Top port multi-part surface mount silicon condenser microphone
09693133 ยท 2017-06-27
Assignee
Inventors
Cpc classification
H01L21/78
ELECTRICITY
B81B7/0038
PERFORMING OPERATIONS; TRANSPORTING
Y10T29/49798
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T29/4908
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T29/49005
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2924/0002
ELECTRICITY
B81B2201/0257
PERFORMING OPERATIONS; TRANSPORTING
H01L23/10
ELECTRICITY
B81C3/00
PERFORMING OPERATIONS; TRANSPORTING
B81B7/0064
PERFORMING OPERATIONS; TRANSPORTING
B81B3/0021
PERFORMING OPERATIONS; TRANSPORTING
H01L2924/0002
ELECTRICITY
B81B7/007
PERFORMING OPERATIONS; TRANSPORTING
H04R2225/49
ELECTRICITY
B81B2207/092
PERFORMING OPERATIONS; TRANSPORTING
H01L2924/00
ELECTRICITY
H04R1/04
ELECTRICITY
H01L2924/00
ELECTRICITY
B81B7/0061
PERFORMING OPERATIONS; TRANSPORTING
B81B7/0058
PERFORMING OPERATIONS; TRANSPORTING
B81C1/00301
PERFORMING OPERATIONS; TRANSPORTING
International classification
H04R1/28
ELECTRICITY
H04R23/00
ELECTRICITY
B81C3/00
PERFORMING OPERATIONS; TRANSPORTING
H01L21/00
ELECTRICITY
H04R31/00
ELECTRICITY
B81B7/00
PERFORMING OPERATIONS; TRANSPORTING
H01L23/10
ELECTRICITY
H04R1/04
ELECTRICITY
B81B3/00
PERFORMING OPERATIONS; TRANSPORTING
H01L21/78
ELECTRICITY
Abstract
A surface mount package for a micro-electro-mechanical system (MEMS) microphone die is disclosed. The surface mount package features a substrate with metal pads for surface mounting the package to a device's printed circuit board and for making electrical connections between the microphone package and the device's circuit board. The surface mount microphone package has a cover, and the MEMS microphone die is substrate-mounted and acoustically coupled to an acoustic port provided in the surface mount package. The substrate and the cover are joined together to form the MEMS microphone, and the substrate and cover cooperate to form an acoustic chamber for the substrate-mounted MEMS microphone die.
Claims
1. A silicon condenser microphone comprising: a rigid rectangle-shaped microphone base adapted for solder reflow surface mounting and having substantially planar top and bottom surfaces, the microphone base comprising: a top portion comprising a first conductive layer with a first non-conductive layer disposed on a lower surface of the first conductive layer, and a second conductive layer disposed on a lower surface of the first non-conductive layer, wherein the first conductive layer is patterned to form a plurality of conductive pads; a bottom portion comprising a third conductive layer with a second non-conductive layer disposed on a lower surface of the second conductive layer, and a fourth conductive layer disposed on a lower surface of the second non-conductive layer, wherein the second and third conductive layers are patterned into electrodes, wherein the fourth conductive layer is pattered to form a plurality of solder pads; a passive electronic material layer disposed between the second and third conductive layers and in electrical contact with the second and third conductive layers; and one or more electrical paths disposed completely within the microphone base, wherein the one or more electrical paths electrically couple one or more of the plurality of conductive pads in the first conductive layer to one or more of the solder pads in the fourth conductive layer; a MEMS microphone die mounted to the top surface of the microphone base and electrically coupled to at least one of the conductive pads in the first conductive layer; and a single-piece rectangular cover, the rectangular cover including an acoustic port, wherein the rectangular cover is formed from a solid material and has a predetermined shape with a top portion and a substantially vertical and continuous sidewall portion that adjoins the top portion at an angle and that completely surrounds and supports the top portion, the sidewall portion having a predetermined height, an exterior sidewall surface, an interior sidewall surface, and an attachment surface, the acoustic port disposed in the top portion of the rectangular cover and passing completely through the rectangular cover, wherein the attachment surface of the sidewall portion of the rectangular cover is aligned with and attached to a peripheral region along each edge of the top surface of the microphone base, and wherein the predetermined height of the sidewall portion of the rectangular cover, the interior sidewall surface of the sidewall portion of the rectangular cover, and an interior surface of the top portion of the rectangular cover, in cooperation with the top surface of the microphone base, provide a protective enclosure for the MEMS microphone die to reduce electromagnetic interference.
