BORON NITRIDE CONTAINING VACANT SITE DEFECTS FOR USE IN CATALYTIC HYDROGENATION
20240367974 ยท 2024-11-07
Inventors
Cpc classification
C07C2521/02
CHEMISTRY; METALLURGY
B01J37/088
PERFORMING OPERATIONS; TRANSPORTING
C01P2002/76
CHEMISTRY; METALLURGY
B01J35/30
PERFORMING OPERATIONS; TRANSPORTING
International classification
Abstract
A composition comprising a boron nitride hexagonal lattice structure in which boron atoms and nitrogen atoms are present in a B:N molar ratio of 1:4-1:8 or 4:1-8:1, wherein the molar ratio corresponds to vacant site defects within the boron nitride hexagonal lattice structure. Also described are methods for producing the boron nitride composition as well as methods for using the boron nitride composition as a catalyst in a hydrogenation process.
Claims
1. A composition comprising a boron nitride hexagonal lattice structure in which boron atoms and nitrogen atoms are present in a B:N molar ratio of 1:4-1:8 or 4:1-8:1, wherein said molar ratio corresponds to vacant site defects within the boron nitride hexagonal lattice structure.
2. The composition of claim 1, wherein the B:N molar ratio is 1:5-1:7 or 5:1-7:1.
3. The composition of claim 1, wherein the B:N molar ratio is 1:4-1:8.
4. The composition of claim 1, wherein the B:N molar ratio is 1:5:1:7.
5. The composition of claim 1, wherein the composition is prepared by a method in which a molten mixture of NaBH.sub.4 and NaNH.sub.2 is heated under an inert atmosphere to a temperature of at least 700 C., wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:4-1:8 or 4:1-8:1.
6. The composition of claim 5, wherein the temperature is at least 800 C.
7. The composition of claim 5, wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:5:1:7 or 5:1-7:1.
8. The composition of claim 5, wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:4-1:8.
9. The composition of claim 5, wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:5:1:7.
10. A method of producing a boron nitride hexagonal lattice structure containing vacant site defects, the method comprising heating a molten mixture of NaBH.sub.4 and NaNH.sub.2 under an inert atmosphere to a temperature of at least 700 C., wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:4-1:8 or 4:1-8:1.
11. The method of claim 10, wherein the temperature is at least 800 C.
12. The method of claim 10, wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:5:1:7 or 5:1-7:1.
13. The method of claim 10, wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:4-1:8.
14. The method of claim 10, wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:5:1:7.
15. A method of catalytically hydrogenating an unsaturated organic compound, the method comprising contacting the unsaturated organic compound with hydrogen gas in the presence of a hydrogenation catalyst at a temperature of 80 C.-300 C., wherein the hydrogenation catalyst comprises a boron nitride hexagonal lattice structure in which boron atoms and nitrogen atoms are present in a B:N molar ratio of 1:4-1:8 or 4:1-8:1, wherein said molar ratio corresponds to vacant site defects within the boron nitride hexagonal lattice structure.
16. The method of claim 15, wherein said temperature is 80 C.-200 C.
17. The method of claim 15, wherein said temperature is 80 C.-150 C.
18. The method of claim 15, wherein the B:N molar ratio is 1:5:1:7 or 5:1-7:1.
19. The method of claim 15, wherein the B:N molar ratio is 1:4-1:8.
20. The method of claim 15, wherein the B:N molar ratio is 1:5:1:7.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0008]
[0009]
[0010]
[0011]
DETAILED DESCRIPTION
[0012] As well known, conventional two-dimensional (2D) hexagonal boron nitride (h-BN) is prepared using equimolar amounts of B and N atoms and possesses alternating surface Lewis acid site (B center) and Lewis base site (N center) with a layered honeycomb-like structure and a substantial absence of defects. In contrast, the presently described h-BN material, which is prepared using non-equimolar amounts of B and N, is characterized by a substantial presence of vacant site defects (i.e., FLP-like sites), such as depicted in
[0013] In a first aspect, the present disclosure is directed to a catalyst composition containing a boron nitride hexagonal (h-BN) lattice structure in which boron atoms and nitrogen atoms are present in a B:N molar ratio of 1:4-1:8 or 4:1-8:1 and wherein the boron nitride hexagonal lattice structure contains vacant site defects. Since the foregoing molar ratios do not include an equimolar (1:1) ratio, they result in or give rise to (i.e., correspond to) vacant site defects within the boron nitride hexagonal lattice structure.
