NANOSTRUCTURE FORMATION DEVICE USING MICROWAVES
20190048471 ยท 2019-02-14
Inventors
Cpc classification
H01L21/02565
ELECTRICITY
H01L21/6715
ELECTRICITY
C23C18/143
CHEMISTRY; METALLURGY
International classification
Abstract
The present invention relates to a nanostructure formation device using microwaves and, more specifically, to a novel structure of a nanostructure formation device using microwaves, the device being capable of introducing a solution process factor to a conventional nanostructure formation device using microwaves, so as to stably manufacture a nanostructure by using a microwave while consistently maintaining the concentration of a formation solution and the process conditions for it when the nanostructure is formed through a solution process.
Claims
1. A nanostructure formation device using microwaves, the device comprising: a chamber; a microwave generator mounted within the chamber; and a reaction container part contained in the chamber comprising a reaction solution and a substrate.
2. The nanostructure formation device of claim 1, further comprising a reaction solution circulator for circulating a reaction solution from a reaction solution reservoir outside the chamber to a reaction container inside the chamber.
3. The nanostructure formation device of claim 2, wherein the reaction solution circulator comprises a reaction solution inlet and a reaction solution outlet.
4. The nanostructure formation device of claim 3, wherein the reaction solution circulator further comprises an actuating pump.
5. The nanostructure formation device of claim 3, wherein the reaction solution circulator comprises a reaction solution inlet pipe and a reaction solution outlet pipe that are connected to the outside of the chamber.
6. The nanostructure formation device of claim 5, wherein the reaction solution inlet pipe and the reaction solution outlet pipe are fainted of double pipes consisting of an outer metal pipe and an inner Teflon pipe.
7. The nanostructure formation device of claim 1, wherein the reaction container part comprises an upper reaction container, a substrate, and a lower reaction container that are sequentially stacked in a disassemblable or assemblable state, wherein the portion where the bottom of the upper reaction container adjoins the substrate comprises an elastic body.
8. The nanostructure formation device of claim 7, wherein the upper reaction container comprises: a vertical portion having a vertical height to contain a reaction solution; and a tapered sloping portion formed above the vertical portion.
9. The nanostructure formation device of claim 1, comprising a plurality of reaction container parts within the chamber.
10. The nanostructure formation device of claim 9, further comprising an inner reaction solution circulator for circulating a reaction solution between the plurality of reaction container parts.
11. The nanostructure formation device of claim 1, comprising a microwave feeder and a temperature controller that are formed outside the chamber.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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[0031]
[0032] (a) of
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[0036] (a) of
DESCRIPTION OF EXEMPLARY EMBODIMENTS
[0037] Hereinafter, an exemplary embodiment of the present invention will be described in more details. However, the present invention is not limited by the following embodiment.
<Exemplary Embodiment> Manufacture of Nanostructure Formation Device Using Microwaves
[0038]
[0039] As shown in
[0040] Moreover, as shown in
[0041]
[0042] <Test Examples> Formation of Nanostructure Using Nanostructure Formation Device Using Microwaves
Test Example 1: Efficiency (Growth Rate) Analysis of ZnO Nanorod Synthesis Process Using Microwaves
[0043] ZnO nanorods were synthesized by using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment, and ZnO nanorods were synthesized by traditional hydrothermal synthesis methods. The growth rate for each synthesis process was analyzed and the results were tabulated in Table 1 below.
TABLE-US-00001 TABLE 1 Process efficiency of traditional Test Example 1 hydrothermal synthesis methods Process method Microwave-chemical Hydrothermal Hydrothermal bath deposition synthesis synthesis Process 15 mins 12 hours 20 hours time Nanorod App. 453 nm App. 1,500 nm App. 1,000 nm length Nanorod App. 64 nm App. 150 nm App. 40 to 80 nm diameter Growth 1,812 nm/hour 125 nm/hour 50 nm/hour rate
[0044] As shown in Table 1, the ZnO nanorod synthesis process using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment of the present invention showed a large increase in growth rate (nanorods synthesized per hour), in comparison with the ZnO nanorod synthesis processes using traditional hydrothermal synthesis methods, and it can be seen that, in comparison with the traditional hydrothermal synthesis methods, the process time was greatly reduced but the process efficiency was definitely increased.
[0045] The SEM analysis images of the ZnO nanorods synthesized by the aforementioned synthesis processes are depicted in
Test Example 2: ZnO Nanorods (Full Width at Half Maximum Analysis)
[0046] The full width at half maximum of ZnO nanorods synthesized by using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment, and the full width at half maximum of ZnO nanorods synthesized by traditional synthesis methods such as atomic layer deposition (ALD), hydrothermal synthesis, chemical bath deposition (CBD), and modified chemical bath deposition (M-CBD) was analyzed and the results were tabulated in Table 2 below.
TABLE-US-00002 TABLE 2 Test Example 2 Traditional synthesis methods Process method Microwave-chemical Atomic layer Chemical solution Modified chemical bath deposition deposition Hydrothermal deposition bath deposition (MC-CBD) (ALD) synthesis (CBD) (M-CBD) Full width at 0.15~0.18 0.3~0.4 0.16~0.32 0.35~0.44 0.18~0.21 half maximum
[0047] As shown in Table 2, the ZnO nanorods synthesized by using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment of the present invention showed a decrease in XRD full width at half maximum, in comparison with the ZnO nanorods synthesized by the traditional synthesis methods.
[0048] The decrease in full width at half maximum means that the particles have high crystalline quality. Accordingly, it can be seen that the ZnO nanorods synthesized by using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment of the present invention have excellent crystalline quality.
[0049] The SEM analysis images of the ZnO nanorods synthesized by the aforementioned synthesis processes are depicted in
Test Example 3: Efficiency (Growth Rate) Analysis of Fe.SUB.2.O.SUB.3 .Nano Thin Film Synthesis Process Using Microwaves
[0050] A Fe.sub.2O.sub.3 nano thin film was synthesized by using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment, and a Fe.sub.2O.sub.3 nano thin film was synthesized by traditional hydrothermal synthesis methods. The growth rate for each synthesis process was analyzed and the results were tabulated in Table 3 below.
TABLE-US-00003 TABLE 3 Process efficiency of traditional hydrothermal Test Example 3 synthesis methods Process method Microwave-chemical Hydrothermal Hydrothermal Hydrothermal bath deposition synthesis synthesis synthesis Process time 10 mins 4 to 24 hours 2 hours 12 hours Thin film thickness 40 nm 120 nm 100 nm 10 nm Growth rate 2,400 nm/hour 29.9 nm/hour 50.04 nm/hour 0.83 nm/hour
[0051] As shown in Table 1, the Fe.sub.2O.sub.3 nano thin film synthesis process using the nanostructure formation device using microwaves manufactured according to an exemplary embodiment of the present invention showed a large increase in growth rate (nanorods synthesized per hour), in comparison with the Fe.sub.2O.sub.3 nano thin film synthesis processes using traditional hydrothermal synthesis methods, and it can be seen that, in comparison with the traditional hydrothermal synthesis methods, the process time was greatly reduced but the process efficiency was definitely increased.
[0052] The SEM analysis images of the Fe.sub.2O.sub.3 nano thin films synthesized by the aforementioned synthesis processes are depicted in
[0053] The nanostructure formation device using microwaves according to the present invention allows for the manufacture of stable materials by consistently maintaining the concentration of a reaction solution and the process conditions for it when thin-film formation, surface treatment, and nanostructure manufacture, and chemical bath deposition are performed by using microwaves.