PLASMONIC METAL NITRIDE AND TRANSPARENT CONDUCTIVE OXIDE NANOSTRUCTURES FOR PLASMON ASSISTED CATALYSIS

Abstract

A nanostructured material system for efficient collection of photo-excited carriers is provided. They system comprises a plurality of plasmonic metal nitride core material elements coupled to a plurality of semiconductor material elements. The plasmonic nanostructured elements form ohmic junctions at the surface of the semiconductor material or at close proximity with the semiconductor material elements. A nanostructured material system for efficient collection of photo-excited carriers is also provided, comprising a plurality of plasmonic transparent conducting oxide core material elements coupled to a plurality of semiconductor material elements. The field enhancement, local temperature increase and energized hot carriers produced by nanostructures of these plasmonic material systems play enabling roles in various chemical processes. They induce, enhance, or mediate catalytic activities in the neighborhood when excited near the resonance frequencies.

Claims

1. A nanostructured material system for efficient collection of photo-excited carriers, comprising: a plurality of plasmonic metal nitride core material elements coupled to a corresponding plurality of semiconductor material elements.

2. The system of claim 1, wherein the plasmonic nanostructured elements form ohmic junctions at the surface of the semiconductor material elements or at close proximity with the semiconductor material elements.

3. The system of claim 1, wherein the plasmonic metal nitride core material is titanium nitride (TiN).

4. The system of claim 3, wherein the semiconductor is titanium dioxide (TiO.sub.2) or TiO.sub.xN.sub.1-x, where 0<x<1.

5. The system of claim 1, wherein the plasmonic metal nitride core material comprises tantalum nitride (TaN).

6. The system of claim 5, wherein the semiconductor material elements comprise tantalum oxide (Ta.sub.xO.sub.y), wherein x and y>1.

7. The system of claim 6, wherein the semiconductor material elements comprise tantalum pentoxide (Ta.sub.2O.sub.5).

8. The system of claim 5, wherein the semiconductor material elements comprise Ta.sub.3N.sub.5.

9. The system of claim 1, further comprising a substrate upon which the nanostructured elements are mounted on a substrate.

10. The system of claim 8, wherein the nanostructured elements are arranged in an array on the substrate.

11. A nanostructured material system for efficient collection of photo-excited carriers, comprising: a plurality of plasmonic transparent conducting oxide core material elements coupled to a corresponding first plurality of semiconductor material elements.

12. The system of claim 11, wherein the plasmonic transparent conducting oxide core material elements comprise indium tin oxide (ITO).

13. The system of claim 12, wherein the first plurality of semiconductor material elements comprise tin oxide.

14. The system of claim 11, wherein the plasmonic transparent conducting oxide core material elements comprise gallium doped zinc oxide (GZO) or aluminum doped zinc oxide (AZO).

15. The system of claim 14, wherein the first plurality of semiconductor material elements comprise zinc oxide.

16. The system of claim 11, further comprising a substrate upon which the nanostructured elements are mounted on a substrate.

17. The system of claim 11, wherein the nanostructured elements are arranged in an array on the substrate.

18. The system of claim 11, further comprising: a plurality of plasmonic metal nitride core material elements coupled to a corresponding second plurality of semiconductor material elements.

19. The system of claim 18, wherein the plasmonic metal nitride core material elements comprise titanium nitride (TiN).

20. The system of claim 19, wherein the second plurality of semiconductor material elements comprise titanium dioxide (TiO.sub.2) or TiO.sub.xNi.sub.1-x, where 0<x<1.

21. The system of claim 18, wherein the plasmonic metal nitride core material elements comprise tantalum nitride (TaN).

22. A nanostructured material system for efficient catalytic activities supported by local heating and local field enhancement, comprising: a plurality of plasmonic metal nitride nanostructures covered with seed layers and illuminated with resonant light source under precursor flow in a reaction chamber, the see layers comprising.

23. The system of claim 22, wherein the seed layers comprise silicon, silica, silicon germanium, silicon nitride, carbon, or metal.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0008] In the following description and drawings, identical reference numerals have been used, where possible, to designate identical features that are common to the drawings.

[0009] FIG. 1A is a top view diagram showing a plurality of nanostructures arranged on a substrate in preparation for plasmon-assisted chemical vapor deposition with transition metal nitrides as the plasmonic local heater according to one embodiment.

[0010] FIG. 1B is a side view diagram showing a plurality of nanostructures arranged on a substrate in preparation for plasmon-assisted chemical vapor deposition with transition metal nitrides as the plasmonic local heater according to one embodiment.

[0011] FIG. 1C is a side view diagram showing nanostructures arranged on a substrate after plasmon-assisted chemical vapor deposition with transition metal nitrides as the plasmonic local heater according to one embodiment.

[0012] FIG. 2 is a diagram showing plasmonic nanostructures of titanium nitride of spherical and rectangular shapes covered with native oxide according to one embodiment.

[0013] FIG. 3 is a structure for plasmon enhanced catalysis application with a transition metal nitride nanostructure as the plasmonic element according to one embodiment.

[0014] The attached drawings are for purposes of illustration and are not necessarily to scale.

