Atomic flux measurement device
09658191 ยท 2017-05-23
Assignee
Inventors
- Tadashi Ohachi (Kyoto, JP)
- Motoi Wada (Kyoto, JP)
- Osamu Ariyada (Tokyo, JP)
- Nobuhiko Yamabe (Kyoto, JP)
Cpc classification
C30B23/005
CHEMISTRY; METALLURGY
International classification
C23C14/54
CHEMISTRY; METALLURGY
C30B23/00
CHEMISTRY; METALLURGY
Abstract
An atomic flux measurement device for measuring the amount of dissociated atomic flux produced by discharge and emitted from a plasma generation cell into a vacuum camber. The atomic flux measurement device includes a counter electrode body including a pair of first and second sheet-like electrodes that are arranged substantially parallel to each other with a predetermined spacing between them, a direct-current power supply configured to maintain the first sheet-like electrode at a negative potential so that atoms attached to the inner surface of the sheet-like electrode undergo self-ionization and to apply a direct-current voltage between the first and second sheet-like electrodes so that a current flows between the first and second sheet-like electrodes, and a direct-current ammeter configured to measure a current flowing due to electrons emitted by the self-ionization of the dissociated atoms attached to the inner surface of the first sheet-like electrode.
Claims
1. An atomic flux measurement device for measuring an amount of disassociated atomic flux that are emitted from a plasma generation cell to a vacuum chamber maintained at a high vacuum, comprising: a counter electrode body including a pair of first and second sheet-like electrodes that face each other and are arranged substantially parallel to each other with a predetermined spacing between them; a first direct-current power supply configured to apply a direct-current voltage between the first and second sheet-like electrodes to cause the atoms attached to an inner surface of the first sheet-like electrode to undergo self-ionization so that a current flows between the first and second sheet-like electrodes; a direct-current ammeter provided between the first and second sheet-like electrodes and configured to measure a value of the current flowing due to the self-ionization of the atoms attached to the inner surface of the first sheet-like electrode; and a calculator configured to calculate the amount of disassociated atomic flux based on a table showing a relationship between the value of the current flowing due to the self-ionization of atoms measured by the direct-current ammeter and the amount of disassociated atomic flux emitted to the vacuum chamber, wherein the first and second sheet-like electrodes are formed of a plurality of plate-like metal mesh sheets having substantially the same shape, wherein the first and second sheet-like electrodes of the counter electrode body are U-shaped and stacked in an interleaved manner with respect to each other with a predetermined spacing.
2. The atomic flux measurement device according to claim 1, wherein the counter electrode body includes a third sheet-like electrode that is formed of a metal mesh sheet and is placed on a side of the counter electrode body where an atomic flux enters, and the potential of the third sheet-like electrode is set to be the same as the potential of the second sheet-like electrode.
3. The atomic flux measurement device according to claim 1, wherein the counter electrode body includes a fourth sheet-like electrode placed outside the first sheet-like electrode, on a side opposite to the side where an atomic flux enters, while being separated from the first sheet-like electrode by a predetermined spacing, and the fourth sheet-like electrode is connected to the first sheet-like electrode.
4. The atomic flux measurement device according to claim 1, further comprising: an A/D converter configured to convert the value of the atomic current measured by the direct-current ammeter into digital data; a memory configured to store the digital data output from the A/D converter; a display configured to display the digital data stored in the memory; and a controller configured to write and read data to and from the memory and control operation of the display.
5. The atomic flux measurement device according to claim 4, wherein the calculator is further configured to: calculate the amount of flux based on the value of the atomic current measured by the direct-current ammeter, wherein: read out a table indicating the relationship between values of atomic currents and amount of flux corresponding to the values of the atomic currents, the table being previously stored in the memory, and check the value of the atomic current measured by the direct-current ammeter against the values of the atomic currents stored in the memory, to calculate an amount of the flux corresponding to the value of the atomic current measured by the direct-current ammeter.
6. The atomic flux measurement device according to claim 1, wherein the atomic flux is generated by dissociation of any molecule of hydrogen H.sub.2, nitrogen N.sub.2 or oxygen O.sub.2.
Description
BRIEF DESCRIPTION OF DRAWINGS
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DESCRIPTION OF EMBODIMENTS
(20) Preferred embodiments of an atomic flux measurement device according to the present invention will be described hereinafter with reference to the accompanying drawings.
