Device and method for coating a substrate

Abstract

A device for coating of a surface of a substrate with a coating material which has at least one coating component and at least one solvent, with the following features: a chamber which can be pressurized, a holding apparatus for holding the substrate on a holding surface and a spray nozzle for coating of the substrate, characterized in that the device has cooling means for cooling of at least the surface of the substrate which is held on the holding surface of the holding apparatus. Furthermore the invention relates to a corresponding method.

Claims

1. A method for applying a resist to a substrate by spray coating, wherein the method comprises: providing a substrate having a substrate surface, holding the substrate on a holding surface of a holding apparatus located inside a chamber which can be pressurized with a pressure, providing a coating material comprised of (i) a resist having at least one coating component and (ii) at least one solvent, wherein the resist is dissolved in the at least one solvent, spraying the coating material onto the substrate surface to coat the substrate surface with the coating material, cooling at least the substrate surface during the spraying of the substrate surface with the coating material, such that the resist is shock frozen during impact of the coating material on the substrate surface, and depositing the resist onto the substrate surface to form a resist layer thereon by sublimation of the at least one solvent in the coating material.

2. The method as claimed in claim 1, wherein pressure and temperature on the substrate surface are controlled by a control apparatus.

3. The method as claimed in claim 1, wherein during the spraying of the coating material onto the substrate surface, at least the substrate surface has a temperature below the phase transition temperature of the coating material from liquid to solid.

4. The method as claimed in claim 1, wherein the sublimation of the at least one solvent includes decreasing the pressure in the chamber over the phase boundary of the at least one solvent from solid to gaseous, while the phase boundary of the at least one coating component from solid to gaseous is not exceeded.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 shows a p-T phase diagram of a single-component system,

(2) FIG. 2 shows a p-T phase diagram of a two-component system of the invention,

(3) FIG. 3 shows a p-T phase diagram of a two-component system of the invention with a method according to the prior art,

(4) FIG. 4 shows a p-T phase diagram of a two-component system of the invention with a method sequence of the invention and

(5) FIG. 5 shows a schematic of one embodiment of the device of the invention.

DETAILED DESCRIPTION OF THE INVENTION

(6) FIGS. 1 to 4 were described above for the general part of the invention.

(7) FIG. 5 shows a schematic of a chamber 7 which can be evacuated, with a holding apparatus 8 whose temperature can be regulated and which can be mainly cooled, on whose holding surface 12 is a substrate 9 (especially a wafer). Above the holding apparatus 8 a spray nozzle 11 and an (optional) cold nozzle 10 are attached to a holding device 13. The spray nozzle 11 and the cold nozzle 10 can preferably be adjusted/controlled independently of one another by a control apparatus which is not shown, and can reach the entire surface 9o of the substrate 9 to be coated.

REFERENCE NUMBER LIST

(8) 1 sublimation or resublimation curve 2 evaporation or condensation curve 3 melting or solidification curve 4 heat treatment 5 freezing 6 sublimation transition 7 chamber 8 holding apparatus 9 substrate 9o surface 10 cold nozzle 11 spray nozzle 12 holding surface 13 holding device s solid phase l liquid phase g gaseous phase B coating B coating