2. The silicon condenser microphone of claim 1, wherein the microphone base further comprises a recess disposed therein, and the MEMS microphone die is positioned over the recess.
3. The silicon condenser microphone of claim 1, wherein the microphone base further comprises an internal cavity with an aperture in the top surface of the microphone base, the internal cavity extending longitudinally within the microphone base, and the MEMS microphone die is positioned over the aperture in the top surface of the base layer.
4. The silicon condenser microphone of claim 1, wherein the passive electronic material layer is a resistive material, and is electrically coupled to one or more of the plurality of conductive pads in the first conductive layer or one or more of the solder pads in the fourth conductive layer through one or more of the electrodes formed in the second and third conductive layers.
5. The silicon condenser microphone of claim 1, wherein the passive electronic material layer is a capacitive dielectric material, and is electrically coupled to one or more of the plurality of conductive pads in the first conductive layer or one or more of the solder pads in the fourth conductive layer through one or more of the electrodes formed in the second and third conductive layers.
6. The silicon condenser microphone of claim 1, wherein a passive electrical element formed in the passive electronic material layer filters one or more of an input signal, an output signal, or input power.
7. The silicon condenser microphone of claim 1, wherein the MEMS microphone die is a pressure-equalizing MEMS microphone die.
8. The silicon condenser microphone of claim 1, wherein a diaphragm of the MEMS microphone die defines a front volume and a back volume within the protective enclosure, and the acoustic port disposed in the rectangular cover is acoustically coupled to the diaphragm.
9. The silicon condenser microphone of claim 8, wherein the interface between the attachment surface of the sidewall portion of the rectangular cover and the top surface of the microphone base is sealed to maintain acoustic pressure within the front volume.
10. The silicon condenser microphone of claim 1, wherein the first and second nonconductive layers comprise one or more layers of FR-4 printed circuit board material.
11. A micro-electro-mechanical system (MEMS) microphone, the microphone comprising: a rigid rectangle-shaped microphone base adapted for solder reflow surface mounting and having substantially planar top and bottom surfaces, the microphone base comprising: a top portion comprising a first conductive layer with a first non-conductive layer disposed on a lower surface of the first conductive layer, and a second conductive layer disposed on a lower surface of the first non-conductive layer, wherein the first conductive layer is patterned to form a plurality of conductive pads; a bottom portion comprising a third conductive layer with a second non-conductive layer disposed on a lower surface of the second conductive layer, and a fourth conductive layer disposed on a lower surface of the second non-conductive layer, wherein the second and third conductive layers are patterned into electrodes, wherein the fourth conductive layer is pattered to form a plurality of solder pads; a passive electronic material layer disposed between the second and third conductive layers and in electrical contact with the second and third conductive layers one or more electrical paths disposed completely within the microphone base, wherein the one or more electrical paths electrically couple one or more of the plurality of conductive pads in the first conductive layer to one or more of the solder pads in the fourth conductive layer; and an acoustic port disposed in an interior region of the microphone base layer and passing completely through the microphone base, wherein one of the plurality of flat solder pads in the fourth conductive layer is a metal ring that completely surrounds the acoustic port in the microphone base; a MEMS microphone die mounted to the top surface of the microphone base and electrically coupled to at least one of the conductive pads in the first conductive layer, the MEMS microphone die being disposed directly over the acoustic port in the microphone base; and a single-piece rectangular cover formed from a solid material and having a predetermined shape with a top portion and a substantially vertical and continuous sidewall portion that adjoins the top portion at an angle and that completely surrounds and supports the top portion, the sidewall portion having a predetermined height, an exterior sidewall surface, an interior sidewall surface, and an attachment surface, wherein the attachment surface of the sidewall portion of the rectangular cover is aligned with and attached to a peripheral region along each edge of the top surface of the microphone base, and wherein the predetermined height of the sidewall portion of the rectangular cover, the interior sidewall surface of the sidewall portion of the rectangular cover, and an interior surface of the top portion of the rectangular cover, in cooperation with the top surface of the microphone base, provide a protective enclosure for the MEMS microphone die to reduce electromagnetic interference.
