MIMCAP STRUCTURE IN A SEMICONDUCTOR DEVICE PACKAGE

Abstract

The disclosed technology relates generally to a semiconductor device package comprising a metal-insulator-metal capacitor (MIMCAP). In one aspect, the MIMCAP comprises portions of a first and second metallization layers in a stack of metallization layers, e.g., copper metallization layers formed by single damascene processes. The MIMCAP comprises a bottom plate formed in the first metallization layer, a first conductive layer on and in electrical contact with the bottom plate, a dielectric layer on and in contact with the first conductive layer, a second conductive layer on and in contact with the dielectric layer, and a top plate formed in the second metallization layer, on and in electrical contact with the second metal plate. The electrical contacts to the bottom and top plates of the MIMCAP formed in the first and second metallization layer are thereby established without forming separate vias between the plates and the metallization layers. In addition, the first conductive layer of the MIMCAP may extend beyond the surface of the dielectric and the second layer for forming other structures.

Claims

1. An interposer substrate configured to electrically connect to one or more semiconductor devices in a semiconductor device package, the interposer substrate comprising: a plurality of interconnected metallization layers including a lower metallization layer and an upper metallization layer that are vertically adjacent metallization layers, at least portions of the upper and lower layers forming parts of a metal-insulator-metal capacitor (MIMCAP), wherein the MIMCAP comprises: a conductive bottom plate which forms a first part of the lower metallization layer, a first conductive layer, at least a portion of which is formed on the bottom plate, a dielectric layer on and in contact with the first conductive layer, a second conductive layer on and in contact with the dielectric layer, wherein the first conductive layer comprises a portion laterally extending beyond an area covered by the dielectric layer and the second conductive layer, and a conductive top plate which forms a first part of the upper metallization layer, the top plate formed on the second conductive layer; and a conductive via which forms a second part of the upper metallization layer and vertically extends therefrom to contact the portion of the first conductive layer.

2. The interposer substrate of claim 1, wherein the second conductive layer is surrounded by a ring structure coplanar with the second conductive layer.

3. The interposer substrate of claim 2, wherein the top plate contacts the second conductive layer without contacting the coplanar ring structure.

4. The interposer substrate of claim 1, wherein the bottom plate directly contacts the lower metallization layer.

5. The interposer substrate of claim 1, wherein the top plate directly contacts the upper metallization layer.

6. The interposer substrate of claim 1, wherein the MIMCAP is formed at a first area of the interposer substrate, the interposer substrate further comprising a second area having formed therein an inductor structure comprising a patterned conductive structure which forms a second part of the lower metallization layer.

7. The interposer substrate of claim 6, wherein the inductor structure further comprises a patterned conductive layer that is coplanar with and formed of the same material as the first conductive layer, the patterned conductive layer being in contact with the patterned conductive structure.

8. The interposer substrate of claim 7, further comprising a second via vertically extending to electrically contact the patterned conductive layer, the second via forming a third part of the upper metallization layer.

9. A method of fabricating an interposer substrate configured to electrically connect to one or more semiconductor devices in a semiconductor device package, the method comprising: forming a plurality of interconnected metallization layers including a lower metallization layer and an upper metallization layer that are vertically adjacent metallization layers, forming a metal-insulator-metal capacitor (MIMCAP) comprising portions of the upper and lower metallization layers, forming the MIMCAP comprising: patterning to form the lower metallization layer comprising a conductive bottom plate, forming a first conductive layer, at least a portion of which is formed on the bottom plate, forming a dielectric layer on and in contact with the first conductive layer, forming a second conductive layer on and in contact with the dielectric layer, wherein forming the first conductive layer comprises forming a portion laterally extending beyond an area covered by the dielectric layer and the second conductive layer, and patterning to form the upper metallization layer comprising a conductive top plate on the second conductive layer; and forming a conductive via which forms another part of the upper metallization layer and vertically extends therefrom to contact the portion of the first conductive layer.

