Wire discharge-machining apparatus with parallel cutting wires
09643270 ยท 2017-05-09
Assignee
Inventors
Cpc classification
B28D5/045
PERFORMING OPERATIONS; TRANSPORTING
B23H7/10
PERFORMING OPERATIONS; TRANSPORTING
B23H9/00
PERFORMING OPERATIONS; TRANSPORTING
International classification
B23H1/02
PERFORMING OPERATIONS; TRANSPORTING
B23H7/10
PERFORMING OPERATIONS; TRANSPORTING
H01L21/78
ELECTRICITY
B23H11/00
PERFORMING OPERATIONS; TRANSPORTING
B28D5/04
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A wire machining method includes: a wire electrode set as cutting wires provided in parallel with a distance between the cutting wires of which a predetermined regional part faces a workpiece; a machining power source that generates a pulse-shaped machining voltage; and plural feeder units that are electrically connected to the plural cutting wires respectively of the wire electrode and supply the machining voltage between the cutting wires and the workpiece respectively. In the parallel cutting wires, the feeder units are arranged such that a direction of a current passed to at least a part of the cutting wires becomes a direction different from a direction of a current passed to other cutting wires.
Claims
1. A wire discharge-machining method comprising: providing in parallel, with a distance therebetween and facing a workpiece, a wire electrode set as cutting wires; generating a machining voltage by a machining power source; electrically connecting a plurality of feeder units to the cutting wires respectively of the wire electrode; supplying the machining voltage between the cutting wires and the workpiece respectively; arranging the plurality of feeder units at both sides of the workpiece, the both sides including a first side and a second side; connecting at least one feeder unit on the first side and at least one feeder unit on the second side to respective power feeder lines from the machining power source; arranging the feeder units in the cutting wires such that a direction of a current passed to at least a part of the cutting wires becomes a direction different from a direction of a current passed to other cutting wires; providing the feeder units on the first side and the second side for each of the cutting wires; connecting the machining voltage from the machining power source to only one of the feeder units on either side of each of the cutting wires to thereby supply the machining voltage between the cutting wires and the workpiece; and slice-machining the workpiece using the cutting wires.
2. A thin sheet manufacturing method comprising: providing in parallel, with a distance therebetween and facing a workpiece, a wire electrode set as cutting wires; generating a machining voltage by a machining power source; electrically connecting a plurality of feeder units to the cutting wires respectively of the wire electrode; supplying the machining voltage between the cutting wires and the workpiece respectively; arranging the plurality of feeder units at both sides of the workpiece, the both sides including a first side and a second side; connecting at least one feeder unit on the first side and at least one feeder unit on the second side to respective power feeder lines from the machining power source; arranging the feeder units in the cutting wires such that a direction of a current passed to at least a part of the cutting wires becomes a direction different from a direction of a current passed to other cutting wires; providing the feeder units on the first side and the second side for each of the cutting wires; connecting the machining voltage from the machining power source to only one of the feeder units on either side of each of the cutting wires to thereby supply the machining voltage between the cutting wires and the workpiece; and preparing a thin sheet from the workpiece using the cutting wires.
3. A semiconductor wafer manufacturing method comprising: providing in parallel, with a distance therebetween and facing a semiconductor wafer material, a wire electrode set as cutting wires; generating a machining voltage by a machining power source; electrically connecting a plurality of feeder units to the cutting wires respectively of the wire electrode; supplying the machining voltage between the cutting wires and the semiconductor wafer material respectively; arranging the plurality of feeder units at both sides of the semiconductor wafer material, the both sides including a first side and a second side; connecting at least one feeder unit on the first side and at least one feeder unit on the second side to respective power feeder lines from the machining power source; arranging the feeder units in the cutting wires such that a direction of a current passed to at least a part of the cutting wires becomes a direction different from a direction of a current passed to other cutting wires; providing the feeder units on the first side and the second side for each of the cutting wires; and connecting the machining voltage from the machining power source to only one of the feeder units on either side of each of the cutting wires to thereby supply the machining voltage between the cutting wires and the semiconductor wafer material.
4. The semiconductor wafer manufacturing method according to claim 3, wherein the semiconductor wafer material is silicon or silicon carbide, or a material having silicon or silicon carbide as a main component.
Description
BRIEF DESCRIPTION OF DRAWINGS
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BEST MODE(S) FOR CARRYING OUT THE INVENTION
First Embodiment
(6) Configurations and operations according to embodiments of the present invention are explained below.
(7) In the first embodiment, the plural guide rollers 3a to 3d are arranged in parallel with a distance between them in an axial line direction. The guide roller 3a and the guide roller 3b are provided at highest positions, and the guide roller 3c is provided at a lowest position below the guide roller 3b. The guide roller 3d is provided below the guide roller 3a arranged with the guide roller 3c.
