ELECTRONIC CIRCUIT PACKAGE USING COMPOSITE MAGNETIC SEALING MATERIAL

Abstract

Disclosed herein is an electronic circuit package includes a substrate, an electronic component mounted on a surface of the substrate, a magnetic mold resin covering the surface of the substrate so as to embed therein the electronic component, a metal film covering the magnetic mold resin, and a magnetic film covering the metal film. The magnetic mold resin includes a resin material, and a magnetic filler blended in the resin material, the magnetic filler containing Fe and 32 wt. % or more and 39 wt. % or less of a metal material composed mainly of Ni.

Claims

1. An electronic circuit package comprising: a substrate; an electronic component mounted on a surface of the substrate; a magnetic mold resin covering the surface of the substrate so as to embed therein the electronic component; a metal film covering the magnetic mold resin; and a magnetic film covering the metal film, wherein the magnetic mold resin includes: a resin material; and a magnetic filler blended in the resin material, the magnetic filler containing Fe and 32 wt. % or more and 39 wt. % or less of a metal material composed mainly of Ni.

2. The electronic circuit package as claimed in claim 1, wherein the metal material further contains 0.1 wt. % or more and 8 wt. % or less of Co relative to a total weight of the magnetic filler.

3. The electronic circuit package as claimed in claim 1, wherein the filler further includes a non-magnetic filler.

4. The electronic circuit package as claimed in claim 3, wherein a ratio of an amount of the non-magnetic filler relative to a sum of an amounts of the magnetic filler and the non-magnetic filler is 1 vol. % or more and 40 vol. % or less.

5. The electronic circuit package as claimed in claim 4, wherein the non-magnetic filler contains at least one material selected from a group consisting of SiO.sub.2, ZrW.sub.2O.sub.8, (ZrO).sub.2P.sub.2O.sub.7, KZr.sub.2(PO.sub.4).sub.3, or Zr.sub.2 (WO.sub.4)(PO.sub.4).sub.2.

6. The electronic circuit package as claimed in claim 1, wherein the magnetic filler has a substantially spherical shape.

7. The electronic circuit package as claimed in claim 1, wherein the magnetic filler is coated with an insulating material.

8. The electronic circuit package as claimed in claim 7, wherein a film thickness of the insulating material is 10 nm or more.

9. The electronic circuit package as claimed in claim 1, wherein the resin material comprises a thermosetting resin material.

10. The electronic circuit package as claimed in claim 9, wherein the thermosetting resin material contains at least one material selected from a group consisting of an epoxy resin, a phenol resin, a urethane resin, a silicone resin, or an imide resin.

11. The electronic circuit package as claimed in claim 1, wherein a volume resistivity of the magnetic mold resin is 10.sup.10 cm or more.

12. The electronic circuit package as claimed in claim 1, further comprising a non-magnetic member provided between the electronic component and the magnetic mold resin.

13. The electronic circuit package as claimed in claim 1, further comprising a metal film covering the magnetic mold resin, wherein the metal film is connected to a power supply pattern provided in the substrate.

14. The electronic circuit package as claimed in claim 13, wherein the metal film is mainly composed of at least one metal selected from a group consisting of Au, Ag, Cu, and Al.

15. The electronic circuit package as claimed in claim 13, wherein a surface of the metal film is covered with an antioxidant film.

16. The electronic circuit package as claimed in claim 13, wherein the power supply pattern is exposed to a side surface of the substrate, and the metal film contacts the power supply pattern exposed on the side surface of the substrate.

17. The electronic circuit package as claimed in claim 1, wherein the magnetic filler blended in the resin material in a blended ratio of 30 vol. % or more to 85 vol. % or less.

18. The electronic circuit package as claimed in claim 1, wherein the a thermal expansion coefficient of the magnetic mold resin is 15 ppm/ C. or less.

19. The electronic circuit package as claimed in claim 1, wherein the magnetic film comprises a permalloy or a super permalloy.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The above features and advantages of the present invention will be more apparent from the following description of certain preferred embodiments taken in conjunction with the accompanying drawings, in which:

[0023] FIG. 1 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a first embodiment of the present invention;

[0024] FIG. 2 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a first modification of the first embodiment;

[0025] FIGS. 3 to 5 are process views for explaining a manufacturing method for the electronic circuit package shown in FIG. 1;

[0026] FIG. 6 is a schematic view for explaining a configuration of a composite magnetic sealing material;

[0027] FIG. 7 is a graph illustrating the relationship between the Ni ratio of the magnetic filler and the thermal expansion coefficient and the magnetic permeability of the composite magnetic sealing material;

[0028] FIG. 8 is a graph illustrating the relationship between the Ni ratio of the magnetic filler and the thermal expansion coefficient of the composite magnetic sealing material;

[0029] FIG. 9 is a graph illustrating the relationship between the Ni ratio of the magnetic filler and the magnetic permeability of the composite magnetic sealing material;

[0030] FIG. 10 is a graph illustrating the relationship between the Co ratio of the magnetic filler and the thermal expansion coefficient and magnetic permeability of the composite magnetic sealing material;

[0031] FIG. 11 is a graph illustrating the relationship between the additive ratio of the non-magnetic filler and the thermal expansion coefficient of the composite magnetic sealing material;

[0032] FIG. 12 is a graph illustrating the relationship between the presence/absence of the insulating coat formed on the surface of the magnetic filler and volume resistivity;

[0033] FIG. 13 is a graph illustrating the relationship between the film thickness of the insulating coat formed on the surface of the magnetic filler and volume resistivity;

[0034] FIG. 14 is a graph illustrating the relationship between volume resistivity of the magnetic filler and that of the composite magnetic sealing material;

[0035] FIG. 15 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a second embodiment of the present invention;

[0036] FIGS. 16 to 18 are process views for explaining a manufacturing method for the electronic circuit package shown in FIG. 15;

[0037] FIG. 19 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a third embodiment of the present invention;

[0038] FIG. 20 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a first modification of the third embodiment;

[0039] FIG. 21 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a second modification of the third embodiment;

[0040] FIG. 22 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a third modification of the third embodiment;

[0041] FIG. 23 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a fourth modification of the third embodiment;

[0042] FIG. 24 is a graph illustrating noise attenuation in the electronic circuit package shown in FIG. 19;

[0043] FIGS. 25 to 27 are graphs each illustrating the relationship between the film thickness of the metal film included in the electronic circuit package shown in FIG. 19 and noise attenuation;

[0044] FIGS. 28 and 29 are graphs illustrating the warp amount of the substrate during temperature rising and that during temperature dropping in the electronic circuit packages shown in FIGS. 1 and 19;

[0045] FIG. 30 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a fourth embodiment of the present invention;

[0046] FIGS. 31 to 32 are process views for explaining a manufacturing method for the electronic circuit package shown in FIG. 30;

[0047] FIG. 33 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a fifth embodiment of the present invention;

[0048] FIG. 34 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a first modification of the fifth embodiment;

[0049] FIG. 35 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a second modification of the fifth embodiment;

[0050] FIGS. 36 and 37 are process views for explaining a manufacturing method for the electronic circuit package shown in FIG. 33;

[0051] FIG. 38 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a sixth embodiment of the present invention;

[0052] FIG. 39 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a first modification of the sixth embodiment;

[0053] FIG. 40 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a second modification of the sixth embodiment;

[0054] FIGS. 41 to 43 are process views for explaining a manufacturing method for the electronic circuit package shown in FIG. 38;

[0055] FIG. 44 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a seventh embodiment of the present invention;

[0056] FIG. 45 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a modification of the seventh embodiment;

[0057] FIGS. 46 and 47 are process views for explaining a manufacturing method for the electronic circuit package shown in FIG. 44;

[0058] FIG. 48 is a cross-sectional view illustrating a configuration of an electronic circuit package according to an eighth embodiment of the present invention;

[0059] FIG. 49 is a cross-sectional view illustrating a configuration of an electronic circuit package according to a modification of the eighth embodiment;

[0060] FIG. 50 is a table indicating compositions 1 to 3; and

[0061] FIGS. 51 and 52 are tables indicating measurement results of the Examples.

DETAILED DESCRIPTION OF THE EMBODIMENTS

[0062] Preferred embodiments of the present invention will be explained below in detail with reference to the accompanying drawings.

First Embodiment

[0063] FIG. 1 is a cross-sectional view illustrating a configuration of an electronic circuit package 11A according to the first embodiment of the present invention.

[0064] As illustrated in FIG. 1, the electronic circuit package 11A according to the present embodiment includes a substrate 20, a plurality of electronic components 31 and 32 mounted on the substrate 20, and a magnetic mold resin 40 covering a front surface 21 of the substrate 20 so as to embed the electronic components 31 and 32.

[0065] Although the type of the electronic circuit package 11A according to the present embodiment is not especially limited, examples thereof include a high-frequency module handling a high-frequency signal, a power supply module performing power supply control, an SIP (System-In-Package) having a 2.5D structure or a 3D structure, and a semiconductor package for radio communication or digital circuit. Although only two electronic components 31 and 32 are illustrated in FIG. 1, more electronic components are incorporated actually.

[0066] The substrate 20 has a double-sided and multilayer wiring structure in which a large number of wirings are embedded therein and may be any type of substrate including: a thermosetting resin based organic substrate such as an FR-4, an FR-5, a BT, a cyanate ester substrate, a phenol substrate, or an imide substrate; a thermoplastic resin based organic substrate such as a liquid crystal polymer; an LTCC substrate; an HTCC substrate; and a flexible substrate. In the present embodiment, the substrate 20 has a four-layer structure including wiring layers formed on the front surface 21 and a back surface 22 and two wiring layers embedded therein. Land patterns are an internal electrode for connecting to the electronic components 31 and 32. The land patterns 23 and each of the electronic components 31 and 32 are electrically and mechanically connected to each other through a respective solder 24 (or a conductive paste). For example, the electronic component 31 is a semiconductor chip such as a controller, and electronic component 32 is a passive component such as a capacitor or a coil. Some electronic components (e.g., thinned semiconductor chip) may be embedded in the substrate 20.

