Radiation-emitting optoelectronic device
09859473 · 2018-01-02
Assignee
Inventors
Cpc classification
H01L2224/8592
ELECTRICITY
H01L2224/48472
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2924/00
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L25/167
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2924/00
ELECTRICITY
H01L2224/48472
ELECTRICITY
International classification
G01J5/20
PHYSICS
H01L25/16
ELECTRICITY
Abstract
A radiation-emitting optoelectronic device is provided. The radiation-emitting optoelectronic device includes a semiconductor chip that, when the device is in operation, emits primary radiation of a wavelength of between 600 nm and 1000 nm. A conversion element includes a conversion material comprising ions of one or more metals selected from a group comprising La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Cr, Pb and Mg. The conversion material converts the primary radiation emitted by the semiconductor chip virtually completely into secondary radiation of a wavelength of between 1000 nm and 6000 nm.
Claims
1. A radiation-emitting optoelectronic device comprising: a semiconductor chip configured to emit primary radiation of a wavelength of between 800 nm and 1000 nm when the device is in operation; and a conversion element that comprises a conversion material comprising a host material and ions of at least one metal selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and Cr, wherein the host material with the ions form a compound of a formula, the formula being one of (A,B).sub.3X.sub.5O.sub.12, (A,B).sub.2X*.sub.3O.sub.12, C.sub.3(A,B).sub.2Z.sub.3O.sub.12, C.sub.3(A,B).sub.2Z*.sub.6O.sub.24 and (A,B).sub.3X.sub.5N.sub.8, wherein: A=Fe.sup.3+, Cr.sup.3+, V.sup.3+, Ti.sup.3+, Sc.sup.3+, Lu.sup.3+ or Y.sup.3+; B is a trivalent cation of a metal selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu and Cr; C=Mg.sup.2+, Fe.sup.2+, Mn.sup.2+, Pb.sup.2+ or Ca.sup.2+; X=Al.sup.3+ or B.sup.3+; X*=W.sup.6+; Z=Si.sup.4+ or Ti.sup.4+; and Z*=W.sup.6+, and wherein the conversion material is configured to convert the primary radiation emitted by the semiconductor chip with a conversion over 95% into secondary radiation of a wavelength of between woo nm and 6000 nm when the device is in operation.
2. The radiation-emitting optoelectronic device according to claim 1, wherein B=Ho.sup.3+ or Tm.sup.3+.
3. The radiation-emitting optoelectronic device according to claim 1, wherein the conversion element comprises a sensitizer that is excited by the emitted primary radiation when the device is in operation, wherein an exciton is excited from a basic state to a higher energy level, the exciton is transferred to the conversion material and the conversion material emits a secondary radiation of a wavelength of between 1000 nm and 6000 nm.
4. The radiation-emitting optoelectronic device according to claim 1, wherein the conversion element is part of a potting compound of the semiconductor chip.
5. The radiation-emitting optoelectronic device according to claim 1, wherein the conversion element forms a potting compound.
6. The radiation-emitting optoelectronic device according to claim 1, wherein the conversion element takes the form of a layer that is in direct contact with the semiconductor chip.
7. A gas sensor comprising: a radiation-emitting optoelectronic device according to claim 1, a detector configured to detect radiation; and a gas chamber arranged between the radiation-emitting optoelectronic device and the detector, wherein the radiation detected by the detector is at least one of the primary radiation and secondary radiation emitted by the radiation-emitting optoelectronic device and then passed through the gas chamber.
8. A method of producing a radiation-emitting optoelectronic device, the method comprising: providing a semiconductor chip configured to emit primary radiation of a wavelength of between 800 nm and 1000 nm; and applying a conversion element over the semiconductor chip, the conversion element comprising a conversion material comprising a host material and ions of at least one metal selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and Cr, wherein the host material with the ions form a compound of a formula, the formula being one of (A,B).sub.3X.sub.5O.sub.12, (A,B).sub.2X*.sub.3O.sub.12, C.sub.3(A,B).sub.2Z.sub.3O.sub.12, C.sub.3(A,B).sub.2Z*.sub.6O.sub.24 and (A,B).sub.3X.sub.5N.sub.8, wherein: A=Fe.sup.3+, Cr.sup.3+, V.sup.3+, Ti.sup.3+, Sc.sup.3+, Lu.sup.3+ or Y.sup.3+; B is a trivalent cation of a metal selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu and Cr; C=Mg.sup.2+, Fe.sup.2+, Mn.sup.2+, Pb.sup.2+ or Ca.sup.2+; X=Al.sup.3+ or B.sup.3+; X*=W.sup.6+; Z=Si.sup.4+ or Ti.sup.4+; and Z*=W.sup.6+, and wherein the conversion material configured to convert the primary radiation emitted by the semiconductor chip with a conversion over 95% into secondary radiation of a wavelength of between 1000 nm and 6000 nm.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) Further advantageous embodiments and further developments of the invention are revealed by the exemplary embodiments described below in connection with the figures.
(2)
(3) Identical, similar or identically acting elements are provided with identical reference numerals in the figures. The figures and the size ratios of the elements illustrated in the figures relative to one another are not to be regarded as being to scale. Rather, individual elements may be illustrated on an exaggeratedly large scale for greater ease of depiction and/or better comprehension.
DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS
(4) The exemplary embodiment shown in
(5) The semiconductor chip 2 is mounted by means of an electrically conductive bonding agent with the back surface contact 15 on a first terminal 4. The electrically conductive bonding agent used is, for example, a metallic solder or an adhesive. The front surface contact 16 is bonded to a second electrical terminal 5 by means of a bonding wire 17.
(6) In the exemplary embodiment shown in
(7) In the exemplary embodiment of
(8) A further exemplary embodiment of a radiation-emitting optoelectronic device described here is described in connection with
(9) The conversion element 6 is applied directly onto the semiconductor chip 2. The semiconductor chip 2 and at least sub-regions of the electrical terminals 4, 5 are enclosed by a radiation-transmissive enclosure 13, which does not bring about any change in wavelength or frequency in the radiation passing through the conversion element 6. The radiation-transmissive enclosure may, for example, consist of at least one of the following materials and/or contain at least one of the following materials: silicone, epoxide, polyurethane or glass.
(10) In the exemplary embodiment shown in
(11) The recess 11 of
(12) For better outcoupling of the light out of the conversion element 6 of
(13) The description made with reference to exemplary embodiments does not restrict the invention to these embodiments. Rather, the invention encompasses any novel feature and any combination of features, including in particular any combination of features in the claims, even if this feature or this combination is not itself explicitly indicated in the claims or exemplary embodiments.