Method for producing a rolled-up electrical or electronic component

Abstract

The present invention relates to the fields of physics, material sciences and micro and nano electronics, and concerns a method for producing a rolled-up electrical or electronic component, as can be used for example as a capacitor, or in aerials. The object of the present invention is to provide a low-cost, environmentally friendly and time-saving method for producing a rolled-up electrical or electronic component with many windings. The object is achieved by a method for producing a rolled-up component in which at least two functional and insulating layers, alternately arranged fully or partially over one another, are applied to a substrate with a sacrificial layer, wherein at least the functional or insulating layer that is arranged directly on the sacrificial layer has a perforation, at least on the two sides that are arranged substantially parallel to the rolling direction.

Claims

1. A method for producing a rolled-up electrical or electronic component comprising: applying at least two functional layers and at least two insulating layers that are alternately arranged fully or partially over one another to a substrate having a sacrificial layer, wherein at least one of the functional or insulating layer is arranged directly on the sacrificial layer and comprises a row of perforations at least on sides arranged essentially parallel to a rolling direction.

2. The method according to claim 1, wherein the row of perforations is composed of a rib-like structuring and the ribs have a basic quadrilateral shape.

3. The method according to claim 1, wherein a rigid or flexible material is used as a substrate.

4. The method according to claim 1, wherein the a substrate comprises silicon, silicon oxide, glass, ceramic, or a film of poly(ethylene terephthalate) (PET) or polyether ether ketone (PEEK), and the sacrificial layer comprises poly(vinyl alcohol) (PVA), poly(acrylic acid) (PAA), biopolysaccharides, cellulose acetate, poly(allylamine) (PAH), methylcellulose or ethylcellulose.

5. The method according to claim 1, wherein layers of an electrically conductive material are applied to the functional layers and layers of a dielectric and/or electrically insulating material are applied to the insulating layers by at least one of atomic layer deposition and/or chemical vapor deposition.

6. The method according to claim 5, wherein the electrically conductive layers comprise Ti, Cr, Al, Au, Ni, Pd, Cu, W, Ta and compounds thereof, or indium tin oxide or highly doped semiconductor material.

7. The method according to claim 1, wherein the at least two functional and insulating layers form a layer stack applied to the sacrificial layer, the layer stack being composed of a layer of at least one dielectric and/or electrically insulating material, a layer of at least one first electrically conductive material, an additional layer of at least one dielectric and/or electrically insulating material, and a layer of at least one second electrically conductive material, wherein the layers of the dielectric and/or electrically insulating material essentially completely cover the layers of the electrically conductive material.

8. The method according to claim 1, wherein the dielectric and/or insulating layers comprise AlOx, SiOx, AlTiOx, SiTiOx, HfOx, TaOx, ZrOx, HfSiOx, ZrSiOx, TiZrOx, TiZrWOx, TiOx, SrTiOx, PbTiOx, SiAlOx, metal nitrides such as aluminum nitrides AlNy, silicon nitrides SiNy, AlScNy, metal oxynitrides such as aluminum oxynitrides AlOxNy, silicon oxynitrides SiOxNy, HfSiOxNy and/or SiCzOxNy.

9. The method according to claim 8, wherein AlOx comprises Al.sub.2O.sub.3 and SiOx comprises SiO.sub.2.

10. The method according to claim 1, wherein the at least one functional or insulating layer that is applied directly to the sacrificial layer has a rolling-up length of 1 mm to 30 mm.

11. The method according to claim 1, wherein the sacrificial layer is removed by etching or using organic solvents and/or water and/or ethylenediaminetetraacetic acid.

12. A method for producing a rolled-up component comprising: applying at least two functional and insulating layers that are alternately arranged fully or partially over one another to a substrate having a sacrificial layer, wherein at least one of the functional or insulating layer is arranged directly on the sacrificial layer and comprises a perforation at least on sides arranged essentially parallel to a rolling direction, wherein the perforation is composed of a rib-like structuring and the ribs have a basic quadrilateral shape, and wherein quadrilateral shape of the ribs includes: one of the sides of the ribs being arranged essentially parallel to the rolling direction of the layers and being part of the edge of the layer to be rolled up and has a lateral length of 1 to 1000 m; an other side of the ribs being essentially parallel to the rolling direction of the layers is arranged at a distance of 5 to 200 m from the edge of the layer to be rolled up; wherein a distance between the ribs in a direction essentially parallel to the rolling direction is 20 to 4000 m, and an angle between an end of the other side of the ribs that is first in the rolling direction and the edge of the layer to be rolled up outside the rib is between 15 and 135, and an angle between an end of the other side of the ribs that is last in the rolling direction and the edge of the layer to be rolled up outside the rib is between 45 and 135, and subsequently removing the sacrificial layer at least fully or partially; and rolling up the layer stack.

