Perovskite thin films having large crystalline grains
09997707 ยท 2018-06-12
Assignee
Inventors
Cpc classification
H10K71/40
ELECTRICITY
H10K30/20
ELECTRICITY
H10K85/1135
ELECTRICITY
H10K85/50
ELECTRICITY
International classification
Abstract
The invention relates generally to perovskite materials, and in particular, to perovskite thin films having large crystalline grains. Methods of forming the perovskite thin films are disclosed herein. The perovskite thin films find particular use in photovoltaic applications.
Claims
1. A method for forming a perovskite thin film having an ABX.sub.3 crystalline structure, wherein the crystalline structure comprises an average grain size of more than 1 micron, the method comprising: forming via vacuum thermal evaporation a layer of a metal (II) halide (BX.sub.2) on a substrate; depositing via spin coating a solution of an organic halide or a metal (I) halide (AX) on the BX.sub.2 layer; and annealing the BX.sub.2 and AX layers to form the perovskite thin film, wherein A is CH.sub.3NH.sub.3.sup.+, CH.sub.3N.sub.2H.sub.2.sup.+, or Cs.sup.+, B is Pb.sup.2+, Sn.sup.2+, and X is Cl.sup.?, Br.sup.? or I.sup.?.
2. The method of claim 1, wherein forming the layer of BX.sub.2 comprises evaporating BX.sub.2 powder under vacuum of 1?10.sup.?2 to 1?10.sup.?5 Pa.
3. The method of claim 1, wherein forming the layer of BX.sub.2 comprises depositing BX.sub.2 at a deposition rate of 0.1 to 50 ?/s.
4. The method of claim 1, wherein forming the layer of BX.sub.2 comprises evaporating BX.sub.2 powder at 210 to 230? C.
5. The method of claim 1, wherein depositing the solution of AX comprises spin coating at a rotational speed of 150 to 15,000 rpm/s.
6. The method of claim 1, wherein depositing the solution of AX comprises spin coating for a period of 5 to 300 s.
7. The method of claim 1, wherein annealing the BX.sub.2 and AX layers comprises annealing for a period of 0.01 to 24 h.
8. The method of claim 1, wherein annealing the BX.sub.2 and AX layers comprises annealing at 90 to 300? C.
9. A perovskite thin film having an ABX.sub.3 crystalline structure obtained from the method of claim 1, wherein the crystalline structure comprises an average grain size of more than 1 micron.
10. The perovskite thin film of claim 9, wherein the average grain size is 7 to 10 microns.
11. A method for forming a planar heterojunction perovskite solar cell, the method comprising: depositing a layer of poly(3,4-ethylene dioxythiophene)-poly(styrene sulfonate) (PEDOT:PSS) on a glass substrate pre-coated with indium-tin oxide (ITO); depositing a layer of poly(9,9-dioctylfluorene-co-N-(4-(3-methylpropyl))diphenylamine) (TFB) on the layer of PEDOT:PSS; forming via vacuum thermal evaporation a layer of a metal (II) halide (BX.sub.2) on the layer of TFB; depositing via spin coating a solution of an organic halide or a metal (I) halide (AX) on the metal (II) halide layer; annealing the BX.sub.2 and AX layers to form a perovskite thin film, wherein A is CH.sub.3NH.sub.3.sup.+, CH.sub.3N.sub.2H.sub.2.sup.+, or Cs.sup.+, B is Pb.sup.2+, Sn.sup.2+, and X is Cl.sup.?, Br.sup.? or I.sup.?; depositing a layer of [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) on the perovskite thin film; and forming a top metal electrode on the PCBM layer to form the solar cell.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) In the drawings, like reference characters generally refer to the same parts throughout the different views. The drawings are not necessarily drawn to scale, emphasis instead generally being placed upon illustrating the principles of various embodiments. In the following description, various embodiments of the invention are described with reference to the following drawings.