First Embodiment
(21) <Configuration of Measurement Device>
(22)
(23) The counter electrode body 11a includes a first and a second sheet-like electrode 12 and 13 that are substantially parallel to each other with a predetermined spacing between them. The first sheet-like electrode 12 is connected to a first terminal 18, and the second sheet-like electrode 13 is connected to a second terminal 19. The first direct-current power supply 14 and the first direct-current ammeter 16 are connected together in series between the terminals 18 and 19. The second direct-current power supply 15 and the second direct-current ammeter 17 are connected together in series between the terminal 19 and a ground terminal (i.e., a terminal having a reference potential) 20.
(24) <Specific Configuration of Counter Electrode Body>
(25)
(26) One end of a wire 27 is connected to one of the nuts 25 on the first sheet-like electrode 12, and one end of the wire 28 is connected to another of the nuts 25 on the second sheet-like electrode 13. The other end of the wire 27 is connected to the first terminal 18, and the other end of the wire 28 is connected to the second terminal 19. Outer circumference surfaces of the wires 27 and 28 are covered by alumina insulating tubes 29.
(27) In this embodiment, the sheet-like electrodes 12 and 13 were formed of a rectangular flat plate of stainless steel (SUS) having a thickness of 0.5 mm and an area of 180 mm (L)50 mm (W). An alumina bushing having a length of 6 mm is used as the spacer 23. A picoammeter (model 6487 manufactured by Keithley Instruments Inc. in the U.S.) was used as the first and second direct-current ammeters 16 and 17 of
(28) Also, in this embodiment, an IRFS-501 RF excited nitrogen source (trade name) manufactured by ARIOS INC. (in Tokyo, Japan) was used as the RF excitation cell 4, and was incorporated into a cell port of a VG80H-MBE growth equipment manufactured by VG SEMICON (in the U.K.). A combined product of the IRFS-501 RF excited nitrogen source, the RF matching box 6 and the RF power supply 7 is commercially available under the model name IRFC-504 from ARIOS INC.
(29) <Principle of Measurement of Amount of Flux>
(30) Before describing the operation of the atomic flux measurement device 10, the principle of measurement of the amount of an atomic flux will be described with reference to
(31) As described above, excited molecules N.sub.2*, excited atoms N* and ground-state atoms N of nitrogen contained in plasma in the HB discharge mode have the properties that they are readily attached to a solid-phase interface, such as, for example, the substrate surface or the metal plate surface. Therefore, if the counter electrode body 11a is provided in a space in which a flux of dissociated nitrogen atoms emitted from the RF excitation cell 4 is present, as shown in
(32) If an appropriate negative bias voltage, is applied to one (i.e. electrode 12) of the sheet-like electrodes 12 and 13 to which the dissociated nitrogen atoms are attached, excited atoms N* and ground-state atoms N of the particles attached to the electrode surface undergo self-ionization, so that, as shown in
(33) In the circuit of
V.sub.A=E.sub.A+V.sub.B<0.
Note that the second direct-current power supply 15 may be removed, i.e., E.sub.B=0.
(34) The negative potential V.sub.A (=E.sub.A+V.sub.B) applied to the sheet-like electrode 12 causes self-ionization of the dissociated nitrogen atoms attached to the inner surface of the sheet-like electrode 12, so that an atomic current I.sub.A corresponding to the number (density) of the dissociated nitrogen atoms flows between the sheet-like electrodes 12 and 13. The value of the atomic current I.sub.A is measured by the first direct-current ammeter 16.
(35) The atomic current I.sub.A is typically represented by
I.sub.A=SF.sub.NV.sub.A+I.sub.0(1)
where is the self-ionization coefficient of the electrode surface, S is the effective electrode area, F.sub.N is the amount of dissociated nitrogen atomic flux on the electrode surface, and I.sub.0 is the current flowing when the potential is zero. The sign indicates that the current is formed of electrons emitted from the electrode having a negative potential.
(36) As shown in Expression (1), the amount of dissociated nitrogen atomic flux and the atomic current I.sub.A have a linear relationship. Therefore, the amount of the atomic flux can be indirectly measured by measuring the atomic current I.sub.A.