10. The method of claim 9, further comprising surrounding the second conductive layer with a ring structure coplanar with the second conductive layer.

11. The method of claim 10, wherein the second conductive layer and the coplanar ring structure are patterned simultaneously.

12. The method of claim 11, wherein forming the portion of the first conductive layer comprises selectively etching a portion of the dielectric layer and a portion of the second conductive layer and stopping to expose the portion of the first conductive layer.

13. The method of claim 12, wherein forming the upper metallization layer and forming the lower metallization comprise patterning by a copper damascene process.

14. The method of claim 13, wherein patterning by the damascene process comprises forming a dielectric layer over the portion of the first conductive layer, etching a portion of the dielectric layer and stopping on the portion of the first conductive layer, such that the conductive bottom plate is not exposed during etching the portion of the dielectric layer.

15. The method of claim 9, wherein the MIMCAP is formed at a first area of the interposer substrate, the method further comprising forming in a second area an inductor structure comprising a patterned conductive structure which forms another part of the lower metallization layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0024] FIGS. 1a to 1g illustrate a method of fabricating a MIMCAP structure according to one embodiment.

[0025] FIGS. 2a to 2e illustrate a method of fabricating a MIMCAP structure according to another embodiment.

[0026] FIGS. 3a to 3c illustrate a method of fabricating a MIMCAP according to another embodiment.

[0027] FIGS. 4a and 4b illustrate a device structure according to one embodiment.

[0028] FIGS. 5a and 5b illustrate a resistor device that can be fabricated together with a MIMCAP according to one embodiment.

DETAILED DESCRIPTION OF CERTAIN ILLUSTRATIVE EMBODIMENTS

[0029] As used herein, a metallization layer refers to a layer or a stack of layers including a dielectric material and a pattern of electrically conductive material embedded in the layer or the stack of layers including the dielectric material. Subsequent metallization layers in the stack are isolated from each other except through vertical connections between the electrically conductive material.

[0030] As used herein, a patterning process refers to a fabrication process in which portions of a layer are removed by etching away the portions while the remainder of the layer is protected by an etch mask, leaving a pattern formed by the remaining parts of the layer. The patterning may take place by known photolithography techniques involving a resist layer, or by hard mask techniques, equally known in the art.

[0031] FIGS. 1a-1g illustrate a method of fabricating a MIMCAP according to one embodiment. In the illustrated embodiment, the MIMCAP is formed between two copper metallization layers produced on a substrate. The substrate may for example be an active or passive interposer substrate onto which various integrated circuit chips are to be assembled. FIG. 1a shows a base substrate 1, provided with an isolation layer 2 over the substrate. In some embodiments, the base substrate 1 comprises silicon and the isolation layer 2 comprises a layer formed of, for example, silicon oxide, silicon nitride, silicon carbide or a combination (e.g. a stack) of two or three of these materials. Alternatively, in other embodiments, the substrate may comprise a glass substrate (i.e. instead of the combined Si+isolation layer).

[0032] On the substrate 1, a first metallization layer M1 is provided, which can be formed, for example, by a damascene process as known in the art. A first layer 3 of inter-metal dielectric (IMD) is deposited, and patterned by a patterning step as defined above, to form openings and/or trenches, which can then be lined with a barrier layer for preventing Cu-diffusion into the IMD combined with a copper seed deposited by a suitable deposition technique (such as physical or chemical vapour depositionPVD or CVD), as known in the art. After that, copper is plated (using electrochemical deposition ECD) to fill openings and/or trenches. The copper which has been plated not only in the openings and trenches but also on top of the IMD, is planarized by a CMP (Chemical Mechanical Polishing) process, which leads to the result shown in FIG. 1b. The barrier layer is not shown in this drawing for clarity. In the disclosed method, the first metallization layer M1 thus obtained comprises at least one plate 4 which is to form the bottom plate of the MIMCAP. This may be a rectangular plate for example. The bottom plate 4 is preferably provided with perforations (not shown) filled with dielectric, which serve to maintain flatness of the bottom plate during CMP. The perforations are obtained as non-etched IMD portions during the IMD patterning step, onto which the copper is deposited, the copper filling the spaces between the IMD portions.

