FLIP-CHIP ON LEADFRAME HAVING PARTIALLY ETCHED LANDING SITES
20170170101 · 2017-06-15
Inventors
- RONALDO MARASIGAN ARGUELLES (BAGUIO CITY, PH)
- EDGAR DOROTAYO BALIDOY (BENGUET, PH)
- GLORIA BIBAL MANAOIS (BAGUIO CITY, PH)
- BERNARD KAEBIN ANDRES ANCHETA (MADDELA, PH)
Cpc classification
H01L2224/13101
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2224/81191
ELECTRICITY
H01L2224/81026
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2924/00012
ELECTRICITY
H01L2224/13101
ELECTRICITY
H01L23/4951
ELECTRICITY
International classification
Abstract
A flip-chip on leadframe package includes a leadframe having a plurality of leads with each lead including an inner leadfinger portion, wherein at least a landing region of all of the inner leadfinger portions are in a single common level (or plane) and include etched areas providing bump pads having concave landing sites (landing sites). A semiconductor die (die) having an active top side surface with functional circuitry including bond pads has bumps or pillars thereon. An area of the landing sites is greater than an area of the bumps or pillars. A distal end of the bumps or pillars is within and electrically coupling to the landing sites. A mold material encapsulates the die and at least a portion of the inner leadfinger portions. The package can be a leaded package or a leadless package.
Claims
1. An integrated circuit (IC) package, comprising: a leadframe comprising a plurality of leads with each said lead including an inner leadfinger portion, wherein at least a landing region of all of said inner leadfinger portions include partially-etched areas providing bump pads having concave landing sites (landing sites); a semiconductor die (die) having an active top side surface with functional circuitry including bond pads with bumps or pillars thereon; wherein an area of said landing sites is greater than an area of said bumps or pillars; wherein a distal end of said bumps or pillars is within and electrically coupled to said landing sites, and a mold material encapsulating said die and at least a portion of said inner leadfinger portions.
2. The IC package of claim 1, wherein said leads each include an external lead portion connected to said inner leadfinger portion extending out from said mold material.
3. The IC package of claim 1, wherein said leads consist of said inner leadfinger portions, and a periphery of said inner leadfinger portions on a bottom of said IC package are exposed from said mold material.
4. The IC package of claim 1, wherein said landing sites include an electroplated layer comprising a metal alloy.
5. The IC package of claim 1, wherein said landing sites have one of a semi-circular, rectangular and trapezoidal cross sectional shape.
6. The IC package of claim 1, wherein said leadframe comprises one of a copper and a copper alloy.
7. The IC package of claim 1, wherein said bumps consist of solder bumps.
8. The IC package of claim 1, wherein said leadframe excludes a die pad.
9. The IC package of claim 1, wherein said area of said landing sites is greater than said area of said bumps or pillars by a factor of 1.1 to 1.5.
10. A method of assembling a flip-chip on leadframe package, comprising: providing a leadframe comprising a plurality of leads with each said lead including an inner leadfinger portion, wherein at least a landing region of all of said inner leadfinger portions are in a single common level and include partially-etched areas providing bump pads having concave landing sites (landing sites); positioning a semiconductor die (die) having an active top side surface with functional circuitry including bond pads with bumps or pillars thereon so that a distal end of said bumps or pillars are within and physically contacting said landing sites, and a heating process for reflowing so that at least said distal end of said bumps or pillars become electrically coupled to said landing sites.
11. The method of claim 10, further comprising forming a mold material providing encapsulation for said die and said inner leadfinger portions.
12. The method of claim 10, further comprising electroplating a plating layer comprising a metal alloy compatible with a material of said distal end of said bump or said pillar in said landing sites before said positioning.
13. The method of claim 10, further comprising applying solder paste or flux to said landing sites before said positioning.
14. The method of claim 11, wherein said leads each include an external lead portion connected to said inner leadfinger portion extending out from said mold material to provide a leaded package.
15. The method of claim 11, wherein said leads consist of said inner leadfinger portions, and a periphery of said inner leadfinger portions on a bottom of said packaged are exposed from said mold material.
16. The method of claim 10, wherein said bumps or pillars consist of solder bumps.
17. The method of claim 10, wherein said area of said landing sites is greater than said area of said bumps or pillars by a factor of 1.1 to 1.5.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0008] Reference will now be made to the accompanying drawings, which are not necessarily drawn to scale, wherein:
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DETAILED DESCRIPTION
[0013] Example embodiments are described with reference to the drawings, wherein like reference numerals are used to designate similar or equivalent elements. Illustrated ordering of acts or events should not be considered as limiting, as some acts or events may occur in different order and/or concurrently with other acts or events. Furthermore, some illustrated acts or events may not be required to implement a methodology in accordance with this disclosure.