(37) As shown in
(38) As shown in
(39) <Results of Measurement>
(40) The results of measurement of current-voltage characteristics using, the above atomic flux measurement device 10 are shown in
(41) According to the measurement result of Fla 4, the atomic current I.sub.A is detected only when the potential V.sub.A (=E.sub.A+V.sub.B) applied to the first sheet-like electrode 12 has a negative value. Because V.sub.B is set to zero, the negative portion of the potential difference (V.sub.AV.sub.B) is the atomic current. As the absolute value of the potential V.sub.A increases, the atomic current I.sub.A linearly increases, and changes in the increase of the current are small.
(42) In
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(44) In the four measurement results (V.sub.B=0, 50 V, 100 V and 150 V) shown in
(45)
(46) From the three measurement results of
(47) Incidentally, if the plasma emitted from the RF excitation cell 4 contains charged particles, such as, for example, nitrogen molecule ions N.sub.2.sup.+, nitrogen atom ions N.sup.+ or electrons e.sup., a current I.sub.B flowing from the second sheet-like electrode 13 toward the ground terminal 20 is measured by the second direct-current ammeter 17. As described above, the atomic current corresponds to the number of neutral dissociated nitrogen atoms attached to the inner surface of the first sheet-like electrode 12. The current I.sub.B measured by the second direct-current ammeter 17 includes a current of charged particles contained in the plasma and, in addition, an atomic current of neutral dissociated nitrogen atoms attached to the outer surface of the second sheet-like electrode 13. In this case, the current of the charged particles is also included in the current I.sub.A measured by the first direct-current ammeter 16, resulting in an error during measurement of the amount of flux. Therefore, the presence of an error in the atomic current can be detected based on the current I.sub.B of the second direct-current ammeter 17.
(48) <Configuration of Measurement Device>
(49) Referring back to
(50) In this embodiment, the amount of the atomic flux striking the substrate 2 is monitored based on the atomic current flowing through the counter electrode body 11a. If you wish to directly find out the amount of the atomic flux, it is necessary to convert the value of the atomic current into the amount of flux. In this case, it is necessary to prepare a table containing the amount of atomic flux and atomic current values measured under the same conditions, based on which the value of an atomic current is converted into the amount of an atomic flux, and store the table in the memory 83 in advance. If the calculator 82 converts a current value measured by the counter electrode body 11a into the amount of an atomic flux based on the table, and the value of the amount of an atomic flux is displayed on the display 84, the amount of dissociated nitrogen atoms (N and N*) flux can be known in situ.
(51) Additionally, a graph is produced that indicates a correlation relationship between the growth rate of the monocrystalline Si.sub.3N.sub.4 buffer layer that is formed on the substrate 2 using the above MBE growth equipment 1 and the value of the atomic current measured by the counter electrode body 11a. If the data of the produced graph is stored as a table in the memory in the growth control circuit 85 (see
(52) Similar to the first direct-current ammeter 16, the current value detected by the second direct-current ammeter 17 is converted into digital data by the A/D converter 22 before being input to the PC 8. Note that, in addition to the above control, the controller 81 sets the voltages of the first and second direct-current power supplies 14 and 15 and controls ON/OFF of the first and second direct-current ammeters 16 and 17.
(53) <Procedure of Measurement of Atomic Flux>
(54) Next, a procedure of measuring the amount of dissociated nitrogen atomic flux that strike the substrate 2 using the atomic flux measurement device 10 of this embodiment will be described.
(55) The RF excitation cell 4 is mounted in the cell port of the above MBE growth equipment 1 shown in
(56) As described above, when the monocrystalline Si.sub.3N.sub.4 buffer layer is grown on the silicon substrate 2, the substrate 2 is preferably indirectly irradiated with a flux of dissociated nitrogen atoms (ground-state atoms N and dissociated nitrogen atoms N*) emitted from the RF excitation cell 4. The indirect irradiation is achieved by any of the following methods.
(57) A first method is to close the travel direction of the flux of dissociated nitrogen atoms emitted from the RF excitation cell 4 using a shutter (not shown). With this method, dissociated nitrogen atoms emitted from an orifice 44 of the RF excitation cell 4 repeatedly strike and rebound off the shutter and the inner wall of the growth chamber (vacuum chamber), and thereafter, a flux having low energy leaks from a gap at the periphery of the shutter, so that the surface of the substrate 2 is irradiated with the low-energy flux.
(58) A second method is to open the above shutter to irradiate the substrate 2 with a flux of dissociated nitrogen atoms that has been emitted from the RF excitation cell 4 and has repeatedly struck and rebounded off the reflection plate 32 and the shroud provided in the vacuum chamber 3.