12. The MEMS microphone of claim 11, wherein the passive electronic material layer is a resistive material, and is electrically coupled to one or more of the plurality of conductive pads in the first conductive layer or one or more of the solder pads in the fourth conductive layer through one or more of the electrodes formed in the second and third conductive layers.
13. The MEMS microphone of claim 11, wherein the passive electronic material layer is a capacitive dielectric material, and is electrically coupled to one or more of the plurality of conductive pads in the first conductive layer or one or more of the solder pads in the fourth conductive layer through one or more of the electrodes formed in the second and third conductive layers.
14. The MEMS microphone of claim 11, wherein a passive electrical element formed in the passive electronic material layer filters one or more of an input signal, an output signal, or input power.
15. The MEMS microphone of claim 11, wherein the MEMS microphone die is a pressure-equalizing MEMS microphone die.
16. The MEMS microphone of claim 11, wherein the microphone base further comprises an acoustic material that substantially blocks contaminants from passing through the acoustic port.
17. The MEMS microphone of claim 16, wherein the acoustic material to block environmental contaminants is a film of polymeric material.
18. The MEMS microphone of claim 16, wherein the acoustic material to block environmental contaminants is hydrophobic.
19. The MEMS microphone of claim 11, wherein a diaphragm of the MEMS microphone die defines a front volume and a back volume within the protective enclosure, and the acoustic port disposed in the microphone base of the substrate is acoustically coupled to the front volume.
20. The MEMS microphone of claim 19, wherein the interface between the attachment surface of the sidewall portion of the cover and the peripheral region of the top surface of the microphone base is sealed to maintain acoustic pressure within the back volume.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
(35) While the invention is susceptible of embodiments in many different forms, there is shown in the drawings and will herein be described in detail several possible embodiments of the invention with the understanding that the present disclosure is to be considered as an exemplification of the principles of the invention and is not intended to limit the broad aspect of the invention to the embodiments illustrated.
(36) The present invention is directed to microphone packages. The benefits of the microphone packages disclosed herein over microphone packaging utilizing plastic body/lead frames include the ability to process packages in panel form allowing more units to be formed per operation and at much lower cost. The typical lead frame for a similarly functioning package would contain between 40 and 100 devices connected together. The present disclosure would have approximately 14,000 devices connected together (as a panel). Also, the embodiments disclosed herein require minimal hard-tooling This allows the process to adjust to custom layout requirements without having to redesign mold, lead frame, and trim/form tooling.
(37) Moreover, many of the described embodiments have a better match of thermal coefficients of expansion with the end user's PCB, typically made of FR-4, since the microphone package is also made primarily of FR-4. These embodiments of the invention may also eliminate the need for wire bonding that is required in plastic body/lead frame packages. The footprint is typically smaller than that would be required for a plastic body/lead frame design since the leads may be formed by plating a through-hole in a circuit board to form the pathway to the solder pad. In a typical plastic body/lead frame design, a (gull wing configuration would be used in which the leads widen the overall foot print.
(38) Now, referring to
(39) The back volume 18 may be formed by a number of methods, including controlled depth drilling of an upper surface 19 of the substrate 14 to form a recess over which the transducer 12 is mounted (
(40) The cover 20 is attached for protection and processability. The cover 20 contains an aperture 24 which may contain a sintered metal insert 26 to prevent water, particles and/or light from entering the package and damaging the internal components inside; i.e. semiconductor chips. The aperture 24 is adapted for allowing sound waves to reach the transducer 12. The sintered metal insert 26 will also have certain acoustic properties, e.g. acoustic damping or resistance. The sintered metal insert 26 may therefore be selected such that its acoustic properties enhance the functional capability of the transducer 12 and/or the overall performance of the silicon microphone 10.
(41) Referring to
(42) Another embodiment of a silicon condenser microphone package 40 of the present invention is illustrated in
(43) In the embodiment illustrated, the housing 42 includes a top portion 48 and a bottom portion 50 spaced by a side portion 52. The housing 42 further includes an aperture or acoustic port 54 for receiving an acoustic signal and an inner chamber 56 which is adapted for housing a transducer unit 58, typically a silicon die microphone or a ball grid array package (BGA). The top, bottom, and side portions 48, 50, 52 are electrically connected, for example with a conductive adhesive 60. The conductive adhesive may be provided conveniently in the form of suitably configured sheets of dry adhesive disposed between the top, bottom and side portions 48, 50 and 52. The sheet of dry adhesive may be activated by pressure, heat or other suitable means after the portions are brought together during assembly. Each portion may comprise alternating conductive and non-conductive layers of 44, 46.