[0033] By way of an example, three additional copper structures 5 are shown, which can include, for example, conductors running along a pre-defined pattern in the first metallization layer M1. Then a stack of three layers (6, 7, 8) is deposited on the planarized surface (FIG. 1c), for example by PVD deposition processes, including a first electrically conductive layer 6, a dielectric layer 7 and a second electrically conductive layer 8. In the rest of this description and in the claims, these electrically conductive layers 6 and 8 will be referred to as conductive layers for reasons of conciseness. The conductive layers may be formed of metal layers or layers of conductive materials, e.g, TiN or TaN. The stack of layers 6/7/8 is then patterned, to form a MIM-stack 9 (FIG. 1d), which covers at least a portion of the bottom plate 4. This is followed by the deposition of a further IMD layer 10 (FIG. 1e), which is patterned to form at least one opening 11 on top of the MIM-stack, as well as vias 12 towards some of the structures 5 (FIG. 1f). By another damascene process, the openings are filled with copper and planarized, resulting in the second metallization layer M2, comprising the top plate 13 (which can be perforated as described above for the first metallization layer M1, for maintaining flatness), in contact with the second conductive layer 8 of the MIM-stack (FIG. 1g), as well as via connections 14 for connecting the structures 5 with a further metallization layer. The final MIMCAP-structure 50 comprises a portion of the bottom plate 4, the first conductive layer 6, the dielectric layer 7, the second conductive layer 8 and the top plate 13.

[0034] In embodiments of the method described herein, no via connections are formed towards the top or bottom plate of the MIMCAP. According to embodiments, the MIMCAP includes the bottom plate 4, the first conductive layer 6 in contact with the bottom plate 4, the dielectric layer 7 in contact with the first conductive layer 6, the second conductive layer 8 in contact with the dielectric layer 7, and the top plate 13 in contact with the second conductive layer, wherein the bottom plate is part of a first metallization layer and the top plate is part of a second metallization layer in a metallization stack coupled between one or more semiconductor devices and an external power source.

[0035] According one embodiment, the formation of the MIM-stack 9 takes place by multiple patterning processes, wherein in the first patterning step, the first conductive layer 6 remains intact on the surface of the planarized first metallization layer Ml, while the dielectric 7 and the second conductive layer 8 are patterned to form a stack of these two layers covering at least a portion of the bottom plate 4. After that, a second patterning step is performed to pattern the first conductive layer 6 and possibly the second conductive layer 8 simultaneously. In this way, the first conductive layer can be used to form additional structures within the first metallization layer M1.

[0036] This embodiment is illustrated in FIGS. 2a-2e. FIG. 2a shows the stage where the stack of layers 6/7/8 described in relation to FIG. 1, has been deposited on the planarized first metallization layer M1. The structures 15 comprise a part of an inductor pattern in the first metallization layer M1, while the MIM-stack also extends over a portion 3 of the IMD 3 of M1, with no metal present in the portion. FIG. 2b shows the result of a first patterning step wherein only the dielectric layer 7 and the second conductive layer 8 are patterned to form a MIM-stack 9 which covers at least a portion of the bottom plate 4. The MIM-stack 9 comprises the remainder of the dielectric layer 7, the second conductive layer 8 and a portion of the first conductive layer 6, where the first conductive layer 6 remains intact on the surface of the first metallization layer M1. That is, etching of layers 7 and 8 stops on the first conductive layer 6, for example, by choosing an etchant having a suitable selectivity between etch rates of the first conductive layer 6 and the dielectric layer 7.