(59) The counter electrode body 11 of the atomic flux measurement device 10 is provided in a portion adjacent to the substrate holder 31 at a position that is located away from a region (straight line) connecting the orifice 44 of the RF excitation cell 4 and the surface of the substrate 2. As described above, dissociated nitrogen atoms emitted from the RF excitation cell 2 repeatedly strike and rebound off the shutter (not shown), the reflection plate 32, the shroud and the like provided in front of the RF excitation cell 2 before entering the space portion of the counter electrode body 11a of the atomic flux measurement device 10. Thereafter, the dissociated nitrogen atoms are attached to the surfaces of the sheet-like electrodes 12 and 13 at a density corresponding, to thermal equilibrium vapor pressure of the space portion, so that an atomic current occurs between the electrodes. The atomic current measured by the atomic flux measurement device 10 is sent to the growth control circuit 85, and is used as data for controlling the thickness of the buffer layer.
(60) In this embodiment, the atomic flux measurement device 10 was used to measure the value of the atomic current while the RF excitation cell 4 was operated under the following conditions. A relationship between the atomic current I.sub.A measured with the first direct-current ammeter 16 and the potential V.sub.A of the first sheet-like electrode 12 at that time is shown in
(61) (1) Power applied to the discharge coil 43 of the RF excitation cell 4: 500 W
(62) (2) Flow rate of nitrogen supplied to the discharge chamber 42 of the RF excitation cell 4: 1.38 sccm
(63) (3) Pressure in the RF excitation cell 4: about 100 Pa
(64) (4) Degree of vacuum in the vacuum chamber 3: 410.sup.?3 Pa
(65) A graph of
(66) It was found that the atomic current I.sub.A varies linearly, depending on the change in the potential V.sub.A. From this result, it was found that there is a linear correlation relationship between the measured value of the atomic current I.sub.A and the amount of dissociated nitrogen atoms (N*+N) flux existing in the space portion of the counter electrode body 11a.
(67) The graph of
(68) A second curve indicated by the symbol + shows a relationship between the potential V.sub.A of the first terminal and the atomic current I.sub.A measured by the first direct-current ammeter 16, where the electromotive force E.sub.A of the first direct-current power supply 16 was changed within the range of 108 V to +108 V while the potential V.sub.B of the second terminal 19 was held constant (200 V). A third curve indicated by the symbol .box-tangle-solidup. shows a relationship between the potential V.sub.A of the first terminal and the atomic current I.sub.A measured by the first direct-current ammeter 16 where the electromotive force E.sub.A of the first direct-current power supply 16 was changed within the range of 108 V to +108 V while the potential V.sub.B of the second terminal 19 was held constant (0 V).
(69) From these measurement results, it was found that the atomic current I.sub.A varies linearly, depending on the magnitude of the electromotive force E.sub.A of the first direct-current power supply 14. Note that a fourth curve indicated by the symbol , which is for reference, shows a relationship between the potential V.sub.A of the first terminal and the current I.sub.A (i.e., a dark current) measured by the first direct-current ammeter 16, where power is not supplied to the RF excitation cell 4.
(70) The graph of
Second Embodiment
(71)
(72) <Configuration of Measurement Device>
(73) The atomic flux measurement device of this embodiment is the same as that of the first embodiment, except for the configuration of the counter electrode body. A counter electrode body 11b of this embodiment employs two sheet-like electrodes 51 and 52 formed of a metal mesh sheet (hereinafter referred to as mesh electrodes) instead of the sheet-like electrodes 12 and 13 of the counter electrode body 11a of the first embodiment.
(74) A reason why the mesh electrode is used as the sheet-like electrode will be described. The counter electrode body 11a of the first embodiment does not have a problem when the amount of dissociated nitrogen atomic flux in indirect irradiation is measured. However, the electrode is harmed of a sheet-like metal, and therefore, when the amount of dissociated nitrogen atomic flux that are emitted from the RF excitation cell 4 and directly strike the substrate 2 (direct irradiation) is measured, the amount of the flux entering the space portion of the counter electrode body varies significantly, depending on the orientation of the electrode. Also, most of the dissociated nitrogen atoms rebound off the surface of the sheet-like electrode to go away from the counter electrode body, and therefore, only a small number of dissociated nitrogen atoms enter the space portion of the counter electrode body 11a to contribute to the atomic current. As a result, the amount of dissociated nitrogen atomic flux cannot be accurately measured.