(8) The wire electrode 2 is ejected from a wire ejection roller 5 after being wound at a predetermined number of times. A portion of the wire electrode 2 between the guide roller 3a and the guide roller 3b becomes a cutting wire 2a capable facing the workpiece 8 and machining the workpiece 8. As shown in
(9) A voltage (a machining voltage) to perform electric discharge machining is supplied to the power feeding wire 2b of the wire electrode 2 from a machining power source 6 via feeders 7A and 7B, and a voltage is supplied between the power feeding wire 2b and the workpiece 8. The machining power source 6 is configured by plural machining power-source units 61 capable of independently supplying a voltage. The feeders 7A and 7B are configured by plural feeder units 71 and 72, respectively insulated from each other, and can independently supply a voltage to each cutting wire 2a. The plural machining power-source units 61 capable of independently supplying a voltage to parallel wire electrodes are connected to a control device (not shown) of the wire discharge-machining apparatus.
(10) Naturally, a voltage application polarity can be suitably inverted according to need, in a similar manner to that of conventional wire discharge machining. A position of the workpiece 8 is controlled by a position control device (not shown) to have a small distance from the wire electrode 2 wound between the guide rollers 3a to 3d. Therefore, an appropriate electric-discharge gap length is maintained for the workpiece 8. A machining liquid (not shown) is supplied between the workpiece 8 and the wire electrode 2 by blowing or by immersion in a similar manner to that of normal wire discharge machining.
(11) Power feeding to parallel wire electrodes in the wire discharge-machining apparatus according to the first embodiment of the present invention is explained next.
(12) According to this configuration, in a state that electric discharge machining occurs between the plural cutting wire 2a and the workpiece 8, and machining currents concurrently flow to the cutting wires 2a, flowing directions of machining currents become mutually opposite directions. Therefore, magnetic fields generated by the cutting wires 2a are offset by magnetic fields generated by mutually adjacent cutting wires 2a. Consequently, an electromagnetic force that becomes a force to warp the cutting wires 2a by working on the cutting wires 2a can be suppressed.
(13) As described above, according to the configuration of the first embodiment, one wire electrode 2 is wound between the plural guide rollers 3a to 3d to form the plural cutting wires 2a. The machining power source 6 and the feeders 7A and 7B are provided to individually feed power to each cutting wire 2a and such that directions of currents flowing to the cutting wires 2a become mutually opposite between adjacent cutting wires 2a. Accordingly, warping of wire electrodes at both ends of the parallel cutting wires 2a can be reduced, and the wire electrodes at both ends of the parallel cutting wires 2a are not warped during machining. As a result, a machined part of the workpiece 8 does not become in an arc shape but becomes a straight line. Consequently, machining precision improves, and thicknesses of wafers cut out at a time from the workpiece 8 by the parallel cutting wires 2a become uniform.
Second Embodiment
(14) In the first embodiment described above, a system of preventing warping of the cutting wires 2a due to an electromagnetic force is explained. According to this system, one wire electrode 2 is wound between the plural guide rollers 3a to 3d to form the plural cutting wires 2a. The machining power source 6 and the feeders 7A and 7B are provided to individually feed power to each cutting wire 2a and to set directions of currents flowing to the cutting wires 2a mutually opposite between adjacent cutting wires 2a. That is, the system according to the first embodiment supplies power to the parallel cutting wires 2a such that flow directions of currents become mutually opposite between adjacent cutting wires 2a, thereby offsetting magnetic fields generated by the cutting wires 2a. This system can prevent warping of the cutting wires 2a due to an electromagnetic force, and can improve machining shape precision. In a second embodiment, a modification of the first embodiment to suppress warping of the cutting wires 2a due to an electromagnetic force in a power feeding system to parallel cutting wires 2a is explained.
(15)
(16) As shown in
(17) Instead of setting adjacent two parallel wires as one group as described above, plural (three, or four, five onwards) cutting wires 2a can be set as one group. In this way, the feeder units 71 and 72 are electrically connected to the wire electrodes 2 of the cutting wires 2a such that adjacent plural cutting wires 2a are set as each group, directions of currents passed to the cutting wires 2a of the same group are set to be the same directions, and directions of currents passed to the cutting wires 2a of adjacent groups become mutually opposite directions. In this case, feeder units to which power feeding lines are not connected function as wire guides (supporting members), and arrange plural cutting wires 2a in parallel on the same plane in cooperation with feeder units to which power feeding lines are connected.
(18) According to this configuration, in a state that electric discharge machining occurs between the parallel cutting wires 2a and the workpiece 8 and that machining currents flow to the parallel cutting wires 2a, magnetic fields generated by the machining currents are weakened by magnetic fields generated in peripheral cutting wires 2a. Therefore, an electromagnetic force working on the cutting wires 2a to warp the cutting wires 2a can be reduced.
