Battery and method for producing a battery
10566615 ยท 2020-02-18
Assignee
Inventors
- Juergen H. Werner (Stuttgart, DE)
- Markus Schubert (Tuebingen, DE)
- Juergen Koehler (Waiblingen, DE)
- Ahmed Garamoun (Stuttgart, DE)
- Christian SAEMANN (Stuttgart, DE)
Cpc classification
H01M4/668
ELECTRICITY
H01M12/04
ELECTRICITY
Y02P70/50
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01M4/0459
ELECTRICITY
Y02E60/10
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01M2004/021
ELECTRICITY
H01M10/0436
ELECTRICITY
International classification
H01M4/13
ELECTRICITY
H01M10/0525
ELECTRICITY
H01M4/82
ELECTRICITY
Abstract
A method is disclosed for producing a battery preparing a first electrode by providing a substrate and depositing onto the substrate at least one silicon-based semiconductor layer of a specific porosity, in particular a doped micro-crystalline silicon layer that may comprise additions of Ge, Sn and/or C; treating the semiconductor layer using laser radiation for fully or partially varying the porosity, in particular by increasing the porosity of active regions for accommodating ions, in particular lithium-ions, or for reducing the porosity of inactive regions, for decreasing the ion-absorption capacity; arranging the first electrode together with a second electrode and an electrolyte within a housing; and contacting the two electrodes and connecting with external terminals accessible from outside the housing. Also disclosed is a battery made according to the disclosed method.
Claims
1. A method for producing a battery, comprising the steps of: (a) preparing a first electrode by providing a substrate and depositing onto said substrate at least one silicon-based semiconductor layer of a specific porosity greater than zero, wherein the semiconductor layer includes gases and is of a specific doping; (b) treating said semiconductor layer using laser radiation for micro-stabilizing said semiconductor layer by freeing the gases contained within said semiconductor layer to thereby increase said porosity of said semiconductor layer locally for generating active porous regions having a locally increased ion intake capacity; (c) arranging said first electrode together with a second electrode and an electrolyte within a housing; and (d) contacting said two electrodes and connecting with external terminals accessible from outside said housing.
2. The method of claim 1, wherein said micro-stabilized semiconductor layer is a thin layer provided with a p-type or n-type doping being selected from the group consisting of nitrogen, phosphorous, arsenic, antimony, boron, aluminum, gallium and indium.
3. The method of claim 1, wherein said semiconductor layer is locally irradiated by laser radiation to generate pores.
4. The method of claim 1, wherein in step (a) a doping layer is deposited on the surface of the semiconductor layer, and in step (b) a local doping is generated by means of laser radiation, said local doping having a different ion-absorption capacity than any remaining regions of said semiconductor layer.
5. The method of claim 1, wherein said semiconductor layer is irradiated by means of a laser for generating locally strengthened grid points by local laser crystallization.
6. The method of claim 1, wherein said semiconductor layer in the shape of a three-dimensional skeleton having a grid width of 0.5 to 100 micrometers, is micro-stabilized.
7. The method of claim 1, wherein said semiconductor layer is deposited by spraying, printing, or by a vacuum deposition method.
8. The method of claim 7, wherein said semiconductor layer is deposited by means of PECVD using an excitation frequency in the range of 10 kHz to 500 MHz, or in the microwave range.
9. The method of claim 1, wherein said electrode is combined with a second electrode configured as an air-cathode for generating a primary battery.
10. The method of claim 1, wherein said battery is produced as a secondary battery, wherein between said electrodes a separator is arranged.
11. The method of claim 1, wherein an alkaline electrolyte material is used for preparing said electrolyte.
12. The method of claim 1, wherein a non-aqueous electrolyte material is used for preparing said electrolyte, said non-aqueous electrolyte material being selected from the group consisting of an ion-liquid, a mixture of a non-ion containing polar solvent and a cation and an anion, a conductive polymer, an oxidic ceramic, and mixtures thereof.
13. The method of claim 1, wherein a flexible carrier material is provided which is soaked with an electrolyte material.
14. The method of claim 1, wherein a gel is used for preparing said electrolyte.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) Further features and advantages of the invention will become obvious from the subsequent description of preferred embodiments with reference to the drawings, of which:
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
DESCRIPTION OF PREFERRED EMBODIMENTS
(10) In
(11) Within a housing 12 of stainless steel a substrate 14 configured as a glass plate is provided. The substrate 14 is provided with an electrically conductive layer 16 whereon a doped, micro-crystalline silicon layer with a particular porosity is deposited. As an electrolyte 20 a solution of KOH with a strength of 0.01 M is provided, which is encapsulated by means of a rubber sealing 22. The doped silicon thin layer on the metallized substrate 14 forms the first electrode 24 which is led to the outside by means of a connection 28. The air electrode 25 serves as the second electrode being led to the outside by means of a connection 26.
(12)
Anode: Si+4OH-.fwdarw.Si(OH)4+4E-(1)
Cathode: O2+2H2O+4E-.fwdarw.4OH(2).
(13) However, the corrosion (self-discharge) is as follows:
Si+2OH+2H2O.fwdarw.SiO2(OH)2-2+2H2(3).
(14) As also with the wafer-based cells in the thin-layer cell, the forming of the oxidation product Si(OH)4 occurs at the anode. The alkaline electrolyte dissolves this oxide as soon as it is generated. Therefore, there is a continuous and permanent discharge process, as soon and as long as silicon is in contact with the electrolyte.