(75) In contrast to this, when the mesh electrode is used as the sheet-like electrode, a flux F of dissociated nitrogen atoms emitted from the RF excitation cell 4 passes through interstices of the mesh electrode to enter the space portion of the counter electrode body 11b, so that the thermal equilibrium vapor pressure of the space portion increases. The dissociated nitrogen atoms are attached to the electrode surface at a density corresponding to thermal equilibrium vapor pressure, resulting in an atomic current.
(76) As in the first embodiment, the first and second direct-current power supplies 14 and 15 apply a negative bias potential V.sub.A=E.sub.A+V.sub.B to the first mesh electrode 51. An atomic current I.sub.A based on self-ionization of the dissociated nitrogen atoms (N*+N) attached to the inner surface of the mesh electrode 51 flows between the mesh electrodes 51 and 52.
(77) Thus, the counter electrode body 11b can measure not only the amount of a flux of dissociated nitrogen atoms (N*+N) that are emitted from the RF excitation cell 4 and enter through peripheral openings of the mesh electrodes 51 and 52 (indirect irradiation), but also the amount of a flux of dissociated nitrogen atoms (N*+N) that are emitted from the RF excitation cell 4 and pass through the interstices of the mesh electrode 52 to enter the space portion of the counter electrode body 11b (direct irradiation).
(78) <Specific Configuration of Counter Electrode Body>
(79)
(80) In this embodiment, the mesh electrode 51 was formed of a mesh (#100 (No. 100)) of stainless steel (SUS404) and had a size of 140 mm (W)300 mm (L), and the mesh electrode 52 was formed of a mesh (#100 (No. 100)) of stainless steel (SUS404) and had a size of 140 mm (W)250 mm (L). The mesh electrodes 51 and 52 are robed, facing each other with a plurality of alumina bushings (insulating spacers) 53 with a diameter of 6 mm being interposed between them to form a spacing (D) of 6 mm.
(81) As shown in
(82) In the counter electrode body 11b of this embodiment, the mesh electrode bodies 51 and 52 are rolled into a spiral, whereby the electrode area is increased without an increase in the volume, and therefore, the amount of dissociated nitrogen atoms attached to the mesh electrode can be increased. As a result, the sensitivity of measurement of the atomic current can be increased, and therefore, the accuracy of detection of the amount of the atomic flux can be increased.
Third Embodiment
(83)
(84) <Configuration of Measurement Device>
(85) As with the counter electrode body 11b of the second embodiment, a counter electrode body 11c of this embodiment employs two mesh electrodes 71 and 72 formed of a metal mesh sheet. On the other hand, unlike the counter electrode body 11b of the second embodiment, the counter electrode body 11c includes a third mesh electrode 73 formed of a metal mesh sheet that is provided on the outer side of the second mesh electrode 72 with a predetermined spacing between them.
(86) If the third mesh electrode 73 is held at an appropriate potential (e.g., the same potential as that of the mesh electrode 72), charged particles N.sub.2.sup.+, e.sup. and the like contained in a flux F can be prevented from entering the mesh electrodes 71 and 72 to some extent. In other words, the mesh electrode 73 functions as a filter that prevents a noise or error current from being added to an atomic current flowing through a closed circuit including the mesh electrodes 71 and 72.
(87) Note that although not essential to the atomic flux measurement device of the present invention, as shown in
(88) The eliminator electrode pair 34 includes a pair of electromagnets facing each other to generate a static magnetic field intersecting the plasma flux emitted from the RF excitation cell 4, thereby laterally deviating the charged particles contained in the plasma flux.
(89) The eliminator electrode pair 34 prevents charged particles from being contained in the flux F emitted from the RF excitation cell 4 to the counter electrode body 11c. Therefore, measurement error in an atomic current in the atomic flux measurement device can be reduced. Note that, in
(90) <Specific Configuration of Counter Electrode Body>
(91)
(92) In the counter electrode body 11b, the two mesh electrodes 51 and 52 having large areas are rolled to form a counter electrode body, in contrast to this, the counter electrode body 11c includes a plurality of the plate-like mesh electrodes 71 and 72, which face each other and are alternately arranged with a spacing.