DETAILED DESCRIPTION

[0015] Transition metal nitrides exhibit plasmonic resonances in the visible and near infrared regions and their performance can reach levels comparable to metals when the growth parameters of the materials are optimized. A significant superiority of some transition metal nitrides over metals is that they also exhibit refractory properties, meaning that they are durable materials at high temperatures. Titanium nitride (TiN) and zirconium nitride (ZrN) are two prominent refractory plasmonic transition metal nitrides. In addition to their good plasmonic performance and refractory properties, they also accommodate self-passivating native oxide layers, which can be removed by nitridation or further extended by oxidation.

[0016] According to one embodiment, a chemical vapor deposition (CVD) chemical process is enhanced via local heating and field enhancement through plasmonic resonance when illuminated by a light source 4 as shown in FIG. 1B (side view) and 1C (top view). Precursors may be present in vapor and liquid forms in bulk amounts in a reaction chamber surrounding a substrate 1, which may comprise, for example, magnesium oxide, sapphire, glass, silicon, fused silica, or the like. In cases where precursors are in liquid phase, vaporization may occur due to very high local temperatures near the plasmonic nanostructures 2 arrayed on a substrate 1 as shown in FIG. 1A, where a CVD growth layer 5 is initialized by a seed layer 3 as shown in FIG. 1C. The material composition of the seed layer 3 may comprise, for example, silicon, silica, silicon germanium, silicon nitride, carbon (including nanotubes, graphene, and diamond), or certain metals such as tungsten, however other seed layer materials may be used depending on the desired properties of the growth layer 5. Vacuum requirements of the growth chamber may be relaxed when the growth occurs in the bulk liquid precursor. In cases where precursors are in vapor phase, the chamber pressure may be atmospheric or any levels of vacuum down to 10.sup.8 torr.

[0017] As shown in FIG. 2, titanium nitride nanoparticles 6 absorb light in the visible and near infrared regions of the electromagnetic spectrum with efficiencies comparable to gold. Furthermore, the absorption peak of TiN nanoparticles is broader. This enables larger overall absorption and in return higher hot carrier generation. In addition, TiN forms an ohmic junction with TiO.sub.2 (layer 7, FIG. 2), which is a benchmark photocatalyst, thereby enabling higher efficient plasmon-enhanced hot electron collection that can be utilized in applications such as solar harvesting and photodetection. Catalytic nanoparticles 8 may also be deposited on the surface of the TiO2 layer. The nanoparticles 8 may be formed from catalytic metals, such as Cu, Pt, Pd or the like. The absence of a barrier in the case of an ohmic junction further enhances the collection of cold electrons due to interband transitions, significantly increasing the overall system efficiency. Similarly, TaN may be used as the nanoparticle 6 and paired with its semiconducting polymorph Ta.sub.3N.sub.5 or oxide (e.g., Ta.sub.2O.sub.5) as the layer 7. This approach may be further extended to other plasmonic materials, which have a Fermi level inside the conduction band, i. e. doped transparent conductive oxides, such as aluminum doped zinc oxide (AZO), gallium doped zinc oxide (GZO), or indium tin oxide (ITO), which are plasmonic in the near and mid-infrared ranges. In such cases, the core material is the doped transparent conductive oxide, and the surrounding semiconducting element is the corresponding semiconducting non-doped oxide (e.g., zinc oxide or tin oxide).

[0018] The formation of efficient junctions involving plasmonic transition metal nitrides and doped transparent conductive oxides can be generalized to the use of other common semiconductor used in solar energy conversion such as Si, -Fe.sub.2O.sub.3, and 2D transition metal dichalcogenides.

[0019] According to one embodiment, refractory transition metal nitrides form the core of a structure for plasmon-assisted catalysis such as biomass conversion, (photo) steam reforming, and carbon dioxide photoreduction, where the hot carriers generated from surface plasmon decay decrease the transition state energy of a certain chemical reaction and/or decrease the catalyst deactivation due to side effects such as coke formation, surface reconstruction, and metal passivation. As shown in FIG. 3, the structure may include the use of an inorganic nanocrystal 9 (e.g., TiO.sub.2, Al.sub.2O.sub.3) as a support substrate material; plasmonic transition metal nitride nanoparticles 10 deposited on the facets of the support substrate; a catalytic metallic shell 11 formed from Cu, Pt, or Pd that covers the nanoparticles 10 providing thermal and chemical protection to the nanoparticles 10.

[0020] The invention is inclusive of combinations of the aspects described herein. References to a particular aspect and the like refer to features that are present in at least one aspect of the invention. Separate references to an aspect (or embodiment) or particular aspects or the like do not necessarily refer to the same aspect or aspects; however, such aspects are not mutually exclusive, unless so indicated or as are readily apparent to one of skill in the art. The use of singular or plural in referring to method or methods and the like is not limiting. The word or is used in this disclosure in a non-exclusive sense, unless otherwise explicitly noted.

[0021] The invention has been described in detail with particular reference to certain preferred aspects thereof, but it will be understood that variations, combinations, and modifications can be effected by a person of ordinary skill in the art within the spirit and scope of the invention.