Method of fabricating a tungsten plug in a semiconductor device

Abstract

In a semiconductor process, a seamless tungsten plug is formed in an inter-layer dielectric by forming the inter-layer dielectric from multiple oxide layers having different wet etch rates, from lowest wet-etch rate for the lowest layer to highest wet-etch rate for the highest layer, forming a hole or trench in the inter-layer dielectric using a dry etch process, reconfiguring the hole or trench to have sloped side walls by performing a wet etch step, and filling the hole or trench with tungsten and etching back the tungsten to form a seamless tungsten plug.

Claims

1. A semiconductor device, comprising: a substrate comprising silicon; a first dielectric layer above the substrate; a second dielectric layer on the first dielectric layer; and a third dielectric layer on the second dielectric layer; a trench extending through the third dielectric layer, the second dielectric layer, and the first dielectric layer, and partially into the silicon of the substrate, the trench having a sidewall wherein an edge of the first dielectric layer is recessed from a top edge of the silicon at the sidewall, an edge of the second dielectric layer is recessed from the edge of the first dielectric layer at the sidewall and an edge of the third dielectric layer is recessed from the edge of the second dielectric layer at the sidewall; and a contiguous tungsten contact filling the trench.

2. The semiconductor device of claim 1, wherein the first dielectric comprises a first material, the second dielectric layer comprises a second material different than the first material, and the third dielectric layer comprises a third material different than the first and second materials.

3. The semiconductor device of claim 2, wherein the first material is thermal oxide, the second material is Tetraethylorthosilicate (TEOS) oxide, and the third material is Borophosphosilicate Glass (BPSG).

4. The semiconductor device of claim 1 further comprising a contact barrier layer lining the trench, wherein the contact barrier layer contacts the top edge of the silicon, the edge of the first dielectric layer, the edge of the second dielectric layer and the edge of the third dielectric layer.

5. The semiconductor device of claim 4, wherein the contact barrier layer comprises a bi-layer of Ti and TiN.

6. A semiconductor device, comprising: a substrate comprising silicon; a first dielectric layer comprising a first material having a first wet etch rate above the substrate; a second dielectric layer comprising a second material with a second wet etch rate directly on the first dielectric layer; and a third dielectric layer directly on the second dielectric layer, the third dielectric layer comprising a third material having a third wet etch rate, wherein the third wet etch rate is greater than the second wet etch rate which is greater than the first etch rate; a trench extending through the third dielectric layer, the second dielectric layer, and the first dielectric layer, and partially into the silicon of the substrate, the trench having a sidewall wherein an edge of the first dielectric layer is recessed from a top edge of the silicon at the sidewall, an edge of the second dielectric layer is recessed from the edge of the first dielectric layer at the sidewall and an edge of the third dielectric layer is recessed from the edge of the second dielectric layer at the sidewall; a contact barrier layer lining the trench; and a contiguous tungsten contact filling the trench.

7. The semiconductor device of claim 6, wherein the contact barrier layer comprises a bi-layer of Ti and TiN.

8. The semiconductor device of claim 7, wherein the contact barrier layer contacts the top edge of the silicon, the edge of the first dielectric layer, the edge of the second dielectric layer and the edge of the third dielectric layer.

9. The semiconductor device of claim 6, further comprising a contact barrier layer lining the trench.

10. The semiconductor device of claim 9, wherein the contact barrier layer comprises a bi-layer of Ti and TiN.

11. The semiconductor device of claim 9, wherein the contact barrier layer contacts the trench sidewall at each of the at least four steps.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a sectional view of part of a semiconductor device showing prior art tungsten plugs;

(2) FIG. 2 is a sectional view of part of a semiconductor device showing a step in the formation of a tungsten plug involving a contact etch through an interlayer dielectric in accordance with one embodiment of the invention;

(3) FIG. 3 is a sectional view through the device of FIG. 2 showing a further step in the formation of the tungsten plug involving a wet etch pull-back step of the interlayer dielectric in accordance with one embodiment of the invention, and

(4) FIG. 4 shows a sectional view of tungsten plugs formed in accordance with one embodiment of the invention.

DETAILED DESCRIPTION OF THE INVENTION

(5) One embodiment of the present invention is shown in FIGS. 2-4. In order to address the tungsten plug seam problem, the interlayer dielectric is composed of multiple layers of dielectric material with different wet etch rates. In this embodiment three different oxide layers are formed on the silicon substrate 200. First a thermal oxide layer 202 is formed using a high temperature oxidizing agent such as water vapor or molecular oxygen to diffuse into the silicon substrate and react to form a thin SiO2 layer 202. The thermal oxide or SiO2 layer 202 may be between 100 and 700 Angstroms thick. A Tetraethylorthosilicate (TEOS) oxide layer 204 is subsequently formed by chemical vapor deposition (CVD), or can be a furnace grown TEOS, on top of the thermal oxide layer 202, followed by a Borophosphosilicate Glass (BPSG) layer 206. The TEOS layer may be between 800 and 1600 Angstroms thick, while the BPSG layer may be between 2500 and 4500 Angstroms thick.

(6) In the present embodiment, the first SiO2 layer 202 is formed as a by-product to a gate oxide process. In order to create a vertical hole 208 or trench in the three oxide layers 202, 204, 206, a photoresist is deposited and patterned, whereafter a contact etch, which is a dry etch process, is performed to etch the oxide layers and the silicon substrate 200. The contact etch, in this embodiment, involves a two step contact etch:

(7) Step 1: the oxide film stack is etched, stopping at the silicon 200 surface (this is processed using an oxide etcher tool)

(8) Step 2: The silicon 200 is etched to a certain depth (Si recess) (this is processed using a Si etcher tool). The Si recess depth depends on the device requirements; in this embodiment a depth of 0.1 um˜0.5 um was chosen.

(9) This is followed by a wet etch process step, which in this embodiment is a diluted hydrofluoric acid (HF) wet etch step. Since the oxide layers making up the interlayer dielectric in this embodiment are chosen to have increasing etch rate from bottom to top, the thermal oxide 202 will be laterally etched the least while the BPSG layer 206 will be laterally etched the most to create a hole 300 with substantially sloped or tapered side walls as shown in FIG. 3.

(10) A contact barrier layer is then deposited, which in this embodiment is a Ti/TiN layer and is deposited in this embodiment without an Argon pre-clean, since the wet etch has a pre-cleaning effect. The Ti/TiN layer is then annealed. This is designated in FIG. 4 by reference numeral 400. Thereafter the hole or trench is filled with tungsten to define a tungsten plug 402. The wafer surface tungsten is etched back to leave behind a seamless tungsten plug in the hole or trench. For ease of reference, the hole or trench for the tungsten will be referred to herein simply as a hole. It will however be appreciated that the term hole will cover a variety of shapes for the etched depressions including trenches. The etch back can be performed, for instance, using chemical mechanical polishing or a dry etch. This allows the metal 1 layer 404 to be deposited over the tungsten plug 402 to make good contact with the plug 402.

(11) In the above embodiment, layers of thermal oxide, TEOS and BPSG were used, however, it will be appreciated that other dielectric layers could be used, having increasing etch resistance for the higher layers, without departing from the scope of the invention. For example, other oxide types, like PEOX, PSG, SOG, etc., could be used provided they are stacked with increasing wet etch rate toward the top.