[0037] In a second patterning step, the first conductive layer 6 is patterned, as shown in FIG. 2c. Portions 20 and 21 of the layer 6 to the left and right of the MIM stack remain. Furthermore, a portion 22 above the inductor structure 15 and covering the entire inductor structure remains as well. Finally, a rectangular portion 23 remains on the portion 10 of the IMD. These portions 20 to 23 of the first conductive layer 6 can now serve as additional structural elements in the metallization layout. Deposition and patterning of the second metallization layer M2 results in the view of FIG. 2d, once again with the top copper plate 24 on and in contact with the second conductive layer 8 of the MIM-stack. A via 25 is produced for contacting the first conductive layer 6 and thus the bottom plate 4 from the second metallization layer M2. Vias 26 are provided for contacting the inductor 15, while rectangular vias 27, as seen in the top view of FIG. 2e, are produced for connecting the rectangular portion 23 of the first conductive layer to the second metallization layer M2. In this way, the rectangular portion 23 may be integrated as a resistor in the circuit defined within the second metallization layer M2.

[0038] The function of the inductor shaped portion 22 of layer 6 and of the portion 21 to the right of the MIMCAP (contacted by via 25) is to provide a possible advantage in the processing of the M1 and M2 layers. When etching the vias 25 and 26 for example, the etching stops on the first conductive layer 6 (e.g. a TaN layer), and not on the Cu. Stopping on a Cu layer can lead to contamination of the etching chamber, which complicates the process. The presence of the first conductive layer 6 makes it possible to avoid those complications (by patterning the portion 22) at least during processing of the M1 and M2 layers, which is particularly advantageous given the high copper density of the layers M1 and M2. So even though the invention is not limited (as seen in FIG. 1 for example) to the embodiment wherein portions of the first conductive layer 6 remain on inductors and/or other structures in the M1 layer, the invention does represent a considerable advantage in providing this possibility.

[0039] In some embodiments, the patterned portion 22 of layer 6 can also serve as at least a part of an inductor (i.e. without the inductor pattern 15 in the M1 layer). In some embodiments, the patterned layer 22 can serve as a stand-alone inductor without the inductor pattern 14, in circumstances where the thickness of the inductor pattern 22 is sufficient for serving as a workable inductor. In general, the patterned portions of the first conductive layer 6 may serve as contact portions for structures (such as inductor 15) in one of the metallization layers M1/M2 or the portions may themselves play the part of circuit elements in the metallization layers (such as the resistor 23, or theoretically, the inductor pattern 22).

[0040] In a still further embodiment, the patterning process for patterning the first conductive layer 6 serves also to pattern portions of the second conductive layer 8 that forms the top layer of the MIM stack 9. According to an embodiment illustrated in FIGS. 3a-3c, this patterning is to the effect that a ring structure 30 (not necessarily circular-shaped) is formed surrounding a central portion 31 of the top conductive layer 8, in the plane of the MIMCAP. The top copper plate 24 then only contacts the central portion 31. The ring portion 30 serves to prevent possible shorting between the top and bottom electrodes at the edge of the capacitor. The structure of the MIMCAP of the invention, and its fabrication method allows formation of such a protective ring 30 simultaneously with the patterning of the first conductive layer 6, and thus provides an economic way of producing complex structures.

[0041] According to another embodiment, the first conductive layer 6 remains intact after a first patterning process, as in the embodiments of FIGS. 2 and 3, however, unlike in the embodiments of FIGS. 2 and 3, but in the second patterning process, it is only the second conductive layer 8 which is further patterned, for example to form a ring structure 30, while the first conductive layer 6 still remains intact. Example structures fabricated by this embodiment is illustrated in FIGS. 4a and 4b. In these embodiments, there is no separate process of processing a separate bottom plate having dimensions that are in the same order of magnitude as the top plate 13 or 24. The bottom plate of the MIMCAP is a portion of a larger metal layer in the M1-layer.