[0067] The land patterns 23 are connected to external terminals 26 formed on the back surface 22 of the substrate 20 through internal wirings 25 formed inside the substrate 20. Upon actual use, the electronic circuit package 11A is mounted on an unillustrated mother board, and land patterns on the mother board and the external terminals 26 of the electronic circuit package 11A are electrically connected. A material for a conductor forming the land patterns 23, internal wirings 25, and external terminals 26 may be a metal such as copper, silver, gold, nickel, chrome, aluminum, palladium, indium, or a metal alloy thereof or may be a conductive material using resin or glass as a binder; however, when the substrate 20 is an organic substrate or a flexible substrate, copper or silver is preferably used in terms of cost and conductivity. The above conductive materials may be formed by using various methods such as printing, plating, foil lamination, sputtering, vapor deposition, and inkjet.

[0068] The magnetic mold resin 40 covers the front surface of the substrate 20 so as to embed the electronic components 31 and 32 therein. The magnetic mold resin 40 is a mold member and serves also as a magnetic shielding. In the present embodiment, a side surface 42 of the magnetic mold resin 40 and a side surface 27 of the substrate 20 form the same plane. Although details of the magnetic mold resin 40 will be explained later, the magnetic mold resin 40 composed of a composite magnetic sealing material having very small thermal expansion coefficient (15 ppm/ C. or less for example) compared with a conventional magnetic sealing material. The magnetic mold resin 40 contacts the electronic components 31, 32 and land patterns 23, so that the volume resistance thereof needs to be sufficiently large. Specifically, it is desirable that the volume resistance is equal to or larger than 10.sup.10 cm.

[0069] Further, when a distance between an electronic component such as a high-frequency inductor and the magnetic mold resin 40 is too small, characteristics thereof such as an inductance value may fluctuate from a design value. In such a case, the fluctuation of the characteristics can be reduced by covering a part of or the entire electronic component with a non-magnetic member. FIG. 2 is a cross-sectional view illustrating a configuration of an electronic circuit package 11B according to a modification. The electronic circuit package 11B of FIG. 2 differs from the electronic circuit package 11A of FIG. 1 in that the electronic component 32 is covered with a non-magnetic member 90. As the non-magnetic member 90, a common resin can be used. By interposing the non-magnetic member 90 between the electronic component 32 and the magnetic mold resin 40, a sufficient distance between the electronic component 32 and magnetic mold resin 40 can be ensured, so that it is possible to reduce the fluctuation of characteristics such as the inductance value.

[0070] The following describes a manufacturing method for the electronic circuit package 11A according to the present embodiment.

[0071] FIGS. 3 to 5 are process views for explaining a manufacturing method for the electronic circuit package 11A.

[0072] As illustrated in FIG. 3, an assembly substrate 20A having a multilayer wiring structure is prepared. A plurality of the land patterns 23 are formed on the front surface 21 of the assembly substrate 20A, and a plurality of the external terminals 26 are formed on the back surface 22 of the assembly substrate 20A. Further, a plurality of the internal wirings 25 are formed in an inner layer of the assembly substrate 20A. A dashed line a in FIG. 3 denotes a part to be cut in a subsequent dicing process.

[0073] Then, as illustrated in FIG. 3, the plurality of electronic components 31 and 32 are mounted on the front surface 21 of the assembly substrate 20A so as to be connected to the land patterns 23. Specifically, the solder 24 is provided on the land pattern 23, followed by mounting of the electronic components 31 and 32 and by reflowing, whereby the electronic components 31 and 32 are connected to the land patterns 23.

[0074] Then, as illustrated in FIG. 4, the front surface 21 of the assembly substrate 20A is covered with the magnetic mold resin 40 so as to embed the electronic components 31 and 32 in the magnetic mold resin 40. Examples of the formation method for the magnetic mold resin 40 may include transfer molding, compression molding, injection molding, cast molding, vacuum cast molding, dispense molding, and molding using a slit nozzle.

[0075] Then, as illustrated in FIG. 5, the assembly substrate 20A is cut along the dashed line a to divide the assembly substrate 20A into individual substrates 20, whereby the electronic circuit package 11A according to the present embodiment is completed.

[0076] The following describes details of the composite magnetic sealing material constituting the magnetic mold resin 40.

[0077] FIG. 6 is a schematic view for explaining a configuration of a composite magnetic sealing material constituting the magnetic mold resin 40.

[0078] As illustrated in FIG. 6, a composite magnetic sealing material 2 constituting the magnetic mold resin 40 includes a resin material 4, and a magnetic filler 6 and a non-magnetic filler 8 which are blended in the resin material 4. Although not especially limited, the resin material 4 is preferably composed mainly of a thermosetting resin material. Specifically, the resin material 4 is preferably composed mainly of an epoxy resin, a phenol resin, a urethane resin, a silicone resin, or an imide resin and more preferably uses a base resin and a curing agent used for an epoxy resin-based or a phenol resin-based semiconductor sealing material.

[0079] The most preferable is the epoxy resin having a reactive epoxy group at its terminal, which can be combined with various types of curing agents and curing accelerators. Examples of the epoxy resin include a bisphenol A epoxy resin, a bisphenol F epoxy resin, a phenoxy type epoxy resin, a naphthalene type epoxy resin, a multifunctional-type epoxy resin (dicyclopentadiene type epoxy resin, etc.), a biphenyl-type (bifunctional) epoxy resin, and an epoxy resin having a special structure. Among them, the biphenyl type epoxy resin, naphthalene type epoxy resin, and dicyclopentadiene type epoxy resin are useful since they can attain low thermal expansion. Examples of the curing agent or curing accelerator include amine-based compound alicyclic diamine, aromatic diamine, other amine-based compounds (imidazole, tertiary amine, etc.), an acid anhydride compound (high-temperature curing agent, etc.), a phenol resin (novolac type phenol resin, cresol novolac type phenol resin, etc.), an amino resin, dicyandiamide, and a Lewis acid complex compound. For material kneading, known means such as a kneader, three-roll mills, or a mixer may be used.

[0080] The magnetic filler 6 is formed of an FeNi based material and contains 32 wt. % or more and 39 wt. % or less of a metal material composed mainly of Ni. The remaining 61-68 wt. % is Fe. The blending ratio of the magnetic filler 6 to the composite magnetic sealing material 2 is 30 vol. % or more and 85 vol. % or less. When the blending ratio of the magnetic filler 6 is less than 30 vol. %, it is difficult to obtain sufficient magnetic characteristics; on the other hand, when the blending ratio of the magnetic filler 6 exceeds 85 vol. %, it is difficult to ensure characteristics, such as flowability, required for a sealing material.

[0081] The metal material composed mainly of Ni may contain a small amount of Co. That is, a part of Ni may be substituted by Co. The containment of Co enables a further reduction in the thermal expansion coefficient of the composite magnetic sealing material 2. The adding amount of Co to the composite magnetic sealing material 2 is preferably 0.1 wt. % or more and 8 wt. % or less.

[0082] The shape of the magnetic filler 6 is not especially limited. However, the magnetic filler 6 may preferably be formed into a spherical shape for high packing density. Further, fillers of different particle sizes may be blended as the magnetic filler 6 for closest packing. Further, forming the magnetic filler 6 into a spherical shape (or substantially a spherical shape) enables a reduction in damage to electronic components during molding. Particularly, for high packing density or closest packing, the shape of the magnetic filler 6 is preferably a true sphere. The magnetic filler 6 preferably has a high tap density and a small specific surface area. As a formation method for the magnetic filler 6, there are known a water atomization method, a gas atomization method, and a centrifugal disc atomization method. Among them, the gas atomization method is most preferable since it can achieve a high tap density and reduce the specific surface area.

[0083] Although not especially limited, the surface of the magnetic filler 6 is covered with an insulating coat 7 formed of an oxide of metal such as Si, Al, Ti, or Mg or an organic material for enhancement of flowability, adhesion, and insulation performance. To sufficiently enhance the volume resistivity of the composite magnetic sealing material 2, the film thickness of the insulating coat 7 is preferably set to 10 nm or more. The insulating coat 7 may be achieved by coating a thermosetting material on the surface of the magnetic filler 6 or may be achieved by formation of an oxide film by hydration of metal alkoxide such as tetraethyloxysilane or tetraemthyloxysilane and, most preferably, it is achieved by formation of a silicon oxide coating film. Further, more preferably, organofunctional coupling treatment is applied to the insulating coat 7.

[0084] In this embodiment, the composite magnetic sealing material 2 contains the non-magnetic filler 8. As the non-magnetic filler 8, a material having a smaller thermal expansion coefficient than that of the magnetic filler 6, such as SiO.sub.2, ZrW.sub.2O.sub.8, (ZrO).sub.2P.sub.2O.sub.7, KZr.sub.2(PO.sub.4).sub.3, or Zr.sub.2(WO.sub.4)(PO.sub.4).sub.2, or a material having a negative thermal expansion coefficient is preferably used. By adding the non-magnetic filler 8 to the composite magnetic sealing material 2, it is possible to further reduce the thermal expansion coefficient. Further, the following materials may be added to the composite magnetic sealing material 2: flame retardant such as aluminum oxide or magnesium oxide; carbon black, pigment, or dye for coloring; surface-treated nanosilica having a particle diameter of 100 nm or less for enhancement of slidability, flowability, and dispersibility/kneadability; and a wax component for enhancement of mold releasability. In the present invention, it is not essential that the composite magnetic sealing material constituting the magnetic mold resin 40 contains the non-magnetic filler.

[0085] Further, organofunctional coupling treatment may be applied to the surface of the magnetic filler 6 or surface of the non-magnetic filler 8 for enhancement of adhesion and flowability. The organofunctional coupling treatment may be performed using a known wet or dry method, or by an integral blend method. Further, the surface of the magnetic filler 6 or surface of the non-magnetic filler 8 may be coated with a thermosetting resin for enhancement of wettability.

[0086] When the non-magnetic filler 8 is added, the ratio of the amount of the non-magnetic filler 8 relative to the sum of the amounts of the magnetic filler 6 and the non-magnetic filler 8 is preferably 1 vol. % or more and 40 vol. % or less. In other words, 1 vol. % or more and 40 vol. % or less of the magnetic filler 6 can be substituted by the non-magnetic filler 8. When the additive amount of the non-magnetic filler 8 is less than 1 vol. %, addition effect of the non-magnetic filler 8 is hardly obtained; on the other hand, when the additive amount of the non-magnetic filler 8 exceeds 40 vol. %, the relative amount of the magnetic filler 6 is too small, resulting in difficulty in providing sufficient magnetic characteristics.