EXAMPLES
Example 1
(15) With the battery 10 according to
(16) For the deposition of n-type doped thin layers of amorphous silicon (a-Si) or of silicon carbide (a-SiC), a PECVD process is used at a temperature of about 170 C., using silane (SiH4) as a silicon source, phosphine in silane (2% PH 3/SiH4) as a doping gas, as well as possibly methane (CH4) as a carbon source. The deposition rate is 10 nm/min. In this way a 500 nm thick n-type doped amorphous silicon or silicon carbon layer is generated on the electrically conductive substrate 14. The doped a-Si layer or a-SiC layer, respectively, were deposited with different conductivities and carbon contents. The active surface of the primary battery cell formed thereof is 4.5 cm2, this being limited by the diameter of the rubber sealing 22 according to
(17)
(18) TABLE-US-00001 Deposition Gases n a-Si/SiC Discharge Electrolyte (sccm) Con- Current Concen- Specific Sample SiH.sub.4/ ductivity Density tration Capacity No. PH.sub.3/CH.sub.4 (.cm) [A/cm.sup.2] [M] [Ah/kg] 38 3/3/0 (a-Si) 440 1 KOH, 0.001 49 24 3/3/0 (a-Si) 440 2 KOH, 0.001 98 22 3/3/0 (a-Si) 440 10 KOH, 0.001 267 37 3/3/0 (a-Si) 440 10 NaOH, 0.01 259 42 3/3/0 (a-Si) 440 10 KOH, 0.1 279 35 3/3/0 (a-Si) 440 20 KOH, 0.1 117 36 3/3/0 (a-Si) 440 40 KOH, 0.1 190 46 3/3/1 (a-SiC) 610 10 KOH, 0.01 342 48 3/3/0 (a-Si) 2135 10 KOH, 0.01 333
(19) As shown in equations (1) to (3) above, a part of the silicon is consumed as battery fuel, while the remainder is consumed by the self-discharging process. With the battery cell according to example 22 of table 1 from doped a-Si with a specific capacity of 267 Ah/kg while using 0.01 M KOH as electrolyte and a discharge current density of 10 A/cm2 only about 7% of the deposited material were utilized as battery fuel. The measured self-discharge rate of about 2.5 mm/min of doped a-Si in 0.01 M KOH limits the specific capacity of the material. With a-SiC, a better usage is reached, see sample numbers 46 and 48 according to table 1. Herein about 9% of the a-SiC material were oxidized and served as fuel for the battery reaction. a-SiC shows a higher specific energy due to the lower self-discharge corrosion rate, since silicon-carbon bonds are stronger than the silicon-hydrogen bonds.
Example 2
(20) By a locally pulsed laser radiation of the a-Si layers or the a-SiC layers, respectively, during deposition of the layers the enclosed gases can be freed and thus the porosity can be increased.
(21) To this end for example a laser radiation with a line focus and a wavelength =532 nm at a pulse repetition frequency f=20 kHz is used. Herein the gas molecules, or gas atoms, respectively, present in the layer are strongly heated. By the temperature increase the gas pressure increases and bursts the surrounding silicon. The pores generated thereby have a size in the micrometer range. The porosity can be controlled by the energy density of the radiation by the laser. The pulse durations for example are between 210 and 230 nanoseconds with a pulse energy density Ep=0.47 Jcm.sup.2. The line focus width is about 4.5 m.
(22) The discharge current density is increased by increasing the porosity of the layers by laser radiation. However, with a specific capacity remaining constant that is limited by the present silicon volume, the operation duration of the Si-primary battery is decreased.
(23)
Example 3
(24) The basic design of a secondary battery according to the invention is shown in
(25) Such a secondary battery 10b uses a doped micro-crystalline silicon layer at the first electrode 24 having a controlled porosity and being three-dimensionally micro-stabilized.
(26) =532 nm at a pulse repetition frequency f=20 kHz makes it porous during the transition from the amorphous to the crystalline state. Herein the gas molecules or gas atoms, respectively present within the layer are strongly heated. By the temperature increase the gas pressure rises and bursts the surrounding silicon. The pores generated thereby have a size in the micrometer-range. The porosity can be controlled by the energy density of the radiation by the laser. The pulse durations in this example are between 210 and 230 nanoseconds with a pulse energy density Ep=0.47 Jcm2. The line focus width is about 4.5 m. The non-irradiated regions practically have no pores and serve for stabilizing the layer. The form of the irradiated or porous regions, respectively, as well as of the non-irradiated, non-porous regions by means of optical imaging of the laser radiation can be adjusted almost arbitrarily.
Example 4
(27)
Example 5
(28)
Example 6
(29)
(30) In this way a three-dimensional, porous grid structure 18c can be generated which is particularly suitable for ion intake, in particular for the intake of lithium-ions, and is reinforced in regular distances so that a cohesion also of larger structures is ensured.
(31) Such a structure 18c is shown exemplarily in
(32) By the controlled porosity and by three-dimensional micro-stabilization of the silicon layer, a particularly high absorption capacity for lithium ions with simultaneously increased mechanical stability results, whereby the production of lithium-ion secondary batteries with high capacity and long-term cycling resistance can be reached.