Method And Structure for Low Density Silicon Oxide for Fusion Bonding and Debonding

Abstract

Described herein is a method of bonding and/or debonding substrates. In one embodiment, at least one of the surfaces of the substrates to be bonded is comprised of an oxide. In one embodiment, the surfaces of both substrates comprise an oxide. A wet etch may then be utilized to debond the substrates by etching away the layers that have been bonded. In one embodiment, a fusion bonding process is utilized to bond two substrates, at least one substrate having a silicon oxide surface. In one exemplary etch, a dilute hydrofluoric (DHF) etch is utilized to etch the bonded silicon oxide surface, allowing for two bonded substrates to be debonded. In another embodiment, the silicon oxide may be a low density silicon oxide. In one embodiment, both substrates may have a surface layer of the low density silicon oxide which may be fusion bonded together.

Claims

1. A method for processing a first substrate and a second substrate, comprising: providing an oxide surface layer on at least one of the first substrate and the second substrate; fusion bonding the first substrate and the second substrate; and debonding the first substrate and the second substrate through the use of an oxide etchant.

2. The method of claim 1, wherein the oxide surface layer comprises a low density silicon oxide.

3. The method of claim 2, wherein the oxide etchant comprises hydrofluoric acid.

4. The method of claim 3, wherein the oxide etchant comprises diluted hydrofluoric acid.

5. The method of claim 1, wherein the first substrate has a first oxide surface layer and the second substrate has a second oxide surface layer.

6. The method of claim 5, wherein the first oxide surface layer comprises a low density silicon oxide and the second oxide surface layer comprises a low density silicon oxide.

7. The method of claim 6, wherein the fusion bonding forms SiOSi bonds.

8. The method of claim 7, wherein the oxide etchant comprises a wet oxide etchant.

9. The method of claim 8, wherein the oxide etchant comprises hydrofluoric acid.

10. The method of claim 1, wherein the oxide etchant comprises a wet oxide etchant.

11. The method of claim 10, wherein the first substrate has a first oxide surface layer and the second substrate has a second oxide surface layer.

12. The method of claim 11, wherein the first oxide surface layer comprises a low density silicon oxide and the second oxide surface layer comprises a low density silicon oxide.

13. The method of claim 12, wherein the fusion bonding forms SiOSi bonds.

14. The method of claim 13, wherein the oxide etchant comprises hydrofluoric acid.

15. A multi-substrate structure, comprising: a first semiconductor wafer; a second semiconductor wafer; and a silicon oxide layer between the first semiconductor wafer and the second semiconductor wafer, the first semiconductor wafer and the second semiconductor wafer being fusion bonded together by the silicon oxide layer.

16. The multi-substrate structure of claim 15, wherein one of the first semiconductor wafer and the second semiconductor wafer had a low density silicon oxide surface prior to the first semiconductor wafer and the second semiconductor wafer being fusion bonded.

17. The multi-substrate structure of claim 15, wherein, prior to the first semiconductor wafer and the second semiconductor wafer being fusion bonded, the first semiconductor wafer had a low density first silicon oxide surface and the second semiconductor wafer had a low density second silicon oxide surface.

18. The multi-substrate structure of claim 15, wherein the silicon oxide layer provides SiOSi bonds between the first semiconductor wafer and the second semiconductor wafer.

19. The multi-substrate structure of claim 18, wherein at least a first portion of the silicon oxide layer is part of the first semiconductor wafer and a second portion of the silicon oxide layer is part of the second semiconductor wafer.

20. The multi-substrate structure of claim 19, wherein at least one of the first or second semiconductor wafers comprises a front-side processing area and a back-side processing area.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0013] A more complete understanding of the present inventions and advantages thereof may be acquired by referring to the following description taken in conjunction with the accompanying drawings, in which like reference numbers indicate like features. It is to be noted, however, that the accompanying drawings illustrate only exemplary embodiments of the disclosed concepts and are therefore not to be considered limiting of the scope, for the disclosed concepts may admit to other equally effective embodiments.

[0014] FIG. 1 illustrates an exemplary multi-substrate structure.

[0015] FIG. 2A illustrates two substrates prior to bonding configured according to the techniques disclosed herein.

[0016] FIG. 2B illustrates the two substrates of FIG. 2A after bonding.

[0017] FIGS. 3A-3B illustrate an exemplary multi-substrate structure configured according to the techniques disclosed herein.

[0018] FIGS. 4A-4E illustrate an exemplary bonding and debonding process according to the techniques disclosed herein.

[0019] FIG. 5 illustrates an exemplary method for utilizing the bonding techniques disclosed herein.