(44) The chamber 56 may include an inner lining 61. The inner lining 61 is primarily formed by conductive material. It should be understood that the inner lining may include portions of non-conductive material, as the conductive material may not fully cover the non-conductive material. The inner lining 61 protects the transducer 58 against electromagnetic interference and the like, much like a faraday cage. The inner lining 61 may also be provided by suitable electrically coupling together of the various conductive layers within the top, bottom and side portions 48, 50 and 52 of the housing.
(45) In the various embodiments illustrated in
(46) The environmental barrier layer 62 is generally sealed between layers of the portion, top 48 or bottom 50 in which the acoustic port 54 is formed. For example, the environmental barrier may be secured between layers of conductive material 44 thereby permitting the layers of conductive material 44 to act as a capacitor (with electrodes defined by the metal) that can be used to filter input and output signals or the input power. The environmental barrier layer 62 may further serve as a dielectric protective layer when in contact with the conductive layers 44 in the event that the conductive layers also contain thin film passive devices such as resistors and capacitors.
(47) In addition to protecting the chamber 56 from environmental elements, the barrier layer 62 allows subsequent wet processing, board washing of the external portions of the housing 42, and electrical connection to ground from the walls via thru hole plating. The environmental barrier layer 62 also allows the order of manufacturing steps in the fabrication of the printed circuit board-based package to be modified. This advantage can be used to accommodate different termination styles. For example, a double sided package can be fabricated having a pair of apertures 54 (see
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(61) Alternatively, the sidewalls 74 may be formed by may alternating layers of non-conductive material 46 and conductive material 44, each having a routed window 72 (see
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(70) TABLE-US-00001 TABLE 1 Materials Material Type Component Note 1 0.5/0.5 oz. DST Bottom Portion (Conductive Cu 5 core FR-4 Layers Non-Conductive Layer 1) 2 0.5/0.5 oz. DST Bottom Portion (Conductive Cu 5 core FR-4 Layers 3 and 4; Non-Conductive Layer 2) 3 106 pre-preg For Laminating Material 1 and Material 2 4 0.5/0.5 oz. DST Side Portion Metallized Afterward Cu 40 Core FR-4 5 Bare/0.5 oz. Cu 2 Top Portion (Each Piece Includes core FR-4 (2 1 Conductive and 1 Non- pieces) Conductive Layer) 6 Expanded PTFE Environmental Barrier
(71) TABLE-US-00002 TABLE 2 Processing of Materials (Base Portion Material 1) Step Type Description Note 1 Dry Film Conductive Layers 2 Expose Mask Material 1 Forms Ground Plane (Upper Conductive on Lower Conductive Layer) Layer 3 Develop 4 Etch Cu No Etching on Upper Conductive Layer 5 Strip Dry Film
(72) TABLE-US-00003 TABLE 3 Processing of (Bottom Portion Material 2) Step Type Description Note 1 Dry Film Conductive Layers 2 Expose Mask Material 2 (Upper Forms Ground Conductive Layer) Plane on Upper Conductive Layer 3 Develop 4 Etch Cu No Etching on Upper Conductive Layer 5 Strip Dry Film
(73) TABLE-US-00004 TABLE 4 Processing of Materials 1, 2, and 3 (Form Bottom Portion) Step Type Description Note 1 Laminate Materials 1 and 2 Laminated Using Material 3 2 Drill Thru Drill Bit = 0.025 in. Holes 3 Direct Plates Thru Holes Metallization/ Flash Copper 4 Dry Film (L1 Forms Traces and and L4) Solder Pads 5 Expose Mask Laminated Materials 1 and 2 (Upper and Lower Conductive Layers) 6 Develop 7 Electrolytic Cu 1.0 mil 8 Electrolytic Sn As Required 9 Strip Dry Film 10 Etch Cu 11 Etch Cu 12 Insert Finishing NG Option (See NG Option for Proof of Option Here Table Below) Principle 13 Dry Film 2.5 mil Minimum Thickness on (cover lay) on Upper Conductive Layer Upper Conductive Layer Only 14 Expose Mask Laminated This mask defines an Materials 1 and 2 area on the upper (upper and lower) conductive layer that will receive a dry film solder mask (cover lay). The bottom layer will not have dry film applied to it. The plated through holes will be bridged over by the coating on the top. 15 Develop 16 Cure Full Cure 17 Route Panels Route Bit = As Forms 4 4 pieces. Required Conforms to finished dims
(74) Table 5 describes the formation of the side portion 52. This process involves routing a matrix of openings in FR-4 board. However, punching is thought to be the cost effective method for manufacturing. The punching may done by punching through the entire core, or, alternatively, punching several layers of no-flow pre-preg and thin core c-stage which are then laminated to form the wall of proper thickness.