13. A method for producing a rolled-up component comprising: applying at least two functional and insulating layers that are alternately arranged fully or partially over one another to a substrate having a sacrificial layer, wherein at least one of the functional or insulating layer is arranged directly on the sacrificial layer and comprises a perforation at least on sides arranged essentially parallel to a rolling direction, and wherein the at least two functional and insulating layers are alternately arranged over one another on the sacrificial layer and comprise ribs on sides parallel to a rolling direction that have a same rib-like structuring with regard to a number and geometry of the ribs.

14. The method according to claim 13, wherein the ribs of the applied functional and insulating layers have sides arranged essentially parallel to the rolling direction of the layers that are part of the edge of the layer to be rolled up, these sides having a lateral length of 10 to 200 m.

15. The method according to claim 13, wherein the ribs of the applied functional and insulting layers have sides arranged parallel to the rolling direction of the layers that neither part of the edge of the layer to be rolled up nor a corner of the ribs, these sides being arranged at a distance of 10 to 50 m from the edge of the layer to be rolled up.

16. The method according to claim 13, wherein a distance in the rolling direction between the ribs of the applied functional and insulating layers is 20 to 500 m.

17. The method according to claim 13, wherein the ribs of the applied functional and insulating layers have a quadrilateral structure in which an angle () between a side of the quadrilateral structure that is first in the rolling direction and the edge of the layer to be rolled up outside the quadrilateral structure is between 30 and 120, more advantageously 45, and an angle () between a side of the quadrilateral structure that is last in the rolling direction and the edge of the layer to be rolled up outside the quadrilateral structure is between 80 and 120, more advantageously 90.

18. The method according to claim 17, wherein the angle () is 45 and the angle () is 90.

Description

(1) The invention is explained below in greater detail with the aid of several exemplary embodiments.

(2) Wherein:

(3) FIG. 1a shows a layer to be rolled up, according to the prior art

(4) FIG. 1b shows a layer to be rolled up, with a perforation

(5) FIG. 2a shows a diagram of the rolling process for a layer according to the prior art

(6) FIG. 2b shows a diagram of the rolling process for a layer with a perforation

(7) FIG. 3 show an exemplary embodiment for production of a capacitor

EXAMPLE 1

Capacitors

(8) For the production of an ultra-compact microcapacitor having a plurality of coils, a layer of methylcellulose was spun in a centrifuge at a rotational speed of 4500 rpm (revolutions per minute) in a completely covering manner onto a silicon substrate with a length of 20 mm and a width of 5 mm with a 1-m thick thermally applied silicon dioxide layer, and was subsequently baked and dried on a hot plate for 5 minutes at 120 C. This layer of methylcellulose, which was thinner than 5 nm, was the sacrificial layer.

(9) Then, using the method of atomic layer deposition, an 11-nm thick Al.sub.2O.sub.3 layer was deposited at 150 C. such that it completely covered the sacrificial layer. This Al.sub.2O.sub.3 layer, which acts as a dielectric, also serves as an insulation layer between the two metallic electrodes following the rolling-up and as protection for the sacrificial layer against the subsequent process steps and air humidity.

(10) With the aid of optical photolithography, the first electrode of the capacitor was structured with a length of 10 mm in the rolling direction and a width of 0.6 mm. By means of electron beam evaporation, a tensioned electrically conductive layer composed of 15 nm Ti and subsequently 20 nm Cr were deposited each at a rate of 0.1 nm/s and subsequently lifted off. The layer comprised a perforation with ribs having a basic quadrilateral shape on both sides of the layer parallel to the rolling direction and was achieved using a mask during the deposition of the layer. The perforation was composed on both sides of geometrically identical and equally sized ribs, was adapted to the expected rolling diameter of 50 m, and had the following dimensions:

(11) Height of the ribs: H=9 m,

(12) Width of the ribs at the edge of the layer: B=25 m,

(13) Distance between the ribs at the edge of the layer: D=25 m,

(14) First angle in the rolling direction: =21,

(15) Second angle in the rolling direction: =78.