[0014] In a first set of embodiments, the B:N molar ratio is within a range of 1:4-1:8. The B:N molar ratio may more particularly be precisely or about, for example, 1:4, 1:5, 1:6, 1:7, or 1:8, or a range bounded by any two of these values, e.g., 1:4-1:8, 1:4-1:7, 1:4-1:6, 1:4-1:5, 1:5-1:8, 1:5-1:7, 1:5-1:6, 1:6-1:8, 1:6-1:7, or 1:7-1:8.
[0015] In a second set of embodiments, the B:N molar ratio is within a range of 4:1 to 8:1. The B:N molar ratio may more particularly be precisely or about, for example, 4:1, 5:1, 6:1, 7:1, or 8:1, or a range bounded by any two of these values, e.g., 4:1-8:1, 4:1-7:1, 4:1-6:1, 4:1-5:1, 5:1-8:1, 5:1-7:1, 5:1-6:1, 6:1-8:1, 6:1-7:1, or 7:1-8:1.
[0016] In some embodiments, the molar ratio is exclusively within any of the above ranges of molar ratios, and thus, excludes any molar ratios outside of the range. In some embodiments, any one or more molar ratios or ranges in molar ratios, such as provided above, are excluded. Moreover, the B:N molar ratio may, in some embodiments, be within a range bounded by any molar ratio found in the above first set of embodiments and any molar ratio found in the above second set of embodiments, except that a molar ratio of 1:1 or perhaps a molar ratio in a range of 1:2-2:1 is excluded. For example, the B:N molar ratio may be within a range of 1:4-4:1 or 1:6-6:1, excluding a molar ratio of 1:1 or excluding a molar ratio in a range of 1:2-2:1.
[0017] Typically, the h-BN material contains nanopores, i.e., is nanoporous. The nanopores typically have a size of 0.5-5 nm, or more particularly, a size of 0.5-3 nm or 0.5-2 nm. The foregoing sizes may correspond to lattice interatom distances or the size of defects. The size of vacant site defects may, in some cases, be larger than other nanopores in the material, e.g., 3, 4, 5, 6, 7, or 10 nm or within a range bounded by any two of the foregoing values. The nanopores may have any of a variety of shapes, such as a circular, square, or triangular shape.
[0018] In another aspect, the present disclosure is directed to methods for producing the presently described h-BN material containing vacant site defects as described above. In the method, a molten mixture of NaBH.sub.4 and NaNH.sub.2 is heated under an inert atmosphere to a temperature of at least 700 C., wherein the molar ratio of NaBH.sub.4:NaNH.sub.2 is 1:4-1:8 or 4:1-8:1 or any of the other molar ratios or ranges thereof provided earlier above, excluding a molar ratio of 1:1 or perhaps a ratio in a range of 1:2-2:1. The inert atmosphere is typically substantially devoid of oxygen or any other reactive gas and is typically predominantly or exclusively composed of one or more inert gases, such as nitrogen and/or argon. In various embodiments, the final temperature at which the molten mixture is heated is precisely or about, for example, 700 C., 725 C., 750 C., 775 C., 800 C., 825 C., 850 C., 875 C., or 900 C., or the temperature is within a range bounded by any two of the foregoing values. Typically, the molten mixture is heated at any of the foregoing final temperatures for a period of time, which is typically precisely or at least 0.5 hour, or more typically, precisely or at least 1 hour, 1.5 hours, 2 hours, 2.5 hours, or 3 hours. In some embodiments, the temperature is raised from room temperature to an intermediate temperature (e.g., 400-600 C., 450-550 C., or about 500 C.) at which the molten mixture is maintained for precisely or at least 0.5, 1, or 1.5 hours, followed by raising the temperature, typically at a ramp rate (e.g., precisely, at least, or up to 1, 2, 5, or 10 C./min) to the final temperature of precisely or about, for example, 700 C., 725 C., 750 C., 775 C., 800 C., 825 C., 850 C., 875 C., or 900 C. Typically, the resulting solid material is washed with deionized water to remove sodium-containing byproduct e.g., NaH. Following the washing step, the solid material is typically dried (typically at a temperature of at least 50 C. and up to 150 C.) for at least 3, 6, 9, or 12 hours.