DETAILED DESCRIPTION

[0020] Described herein is an innovative method for bonding and/or debonding substrates. In one embodiment, at least one of the surfaces of the substrates to be bonded is comprised of an oxide. In one embodiment, the surfaces of both substrates comprise an oxide. Fusion bonding of the substrates may then be performed. Subsequently, a wet etch may then be utilized to debond the substrates by etching away the layers that have been bonded. In one embodiment, a fusion bonding process is utilized to bond two substrates, at least one substrate having a silicon oxide surface. In one exemplary etch, a dilute hydrofluoric (DHF) etch is utilized to etch the bonded silicon oxide surface, allowing for two bonded substrates to be debonded. In one embodiment, the silicon oxide may be a low density silicon oxide. In one embodiment, both substrates may have a surface layer of the low density silicon oxide which may be fusion bonded together.

[0021] The techniques disclosed herein may be utilized during the processing of a wide range of substrates. The substrate may be any substrate for which the use of substrate bonding and/or debonding is desirable. In one embodiment, at least one substrate may be a substrate that has been subject to multiple semiconductor processing steps which yield a wide variety of structures and layers, all of which are known in the substrate processing art, and which may be considered to be part of the substrate. For example, in one embodiment, the substrate may be a semiconductor wafer having one or more semiconductor processing layers formed thereon. The concepts disclosed herein may be utilized at any stage of the substrate process flow, for example front end of line (FEOL) processing steps and/or back end of line (BEOL) processing steps. In some embodiments, one of the substrates may merely be a carrier substrate. In some embodiments, the carrier substrate may be utilized to hold the other substrate while the other substrate is being processed (for example backside processing).

[0022] In one embodiment, both an upper substrate (for example an upper wafer) and a lower substrate (for example a lower wafer) each have an exposed oxide surface (for example a silicon oxide surface). FIG. 2A illustrates such an arrangement in which an upper substrate 205 has an upper substrate oxide surface 206 and a lower substrate 210 has a lower substrate oxide surface 211. FIG. 2B illustrate the fusion bonding of the upper substrate 205 and the lower substrate 210. More particularly, FIG. 2A illustrates each substrate and the exposed surface before bonding. As shown in FIG. 2B, after a fusion bonding dehydration condensation process, the two substrates become bonded by making SiOSi bonds between the two substrates. In the exemplary embodiment shown, both the upper and lower substrates have an oxide layer. However, it will be recognized that the techniques disclosed herein may still be utilized even if only one surface has an exposed oxide layer. Moreover, in the exemplary embodiments shown, a silicon oxide layer is utilized for bonding the substrates. It will be recognized that the techniques disclosed herein may be utilized with other oxides including, for example but not limited to silicon oxide carbide (SiOC), SiCOH, silicon oxynitride (SiON), etc.

[0023] FIG. 3A illustrates an exemplary embodiment of a multi-substrate structure 300 and the resulting bonded substrates of a process such as seen in FIGS. 2A and 2B.

[0024] As shown in FIG. 3A, a multi-substrate structure 300 an upper substrate 305 (for example an upper wafer) has a front-side device area 316, a substrate body 318 (for example silicon) and a back-side device area 320. A lower substrate 310 (for example a lower wafer) is also provided. The upper substrate 305 and the lower substrate 310 are bonded together with a bonding silicon oxide layer 314. In the embodiment shown in FIG. 3A, the silicon oxide between the two substrates may be a low density silicon oxide. The bonding silicon oxide layer 314 may be considered to be a portion of the upper substrate, the lower substrate, or both. The bonding silicon oxide layer 314 may have been formed by a bonding process described above wherein a silicon oxide layer on an exposed surface of one or both of the substrates prior to bonding is used to bond the substrates together.

[0025] If it is desired to debond the two substrates of FIG. 3A, the substrates may be exposed to a wet diluted hydrofluoric acid (DHF). The DHF will provide a high etch rate of the bonding silicon oxide layer 314. Thus, as shown in FIG. 3B, the bonded substrates may be exposed to a DHF wet etch. The low density silicon oxide of the bonding silicon oxide layer 314 will have a high etch rate to the DHF and the DHF will act to remove the bonding silicon oxide layer 314. Upon removal of the bonding silicon oxide layer, the upper substrate 305 and the lower substrate 310 may then be easily separated. It will be recognized that the etchant does not have to be a wet etchant. For r example an HF vapor etch could be used. Alternatively, other silicon oxide etchants may be utilized. Further, depending upon the oxide utilized, etchants may also include phosphoric acid.

[0026] It will be recognized that the thicknesses of the oxide layers utilized to bonding the two substrates together may vary depending upon a particular application for use of the techniques disclosed herein. In one embodiment, the upper and lower substrates may each have an oxide in a thickness of less than 10 um and more particularly in a range of 5 um to 10 nm and even more particularly 500 nm to 100 nm.