(75) After routing the matrix, the board will have to be electroless or DM plated. Finally, the boards will have to be routed to match the bottom portion. This step can be done first or last. It may make the piece more workable to perform the final routing as a first step.
(76) TABLE-US-00005 TABLE 5 Processing of Material 4 (Side Portion) Step Type Description Note 1 Route/Punch Route Bit = 0.031 in. Forms Side Portion Matrix of Openings 2 Direct 0.25 mil minimum Forms Sidewalls on Metallization/Flash Side Portion Cu 3 Route Panels
(77) Table 6 describes the processing of the top portion. The formation of the top portion 48 involves imaging a dry film cover lay or liquid solder mask on the bottom (i.e. conductive layer forming the inner layer. The exposed layer of the top portion 48 will not have a copper coating. It can be processed this way through etching or purchased this way as a one sided laminate.
(78) A matrix of holes is drilled into the lid board. Drilling may occur after the imaging step. If so, then a suitable solder mask must be chosen that can survive the drilling process.
(79) TABLE-US-00006 TABLE 6 Processing of Ton Portion Step Type Description Note 1 Dry Film Conductive Layer 2 Expose Mask Bare Layer Form Conduction Ring 3 Develop 4 Cure 5 Drill Matrix Drill Bit 0.025 in. Acoustic Ports of Holes 6 Laminate PTFE (Environmental Barrier) Forms Top Between 2 Pieces of Material 5 Portion
(80) TABLE-US-00007 TABLE 7 Processing of Laminated Materials 1 and 2 with Material 4 Step Type Description Note 1 Screen Conductive Adhesive on Material 4 2 Laminate Bottom Portion with Forms Bottom Side Portion Portion with Side Portion (spacer) 3 Add Transducer Silicon Die Microphone Assembly and Integrated Circuit
(81) TABLE-US-00008 TABLE 8 Processing of Laminated Materials 1, 2, and 4 with Material 5 Step Type Description Note 1 Screen Conductive Adhesive on Top Portion 2 Laminate Bottom Portion and Side Forms Housing Portion with Top Portion 3 Dice
(82) TABLE-US-00009 TABLE 9 Finishing Option NG (Nickel/Gold) Step Type Description Note 1 Immersion Ni (40-50 -in) 2 Immersion Au (25-30 -in)
(83) TABLE-US-00010 TABLE 10 Finishing Option NGT (Nickel/Gold/Tin) Step Type 1 Mask L2 (using thick dry film or high tack dicing tape) 2 Immersion Ni (40-50 -in) 3 Immersion Au (25-30 -in) 4 Remove Mask on L2 5 Mask L1 (using thick dry film or high tack dicing tape) bridge over cavity created by wall 6 Immersion Sn (100-250 -in) 7 Remove Mask on L1
(84) TABLE-US-00011 TABLE 11 Finishing Option ST (Silver/Tin) Step Type 1 Mask L2 (using thick dry film or high tack dicing tape) 2 Immersion Ag (40-50 -in) 3 Remove Mask on L2 4 Mask L1 (using thick dry film or high tack dicing tape) bridge over cavity created by wall 5 Immersion Sn (100-250 -in) 6 Remove Mask on L1
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(86) The microphone, microphone package and method of assembly herein described further allow the manufacture of multiple microphone assembly, such as microphone pairs. In the simplest form, during separation two microphones may be left joined together, such as the microphone pair 96 shown in
(87) While specific embodiments have been illustrated and described, numerous modifications come to mind without significantly departing from the spirit of the invention, and the scope of protection is only limited by the scope of the accompanying Claims.