[0042] According to an embodiment, the process of patterning the dielectric layer 7 and the second conductive layer 8 of the MIM-stack, with the first conductive layer 6 remaining intact, does not only take place at the location of the eventual MIMCAP above the bottom plate 4, but similar stacks of portions 7 and 8 formed by patterning the layers 7 and 8 may also remain on other locations. In embodiments illustrated in FIGS. 5a and 5b, additional stacks 40 including the portions 7 and 8 are produced on the resistor portion 23. In some embodiments, the stacks 40 protect a large portion of the resistor metal during the etching of the dielectric 7 in other areas. This therefore allows a better control of the resistance value of the resistor. The stack 40 may be further provided with a connection 28 to the next metallization layer (FIG. 5b).

[0043] In some embodiments, the IMD material may be formed of silicon oxide (SiO.sub.2), a combination of SiO.sub.2 with silicon nitride (Si.sub.3N.sub.4) or a combination of SiO.sub.2 and silicon carbide (SiC). In other embodiments, the IMD may be formed of a low-k material. In some embodiments, the metal material of the metallization comprises copper. In some embodiments, the M1 and M2 layers may have thicknesses according to known practice in the domain of damascene processing, e.g. around 1 micron. In some embodiments, the thickness of the M2 layer may be chosen higher than M1 given that the CMP process will generally take longer as the topography caused by the MIM-stack patterning needs to be removed.

[0044] In some embodiments, the first and second conductive layer 6/8 of the MIM-stack may be formed of, for example, Ta, TaN, Ti, TiN, or other suitable conductive materials. The layers 6, 7 and 8 preferably have the same thickness, e.g. between about 50 nm and about 100 nm. At least the thickness of the first and second conductive layer 6 and 8 is preferably the same, especially in the embodiment of FIG. 2, where both layers are etched in the same etching process.

[0045] In some embodiments, the dielectric layer 7 of the MIM-stack may be formed of, for example, silicon oxide (e.g., SiO.sub.2), silicon nitride (e.g., Si.sub.3N.sub.4), silicon carbide (e.g., SiC), tantalum oxide (e.g., Ta.sub.2O.sub.5), hafnium oxide (e.g., HfO.sub.2), titanium oxide (e.g., TiO.sub.2), an ONO-stack (Oxide-nitride-oxide), or any other suitable dielectric material.

[0046] According to an embodiment, an annealing process can be performed prior to performing a CMP process on the first metallization layer M1. In one embodiment, the annealing temperature is between about 350 C. and about 450 C. The annealing is done to decrease hillocks formation due to stress induced by the subsequent processes (MIM-stack deposition).

[0047] The embodiments disclosed herein can be integrated with existing BEOL process schemes. According to an embodiment, for example, various embodiments of the MIMCAP structures described above can be integrated with an interposer substrate, in particular between the power supply layer the ground layer of such an interposer. This is particularly advantageous due to the large surface that is available for the MIMCAP.

[0048] While the invention has been illustrated and described in detail in the drawings and foregoing description, such illustration and description are to be considered illustrative or exemplary and not restrictive. Other variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed invention, from a study of the drawings, the disclosure and the appended claims. In the claims, the word comprising does not exclude other elements or processes, and the indefinite article a or an does not exclude a plurality. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage. Any reference signs in the claims should not be construed as limiting the scope.

[0049] The foregoing description details certain embodiments of the invention. It will be appreciated, however, that no matter how detailed the foregoing appears in text, the invention may be practiced in many ways, and is therefore not limited to the embodiments disclosed. It should be noted that the use of particular terminology when describing certain features or aspects of the invention should not be taken to imply that the terminology is being re-defined herein to be restricted to include any specific characteristics of the features or aspects of the invention with which that terminology is associated.

[0050] Unless specifically specified, the description of a layer being formed, deposited or produced on another layer or substrate, includes: [0051] the layer being formed, deposited or produced, or formed, deposited or deposited directly on, i.e. in contact with, the other layer/layers and/or the substrate, and [0052] the layer being formed, deposited or produced on one or a stack of intermediate layers between the layer and the other layer and/or the substrate.