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DESCRIPTION
(20) The following detailed description refers to the accompanying drawings that show, by way of illustration, specific details and embodiments in which the invention may be practised. These embodiments are described in sufficient detail to enable those skilled in the art to practise the invention. Other embodiments may be utilized and structural, logical, material and electrical changes may be made without departing from the scope of the invention. The various embodiments are not necessarily mutually exclusive, as some embodiments can be combined with one or more other embodiments to form new embodiments.
(21) For photovoltaic applications, large crystalline grains are highly desirable in significantly reducing charge recombination at grain boundaries, which have vital impact for device performance. In the present disclosure, it is successfully demonstrated the growth of a perovskite thin film with a large average grain size approaching 7 microns by combining vacuum and solution-processed approaches, which is the largest size for CH.sub.3NH.sub.3PbI.sub.3 perovskite, which is used as photoactive layer for efficient planar heterojunction perovskite solar cells. Featuring a lower highest occupied molecular orbital (HOMO, 5.4 eV) of poly(9,9-dioctylfluorene-co-N-(4-(3-methylpropyl))diphenylamine) (TFB) than that (5.1 eV) of poly(3,4-ethylene dioxythiophene)-poly(styrene sulfonate) (PEDOT:PSS), devices with CH.sub.3NH.sub.3PbI.sub.3 (HOMO, 5.4 eV) sandwiched between very thin PEDOT:PSS/TFB and [6,6]-phenyl-C61 butyric acid methyl ester (PCBM) showed high PCEs with remarkable fill factors. Self-consistent photoelectric simulations were carried out to identify more clearly the roles played by optical field distribution, energy band and carrier concentration in an operating perovskite solar cell. With this proposed approach, high-quality and micron-sized perovskite photoactive layers with full coverage on the substrates were achieved. Excitingly, the device performance based on micron-sized perovskite surpasses that with traditional two-step films. Correspondingly, the carrier diffusion length and trap-state density of the proposed films are superior to the traditional ones. Building on this very promising method, it has been achieved a hysteresis-free PCE as high as 18.56% with a fill factor of 84.5% under standard AM 1.5G illumination in a planar heterojunction with micron-sized perovskite morphology, which demonstrates the potential for a wide variety of applications in photovoltaic fields.
Experiment Details
(22) Materials:
(23) Unless specially stated, all chemicals were used as received. 1,2-dichlorobenzene (ODCB, 99%), lithium fluoride (LiF, powder, 99.999% trace metals basis), lead iodide (PbI.sub.2, beads, anhydrous, 99.999% trace metals basis), methylamine (33 wt % in ethanol), and isopropyl alcohol(anhydrous) and hydroiodic acid (HI, 57 wt % in water) were purchased form Sigma-Aldrich. [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) was purchased from Nano-C. Commercial indium tin oxide (ITO) substrates and poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-(4,4-(N-(4-sec-butylphenyl) diphenylamine)] (TFB, MW>30000 (GPC)) were purchased from Lumtec. Poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS, Clevios? P VP AI 4083) was obtained from Heraeus.
(24) Synthesis of Methylammonium Iodide:
(25) The methylammonium halide precursors (CH.sub.3NH.sub.3I) were synthesized through the reaction of hydroiodic acid (HI) with methylamine followed by recrystallization from ethanol. An equimolar amount of HI (57 wt % in water) was added dropwise into the methylamine (33 wt % in ethanol) at 0? C. under stirring. Upon drying at 100? C., a snow-white powder was obtained, which was further dried overnight in a vacuum chamber and purified with ethanol before use.
