measurement
Working Example 14
(147) Next, other than using the device for electrical measurement 1 produced with working example 13, the electrical measurement apparatus 10 was produced using the same procedure as working example 4. Other than using for the sample an item for which a standard substance of PM2.5 (National Institute for Environmental Studies CRM No. 28, urban particulate matter) was dispersed in 0.1 M KCl, and using 6 V as the voltage applied to the drive circuit 30 and 1.5 V as the voltage applied to the measuring circuit 40, measurement was performed using the same procedure as working example 5.
(148) From the above results, it became clear that the electrodes configuring the measuring circuit can be formed flanking the sample migration channel 3 as shown in
INDUSTRIAL APPLICABILITY
(149) By using the device for electrical measurement 1 of the present embodiment, it is possible to design the drive circuit and the measuring circuit as separate circuits, so it is possible to set the voltage of the drive circuit high, and to increase the detection sensitivity. Furthermore, since it is possible to accurately read the transient current, it is possible to read the surface charge of the sample, and it is also possible to create a stretched state of the sample inside the sample migration channel, and to measure biomolecules such as of nucleic acid, protein, etc. Furthermore, it is possible to separate samples before measuring.
(150) Therefore, this is useful in developing measurement equipment for doing accurate analysis of samples in companies and research institutions, etc.