(16) Then, a second 11-nm thick Al.sub.2O.sub.3 layer was once again deposited by means of atomic layer deposition at 150 C. such that it completely covered the first electrically conductive layer, albeit without perforation on the sides.

(17) After optical lithography for the second electrode, the deposition of the second electrically conductive layer, also once again without any rib-like structuring one the sides, of 10 nm Cr took place at a rate of 0.1 nm/s and with a subsequent lift-off. Finally, the protruding sacrificial layer was removed using water, and the tensioned layer stack was rolled up at a speed of 2 mm/min.

(18) Through the use of the perforation according the invention, it was possible to consistently carry out the rolling-up procedure over the entire rolling-up length across the entire rolling-up front in the rolling direction and at a high rolling-up speed.

(19) In this manner, it was possible to produce a rolled-up capacitor using a cost-effective, environmentally friendly and time-saving method.

(20) FIG. 3 illustrates an exemplary embodiment for the production of a capacitor, for example, a layer stack 1 is applied to the sacrificial layer 2 of substrate 3, which layer stack 1 is composed of a layer 4 of at least one dielectric and/or electrically insulating material, a layer 5 of at least one first electrically conductive material, an additional layer 6 of at least one dielectric and/or electrically insulating material, and a layer 7 of at least one second electrically conductive material, and in which layer stack 1 the layers 4, 6 of the dielectric and/or electrically insulating material essentially completely cover the layers 5, 7 of the electrically conductive material.

EXAMPLE 2

Antenna

(21) For the production of a three-dimensional antenna, a layer of a 4% (w/v) diluted poly(acrylic acid) (PAA) was spun at 3000 rpm in a completely covering manner onto a 2222 mm.sup.2 glass substrate with a thickness of 200 m. The final layer thickness of this sacrificial layer was 500 nm. This layer was dried at 35 C. for 2 minutes and then immersed in a 1-molar solution of CaCl.sub.2 in deionized (DI) water. The coated substrate was subsequently washed in DI water and dried. By means of standard photolithography, the base surface of the antenna was structured using AR-P3510 photoresist. The PAA sacrificial layer was removed at the uncoated sites using undiluted AR300-35 developer and washed in DI water, The photoresist was removed in acetone, and the coated substrate was washed in isopropanol and dried. A tensioned layer stack of organic materials was applied to this sacrificial layer. The first layer was composed of PAA (M.sub.w=150000) and PVA at a ratio of 1:1, 4% (w/v) diluted in water. The second layer was composed of polyimide (M.sub.w=100000), 2% (w/v) diluted in N-methyl-2-pyrrolidone. The first polymer layer was applied at 8000 rpm to the sacrificial layer over the entire area with a resulting layer thickness of 500 nm. This layer was structured by means of standard photolithography and undiluted developer, wherein the layer comprised on both sides of the layer parallel to the rolling direction the perforation with ribs having a basic quadrilateral shape and the following dimensions:

(22) Height of the ribs: H=200 m,

(23) Width of the ribs at the edge of the layer: B=100 m,

(24) Distance between the ribs at the edge of the layer: D=300 m,

(25) First angle in the rolling direction: =45,

(26) Second angle in the rolling direction: =90.

(27) The perforation was composed on both sides of geometrically identical and equally sized ribs.

(28) The deposition of the metal layer on the tensioned layer without perforation followed. For this purpose, the photoresist was structured by means of standard photolithography and Ta(10 nm)/Cu(100 nm)/Ta(10 nm) was deposited by means of magnetron sputtering. During this step, Ar at a partial pressure of 0.1 Pa was used as a sputtering gas. The lift-off took place with acetone and a subsequent rinsing in isopropanol.

(29) The planar, two-dimensional structures produced in such a manner with a footprint of 5.517 mm.sup.2 were rolled up into three-dimensional helical antennas by removal from the substrate. The removal was achieved by means of selective etching of the sacrificial layer in a 0.5-molar ethylenediaminetetraacetic acid (EDTA) solution. After the rolling process, the antennas were washed in DI water and dried in air. The diameter of the rolled-up antenna was 300 m, and the length after the rolling was 5.5 mm.

(30) Through the use of the perforation according the invention, it was possible to consistently carry out the rolling-up procedure over the entire rolling-up length across the entire rolling-up front in the rolling direction and at a high rolling-up speed.

(31) In this manner, it was possible to produce a rolled-up antenna using a cost-effective, environmentally friendly and time-saving method.