(26) Device Fabrication:
(27) The pre-cleaned ITO patterned glass were cleaned ultrasonically with an alconox (degergent) solution, followed by sonication in sequence with deionized water, acetone and isopropyl alcohol for 15 min each, then the substrates were dried using a stream of nitrogen. Devices were prepared on cleaned ITO substrates by spin coating a thin film (20 nm) of PEDOT:PSS (filtered using a 0.45-?m PTFE syringe filter prior to use) for 60 s under 3000 revolutions per minute with an acceleration of 700, which resulted in a thickness of ?20 nm. The PEDOT:PSS coated substrates were heated on a hot plate at 135? C. for 20 min in air. After thermal annealing the substrates were immediately transferred into a nitrogen glove box (O.sub.2<0.5 ppm, H.sub.2O<0.5 ppm) and a 15-min annealing under 120? C. was performed in order to further remove the residual water. After cooling to room temperature, on top of this layer a thin film of TFB was deposited from an ODCB solution with a concentration of 5 mg ml.sup.?1 using spin coating method with a speed of 3000 revolutions per minute. The ITO/PEDOT:PSS/TFB substrates were heated at 110? C. for 20 min in glove box. Then the substrates were cooled down to room temperature and transferred into a vacuum chamber integrated into an inert glove box and evacuated to a pressure of 3?10.sup.?4 Pa. The PbI.sub.2 layers were then deposited through vacuum thermal evaporation to the desired film thickness. After depositing the PbI.sub.2 layers, the substrates were taken out from chamber and transferred to a spin coater. CH.sub.3NH.sub.3I solution with a concentration of 25 mg ml.sup.?1 in isopropyl alcohol was loaded on the top of PbI.sub.2 thin film and spin coated with different speed. The substrates were heated on a hot plate at 70? C. for 5 min. Then, the substrates were washed twice using isopropyl alcohol and heated on a hot plate at 70? C. for another 5 min with the purpose of removing residual CH.sub.3NH.sub.3I and solvent. After cooling, the substrates were annealed in a covered petri dish containing DMF solution under 100? C. for different timings. After depositing the perovskite photoactive layers, a 20 mg ml.sup.?1 PCBM in ODCB solution was spin coated onto the photoactive layers with a speed of 3000 revolutions per minute for 25 s. The devices were heated on a hot plate at 100? C. for 60 min. The device was completed by the thermal evaporation of a top metal electrode under a base pressure of 5?10.sup.?4 Pa to a thickness of 100 nm. The active area of device was obtained using an appropriate mask (3.2 mm?3.2 mm), and the devices were then encapsulated with a glass cover using an ultraviolet-curable epoxy sealant with an ultraviolet exposure of 1.1 min.
(28) Deposition of PbI.sub.2 Thin Films:
(29) After depositing TFB thin film on the top of PEDOT:PSS layer and corresponding annealing treatment, the substrates were transferred into the vacuum chamber integrated with the glove box. About 500 mg PbI.sub.2 powder was placed in a quartz crucible, and the distance from substrate to crucible is about 30 cm. The sources are directed upwards with an angle of approximately 90? with respect to the bottom of the chamber. There are two shutters, one is placed on the top of crystal crucible and the other is below the substrate holder. The evaporation rate of PbI.sub.2 was monitored using a quartz crystal oscillator placed between substrate and crucible and close to the substrate. And the evaporation can be precisely adjusted through controlling the input current on quartz crucible. Various thickness of PbI.sub.2 was obtained under 3?10.sup.?4 Pa by evaporating PbI.sub.2 at various temperatures in the range 210-230? C. with evaporation rate varying from 0.2-1 ?/s. After depositing the PbI.sub.2 layer, the high-purity nitrogen gas (>99.999%) was loaded into the vacuum chamber up to 1?10.sup.5 Pa. Then, the substrates were transferred into the glove box and heated at 100? C. for 10 min.