[0019] In a first set of embodiments, the NaBH.sub.4:NaNH.sub.2 molar ratio is within a range of 1:4-1:8. The NaBH.sub.4:NaNH.sub.2 molar ratio may more particularly be precisely or about, for example, 1:4, 1:5, 1:6, 1:7, or 1:8, or a range bounded by any two of these values, e.g., 1:4-1:8, 1:4-1:7, 1:4-1:6, 1:4-1:5, 1:5-1:8, 1:5-1:7, 1:5-1:6, 1:6-1:8, 1:6-1:7, or 1:7-1:8.
[0020] In a second set of embodiments, the NaBH.sub.4:NaNH.sub.2 molar ratio is within a range of 4:1 to 8:1. The NaBH.sub.4:NaNH.sub.2 molar ratio may more particularly be precisely or about, for example, 4:1, 5:1, 6:1, 7:1, or 8:1, or a range bounded by any two of these values, e.g., 4:1-8:1, 4:1-7:1, 4:1-6:1, 4:1-5:1, 5:1-8:1, 5:1-7:1, 5:1-6:1, 6:1-8:1, 6:1-7:1, or 7:1-8:1.
[0021] In some embodiments, the NaBH.sub.4:NaNH.sub.2 molar ratio is exclusively within any of the above ranges of molar ratios, and thus, excludes any molar ratios outside of the range. In some embodiments, any one or more molar ratios or ranges in molar ratios, such as provided above, are excluded. Moreover, the NaBH.sub.4:NaNH.sub.2 molar ratio may, in some embodiments, be within a range bounded by any molar ratio found in the above first set of embodiments and any molar ratio found in the above second set of embodiments, except that a molar ratio of 1:1 or perhaps a molar ratio in a range of 1:2-2:1 is excluded. For example, the NaBH.sub.4:NaNH.sub.2 molar ratio may be within a range of 1:4-4:1 or 1:6-6:1, excluding a molar ratio of 1:1 or excluding a molar ratio in a range of 1:2-2:1.
[0022] In another aspect, the present disclosure is directed to a method of catalytically hydrogenating an unsaturated organic compound by use of the above described h-BN catalyst containing a substantial amount of defects. The unsaturated organic compound may be, for example, an olefin, alkyne, unsaturated oil, aromatic, ketone, aldehyde, imine, nitrile, ester, or carboxylic acid. The reaction temperature is typically at least 80 C. and up to 300 C. In various embodiments, the reaction temperature may be, for example, precisely or about 80 C., 90 C., 100 C., 110 C., 120 C., 130 C., 140 C., 150 C., 180 C., 200 C., 220 C., 250 C., 280 C., or 300 C., or the temperature is within a range bounded by any two of the foregoing values (e.g., 80 C.-200 C. or 80 C.-150 C.). The h-BN catalyst may have any of the B:N molar ratios described above, such as 1:4-1:8, 4:1-8:1, 1:5:1:7, or 5:1-7:1 or any of the other specific values or sub-ranges provided earlier above.
[0023] Examples have been set forth below for the purpose of illustration and to describe certain specific embodiments of the invention. However, the scope of this invention is not to be in any way limited by the examples set forth herein.