[0087] The composite magnetic sealing material 2 may be a liquid or solid, depending on selection of a base resin and a curing agent according to the molding method therefor. The composite magnetic sealing material 2 in a solid state may be formed into a tablet shape for transfer molding and into a granular shape for injection molding or compression molding. The molding method using the composite magnetic sealing material 2 may be appropriately selected from among the followings: transfer molding; compression molding; injection molding; cast molding; vacuum cast molding; vacuum printing; printing; dispensing; and a method using a slit nozzle. A molding condition may be appropriately selected from combinations of the base resin, curing agent and curing accelerator to be used. Further, after-cure treatment may be applied as needed after the molding.

[0088] FIG. 7 is a graph illustrating the relationship between the Ni ratio of the magnetic filler 6 and the thermal expansion coefficient and the magnetic permeability of the composite magnetic sealing material 2. The graph of FIG. 7 represents a case where the magnetic filler 6 is composed of substantially only Fe and Ni. Here, it is assumed that the additive amount of the magnetic filler 6 relative to the composite magnetic sealing material 2 is 70 vol. % and no non-magnetic filler 8 is added to the composite magnetic sealing material 2.

[0089] As illustrated in FIG. 7, when the Ni ratio of the magnetic filler 6 is 32 wt. % or more and 39 wt. % or less, the thermal expansion coefficient of the composite magnetic sealing material 2 is remarkably reduced (it may be reduced to 10 ppm/ C. in some conditions). In the example of FIG. 7, the smallest thermal expansion coefficient (about 9.3 ppm/ C.) is obtained when the Ni ratio is about 35 wt. %. On the other hand, the magnetic permeability is not strongly correlated to the Ni ratio, and is 12 to 13 in the range of the Ni ratio illustrated in FIG. 7.

[0090] The reason that such characteristics are obtained is that invar characteristics where volumetric changes due to thermal expansion and magnetic distortion cancel out each other is exhibited when the Ni ratio falls within the above range. A material where the invar characteristic is exhibited is called an invar material, which is known as a material for a die requiring high precision; however, it was not used as a material for the magnetic filler to be blended in a composite magnetic sealing material. The present inventor pays attention to the magnetic characteristics and small thermal expansion coefficient that the invar material has and uses the invar material as a material for the magnetic filler and thereby realize the composite magnetic sealing material 2 having a small thermal expansion coefficient.

[0091] FIG. 8 is a graph illustrating the relationship between the Ni ratio of the magnetic filler 6 and the thermal expansion coefficient of the composite magnetic sealing material 2. The graph of FIG. 8 represents a case where the magnetic filler 6 is composed substantially of only Fe and Ni. Here, it is assumed that the additive amount of the magnetic filler 6 relative to the composite magnetic sealing material 2 is 50 vol. %, 60 vol. %, or 70 vol. % and no non-magnetic filler 8 is added to the composite magnetic sealing material 2.

[0092] As illustrated in FIG. 8, even in a case where the additive amount of the magnetic filler 6 is either 50 vol. %, 60 vol. %, or 70 vol. %, when the Ni ratio of the magnetic filler 6 is 32 wt. % or more and 39 wt. % or less, the thermal expansion coefficient of the composite magnetic sealing material 2 is remarkably reduced. The more the additive amount of the magnetic filler 6 is, the smaller the thermal expansion coefficient. Therefore, when the additive amount of the magnetic filler 6 is small (e.g., 30 vol. %), the non-magnetic filler 8 formed of molten silica is further added to reduce the thermal expansion coefficient of the composite magnetic sealing material 2 to 15 ppm/ C. or less. Specifically, by setting the total additive amount of the magnetic filler 6 and the non-magnetic filler 8 to 50 vol. % or more and 85 vol. % or less, the thermal expansion coefficient of the composite magnetic sealing material 2 can be sufficiently reduced (e.g., to 15 ppm/ C. or less).

[0093] FIG. 9 is a graph illustrating the relationship between the Ni ratio of the magnetic filler 6 and the magnetic permeability of the composite magnetic sealing material 2. As in the case of the graph of FIG. 8, the graph of FIG. 9 represents a case where the magnetic filler 6 is composed substantially of only Fe and Ni and the additive amount of the magnetic filler 6 relative to the composite magnetic sealing material 2 is 50 vol. %, 60 vol. %, or 70 vol. %, and no non-magnetic filler 8 is added to the composite magnetic sealing material 2.

[0094] As illustrated in FIG. 9, even in a case where the additive amount of the magnetic filler 6 is either 50 vol. %, vol. %, or 70 vol. %, the Ni ratio and the magnetic permeability are not strongly correlated to each other. The more the additive amount of the magnetic filler 6 is, the larger the magnetic permeability.

[0095] FIG. 10 is a graph illustrating the relationship between the Co ratio of the magnetic filler 6 and the thermal expansion coefficient and magnetic permeability of the composite magnetic sealing material 2. The graph of FIG. 10 represents a case where the sum of the amounts of Ni and Co contained in the magnetic filler 6 is 37 wt. %, the additive amount of the magnetic filler 6 relative to the composite magnetic sealing material 2 is 70 vol. %, and no non-magnetic filler 8 is added to the composite magnetic sealing material 2.

[0096] As illustrated in FIG. 10, as compared to a case where Co is not contained (Co=0 wt. %) in the magnetic filler 6, the thermal expansion coefficient of the composite magnetic sealing material 2 is further reduced when Ni constituting the magnetic filler 6 is substituted by 8 wt. % or less of Co. However, when the substituted amount by Co is 10 wt. %, the thermal expansion coefficient is conversely increased. Therefore, the additive amount of Co relative to the magnetic filler 6 is preferably 0.1 wt. % or more and 8 wt. % or less.

[0097] FIG. 11 is a graph illustrating the relationship between the additive ratio of the non-magnetic filler 8 and the thermal expansion coefficient of the composite magnetic sealing material 2. The graph of FIG. 11 represents a case where the sum of the amounts of the magnetic filler 6 and the non-magnetic filler 8 is 70 vol. %, the magnetic filler 6 is composed of 64 wt. % of Fe and 36 wt. % of Ni, and the non-magnetic filler 8 is formed of SiO.sub.2.

[0098] As illustrated in FIG. 11, as the ratio of the amount of the non-magnetic filler 8 is increased, the thermal expansion coefficient of the composite magnetic sealing material 2 is reduced; however, when the amount of the non-magnetic filler 8 exceeds 40 vol. % relative to 60 vol. % of the magnetic filler 6, thermal expansion coefficient reduction effect is nearly saturated. Thus, the amount of the non-magnetic filler 8 relative to the sum of the amounts of the magnetic filler 6 and non-magnetic filler 8 is preferably 1 vol. % or more and 40 vol. % or less.

[0099] FIG. 12 is a graph illustrating the relationship between the presence/absence of the insulating coat 7 formed on the surface of the magnetic filler 6 and volume resistivity. Two compositions are prepared as a material for the magnetic filler 6 as follows: composition A (Fe=64 wt. %, Ni=36 wt. %); and composition B (Fe=63 wt. %, Ni=32 wt. %, Co=5 wt. %). The insulating coat 7 is formed of SiO.sub.2 having a thickness of 40 nm. The magnetic filler 6 of either the composition A or composition B has a cut diameter of 32 m and a particle diameter D50 of 20 m.

[0100] As illustrated in FIG. 12, in both the composition A and composition B, coating with the insulating coat 7 significantly increases the volume resistivity of the magnetic filler 6. In addition, the coating with the insulating coat 7 reduces pressure dependency of the magnetic filler 6 at the time of measurement.

[0101] FIG. 13 is a graph illustrating the relationship between the film thickness of the insulating coat 7 formed on the surface of the magnetic filler 6 and volume resistivity. The graph of FIG. 13 represents a case where the magnetic filler 6 is composed of 64 wt. % of Fe and 36 wt. % of Ni. The particle diameter of the magnetic filler 6 is equal to the particle diameter of the magnetic filler 6 in the example of FIG. 12.

[0102] As illustrated in FIG. 13, by coating the magnetic filler 6 with the insulating coat 7 having a film thickness of 10 nm or more, the volume resistivity of the magnetic filler 6 is increased. In particular, when the magnetic filler 6 is coated with the insulating coat 7 having a film thickness of 30 nm or more, a very high volume resistivity can be obtained regardless of an applied pressure at the time of measurement.

[0103] FIG. 14 is a graph illustrating the relationship between the volume resistivity of the magnetic filler 6 and that of the composite magnetic sealing material 2.

[0104] As illustrated in FIG. 14, the volume resistivity of the magnetic filler 6 and that of the composite magnetic sealing material 2 are in proportion to each other. In particular, when the volume resistivity of the magnetic filler 6 is 10.sup.5 cm or more, the volume resistivity of the composite magnetic sealing material 2 can be increased to 10.sup.10 cm or more. When the composite magnetic sealing material 2 having a volume resistivity of 10.sup.10 cm or more is used as a molding material for electronic circuit package, a sufficient insulating performance can be ensured.

[0105] As described above, the electronic circuit packages 11A and 11B each have the magnetic mold resin 40 composed of composite magnetic sealing material 2 having very small thermal expansion coefficient. Therefore, it is possible to prevent the warp of the substrate, interfacial delamination or crack of a molding material caused due to a temperature change with obtaining the magnetic shielding characteristics.

Second Embodiment

[0106] FIG. 15 is a cross-sectional view illustrating a configuration of an electronic circuit package 12A according to the second embodiment of the present invention.

[0107] As illustrated in FIG. 15, an electronic circuit package 12A according to the present embodiment differs from the electronic circuit package 11A according to the first embodiment illustrated in FIG. 1 in that a planar size of the magnetic mold resin 40 is slightly smaller than a planar size of the substrate 20 and, therefore, an outer peripheral portion of the front surface 21 of the substrate is exposed from the magnetic mold resin 40. Other configurations are the same as those of the electronic circuit package 11A according to the first embodiment. Thus, in FIG. 15, the same reference numerals are given to the same elements as in FIG. 1, and repetitive descriptions will be omitted.

[0108] As exemplified by the electronic circuit package 12A according to the present embodiment, it is not essential in the present invention that the side surface 42 of the magnetic mold resin 40 and the side surface 27 of the substrate 20 form the same plane, but the planar size of the magnetic mold resin 40 may be smaller than that of the substrate 20.

[0109] FIGS. 16 to 18 are views for explaining a manufacturing method for the electronic circuit package 12A.