(30) Characterization
(31) The optical microscope images were conducted using an optical-filed microscope (Model: Olympus BX51M) with 5? and 10? lens under Olympus U-DICR prism at room temperature. Optical characteristics were collected using a PerkinElmer Lambda 950 ultraviolet-visible-near infrared spectrophotometer in the range 300-900 nm. All samples for absorbance measurement were fabricated using identical process in comparison with the photoactive layers in device architecture. Samples consisted of perovskites prepared on glass and coated with the inert polymer poly(methyl methacrylate) as protective layers. XRD spectra of the prepared films were measured using a Bruker Advance D8 X-ray diffractometer equipped with a LynxEye detector, Cu tube (CuK?=1.5418 ?) and operated at 40 KV and 30 mA with a 2 theta scan range of 10-70?. The film thickness was determined by a surface profiler (KLA-Tencor P-10). The surface morphology of the perovskite films were performed using a Jeol JSM-7100F filed-emission scanning electron microscope with an accelerating voltage of 5 KV. The current density-voltage sweeps of all solar cells were measured through Keithley 2400 source meter under simulated air mass 1.5-global illumination (100 mW cm.sup.?2) using a Xenon-lamp-based solar simulator (Solar Light Co. Inc.) and a calibrated Si-reference cell certified by the National Renewable Energy Laboratory, USA. This calibrated Si-reference cell was used for light intensity calibration every time before sweep. The mismatch factor was calculated to be less than 2%. The sweeps were measured by reverse and forward scans (forward from 1.2 V to ?1.0 V and reverse from ?1.0 V to 1.2 V). The step voltage was set at 15 mV and the delay time was modulated, which is a delay set at each voltage step before sweeping each current. A mask (0.09 cm.sup.2) was employed during device measurement to avoid any probable edge effect. The external quantum efficiency spectra were recorded with a PVE 300 (Bentham) system comprised of a Xenon lamp, a momochoromator, a chopper, a lock-in amplifier and a calibrated silicon photodetector.
(32) Method for Optical and Electrical Modelling
(33) APSYS Simulation
(34) The commercial simulation package of APSYS enables the numerical simulations to the perovskite solar cell devices studied in this disclosure. APSYS is able to solve the Poisson's equations, drift-diffusion equations and the continuity equations with proper boundary conditions and material parameters set by users.
(35) The Poisson's equations solved in the simulator are as follows:
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(37) where V is the potential distribution within each semiconductor layer, and n, p, N.sub.D.sup.+ and N.sub.A.sup.? denote the electron concentration, hole concentration, ionized donor concentration and the ionized acceptor concentration, respectively.
(38) The relationship between the current density and the applied voltage is calculated by the following equations,
J.sub.n=q.Math.?.sub.n.Math.n.Math.E+e.Math.D.sub.n.Math.?n
J.sub.p=q.Math.?.sub.p.Math.p.Math.E+e.Math.D.sub.p.Math.?p
(39) where, J.sub.n and J.sub.p represent the spatial electron current density and the hole current density, respectively. ?.sub.n and ?.sub.p are used to account for the electron mobility and the hole mobility, respectively, while E represents the applied electric field. D.sub.n and D.sub.p stand for the diffusion constants for electrons and hole, respectively, and they can be calculated according to the well-known Einstein relationship.
(40) The current continuity equations employed in this simulator are shown as follows:
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(42) where the electron (n) and hole (p) recombination rate is achieved through the j.sub.th deep trap, which are shown by
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However, in order to simplify the calculations, the deep trap-caused recombination rate was treated by setting a recombination lifetime, such that
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in which ?.sub.n and ?.sub.p are the trap-caused recombination lifetimes for electrons and holes, respectively. R.sub.sp and R.sub.au denote the spontaneous recombination rate and Auger recombination rate. G.sub.opt(t) represents the carrier generation rate caused by the external influence such as the optical excitation with high energy photons. Here, f.sub.D and f.sub.A mean the occupancy of the donor and acceptor levels, respectively with N.sub.D and N.sub.A denoting the donor and acceptor concentration, respectively.
