An object of the present disclosure is to provide a trench gate type power semiconductor device that does not easily break even when stress is applied. A SiC-MOSFET includes a SiC substrate, a drift layer of a first conductive type, formed on the SiC substrate, a base region of a second conductivity type formed in a surface layer of the drift layer, a source region of the first conductivity type selectively formed in a surface layer of the base region, a trench extending through the base region and the source region and reaching the drift layer, a gate electrode embedded in the trench and having a V-shaped groove on an upper surface thereof, and an oxide film formed on an upper surface including the groove of the gate electrode, in which a bottom of the V-shape groove is deeper than the base region.

An object of the present disclosure is to provide a trench gate type power semiconductor device that does not easily break even when stress is applied. A SiC-MOSFET includes a SiC substrate, a drift layer of a first conductive type, formed on the SiC substrate, a base region of a second conductivity type formed in a surface layer of the drift layer, a source region of the first conductivity type selectively formed in a surface layer of the base region, a trench extending through the base region and the source region and reaching the drift layer, a gate electrode embedded in the trench and having a V-shaped groove on an upper surface thereof, and an oxide film formed on an upper surface including the groove of the gate electrode, in which a bottom of the V-shape groove is deeper than the base region.

A radio frequency amplifier includes a first input terminal, a second input terminal, an output terminal, and first and second amplifiers. The first amplifier includes a first amplifier input coupled to the first input terminal, and a first amplifier output. The second amplifier includes a second amplifier input coupled to the second input terminal, and a second amplifier output coupled to the output terminal by an output inductive element. An output combiner circuit is coupled between the first amplifier output and the second amplifier output. The output combiner circuit includes a first inductive element, a capacitor, and a second inductive element. The first inductive element is coupled between the first amplifier output and a first terminal of the capacitor, and the second inductive element is coupled between the second amplifier output and the first terminal of the capacitor. A second terminal of the capacitor is coupled to ground.

A semiconductor device includes a substrate, a conductive part, a controller module and a sealing resin. The substrate has a substrate obverse surface and a substrate reverse surface facing away from each other in a z direction. The conductive part is made of an electrically conductive material on the substrate obverse surface. The controller module is disposed on the substrate obverse surface and electrically connected to the conductive part. The sealing resin covers the controller module and at least a portion of the substrate. The conductive part includes an overlapping wiring trace having an overlapping portion overlapping with the electronic component as viewed in the z direction. The overlapping portion of the overlapping wiring trace is not electrically bonded to the controller module.

Provided is a metal component that is configured to be used for manufacturing a semiconductor device, the metal component including: a substrate having a conductivity; and a noble metal plating layer formed on all or part of a surface of the substrate, wherein the noble metal plating layer has a surface with irregularities, and a protrusion of the irregularities has an aspect ratio of 0.3 or more.

Provided is a metal component that is configured to be used for manufacturing a semiconductor device, the metal component including: a substrate having a conductivity; and a noble metal plating layer formed on all or part of a surface of the substrate, wherein the noble metal plating layer has a surface with irregularities, and a protrusion of the irregularities has an aspect ratio of 0.3 or more.

The present invention provides a QFN packaging structure and QFN packaging method. The electromagnetic shielding layer as provided on the outer side of the QFN packaging structure by spacing at a certain interval from the leads may cooperate with the base island having the lug boss on the side edge, such that all surfaces of the chip can be electromagnetically shielded and protected while ensuring the insulation between the electromagnetic shielding layer and the leads.

The present invention provides a QFN packaging structure and QFN packaging method. The electromagnetic shielding layer as provided on the outer side of the QFN packaging structure by spacing at a certain interval from the leads may cooperate with the base island having the lug boss on the side edge, such that all surfaces of the chip can be electromagnetically shielded and protected while ensuring the insulation between the electromagnetic shielding layer and the leads.

An electronic device comprises a semiconductor die, a layer stack disposed on the semiconductor die and comprising one or more functional layers, wherein the layer stack comprises a protection layer which is an outermost functional layer of the layer stack, and a sacrificial layer disposed on the protection layer, wherein the sacrificial layer comprises a material which decomposes or becomes volatile at a temperature between 100° and 400° C.

A semiconductor package includes a base substrate; an interposer substrate including a semiconductor substrate having a first surface facing the base substrate and a second surface, opposing the first surface, and a passivation layer on at least a portion of the first surface; a plurality of connection bumps between the base substrate and the interposer substrate; an underfill resin in a space between the base substrate and the interposer substrate; and a first semiconductor chip and a second semiconductor chip on the interposer substrate. The interposer substrate has a first region, in which the plurality of connection bumps are included, and a second region and a third region adjacent a periphery of the first region, and the passivation layer is in the second region and includes a first embossed pattern in the second region.