[0110] First, as illustrated in FIG. 16, the substrate 20 is prepared by previously cutting the assembly substrate 20A into individual pieces, and the plurality of electronic components 31 and 32 are mounted on the substrate 20 so as to be connected to the land patterns 23 on the front surface 21 of the substrate 20. Specifically, the solder 24 is provided on the land patterns 23, followed by mounting of the electronic components 31 and 32 and by reflowing, whereby the electronic components 31 and 32 are connected to the land pattern 23.

[0111] Then, as illustrated in FIG. 17, the substrate 20 on which the electronic components 31 and 32 are mounted is set in a mold 80. Then, as illustrated in FIG. 18, a composite magnetic material which is a material forming the magnetic mold resin 40 is injected along a flow path 81 of the mold 80, followed by pressuring and heating. The electronic circuit package 12A according to the present embodiment is then completed.

[0112] As described above, the magnetic mold resin 40 may be formed after dividing the assembly substrate 20A into individual substrates 20.

Third Embodiment

[0113] FIG. 19 is a cross-sectional view illustrating a configuration of an electronic circuit package 13A according to the third embodiment of the present invention.

[0114] As illustrated in FIG. 19, the electronic circuit package 13A according to the present embodiment differs from the electronic circuit package 11A in that it further includes a metal film 60 that covers an upper surface 41 and a side surface 42 of the magnetic mold resin 40 and covers a side surface 27 of the substrate 20. Out of the internal wirings 25 illustrated in FIG. 19, internal wirings 25G are power supply patterns. A part of the power supply patterns 25G is exposed from the substrate 20 on the side surface 27. The power supply patterns 25G are typically ground patterns to which a ground potential is to be applied; however, it is not limited to the ground patterns as long as the power supply patterns 25G are a pattern to which a fixed potential is to be applied. Other configurations are the same as those of the electronic circuit package 11A according to the first embodiment. Thus, in FIG. 19, the same reference numerals are given to the same elements as in FIG. 1, and repetitive descriptions will be omitted.

[0115] The metal film 60 serves as an electromagnetic shielding and is preferably mainly composed of at least one metal selected from a group consisting of Au, Ag, Cu, and Al. The metal film 60 preferably has a resistance as low as possible and most preferably uses Cu in terms of cost. An outer surface of the metal film 60 is preferably covered with an anticorrosive metal such as SUS, Ni, Cr, Ti, or brass or an antioxidant film made of a resin such as an epoxy resin, a phenol resin, an imide resin, an urethane resin, or a silicone resin. The reason for this is that the metal film 60 undergoes oxidative deterioration by an external environment such as heat or humidity; and, therefore, the aforementioned treatment is preferable to suppress and prevent the oxidative deterioration. A formation method for the metal film 60 may be appropriately selected from known methods, such as a sputtering method, a vapor-deposition method, an electroless plating method, an electrolytic plating method. Before formation of the metal film 60, pretreatment for enhancing adhesion, such as plasma treatment, coupling treatment, blast treatment, or etching treatment, may be performed. As a base of the metal film 60, a high adhesion metal film such as a titanium film, a chromium film, or an SUS film may be formed thinly in advance.

[0116] As illustrated in FIG. 19, the power supply patterns 25G are exposed to the side surfaces 27 of the substrate 20. The metal film 60 covers the side surfaces 27 of the substrate 20 and is thereby connected to the power supply pattern 25G.

[0117] It is desirable that a resistance value at an interface between the metal film 60 and the magnetic mold resin 40 is equal to or larger than 10.sup.6. In this case, an eddy current generated when electromagnetic wave noise enters the metal film 60 hardly flows in the magnetic mold resin 40, which can prevent deterioration in the magnetic characteristics of the magnetic mold resin 40 due to inflow of the eddy current. The resistance value at the interface between the metal film 60 and the magnetic mold resin 40 refers to a surface resistance of the magnetic mold resin when the metal film 60 and magnetic mold resin 40 directly contact each other and to a surface resistance of an insulating film when the insulating film is present between the metal film 60 and the magnetic mold resin 40.

[0118] The resistance value at the interface between the metal film 60 and the magnetic mold resin 40 is preferably equal to or larger than 10.sup.6 over the entire area of the interface; however, it does not matter if the resistance value is partly smaller than 10.sup.6.

[0119] Basically, the surface resistance value of the magnetic mold resin 40 substantially coincides with the volume resistivity of the magnetic mold resin 40. Thus, basically, when the volume resistivity of the magnetic mold resin 40 is equal to or larger than 10.sup.10 cm, the surface resistance value of the magnetic mold resin 40 is also equal to or larger than 10.sup.10. However, as explained with reference to FIG. 5, the magnetic mold resin 40 undergoes dicing at manufacturing, so that the magnetic filler 6 may be exposed to a cut surface (i.e., side surface 42), and in this case, the surface resistance value of the side surface 42 becomes smaller than the volume resistivity. Similarly, when the top surface 41 of the magnetic mold resin 40 is ground for reducing height or roughing the surface, the magnetic filler 6 may be exposed to the top surface 41, and in this case, the surface resistance value of the top surface 41 becomes smaller than the volume resistivity. As a result, even when the volume resistivity of the magnetic mold resin 40 is equal to or larger than 10.sup.10 cm, the surface resistance value of the magnetic mold resin 40 may be smaller than 10.sup.10; however, in such a case, when the surface resistance value of the magnetic mold resin 40 is equal to or larger than 10.sup.6, it is possible to prevent inflow of the eddy current.

[0120] When the surface resistance value of the top surface 41 or side surface 42 of the magnetic mold resin 40 is reduced to smaller than 10.sup.6, a thin insulating material may be formed on the top surface 41 or side surface 42 of the magnetic mold resin 40. FIG. 20 is a cross-sectional view illustrating a configuration of an electronic circuit package 13B according to a first modification. The electronic circuit package 13B of FIG. 20 differs from the electronic circuit package 13A of FIG. 19 in that a thin insulating film 70 is interposed between the top surface 41 and side surfaces 42 of the magnetic mold resin 40 and the metal film 60. With this configuration, even when the surface resistance value of the top surface 41 or side surface 42 of the magnetic mold resin 40 is reduced to smaller than 10.sup.6, the resistance value at the interface between the metal film 60 and the magnetic mold resin 40 can be made equal to or larger than 10.sup.6, making it possible to prevent deterioration in the magnetic characteristics due to the eddy current.

[0121] FIG. 21 is a cross-sectional view illustrating a configuration of an electronic circuit package 13C according to a second modification of the third embodiment.

[0122] As illustrated in FIG. 21, an electronic circuit package 13C according to the second modification differs from the electronic circuit package 13A illustrated in FIG. 19 in that a planar size of the magnetic mold resin 40 is slightly smaller than a planar size of the substrate 20 and, therefore, an outer peripheral portion of the front surface 21 of the substrate 20 is exposed from the magnetic mold resin 40. Other configurations are the same as those of the electronic circuit package 13A. Thus, in FIG. 21, the same reference numerals are given to the same elements as in FIG. 19, and repetitive descriptions will be omitted.

[0123] As exemplified by the electronic circuit package 13C according to the second modification, it is not essential in the present invention that the side surface 42 of the magnetic mold resin 40 and the side surface 27 of the substrate 20 form the same plane, but the planar size of the magnetic mold resin 40 may be smaller than that of the substrate 20.

[0124] Further, as illustrated in FIG. 22 which illustrates an electronic circuit package 13D as the third modification of this embodiment, a structure in which the metal film 60 does not cover the side surface 27 of the substrate 20 may be employed. In this case, a power supply patterns 28G are provided at an outer peripheral portion of the surface 21 of the substrate 20 that is exposed from the magnetic mold resin 40 and contacts the metal film 60. As a result, a fixed potential such as a ground potential is applied to the metal film 60.

[0125] FIG. 23 is a cross-sectional view illustrating a configuration of an electronic circuit package 13E according to the fourth modification of the third embodiment.

[0126] As illustrated in FIG. 23, an electronic circuit package 13E according to the fourth modification differs from the electronic circuit package 13A illustrated in FIG. 19 in that the planar size of the magnetic mold resin 40 is slightly larger than the planar size of the substrate 20. Other configurations are the same as those of the electronic circuit package 13A. Thus, in FIG. 23, the same reference numerals are given to the same elements as in FIG. 19, and repetitive descriptions will be omitted.

[0127] As exemplified by the electronic circuit package 13E according to the fourth modification, in the present invention, the planar size of the magnetic mold resin 40 may be larger than that of the substrate 20.

[0128] As described above, the electronic circuit packages 13A to 13E according to the present embodiment use the magnetic mold resin 40 and have the surfaces covered with the metal film 60. With this configuration, it is possible to obtain a composite shielding structure. This can effectively shield electromagnetic wave noise radiated from the electronic components 31 and 32 and external electromagnetic wave noise entering the electronic components 31 and 32 while achieving reduction in height. In particular, the electronic circuit packages 13A to 13E according to the present embodiment can shield the electromagnetic wave noise radiated from the electronic components 31 and 32 more effectively. This is because the electromagnetic wave noise radiated from the electronic components 31 and 32 is partly absorbed when it passes through the magnetic mold resin 40, and the remaining electromagnetic wave noise that has not been absorbed is reflected by the metal film 60 and passes through the magnetic mold resin 40 once again. As described above, the magnetic mold resin 40 acts on the incident electromagnetic wave noise twice, thereby effectively shielding the electromagnetic wave noise radiated from the electronic components 31 and 32.

[0129] Further, when the volume resistivity of the magnetic mold resin 40 is equal to or more than 10.sup.10 cm in the electronic circuit packages 13A to 13E according to the present embodiment, it is possible to ensure sufficient insulating performance required for the mold member. In addition, when the resistance value at the interface between the magnetic mold resin 40 and the metal film 60 is equal to or more than 10.sup.6, it is possible to substantially prevent the eddy current generated when the electromagnetic wave noise enters the metal film 60 from flowing into the magnetic mold resin 40. As a result, it is possible to prevent deterioration in the magnetic characteristics of the magnetic mold resin 40 due to inflow of the eddy current.