(93) In the counter electrode body 11c, the first mesh electrodes 71 including plate-like metal mesh sheets are joined together in the shape of a comb, and the second mesh electrodes 72 having a similar configuration, are alternately arranged and combined with a ceramic insulating spacer 74 being interposed between each electrode. Note that the insulating spacers 74 are fastened together using a wire 75 so that the insulating spacers 74 are not displaced.
(94) The flux F of dissociated nitrogen atoms emitted from the RF excitation cell 4 enters a space portion between each electrode not only from a peripheral portion (indirect irradiation) but also from the front sides of the mesh electrodes 72 (direct irradiation). The dissociated nitrogen atoms (N and N*) coming to the space portions are attached to the inner surfaces of the first mesh electrodes 71, so that an atomic current flows between both electrodes.
(95) While the size of the counter electrode body 11b is reduced by rolling the mesh electrodes, the size of the counter electrode body 11c is reduced by stacking the mesh electrodes. By using a plurality of the mesh electrodes 71 and 72 that are put on top of each other, the mesh electrode area is increased without an increase in the volume of the counter electrode body, whereby the amount of dissociated nitrogen atoms attached to the electrode surface is increased. As a result, the sensitivity of measurement of the atomic current can be increased, and therefore, the accuracy of detection of the amount of the dissociated nitrogen atomic flux can be increased.
(96) A second difference is that the comb-like third mesh electrode 73 is provided in front of the counter electrode body. As described above, the mesh electrode 73 has a function of preventing a noise or error current from being added to the atomic current flowing through the closed circuit including the mesh electrodes 71 and 72. As shown in
(97) Note that the configuration of the counter electrode body 11c is not limited to that shown in
Fourth Embodiment
(98)
(99) <Configuration of Measurement Device>
(100) The atomic flux measurement device of this embodiment is the same as those of the first and second embodiments, except for the configuration of the counter electrode body. In a counter electrode body 11d of this embodiment, a sheet-like electrode 91 similar to that of the first embodiment is used as a first sheet-like electrode that is held at a potential V.sub.A, and a mesh electrode 92 similar to that of the second embodiment is used as a second sheet-like electrode that is held at a potential V.sub.B.
(101) As in the second embodiment, a mesh electrode is used as the second sheet-like electrode 92 to which an atomic flux is input. Therefore, a flux F of dissociated nitrogen atoms emitted from the RF excitation cell 4 passes through interstices of the mesh electrode to enter a space portion of the counter electrode body 11d, so that thermal equilibrium vapor pressure of the space portion increases. The dissociated nitrogen atoms are attached to the electrode surface at a density corresponding to thermal equilibrium vapor pressure, resulting in an atomic current.
(102) On the other hand, because the sheet-like electrode 91 similar to that of the first embodiment is used as the first sheet-like electrode that is held at the potential V.sub.A, most of the dissociated nitrogen atoms that have passed through the mesh electrode 92 to enter the space portion of the counter electrode body 11d make contact with a surface of the sheet-like electrode 91. As a result, the value of the atomic current can be expected to increase compared to the counter electrode body 11b of the second embodiment.
(103) <Specific Configuration of Counter Electrode Body>
(104)
(105) In the counter electrode body 11d of this embodiment, the first sheet-like electrode that is held at the potential V.sub.A includes the sheet-like electrode 91 and the mesh electrode 93. Specifically, as shown in
(106) As described above, most of the dissociated nitrogen atoms that have passed through interstices of the mesh electrodes 92 and 93 make contact with the surface of the sheet-like electrode 91, and therefore, the value of the atomic current can be expected to increase compared to the counter electrode body 11c of the third embodiment.
(107) As described above, the atomic flux measurement device of the present invention holds the first sheet-like electrode at a negative potential, and further, reduces the value of the potential, thereby increasing the sensitivity of measurement of the atomic current. Therefore, the atomic current can be measured using a relatively low-cost ammeter. As a result, the manufacturing cost of the measurement device can be reduced.
(108) The sheet-like electrodes are formed of a metal mesh sheet, and the sheets are rolled or stacked. As a result, the electrode surface area can be increased without an increase in the volume of the counter electrode body. Therefore, a compact atomic flux measurement device having a high measurement sensitivity can be provided.
(109) Note that, in each of the above embodiments, the atomic flux measurement device 10 is used to monitor the amount of nitrogen active species (N and N*) flux emitted from the RF excitation cell 4. The atomic flux measurement device of the present invention is not limited to this application.