(45) FDTD Simulation
(46) Calculation of Light Intensity Distribution Across the Solar Cell Device Using 3D FDTD Method
(47) Light intensity distribution across the solar cell device is derived using 3D FDTD method. Finite-difference time-domain (FDTD) method is a numerical technique to solve Maxwell's equations in complex geometries. The electric and magnetic vector components are solved in a leapfrog manner and evolve forward in time. The resulting solution is electric and magnetic vectors in time domain and can be converted to vectors in the frequency domain by exploiting Fourier transforms.
(48) The FDTD method adopts the Yee's algorithm that discretizes the computation domain with regular, structured, staggered, rectangular grids and the electric and magnetic fields are staggered in both space and time. In 3D Cartesian coordinate system, two grid cells are used for discretization. Each of them has dimensions ?x, ?y, and ?z along respective axis.
(49) The coordinate of a node on the grid can be expressed in discrete form as: (x,y,z).sub.i,j,k=(i?x,j?y,k?z), where i, j, and k are integers. Similarly, time is discretized as t=n?t. An arbitrary function f(x,y,z,t) at any node can be expressed as:
f(x,y,z,t)=f(i?x,j?y,k?z,n?t)=f.sub.i,j,k.sup.n
(50) Therefore, the Maxwell's equations could be developed into a discretized form leading to a total of six recursive equations, which can then be used to solve for the time-dependent vector field intensities. Finally, these time-dependent solutions can be converted to functions of frequency or wavelength by performing Fourier transforms.
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(52) The simulation setup for the solar cell device is briefly described as follows. One solar cell device structure consists of a 4 um glass substrate, an 100 nm ITO conductive layer, a 20 nm PEDOT layer, a perovskite layer, a 20 nm PCBM layer and 100 nm Al electrode from bottom to the top. The other is inserted a 10 nm TFB layer between the PEDOT and perovskite layers. The thickness of the perovskite layer is set 200 nm, 250 nm, 300 nm, 350 nm, 400 nm, 500 nm, 1000 nm, respectively. The simulation boundary around the device is perfect match layer (PML) in the vertical direction and period in the horizontal direction. The plane wave source is set in the glass um away from the interface between the ITO layer and glass substrate and the wavelength range is from 300 to 800 nm. The plane wave is injected normal to the device layers and from bottom to the top. A monitor is put across the solar device and field distribution is extracted from the monitor along the vertical direction from bottom to the top.
(53) Results
(54) Methodology and Optoelectronic Characteristics.
(55) As shown in
(56) The optical absorption curves of perovskite thin films were carried out as shown in
(57) Morphology Evolution of Perovskite Thin Films.
(58) By optical observation under controllable annealing, the evolution of film morphology transformed through three distinct stages, as evidenced via optical microscopy measurements (
(59) Self-Consistent Optoelectronic Simulation.
(60) The optical field intensity profile distribution through finite-difference time-domain (FDTD) simulations (Lumerical Solutions, Inc.) was visualized for perovskite solar cells with varied photoactive layer thickness (200-1000 nm). The wavelength range used was 300-700 nm, and the illumination was from the ITO side. The optical field intensity at any given position in the device can be calculated with the optical constants (reflective index n and extinction coefficient k) and the thickness of each layer (
(61) As shown in
(62) Based on these optical behaviors, using the commercial APSYS package (Crosslight Inc.), the current density-voltage characteristics of the perovskite solar cells with different photoactive layer thicknesses were simulated under standard AM 1.5G solar illumination. This self-consistent optoelectronic simulation primarily involves solving Maxwell, Poisson, and charge drift-diffusion equations, which can reasonably support the assumption of improved material quality for large grains in the present case. By means of material characteristic parameters, the model quantitatively produces all the prominent features of the current density-voltage (J-V) plots. With the progressive increase of photoactive layer thickness, the photocurrent gradually increases due to the more sufficient absorption by CH.sub.3NH.sub.3PbI.sub.3. However, the saturated current density occurs when the photoactive layer thickness reaches 350 nm (
(63) The typical energy band diagram and carrier density profiles in all regions of the device were simulated (
(64) Solar-Cell Performance.