[0130] FIG. 24 is a graph illustrating noise attenuation in the electronic circuit package 13A in the case where the substrate 20 has a thickness of 0.25 mm, and the magnetic mold resin 40 has a thickness of 0.50 mm. The metal film 60 is composed of a laminated film of Cu and Ni, and two types of metal films 60 whose Cu films have different thicknesses are evaluated. Specifically, the metal film 60 of sample A has a configuration in which the Cu film having a thickness of 4 m and the Ni film having a thickness of 2 m are laminated, and the metal film 60 of sample B has a configuration in which the Cu film having a thickness of 7 m and the Ni film having a thickness of 2 m are laminated. For comparison, values of samples C and D each formed by using a molding material not containing the magnetic filler 6 are also shown. The metal film 60 of sample C has a configuration in which the Cu film having a thickness of 4 m and the Ni film having a thickness of 2 m are laminated, and the metal film 60 of sample D has a configuration in which the Cu film having a thickness of 7 m and the Ni film having a thickness of 2 m are laminated.

[0131] As illustrated in FIG. 24, when the composite magnetic sealing material 2 containing the magnetic filler 6 is used, noise attenuation effect is enhanced especially at a frequency band of 100 MHz or less as compared to a case where the molding material not containing the magnetic filler 6 is used. Further, it can be seen that the larger the thickness of the metal film 60, the higher the noise attenuation performance.

[0132] FIGS. 25 to 27 are graphs each illustrating the relationship between the film thickness of the metal film 60 included in the electronic circuit package 13A and noise attenuation. FIG. 25, FIG. 26, and FIG. 27 illustrate the noise attenuation in the frequency bands of 20 MHz, 50 MHz, and 100 MHz, respectively. For comparison, a value obtained when a molding material not containing the magnetic filler 6 is also shown.

[0133] As illustrated, in all the frequency bands of FIGS. 25 to 27, the larger the thickness of the metal film 60, the higher the noise attenuation performance. Further, by using the composite magnetic sealing material 2 containing the magnetic filler 6, it is possible to obtain higher noise attenuation performance in all the frequency bands of FIGS. 25 to 27, than in a case where a molding material not containing the magnetic filler 6.

[0134] FIG. 28 is a graph illustrating the warp amount of the substrate 20 during temperature rising and that during temperature dropping in the electronic circuit packages 11A (without metal film) and the electronic circuit packages 13A (with metal film). For comparison, values obtained when the magnetic filler 6 is substituted by the non-magnetic filler formed of SiO.sub.2 are shown in FIG. 29.

[0135] As illustrated in FIG. 28, the warp amount of the substrate 20 caused due to a temperature change is smaller in the electronic circuit package 13A having the metal film 60 than in the electronic circuit package 11A not having the metal film 60. Further, as is clear from a comparison between FIGS. 28 and 29, the warp characteristics of the respective electronic circuit packages 11A and 13A using the composite magnetic sealing material 2 containing the magnetic filler 6 are substantially equivalent to the warp characteristics of the respective electronic circuit packages 11A and 13A using a molding material containing the non-magnetic filler formed of SiO.sub.2.

Fourth Embodiment

[0136] FIG. 30 is a cross-sectional view illustrating a configuration of an electronic circuit package 14A according to the fourth embodiment of the present invention.

[0137] As illustrated in FIG. 30, an electronic circuit package 14A according to the present embodiment is the same as the electronic circuit package 13A according to the third embodiment illustrated in FIG. 19 except for shapes of the substrate 20 and metal film 60. Thus, in FIG. 30, the same reference numerals are given to the same elements as in FIG. 19, and repetitive descriptions will be omitted.

[0138] In the present embodiment, the side surface 27 of the substrate 20 is formed stepwise. Specifically, a side surface lower portion 27b protrudes from a side surface upper portion 27a. The metal film 60 is not formed over the entire side surface of the substrate 20 but formed so as to cover the side surface upper portion 27a and a step portion 27c. That is, the side surface lower portion 27b is not covered with the metal film 60. Also in the present embodiment, the power supply patterns 25G are exposed from the side surface upper portion 27a of the substrate 20, so that the metal film 60 is connected to the power supply patterns 25G at the exposed portion.

[0139] FIGS. 31 and 32 are process views for explaining a manufacturing method for the electronic circuit package 14A.

[0140] First, the magnetic mold resin 40 is formed on the front surface 21 of the assembly substrate 20A by using the method described in FIGS. 3 and 4. Then, as illustrated in FIG. 31, a groove 43 is formed along the dashed line a denoting the dicing position. In the present embodiment, the power supply patterns 25G pass the dashed line a as a dicing position. Thus, when the assembly substrate 20A is cut along the dashed line a, the power supply patterns 25G are exposed from the side surface 27 of the substrate 20. The groove 43 is formed so as to completely cut the magnetic mold resin 40 and so as not to completely cut the assembly substrate 20A. As a result, the side surface 42 of the magnetic mold resin 40 and side surface upper portion 27a and step portion 27c of the substrate 20 are exposed inside the groove 43. A depth of the groove 43 is set so as to allow at least the power supply patterns 25G to be exposed from the side surface upper portion 27a.

[0141] Then, as illustrated in FIG. 32, the metal film 60 is formed by using a sputtering method, a vapor-deposition method, an electroless plating method, an electrolytic plating method, or the like. As a result, the top surface 41 of the magnetic mold resin 40 and inside of the groove 43 are covered with the metal film 60. At this time, the power supply patterns 25G exposed to the side surface upper portion 27a of the substrate 20 are connected to the metal film 60.

[0142] Then, the assembly substrate 20A is cut along the dashed line a to divide the assembly substrate 20A into individual substrates 20, whereby the electronic circuit package 14A according to the present embodiment is completed.

[0143] As described above, according to the manufacturing method for the electronic circuit package 14A of the present embodiment, formation of the groove 43 allows the metal film 60 to be formed before dividing the assembly substrate 20A into individual substrates 20, thereby forming the metal film 60 easily and reliably.

[0144] While the preferred embodiments of the present invention have been described, the present invention is not limited thereto. Thus, various modifications may be made without departing from the gist of the invention, and all of the modifications thereof are included in the scope of the present invention.

Fifth Embodiment

[0145] FIG. 33 is a cross-sectional view illustrating a configuration of an electronic circuit package 15A according to the fifth embodiment of the present invention.

[0146] As illustrated in FIG. 33, the electronic circuit package 15A according to the present embodiment includes a substrate 20, a plurality of electronic components 31 and 32 mounted on the substrate 20, a magnetic mold resin 40 covering a front surface 21 of the substrate 20 so as to embed the electronic components 31 and 32, a magnetic film 50 covering the magnetic mold resin 40, and a metal film covering the magnetic film 50 and the magnetic mold resin 40.

[0147] Although the type of the electronic circuit package 15A according to the present embodiment is not especially limited, examples thereof include a high-frequency module handling a high-frequency signal, a power supply module performing power supply control, an SIP (System-In-Package) having a 2.5D structure or a 3D structure, and a semiconductor package for radio communication or digital circuit. Although only two electronic components 31 and 32 are illustrated in FIG. 33, more electronic components are incorporated actually.

[0148] The substrate 20 has a double-sided and multilayer wiring structure in which a large number of wirings are embedded therein and may be any type of substrate including: a thermosetting resin based organic substrate such as an FR-4, an FR-5, a BT, a cyanate ester substrate, a phenol substrate, or an imide substrate; a thermoplastic resin based organic substrate such as a liquid crystal polymer; an LTCC substrate; an HTCC substrate; and a flexible substrate. In the present embodiment, the substrate 20 has a four-layer structure including wiring layers formed on the front surface 21 and a back surface 22 and two wiring layers embedded therein. Land patterns are an internal electrode for connecting to the electronic components 31 and 32. The land patterns 23 and each of the electronic components 31 and 32 are electrically and mechanically connected to each other through a respective solder 24 (or a conductive paste). For example, the electronic component 31 is a semiconductor chip such as a controller, and electronic component 32 is a passive component such as a capacitor or a coil. Some electronic components (e.g., thinned semiconductor chip) may be embedded in the substrate 20.

[0149] The land patterns 23 are connected to external terminals 26 formed on the back surface 22 of the substrate 20 through internal wirings 25 formed inside the substrate 20. Upon actual use, the electronic circuit package 15A is mounted on an unillustrated mother board, and land patterns on the mother board and the external terminals 26 of the electronic circuit package 15A are electrically connected. A material for a conductor forming the land patterns 23, internal wirings 25, and external terminals 26 may be a metal such as copper, silver, gold, nickel, chrome, aluminum, palladium, indium, or a metal alloy thereof or may be a conductive material using resin or glass as a binder; however, when the substrate 20 is an organic substrate or a flexible substrate, copper or silver is preferably used in terms of cost and conductivity. The above conductive materials may be formed by using various methods such as printing, plating, foil lamination, sputtering, vapor deposition, and inkjet.

[0150] Out of the internal wirings 25 illustrated in FIG. 33, internal wirings 25G are power supply patterns. The power supply patterns 25G are typically ground patterns to which a ground potential is to be applied; however, it is not limited to the ground patterns as long as the power supply patterns 25G are a pattern to which a fixed potential is to be applied.

[0151] The magnetic mold resin 40 covers the front surface of the substrate 20 so as to embed the electronic components 31 and 32 therein. The magnetic mold resin 40 is a mold member and serves also as a first magnetic shielding. In the present embodiment, a side surface 42 of the magnetic mold resin 40 and a side surface 27 of the substrate 20 form the same plane. As described above, the magnetic mold resin 40 is formed of a composite magnetic material in which magnetic fillers 6 are dispersed in a thermosetting resin material 4 as shown in FIG. 6. The magnetic mold resin 40 contacts the electronic components 31, 32 and land patterns 23, so that the volume resistivity thereof needs to be sufficiently large. Specifically, it is preferable that the volume resistivity is equal to or larger than 10.sup.10 cm.

[0152] As the thermosetting resin material used for the composite magnetic material, an epoxy resin, a phenol resin, a silicone resin, a diallyl phthalate resin, a polyimide resin, an urethane resin, and the like may be used, and preferably, a base resin and a curing agent to be used for an epoxy resin- or a phenol resin-based semiconductor sealing material is used. The thermosetting resin material may be either liquid or solid, and the material form differs depending on selection of the base resin and curing agent according to a molding method. When a solid material is used, a material formed into a tablet can be used for transfer molding, and a material formed into a granular form can be used for injection molding or compression molding. A molding method for the thermosetting resin material may be appropriately be selected from among transfer molding, compression molding, injection molding, cast molding, vacuum cast molding, dispense molding, and molding using a slit nozzle. Molding conditions may be appropriately selected from among various combinations of the base resin, curing agent, and curing accelerator to be used. Post-curing may be applied after molding, as required.