(110) Hydrogen gas H.sub.2 or oxygen gas O.sub.2 may be supplied to the RF excitation cell 4, and a relatively high degree of high-frequency power may be applied to the excitation coil 43 of the RF excitation cell 4 to operate the RF excitation cell 4 in the HB discharge mode so that to flux of dissociated hydrogen atoms (H* and H) or dissociated oxygen atoms (O* and O) are emitted from the RF excitation cell 4. The flux of dissociated hydrogen atoms or dissociated oxygen atoms that is emitted from the RF excitation cell 4, and thereafter, repeatedly strike and rebound off the shroud, the reflection plate 32 and the like of the vacuum chamber 3, may be caused to enter the counter electrode body 11c. The atomic current may be measured by the atomic flux measurement device 10. As a result, the amount of the dissociated hydrogen atomic or the dissociated oxygen atomic flux may be determined.
(111) The atomic flux measurement device of the present invention is not limited to the growth process on the substrate surface in the vacuum chamber 3 of the MBE growth equipment, and is, of course, applicable to treatments, such as etching or oxidation, in a chamber under vacuum conditions.
(112) The atomic flux measurement device 10 was provided in the shutter port of the nitrogen RF excitation cell 2 of the MBE growth equipment at a position (indirect irradiation position) that is not directly irradiated with a dissociated nitrogen atomic flux from the nitrogen RF excitation cell 4. The silicon substrate 2 fixed to the substrate holder 31 in the vacuum chamber 3 was indirectly irradiated with a flux of dissociated nitrogen atoms from the nitrogen RF excitation cell 4 so that the dissociated nitrogen atoms are allowed to react with Si atoms on the surface of the silicon substrate 2 (i.e., so-called surface/interface reaction). The process of growth of a monocrystalline Si.sub.3N.sub.4 buffer layer by the reaction was observed based on the atomic current measured by the atomic flux measurement device 10. As a result, as the amount of dissociated nitrogen atoms that are emitted from the nitrogen RF excitation cell 4 and are attached to the shroud (sidewall portion) increases, the amount of dissociated nitrogen atoms that strike the substrate 2 decreases, and therefore, the growth rate of the monocrystalline Si.sub.3N.sub.4 buffer layer decreases.
(113) The undesired decrease in the growth rate due to the increase in the dissociated nitrogen atoms adsorbed to the shroud is overcome as follows. As in an activity control type nitride MBE growth equipment (see JP 2008-78200 A) previously proposed by the present inventors, the discharge modes (the LB discharge mode and the HB discharge mode) of the nitrogen RF excitation cell 4 are alternately switched at appropriate time intervals (duty factor). Atoms of a dissociated nitrogen atomic flux generated during the HB discharge mode period that have been adsorbed to the shroud during one LB discharge mode period are prevented from being deposited on the cooled shroud surface by flushing during the succeeding LB discharge mode period, whereby the decrease in the growth rate of the monocrystalline Si.sub.3N.sub.4 buffer layer on the substrate surface can be effectively prevented.
REFERENCE SIGNS LIST
(114) 1 MBE GROWTH EQUIPMENT 2 SUBSTRATE 3 VACUUM CHAMBER 4 RF EXCITATION CELL 5 METAL MOLECULAR BEAM CELL 6 RF MATCHING BOX 7 RF POWER SUPPLY 8 PC 9 SHUTTER 10 ATOMIC FLUX MEASUREMENT DEVICE 11a-11d COUNTER ELECTRODE BODY 12, 13, 91, 93 SHEET-LIKE ELECTRODE 14, 15 DIRECT-CURRENT POWER SUPPLY 16, 17 DIRECT-CURRENT AMMETER 18, 19 TERMINAL 20 GROUND TERMINAL 21, 22 A/D CONVERTER 23 SPACER 27, 28, 59, 75 WIRE 29 ALUMINUM INSULATING TUBE 31 SUBSTRATE HOLDER 32 REFLECTION PLATE 51, 52, 71, 72, 73, 92 MESH ELECTRODE 53 ALUMINA BUSHING 54 SUPPORT POST 55 ALUMINA TUBE 56 FIXING BAND 57 FIXING DEVICE 58 SEPARATOR 74 INSULATING SPACER 75 WIRE 81 CONTROLLER 82 CALCULATOR 83 MEMORY 84 DISPLAY