[0014] Also, the terms coupled to or couples with (and the like) as used herein without further qualification are intended to describe either an indirect or direct electrical connection. Thus, if a first device couples to a second device, that connection can be through a direct electrical connection where there are only parasitics in the pathway, or through an indirect electrical connection via intervening items including other devices and connections. For indirect coupling, the intervening item generally does not modify the information of a signal but may adjust its current level, voltage level, and/or power level.
[0015]
[0016] The landing sites can be partially-etched areas that are 25% to 75% of the thickness of the full thickness regions of the leads, but can also be 5% to 95% of the thickness of the full thickness regions of the leads. Some example methods to form partially (e.g., half) etched landing sites include coining which comprises denting the inner leadfinger by a stamping apparatus, or by laser etching using a laser apparatus. The leadframe is generally exclusive of a die pad.
[0017] Step 102 comprises positioning a die having an active top side surface with functional circuitry including bond pads (input/output (I/O) pads) with bumps or pillars thereon so that a distal end of the bumps or pillars are within and physically contacting the landing sites. The functional circuitry is generally integrated circuitry that realizes and carries out desired functionality for the flip-chip on leadframe package, such as that of a digital IC (e.g., digital signal processor) or analog IC (e.g., amplifier or power converter), such as a BiMOS IC. The capability of functional circuitry provided by the flip-chip on leadframe package may vary, for example ranging from a simple device to a complex device. The specific functionality contained within functional circuitry is not of importance to disclosed embodiments.
[0018] Bumps can comprise solder bumps, and the pillars can comprise copper pillars or gold (Au) pillars, or the pillars can include bumps on their distal ends. The positioning can comprise having the leadframe stay flat on a pedestal, chuck, or other base which supports the leadframe in an upright position with the landing sites on a top surface, where the solder bumps/pillars of the die are then mounted onto the leadframe from above so that a distal end of the bumps or pillars are inserted within the landing sites. An area of the landing sites is greater than the area of the bumps or pillars, generally by a factor of 1.1 to 1.5.
[0019] Step 103 comprises reflowing so that at least the distal end of the bumps or pillars is electrically coupled (e.g., metallurgical bonded) to the landing sites. In one example, a solder bump reflow process uses a reflow peak temperature of about 255 C. for lead-free solder applications. Step 104 comprises molding a mold material for encapsulating the die and at least a portion of the inner leadfinger portions. In the typical case where the leadframe is part of a leadframe sheet, the method further includes singulating the leadframe sheet into a plurality of disclosed flip-chip on leadframe packages.
[0020] The leads can each include an external lead portion connected to the inner leadfinger portion extending out from the mold material to provide a leaded flip-chip on leadframe package (see
[0021] The leads can also consist of only an inner leadfinger portion, where a periphery of the inner leadfinger portions on a bottom of the package are exposed from the mold material to provide a flat no lead package such as a quad flatpack no leads (QFN) package (see
[0022] The landing sites can include an optional electroplated layer comprising a metal alloy that is compatible with a material of the distal end of the bumps or pillars. For example, one example compatible metal alloy is NiPdAu. Compatible as used herein refers to the solder cap in the pillar or bump being able to form a good metallurgical bond with the landing sites, so it may be possible that the landing sites can also be bare copper assuming the solder cap material can form a good bond with the bare copper landing. The landing sites can have various shapes, such as semi-circular, rectangular or a trapezoidal cross sectional shape (see
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[0029] Disclosed embodiments can be used to form a variety of different semiconductor integrated circuit (IC) devices and related products. The assembly can comprise single semiconductor die or multiple semiconductor die, such as PoP configurations comprising a plurality of stacked semiconductor die. The semiconductor die may include various elements therein and/or layers thereon, including barrier layers, dielectric layers, device structures, active elements and passive elements including source regions, drain regions, bit lines, bases, emitters, collectors, conductive lines, conductive vias, etc. Moreover, the semiconductor die can be formed from a variety of processes including bipolar, insulated-gate bipolar transistor (IGBT), CMOS, BiCMOS and MEMS.
[0030] Those skilled in the art to which this disclosure relates will appreciate that many other embodiments and variations of embodiments are possible within the scope of the claimed invention, and further additions, deletions, substitutions and modifications may be made to the described embodiments without departing from the scope of this disclosure.