[0153] The magnetic filler used for the composite magnetic material may be the same as the magnetic filler shown in FIG. 6.

[0154] A surface of the magnetic filler is preferably insulation-coated with a metal oxide such as Si, Al, Ti, Mg or an organic material for enhancing fluidity, adhesion, and insulation performance. In order to sufficiently increase the volume resistivity of the magnetic mold resin 40, a film thickness of the insulation coating is preferably set to equal to or larger than 10 nm. The insulation coating may be formed by coating a thermosetting material on the surface of the magnetic filler. Alternatively, an oxide film may be formed as the insulation coating by dehydration reaction of a metal alkoxide of tetraethyloxysilane or tetramethyloxysilane, and in this case, formation of a silicon oxide coating film is most preferable. More preferably, organic functional coupling treatment is applied to the formed coating film.

[0155] The composite magnetic material forming the magnetic mold resin 40 may be blended with a non-magnetic filler as shown in FIG. 6. When molten silica, calcium carbonate, magnesium oxide, aluminum oxide, titanium oxide, or the like is used as the non-magnetic filler, the insulating performance and withstand voltage performance of the magnetic mold resin 40 can be enhanced, and, further, incombustibility can be imparted to the magnetic mold resin 40. In addition, fluidity, dielectric constant, mechanical properties such as strength or elastic modulus can be controlled. Further, achievement of the high filling level by addition of the non-magnetic filler can reduce a heat expansion coefficient. In this case, a filler having a low heat expansion coefficient, such as molten silica or zirconium phosphate is preferably used. In order to enhance slidability and fluidity between fillers, surface-treated nanosilica having a particle size of equal to or smaller than 200 nm is preferably used. Further, coupling treatment may be applied to a surface of the non-magnetic filler for enhancement of adhesion and fluidity.

[0156] An upper surface 41 of the magnetic mold resin 40 is covered with the magnetic film 50. The magnetic film 50 is a film formed of a composite magnetic material in which magnetic fillers are dispersed in a thermosetting resin material, a thin film formed of a soft magnetic material or ferrite, or a foil or a bulk sheet and functions as a second magnetic shield. The effective permeability of the magnetic film 50 may be higher than at least the effective permeability of the magnetic mold resin 40 and, preferably, double or more the effective permeability of the magnetic mold resin 40.

[0157] When the film formed of a composite magnetic material is selected as the magnetic film 50, an epoxy resin, a phenol resin, a silicone resin, a diallyl phthalate resin, a polyimide resin, an urethane resin, and the like may be used as the thermosetting resin material, and the magnetic film 50 can be formed by using a thick-film formation method such as a printing method, a molding method, a slit nozzle coating method, a spray method, a dispensing method, an injection method, a transfer method, a compression molding method, or a lamination method using an uncured sheet-like resin. Using the thermosetting resin material can increase reliability (heat resistance, insulation performance, impact resistance, falling resistance) required for electronic circuit packages.

[0158] As the magnetic filler, a ferrite or a soft magnetic metal is preferably used, and a soft magnetic metal having a high bulk permeability is more preferably used. As the ferrite or soft magnetic metal, one or two or more metals selected from a group consisting of Fe, Ni, Zn, Mn, Co, Cr, Mg, Al, and Si and oxides thereof may be used. Specific examples include a ferrite (NiZn ferrite, MnZn ferrite, NiCuZn ferrite, etc.), a permalloy (FeNi alloy), a super permalloy (FeNiMo alloy), a sendust (FeSiAl alloy), an FeSi alloy, an FeCo alloy, an FeCr alloy, an FeCrSi alloy, FeNiCo alloy, and Fe. The shape of the magnetic filler is not especially limited; however, it may be formed into a spherical shape for a high filling level, and fillers of a plurality of particle sizes may be blended for a densest filling structure. In order to maximize a shield effect by a permeability real component and a thermal conversion effect by a loss of a permeability imaginary component, the magnetic filler is more preferably formed by adding flat powder having an aspect ratio of 5 or more.

[0159] Preferably, the surface of the magnetic filler is insulation-coated by an oxide of a metal such as Si, Al, Ti, or Mg, or an organic material for enhancing fluidity, adhesion, and insulation performance. The insulation coating may be formed by coating a thermosetting material on the surface of the magnetic filler. Alternatively, an oxide film may be formed as the insulation coating by dehydration reaction of a metal alkoxide, and in this case, formation of a silicon oxide coating film is most preferable. More preferably, organic functional coupling treatment is applied to the formed coating film.

[0160] The composite magnetic material can be formed on the top surface 41 of the magnetic mold resin 40 using a known method such as a printing method, a molding method, a slit nozzle coating method, a spray method, a dispensing method, or a lamination method using an uncured sheet-like resin.

[0161] When the thin film formed of a soft magnetic material or a ferrite is selected as the magnetic film 50, one or two or more metals selected from a group consisting of Fe, Ni, Zn, Mn, Co, Cr, Mg, Al, and Si and oxides thereof may be used. Specific examples include a permalloy (FeNi alloy), a super permalloy (FeNiMo alloy), a sendust (FeSiAl alloy), an FeSi alloy, an FeCo alloy, an FeCr alloy, an FeCrSi alloy, FeNiCo alloy, and Fe. In this case, the magnetic film 50 can be formed on the top surface 41 of the magnetic mold resin 40 by using a plating method, a spray method, an AD method, and a thermal spraying method, as well as a thin-film formation method such as a sputtering method or a vapor-deposition method. In this case, the material for the magnetic film 50 may be appropriately selected from a required permeability and frequency; however, in order to enhance a shield effect on a lower frequency side (kHz to 100 MHz), an FeCo alloy, an FeNi alloy, an FeAl alloy, or an FeSi alloy is most preferably used. On the other hand, in order to enhance a shield effect on a higher frequency side (50 to several hundreds of MHz), a ferrite film formed of NiZn, MnZn, or NiCuZn, or Fe is most preferably used.

[0162] When a foil or a bulk sheet is used as the magnetic film 50, the foil or bulk sheet is previously set in a die for forming the magnetic mold resin 40. This allows the magnetic film 50 to be directly formed on the top surface 41 of the magnetic mold resin 40.

[0163] The top and side surfaces 51 and 52 of the magnetic film 40, the side surface 42 of the magnetic mold resin 40, and the side surface 27 of the substrate 20 are covered with the metal film 60. The metal film 60 serves as an electromagnetic shielding and is preferably mainly composed of at least one metal selected from a group consisting of Au, Ag, Cu, and Al. The metal film 60 preferably has a resistance as low as possible and most preferably uses Cu in terms of cost. An outer surface of the metal film 60 is preferably covered with an anticorrosive metal such as SUS, Ni, Cr, Ti, or brass or an antioxidant film made of a resin such as an epoxy resin, a phenol resin, an imide resin, an urethane resin, or a silicone resin. The reason for this is that the metal film undergoes oxidative deterioration by an external environment such as heat or humidity; and, therefore, the aforementioned treatment is preferable to suppress and prevent the oxidative deterioration. A formation method for the metal film 60 may be appropriately selected from known methods, such as a sputtering method, a vapor-deposition method, an electroless plating method, an electrolytic plating method. Before formation of the metal film 60, pretreatment for enhancing adhesion, such as plasma treatment, coupling treatment, blast treatment, or etching treatment, may be performed. As a base of the metal film 60, a high adhesion metal film such as a titanium film, a chromium film, or an SUS film may be formed thinly in advance.

[0164] As illustrated in FIG. 33, the power supply patterns 25G are exposed to the side surfaces 27 of the substrate 20. The metal film 60 covers the side surfaces 27 of the substrate 20 and is thereby connected to the power supply pattern 25G.

[0165] Although not limited, it is preferable that a resistance value at an interface between the magnetic film 50 and the magnetic mold resin 40 is equal to or larger than 10.sup.6. In this case, an eddy current generated when electromagnetic wave noise enters the metal film 60 hardly flows in the magnetic mold resin 40, which can prevent deterioration in the magnetic characteristics of the magnetic mold resin 40 due to inflow of the eddy current. The resistance value at the interface between the magnetic film 50 and the magnetic mold resin 40 refers to a surface resistance of the magnetic mold resin 40 when the metal film 60 and magnetic mold resin 40 directly contact each other and to a surface resistance of an insulating film when the insulating film is present between the metal film 60 and the magnetic mold resin 40. The resistance value at the interface between the metal film 60 and the magnetic mold resin 40 is preferably equal to or larger than 10.sup.6 over the entire area of the interface; however, it does not matter if the resistance value is partly smaller than 10.sup.6.

[0166] Basically, the surface resistance value of the magnetic mold resin 40 substantially coincides with the volume resistivity of the magnetic mold resin 40. Thus, basically, when the volume resistivity of the magnetic mold resin 40 is equal to or larger than 10.sup.10 cm, the surface resistance value of the magnetic mold resin 40 is also equal to or larger than 10.sup.10. However, as described later, the magnetic mold resin 40 undergoes dicing at manufacturing, so that the magnetic filler made of a soft magnetic metal may be exposed to a cut surface (i.e., side surface 42), and in this case, the surface resistance value of the side surface 42 becomes smaller than the volume resistivity. Similarly, when the top surface 41 of the magnetic mold resin 40 is ground for reducing height or roughing the surface, the magnetic filler made of a soft magnetic metal may be exposed to the top surface 41, and in this case, the surface resistance value of the top surface 41 becomes smaller than the volume resistivity. As a result, even when the volume resistivity of the magnetic mold resin 40 is equal to or larger than 10.sup.10 cm, the surface resistance value of the magnetic mold resin 40 may be smaller than 10.sup.10; however, in such a case, when the surface resistance value of the magnetic mold resin 40 is equal to or larger than 10.sup.6, it is possible to prevent inflow of the eddy current.

[0167] When the surface resistance value of the top surface 41 or side surface 42 of the magnetic mold resin 40 is reduced to smaller than 10.sup.6, a thin insulating material may be formed on the top surface 41 or side surface 42 of the magnetic mold resin 40. With this configuration, even when the surface resistance value of the top surface 41 or side surface 42 of the magnetic mold resin 40 is reduced to smaller than 10.sup.6, the resistance value at the interface between the magnetic film 50 and the magnetic mold resin 40 can be made equal to or larger than 10.sup.6, making it possible to prevent deterioration in the magnetic characteristics due to the eddy current.