(65) Making use of the micron-sized grains, planar heterojunction perovskite solar cells were fabricated. The J-V curves for devices fabricated with various thicknesses of photoactive layer are shown in
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DISCUSSION
(67) It is herein introduced a new route combining vacuum and solution processes to create and control perovskite morphology, which can be regulated over a large range of time scale and results in micron-size crystallization grains and more uniform thin-film formation. As an example, the schematic diagram of morphology evolution of photoactive perovskite thin film is illustrated in
(68) Proceeding to explore the influence of large-size grain on the transport properties of the perovskite films, charge carrier mobility was determined using space charge-limited current method (
(69) In summary, applying a hybrid process of combining vacuum and solution-processed technologies, it has been demonstrated a new approach for fabricating photoactive layers for high-efficiency planar heterojunction perovskite solar cells. For the first time, it is observed the morphology evolution of micron-scale large-size perovskite grains in perovskite thin films, which can be easily regulated on a large time scale. Assisted by drift-diffusion and Poisson equations along with the transfer-matrix solution, the self-consistent optoelectronic simulation is carried out to predict the optimized photoactive layer thickness and spatial optical field redistribution profiles, which are in good agreement with the present experimental results. The large grain perovskite films resulted from the present hybrid approach enjoyed along carrier diffusion length and low charge trap-state density, which substantially support the superior device performance. With the device engineering by the introduction of polymer TFB as hole transport layer, the present device has achieved a hysteresis-free PCE of 18.56% with a V.sub.OC of 1.05 V, a J.sub.SC of 20.92 mA/cm.sup.2 and a FF of 84.5%. This is by far one of the highest efficiency cells reported for CH.sub.3NH.sub.3PbI.sub.3-only solar cell without any additives. Furthermore, the FF value of 87.3% is the best result for perovskite solar cells. Further improvement in efficiency can be expected by optimizing the photoactive layer morphology and device interfacial engineering. More importantly, for perovskite solar cells to early meet commercial requirements in global photovoltaic community, this proposed technology is expected to provide a viable route for the fabrication of high-efficiency large-area device modules.
(70) By comprising it is meant including, but not limited to, whatever follows the word comprising. Thus, use of the term comprising indicates that the listed elements are required or mandatory, but that other elements are optional and may or may not be present.
(71) By consisting of is meant including, and limited to, whatever follows the phrase consisting of. Thus, the phrase consisting of indicates that the listed elements are required or mandatory, and that no other elements may be present.
(72) The inventions illustratively described herein may suitably be practiced in the absence of any element or elements, limitation or limitations, not specifically disclosed herein. Thus, for example, the terms comprising, including, containing, etc. shall be read expansively and without limitation. Additionally, the terms and expressions employed herein have been used as terms of description and not of limitation, and there is no intention in the use of such terms and expressions of excluding any equivalents of the features shown and described or portions thereof, but it is recognized that various modifications are possible within the scope of the invention claimed. Thus, it should be understood that although the present invention has been specifically disclosed by preferred embodiments and optional features, modification and variation of the inventions embodied therein herein disclosed may be resorted to by those skilled in the art, and that such modifications and variations are considered to be within the scope of this invention.
(73) By about in relation to a given numerical value, such as for temperature and period of time, it is meant to include numerical values within 10% of the specified value.
(74) The invention has been described broadly and generically herein. Each of the narrower species and sub-generic groupings falling within the generic disclosure also form part of the invention. This includes the generic description of the invention with a proviso or negative limitation removing any subject matter from the genus, regardless of whether or not the excised material is specifically recited herein.
(75) Other embodiments are within the following claims and non-limiting examples. In addition, where features or aspects of the invention are described in terms of Markush groups, those skilled in the art will recognize that the invention is also thereby described in terms of any individual member or subgroup of members of the Markush group.
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