Examples
Overview
[0024] In this work, H.sub.2 activation and dissociation catalyzed by h-BN was achieved by incorporating into the h-BN lattice sterically-hindered vacant defect Lewis acid (B center) and Lewis base (N center) sites anchored within the rigid lattice of the h-BN scaffold. The concept is schematically shown in
[0025] In the molten salts-involved ionothermal procedure, equimolar NaBH.sub.4 and NaNH.sub.2 reactants were employed as boron and nitrogen sources, respectively. Theoretically, varying the ratio of the starting materials, e.g., by adding more boron source (NaBH.sub.4) or nitrogen source (NaNH.sub.2), will generate h-BNs with diverse defects within the lattice, thus creating fixed Lewis acid (B) and base (N) sites with an unsaturated bonding type. To demonstrate this, thermal treatment of the NaBH.sub.4 and NaNH.sub.2 mixtures with various molar ratios, including 1:1, 1:3, 1:5, 1:7, and 1:9, was conducted, and all these batches afforded high-quality h-BN materials denoted as h-BN-1, h-BN-2, h-BN-3, h-BN-4, and h-BN-5, respectively. Near-edge X-ray absorption fine structure (NEXAFS) spectra of the as-afforded h-BNs demonstrated the successful introduction of B and N defects within the h-BN scaffolds with controllable types and ratios. Results for h-BN-1, h-BN-4, and h-BN-5 are shown in
[0026] Results of powder X-ray diffraction (PXRD) verified that the atomically periodic architecture of h-BNs matched well with a typical hexagonal structure (JCPDS card no. 01-073-2095) (H. Chen et al., Angew. Chem. Int. Ed., 58 (31), 10626, 2019). The PXRD results for h-BN-1, h-BN-2, h-BN-3, h-BN-4, and h-BN-5 are shown
[0027] The chemical structures of the as-afforded h-BNs were characterized by Fourier transform infrared (FTIR) spectra, as shown in
[0028] To evaluate the H.sub.2 activation potential of these h-BN materials, their surface basicity and acidity properties were measured by temperature programmed desorption (TPD) profiles. As shown in
[0029] To demonstrate the H.sub.2 activation capability of h-BNs and demonstrate their FLP behavior, H/D isotope scrambling experiments were performed using an H.sub.2/D.sub.2 mixture (ca. 1:1 v/v) (1 bar) at 100 C. taking h-BN-4 as an example. The results are shown in
[0030] In situ diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS) of H.sub.2 chemisorption was conducted to study the H-H cleavage capability of h-BN skeletons in h-BN-1, h-BN-4, and h-BN-5. The results are shown in
[0031] Comparatively, for h-BN-4, as the temperature increased, three peaks located at 3430, 3550, and 3687 cm.sup.1 were observed, being assigned to the NH stretching mode (see
[0032] Hydrogenation of styrene was selected as a feature reaction to explore the catalytic performance of defect-containing h-BN.
[0033] The catalytic activity of h-BN materials fabricated by other methods was also tested for styrene hydrogenation ability. Commercial h-BN showed no catalytic activity. The h-BN counterpart prepared from boron trioxide and urea with relatively low crystallinity possessed no ability to activate H.sub.2 under ambient pressure (H. Chen et al., Adv. Funct. Mater., 29 (50), 1906284, 2019). The defects-enriched h-BN nanosheets (h-BNNS) derived from liquid N.sub.2 exfoliation gave no yield of ethylbenzene, underscoring the importance of carefully selecting the defect types by successively varying the feeding ratio of B and N source. TPD profiles of these non-active h-BNs revealed the lack of Lewis acid or base sites within their scaffolds.
[0034] Notably, the excellent H.sub.2 activation performance of h-BN-4 derived herein was further demonstrated by its good reusability, with >99% yield of ethylbenzene being maintained after cycling for five times. An isotope labeling experiment with an H.sub.2/D.sub.2 (molar ratio of 1:1) mixture in styrene hydrogenation afforded ethylbenzene mixtures with molecular weights (MWs) of 106, 107, and 108, corresponding to the involvement of none, one, and two D atoms in the product, respectively. Successful cleavage of the H-H and D-D bond was verified by the ethylbenzene product with MW=107 derived from the addition of H and D atom (see
[0035] In summary, the creation of sterically hindered Lewis acid and base sites in h-BN skeleton was achieved by controlling the feeding ratio of boron and nitrogen sources via the molten salts-derived ionothermal method. The as-afforded h-BNs were able to achieve efficient H.sub.2 activation and dissociation under atmosphere pressure via FLP-like behavior. Attractive performance of the corresponding h-BN in a hydrogenation reaction further elucidated that promising progress has been made in this work to construct high-quality metal-free heterogeneous catalysts towards industrial hydrogenation procedures.
[0036] While there have been shown and described what are at present considered the preferred embodiments of the invention, those skilled in the art may make various changes and modifications which remain within the scope of the invention defined by the appended claims.