[0168] In addition, it is desirable that a resistance value at an interface between the metal film 60 and the magnetic film 50 is also equal to or larger than 10.sup.6. According to this configuration, an eddy current generated when electromagnetic wave noise enters the metal film 60 hardly flows in the magnetic film 50, which can prevent deterioration in the magnetic characteristics of the magnetic film 50 due to inflow of the eddy current. The resistance value at the interface between the metal film 60 and the magnetic film 50 refers to a surface resistance of the magnetic film 50 when the metal film 60 and magnetic film 50 directly contact each other and to a surface resistance of an insulating film when the insulating film is present between the metal film 60 and the magnetic film 50.

[0169] In order to make a resistance value at an interface between the metal film 60 and the magnetic film 50 equal to or higher than 10.sup.6, a material having a sufficiently high surface resistance is used as the material for the magnetic film 50 or a thin insulating material is formed on the top surface 51 of the magnetic film 50. FIG. 34 is a cross-sectional view illustrating a configuration of an electronic circuit package 15B according to a modification. The electronic circuit package 15B of FIG. 34 differs from the electronic circuit package 15A of FIG. 33 in that a thin insulating adhesive film 70 is interposed between the magnetic film 50 and the metal film 60. By interposing the insulating adhesive film 70, it is possible to make a resistance value at an interface between the metal film 60 and the magnetic film 50 equal to or higher than 10.sup.6 even when a material having a comparatively low resistance value is used as the material for the magnetic film 50, thereby making it possible to prevent deterioration in magnetic characteristics due to an eddy current. In addition, the insulating adhesive film 70 can also improve adhesiveness of the metal film 60.

[0170] Further, when a distance between an electronic component such as a high-frequency inductor and the magnetic mold resin 40 is too small, characteristics thereof such as an inductance value may fluctuate from a design value. In such a case, the fluctuation of the characteristics can be reduced by covering a part of or the entire electronic component with a non-magnetic member. FIG. 35 is a cross-sectional view illustrating a configuration of an electronic circuit package 15C according to a second modification. The electronic circuit package 15C of FIG. 35 differs from the electronic circuit package 15A of FIG. 33 in that the electronic component 32 is covered with a non-magnetic member 90. As the non-magnetic member 90, a common resin can be used. By interposing the non-magnetic member 90 between the electronic component 32 and the magnetic mold resin 40, a sufficient distance between the electronic component 32 and magnetic mold resin 40 can be ensured, so that it is possible to reduce the fluctuation of characteristics such as the inductance value.

[0171] As described above, the electronic circuit packages 15A to 15C according to the present embodiment use the magnetic mold resin 40 and have the surfaces covered with a laminated film of the magnetic film 50 and the metal film 60. With this configuration, it is possible to obtain a composite triple-shield structure without using a magnetic film and the like in addition to the mold resin. This can effectively shield electromagnetic wave noise radiated from the electronic components 31 and 32 and external electromagnetic wave noise entering the electronic components 31 and 32 while achieving reduction in height. In particular, the electronic circuit packages 15A to 15C according to the present embodiment can shield the electromagnetic wave noise radiated from the electronic components 31 and 32 more effectively. This is because the electromagnetic wave noise radiated from the electronic components 31 and 32 is partly absorbed when it passes through the magnetic mold resin 40 and the magnetic film 50, and the remaining electromagnetic wave noise that has not been absorbed is reflected by the metal film 60 and passes through the magnetic film 50 and the magnetic mold resin 40 once again. As described above, the magnetic mold resin 40 acts on the incident electromagnetic wave noise twice, thereby effectively shielding the electromagnetic wave noise radiated from the electronic components 31 and 32.

[0172] In addition, the magnetic film 50 has a higher effective permeability than the magnetic mold resin 40, so that it is possible to achieve higher electromagnetic wave noise absorption effect than in a case where the magnetic film 50 is absent. This effect becomes obvious when the effective permeability of the magnetic film 50 is double or more that of the magnetic mold resin 40.

[0173] The following describes a manufacturing method for the electronic circuit package 15A according to the present embodiment.

[0174] FIGS. 36 and 37 are process views for explaining a manufacturing method for the electronic circuit package 15A.

[0175] As illustrated in FIG. 3, an assembly substrate 20A having a multilayer wiring structure is prepared. A plurality of the land patterns 23 are formed on the front surface 21 of the assembly substrate 20A, and a plurality of the external terminals 26 are formed on the back surface 22 of the assembly substrate 20A. Further, a plurality of the internal wirings 25 including the power supply patterns 25G are formed in an inner layer of the assembly substrate 20A. A dashed line a in FIG. 3 denotes a part to be cut in a subsequent dicing process. As illustrated in FIG. 3, the power supply patterns 25G are provided at a position overlapping the dashed line a in a plan view.

[0176] Then, as illustrated in FIG. 3, the plurality of electronic components 31 and 32 are mounted on the front surface 21 of the assembly substrate 20A so as to be connected to the land patterns 23. Specifically, the solder 24 is provided on the land pattern 23, followed by mounting of the electronic components 31 and 32 and by reflowing, whereby the electronic components 31 and 32 are connected to the land patterns 23.

[0177] Then, as illustrated in FIG. 4, the front surface 21 of the assembly substrate 20A is covered with the magnetic mold resin 40 having a volume resistivity equal to or larger than 10.sup.10 so as to embed the electronic components 31 and 32 in the magnetic mold resin 40. Examples of the formation method for the magnetic mold resin 40 may include, as described above, transfer molding, compression molding, injection molding, cast molding, vacuum cast molding, dispense molding, and molding using a slit nozzle.

[0178] Then, as illustrated in FIG. 36, the magnetic film 50 is formed on the top surface 41 of the magnetic mold resin 40. In this case, in order to enhance adhesion between the magnetic mold resin 40 and magnetic film 50, the top surface 41 of the magnetic mold resin 40 may be subjected to blast treatment or etching treatment to form a physical unevenness thereon, subjected to surface modification by plasma or short-wavelength UV irradiation, or subjected to organic functional coupling treatment.

[0179] When the film formed of a composite magnetic material is used as the magnetic film 50, a thick-film formation method such as a printing method, a molding method, a slit nozzle coating method, a spray method, a dispensing method, an injection method, a transfer method, a compression molding method, or a lamination method using an uncured sheet-like resin can be used. When the magnetic film 50 is formed by using the printing method, slit nozzle method, spraying method, or dispensing method, the viscosity of the composite magnetic material is preferably controlled as needed. The viscosity control may be made by diluting the composite magnetic material with one or two or more solvents having a boiling point of 50 C. to 300 C. The thermosetting material mainly consists of a main agent, a curing agent, and a curing accelerator; however, two or more kinds of main agent or curing agent may be blended according to required characteristics. Further, two or more kinds of solvents may be mixed: a coupling agent for enhancing adhesion and fluidity, a fire retardant for flame retardancy, a dye and a pigment for coloration, a non-reactive resin material for imparting flexibility, and a non-magnetic filler for adjusting a thermal expansion coefficient may be blended. The materials may be kneaded or dispersed by a known means such as a kneader, a mixer, a vacuum defoaming stirring machine, or a three-roll mill.

[0180] When the thin film formed of a soft magnetic material or a ferrite is used as the magnetic film 50, a plating method, a spray method, an AD method, and a thermal spraying method, as well as a thin-film formation method such as a sputtering method or a vapor-deposition method may be used. When a foil or a bulk sheet is used as the magnetic film 50, the foil or bulk sheet is previously set in a die for forming the magnetic mold resin 40. This allows the magnetic film 50 to be directly formed on the top surface 41 of the magnetic mold resin 40.

[0181] Then, as illustrated in FIG. 37, the assembly substrate 20A is cut along the dashed line a to divide the assembly substrate 20A into individual substrates 20. In the present embodiment, the power supply patterns 25G pass the dashed line a as a dicing position. Thus, when the assembly substrate 20A is cut along the dashed line a, the power supply patterns 25G are exposed from the side surface 27 of the substrate 20.

[0182] Then, the metal film 60 is formed so as to cover the top and side surfaces 51 and 52 of the magnetic film 50, the side surface 42 of the magnetic mold resin 40, and side surface 27 of the substrate 20, whereby the electronic circuit package 15A according to the present embodiment is completed. Examples of a formation method for the metal film 60 may include a sputtering method, a vapor-deposition method, an electroless plating method, and an electrolytic plating method. Before formation of the metal film 60, pretreatment for enhancing adhesion, such as plasma treatment, coupling treatment, blast treatment, or etching treatment, may be performed. As a base of the metal film 60, a high adhesion metal film such as a titanium film or a chromium film may be formed thinly in advance.

[0183] Further, when the adhesive film 70 is interposed between the magnetic film 50 and the metal film 60 as in the modification illustrated in FIG. 34, a thermosetting material, a heat-resistance thermoplastic material, or an adhesive material such as an oxide of Si or a low-melting-point glass may be formed thinly on the top surface 51 and/or side surface 52 of the magnetic film 50 before formation of the metal film 60.

[0184] As described above, according to the manufacturing method for the electronic circuit package 15A of the present embodiment, the top surface 41 of the magnetic mold resin 40 can be covered with a laminated film of the magnetic film 50 and the metal film 60.

Sixth Embodiment

[0185] FIG. 38 is a cross-sectional view illustrating a configuration of an electronic circuit package 16A according to the sixth embodiment of the present invention.

[0186] As illustrated in FIG. 38, the electronic circuit package 16A according to the present embodiment differs from the electronic circuit package 15A of FIG. 33 according to the fifth embodiment in that the magnetic film 50 covers not only the top surface 41 of the magnetic mold resin 40, but also the side surface 42. Other configurations are the same as those of the electronic circuit package 15A according to the fifth embodiment. Thus, in FIG. 38, the same reference numerals are given to the same elements as in FIG. 33, and repeated descriptions will be omitted.

[0187] In the present embodiment, the side surface 42 of the magnetic mold resin 40 is fully covered with the magnetic film 50, and thus, a part where the magnetic mold resin 40 and metal film 60 contact each other does not substantially exist. With this configuration, a composite-shield effect in the side surface of the magnetic mold resin 40 can be enhanced. In particular, electromagnetic noise radiated in a side surface direction of the magnetic mold resin 40 is effectively shielded.