[0027] FIG. 4A illustrates an exemplary process flow utilizing the techniques disclosed herein. As shown in FIG. 4A, a first substrate 405 may be subjected to a variety of processing to form structures and devices thereon. For example, the substrate may be subjected to standard front end of line (FEOL) and/or back end of line (BEOL) semiconductor processing to form a FEOL/BEOL area 410 of the first substrate 405. The first substrate 405 may be the upper substrate in the examples of FIGS. 2A-3B. Next, the first substrate 405 may then have a silicon oxide layer formed thereon, in one embodiment a low density silicon oxide (not shown). Next as shown in FIG. 4B, the first substrate 405 may be flipped and bonded to a carrier substrate 415 (the carrier substrate may be the lower substrate of FIGS. 2-3B). The carrier substrate may also have a surface of silicon oxide as described above. The two substrates may then be fusion bonded, such as shown in FIG. 2A to provide a SIOSi bond connection between the two substrates. The first substrate 405 may then be subjected to any of a variety of substrate processing steps. For example, the first substrate 405 may be subjected to an edge trim, grinding, and/or chemical mechanical planarization (CMP) process steps to thin the first substrate 405 to a thinned first substrate 405A as shown in FIG. 4C. Then, any additional back-side processing may also be performed to form a back-side processed area 420 as shown in FIG. 4D. Finally, the first substrate 405 may be debonded from the carrier substrate 415 using the oxide etch debonding techniques described herein and the first substrate 405 may also be diced as shown in FIG. 4E.

[0028] As described in FIGS. 4A-4E, a process is provided in which the advantages of fusion processing may be obtained and utilized even for substrates that may subsequently be desired to be debonded. In the example of FIGS. 4A-4E, front-side processing of a substrate is performed and then the bonding of that substrate to a carrier wafer is performed so that back-side processing of the substrate may then occur. In the example shown, the substrate that is front-side processed is bonded to a carrier substrate and then after the back-side processing, the substrate is debonded.

[0029] The bonding and debonding technique may advantageously be utilized in a wide variety of applications and is not, however, limited to the example of FIGS. 4A-4E. Thus, the use of silicon oxide fusion bonding followed by debonding process which etches the silicon oxide may be used in a variety of other applications. In fact, a wide variety of processes in which it is desirable to fusion bond two substrates but subsequently debond the substrates may utilize the techniques described herein. Moreover, though described herein with regard to a silicon oxide layer(s) and a DHF etch, it will be recognized that other oxides and other etchants may be utilized. Thus, for example, other oxides than silicon oxide may be used for the bonding process and an appropriate etchant for those oxides may be used. Further, even for silicon oxide fusion bonding, the etchant is not limited to DHF as other silicon oxide etchants may be utilized. It will be recognized that after the debonding process, the substrate may be subjected to a clean process prior to further processing.

[0030] As mentioned above, in one embodiment a low density oxide may be used as part of the fusion bonding process. In one specific embodiment, the oxide may be a low density silicon oxide. As used herein, a low density silicon oxide may be an oxide having a density of 2 g/cm.sup.3 or less. The use of a low density oxide is advantageous in that the etch characteristics of a low density oxide are such that the oxide may be more rapidly and easily removed. For example, low density silicon oxide may relatively easily be removed with DHF.

[0031] FIG. 5 illustrate an exemplary method for use of the processing techniques described herein. It will be recognized that the embodiment of FIG. 5 is merely exemplary and additional methods may utilize the techniques described herein. Further, additional processing steps may be added to the method shown in the FIG. 5 as the steps described are not intended to be exclusive. Moreover, the order of the steps is not limited to the order shown in the figure as different orders may occur and/or various steps may be performed in combination or at the same time.

[0032] FIG. 5 illustrates a method for processing a first substrate and a second substrate. The method comprises a first step 505 of providing an oxide surface layer on at least one of the first substrate and the second substrate. The method further comprises step 510 of fusion bonding the first substrate and the second substrate. The method also comprises step 515 of debonding the first substrate and the second substrate through the use of an oxide etchant.

[0033] Further modifications and alternative embodiments of the inventions will be apparent to those skilled in the art in view of this description. Accordingly, this description is to be construed as illustrative only and is for the purpose of teaching those skilled in the art the manner of carrying out the inventions. It is to be understood that the forms and method of the inventions herein shown and described are to be taken as presently preferred embodiments. Equivalent techniques may be substituted for those illustrated and described herein and certain features of the inventions may be utilized independently of the use of other features, all as would be apparent to one skilled in the art after having the benefit of this description of the inventions.