(19) As described above, according to the second embodiment, effects similar to those of the first embodiment are obtained, and power feeding lines can be easily arranged in a power feeding configuration to the parallel cutting wires 2a because power is fed such that plural cutting wires 2a of parallel cutting wires 2a are handled as one group and current flow directions become opposite between groups.
Third Embodiment
(20) In the first embodiment described above, a system of preventing warping of the cutting wires 2a due to an electromagnetic force is explained. According to this system, one wire electrode 2 is wound between the plural guide rollers 3a to 3d to form the plural cutting wires 2a. The machining power source 6 and the feeders 7A and 7B are provided to individually feed power to each cutting wire 2a and to set directions of currents flowing to the cutting wires 2a mutually opposite between adjacent cutting wires 2a. That is, the system according to the first embodiment supplies power to the parallel cutting wires 2a such that flow directions of currents become mutually opposite between adjacent cutting wires 2a, thereby offsetting magnetic fields generated by the cutting wires 2a. This system can prevent warping of the cutting wires 2a due to an electromagnetic force, and can improve machining shape precision.
(21) In the second embodiment, in the power feeding system to the parallel cutting wires 2a, plural parallel cutting wires 2a are handled as groups, power is fed to the cutting wires 2a constituting these groups such that currents flow in the same direction, and current directions passed to the cutting wires 2a of adjacent groups become mutually opposite. In this system, warping of the cutting wires 2a due to an electromagnetic force can be suppressed and machining shape precision can be improved, by weakening the strength of magnetic fields generated by currents flowing to the cutting wires 2a.
(22) In a third embodiment, there is explained a power feeding system to the cutting wires 2a which does not pass currents alternately or in opposite directions for each of the few cutting wires but reduces as far as possible the number of cutting wires 2a to which currents in opposite directions are passed, thereby reducing the magnetic field strength and suppressing warping of the cutting wires 2a due to an electromagnetic force.
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(24) Also in the third embodiment, in a similar manner to those of the first and second embodiments, the wire electrode 2 reeled out from the wire bobbin 1 is wound between the plural guide rollers 3a to 3d at plural times with a small distance between the wire electrodes, thereby forming plural wire running systems. Finally, the wire electrode 2 is wound at a predetermined number of times, and is ejected from the wire ejection roller 5. In this case, in the third embodiment, a portion of the wire electrode 2 between the guide roller 3a and the guide roller 3b becomes the cutting wire 2a to machine the workpiece 8. As shown in
(25) Power feeding to the parallel wire electrodes in the wire discharge-machining apparatus according to the third embodiment of the present invention is explained next.
(26) An operation of the third embodiment is explained next.
(27) As explained above, according to the third embodiment, a direction of a current flowing to each one cutting wire 2a positioned at both ends of parallel cutting wires 2a is set opposite to a direction of currents flowing to remaining parallel cutting wires 2a excluding these two cutting wires 2a. Therefore, an electromagnetic force working on the cutting wires 2a can be reduced, and warping of the cutting wires 2a can be prevented.
(28) In the first to third embodiments, as an example, there have been explained a wire discharge-machining apparatus having plural wire running systems provided by winding the wire electrode 2 between plural guide rollers with a distance between the wire running systems. However, the present invention is not limited thereto, and the first to third embodiments can be also applied to a wire discharge-machining apparatus including three or more wire electrodes that generate an electric discharge between a workpiece and the wire electrodes, even when the wire electrodes are not wound up.
(29) An arrangement positional relationship among the guide rollers, the feeder units, and the workpiece or a stage (not shown) on which the workpiece is mounted in the first to third embodiments is explained. For example, the guide rollers can be arranged between the feeder units arranged at both sides of a workpiece or a stage on which the workpiece is mounted and the workpiece or the stage on which the workpiece is mounted, as shown in
(30) Alternatively, as shown in
(31) When semiconductor materials such as monocrystalline silicon and polycrystalline silicon carbide, solar cell materials such as monocrystalline silicon and polycrystalline silicon, ceramics such as polycrystalline silicon carbide, and sputtering target materials such as tungsten and molybdenum are machined by the above wire discharge-machining method, an electromagnetic force working between wires during electric discharge machining is offset or reduced, and thus warping of wire electrodes is prevented. Therefore, plural wafers can be cut out at a time in high size precision.
EXPLANATIONS OF LETTERS OR NUMERALS
(32) 1 Wire bobbin 2 Wire electrode 2a Cutting wire 2b Power feeding wire 3a, 3b, 3c, 3d Guide roller 5 Wire ejection roller 6 Machining power source 7A, 7B Feeder 8 Workpiece 61 Machining power-source unit 71, 72 Feeder unit