[0188] When a material having a comparatively low resistance value is used as the material for the magnetic film 50, the thin adhesive film 70 is preferably interposed between the top surface 51 of the magnetic film 50 and the metal film 60 as in an electronic circuit package 16B of FIG. 39 according to a modification, and more preferably, the thin adhesive film 70 is interposed between the top surface 51 and side surface 52 of the magnetic film 50 and the metal film 60 as in an electronic circuit package 16C of FIG. 40 according to another modification.

[0189] FIGS. 41 to 43 are process views for explaining a manufacturing method for the electronic circuit package 16A.

[0190] First, the magnetic mold resin 40 is formed by the method described using FIGS. 3 and 4. Then, as illustrated in FIG. 41, a groove 44 having a width W1 is formed along a dashed line a indicating a dicing position. The groove 44 has a depth almost completely cutting the magnetic mold resin 40 and not reaching the inner wiring 25 formed in the substrate 20. As a result, the side surface 42 of the magnetic mold resin 40 and the surface 21 of the substrate 20 are exposed inside the groove 44.

[0191] Then, as illustrated in FIG. 42, the magnetic film 50 is formed to fill the groove 44. Although it is not essential to completely fill the groove 44 with the magnetic film 50, when the groove 44 is filled with the magnetic film 50, the magnetic film needs to have a certain film thickness, so that it is necessary to use the composite magnetic material as the magnetic film 50. Thus, the magnetic film 50 is directly formed on the top surface 41 and side surface 42 of the magnetic mold resin 40, and the surface 21 of the substrate 20 exposed to the bottom of the groove 44 is also covered with the magnetic film 50. Further, as in the modification illustrated in FIG. 39, when the adhesive film 70 is interposed between the top surface 51 of the magnetic film 50 and the metal film 60, after formation of the magnetic film 50, an adhesive material such as a thermosetting material or a heat-resistant thermoplastic material may be thinly formed on the top surface 51 of the magnetic film 50.

[0192] Then, as illustrated in FIG. 43, a groove 45 having a width W2 is formed along the dashed line a to cut the assembly substrate 20A into a plurality of substrates 20. At this time, The width W2 of the groove 45 needs to be smaller than the width W1 of the groove 44. As a result, the substrate 20A is segmented into individual substrates 20 with the magnetic film 50 formed inside the groove 44 remaining. Further, as in the modification illustrated in FIG. 40, when the adhesive film 70 is interposed between the top surface 51 and side surface 52 of the magnetic film and the metal film 60, the side surface 52 of the magnetic film 50 is exposed by formation of the groove 45 without segmentation of the assembly substrate 20A, then an adhesive material such as a thermosetting material or a heat-resistant thermoplastic material is thinly formed on the top surface 51 and side surface 52 of the magnetic film 50, followed by cutting of the assembly substrate 20A.

[0193] Then, the metal film 60 is formed so as to cover the top surface 51 and side surface 52 of the magnetic film 50 and the side surface 27 of the substrate 20, whereby the electronic circuit package 16A according to the present embodiment is completed.

[0194] As described above, in the manufacturing method for the electronic circuit package 16A according to the present embodiment, the two grooves 44 and 45 having different widths are sequentially formed, whereby the side surface 42 of the magnetic mold resin 40 can be covered with the magnetic film 50 without use of a complicated process.

Seventh Embodiment

[0195] FIG. 44 is a cross-sectional view illustrating a configuration of an electronic circuit package 17A according to the seventh embodiment of the present invention.

[0196] As illustrated in FIG. 44, the electronic circuit package 17A according to the present embodiment differs from the electronic circuit package 15A illustrated in FIG. in that the magnetic film 50 is formed on an upper surface 61 of the metal film 60. That is, the positional relationship between the magnetic film 50 and the metal film 60 constituting the laminated film is reversed. Other configurations are the same as those of the electronic circuit package 15A illustrated in FIG. 33. Even with this configuration, high composite shielding effect can be achieved since a triple-shield structure composed of the magnetic mold resin 40, magnetic film 50, and metal film 60 can be obtained.

[0197] When it is difficult to directly form the magnetic film 50 on the upper surface 61 of the metal film 60, a thin adhesive layer 70 can be interposed between the metal film 60 and the magnetic film 50 as in an electronic circuit package 17B according to a modification illustrated in FIG. 45. When the magnetic film 50 functions as an oxidation preventing coating for the metal film 60, it is not necessary to apply the oxidation preventing coating onto the upper surface 61 of the metal film 60; however, the oxidation preventing coating is preferably applied onto the upper surface 61 of the metal film 60 so as to enhance reliability.

[0198] FIGS. 46 and 47 are process views for explaining a manufacturing method of the electronic circuit package 17A.

[0199] First, the magnetic mold resin 40 is formed according to the method described using FIGS. 3 and 4. Then, as illustrated in FIG. 46, the aggregated substrate 20A is cut off along a dashed line a indicating a dicing position to individuate the substrate 20 (see FIG. 3).

[0200] Then, as illustrated in FIG. 47, the metal film 60 is formed so as to cover the upper surface 41 and side surface 42 of the magnetic mold resin 40 and the side surface 27 of the substrate 20. As a result, the metal film 60 is connected to the power supply pattern 25G exposed to the side surface 27 of the substrate 20. Then, the magnetic film 50 is formed on the upper surface 61 of the metal film 60, whereby the electronic circuit package 17A illustrated in FIG. 44 is completed. When it is difficult to directly form the magnetic film 50 on the upper surface 61 of the metal film 60, an adhesive material such as a thermosetting material or a heat-resistant thermoplastic material is thinly formed after formation of the metal film 60 and before formation of the magnetic film 50. In this case, the electronic circuit package 17B illustrated in FIG. 45 is obtained.

Eighth Embodiment

[0201] FIG. 48 is a cross-sectional view illustrating a configuration of an electronic circuit package 18A according to the eighth embodiment of the present invention.

[0202] As illustrated in FIG. 48, the electronic circuit package 18A according to the present embodiment differs from the electronic circuit package 17A illustrated in FIG. 44 in that the magnetic film 50 is formed not only on the upper surface 61 of the metal film 60, but also on a side surface 62 thereof. Other configurations are the same as those of the electronic circuit package 17A illustrated in FIG. 44. Thus, the same reference numerals are given to the same elements, and overlapping description will be omitted. With this configuration, composite shielding effect on the side surface of the magnetic mold resin 40 can be enhanced. In particular, electromagnetic wave noise to be incident from the side direction of the magnetic mold resin 40 can be effectively shielded.

[0203] When it is difficult to directly form the magnetic film 50 on the upper surface 61 and side surface 62 of the metal film 60, a thin adhesive layer 70 is interposed between the upper surface 61 and side surface 62 of the metal film 60 and the magnetic film 50 as in an electronic circuit package 18B according to a modification illustrated in FIG. 49. When the magnetic film 50 functions as an oxidation preventing coating for the metal film 60, it is not necessary to apply the oxidation preventing coating onto the upper surface 61 and side surface 62 of the metal film 60; however, the oxidation preventing coating is preferably applied onto the upper surface 61 and side surface 62 of the metal film 60 in view of reliability enhancement.

EXAMPLES

<Production of Composite Magnetic Sealing Material>

[0204] A resin material was prepared with 830S (bisphenol A epoxy resin) made by Dainippon Ink & Chemicals, Inc., used as a base resin, with 0.5 equivalent of DicyDD (Digi Angi amide) made by Nippon Carbide Industries Co., Inc. added to the base resin as a curing agent, and with 1 wt. % of C11Z-CN (imidazole) made by Shikoku Chemicals Corporation added to the base resin as a curing accelerator.

[0205] 50 vol. %, 60 vol. %, or 70 vol. % of a magnetic filler having the composition illustrated in FIG. 50 was added to the above resin material, followed by intensive kneading to obtain a paste. If pasting failed, butylcarbitol acetate was added appropriately. The obtained paste was coated to a thickness of about 300 m and then heat-cured sequentially at 100 C. for one hour, at 130 C. for one hour, at 150 C. for one hour, and at 180 C. for one hour in this order, to obtain a cured sheet. The composition 1 (comparative example) is a magnetic material generally called PB Permalloy.

<Measurement of Thermal Expansion Coefficient>

[0206] The above cured sheet was cut to a length of 12 mm and a width of 5 mm. Then, TMA was used to raise temperature from room temperature to 200 C. at 5 C./min, and a thermal expansion coefficient was calculated from the amount of expansion in a temperature range of 50 C. to 100 C. which is lower than a glass transition temperature. The measurement results are shown in FIG. 51. In FIG. 51, the measurement result obtained when the non-magnetic filler formed of SiO.sub.2 is used in place of the magnetic filler is also shown.

[0207] As illustrated in FIG. 51, when the magnetic filler having the composition 2 or 3 is used, the thermal expansion coefficient is significantly reduced as compared to when the magnetic filler having the composition 1 (comparative example) is used. In particular, when the additive amount is 60 vol. % or more, a thermal expansion coefficient equivalent to that obtained when the non-magnetic filler formed of SiO.sub.2 is used is obtained, and when the additive amount is 70 vol. %, the thermal expansion coefficient is as small as 10 ppm/ C. or less.

<Measurement of Magnetic Permeability>

[0208] The above cured sheet was cut into a ring shape having an outer diameter of 7.9 mm and an inner diameter of 3.1 mm. Then, the material analyzer function of impedance analyzer E4991 manufactured by Agilent Corp., Ltd. was used to measure an effective magnetic permeability () at 10 MHz. The measurement results are shown in FIG. 52.

[0209] As illustrated in FIG. 52, the magnetic permeability obtained when the magnetic filler having the composition 2 or 3 is substantially equivalent to the magnetic permeability obtained when the magnetic filler having the composition 1 (Comparative Example) is used.

<Considerations>

[0210] The composite magnetic sealing material obtained by adding the magnetic filler having the composition 2 or 3 to a resin material has a thermal expansion coefficient equivalent to the thermal expansion coefficient obtained when the non-magnetic filler formed of SiO.sub.2 is used and has a magnetic permeability equivalent to the magnetic permeability obtained when the magnetic filler formed of PB permalloy is used. Thus, by using, as a sealing material for an electronic circuit package, the composite magnetic sealing material obtained by adding the magnetic filler having the composition 2 or 3 to a resin material, it is possible to obtain excellent magnetic shielding characteristics while preventing the warp of the substrate, interfacial delamination or crack of a molding material.