XENON SUPPRESSION FILTER FOR SPECTROMETRY

Abstract

A device for improving the suppression of light from a Pulsed Xenon light source for spectrometry by combining a Variable Longpass Order-Sorting filter with a Dichroic Balancing filter coated on a fused Silica substrate is disclosed.

Claims

1. A Xenon suppression filter comprising: a Dichroic Balancing filter coated on one side of a fused Silica filter substrate; and, a Variable Longpass Order-Sorting filter coated on the opposite side of said fused Silica filter substrate.

2. A Xeon suppression filter comprising: a Dichroic Balancing filter coated on a first fused Silica filter substrate; a Variable Longpass Order-Sorting filter coated on a second fused Silica filter substrate; and, combining said first and second coated fused Silica filter substrates.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0006] For a fuller understanding of the nature and objects of the invention, reference should be made to the following detailed description, taken in connection with the accompanying drawings, in which:

[0007] FIG. 1 shows a diagram of the Xenon Suppression Filter on one substrate; and,

[0008] FIG. 2 shows a diagram of the spectral response of the Xenon Suppression Filter.

DESCRIPTION OF THE PREFERRED EMBODIMENT

[0009] As discussed the disclosed device improves the suppression of light from a Pulsed Xenon light source for spectrometry by combining a Variable Longpass Order-Sorting filter with a Dichroic Balancing filter by coating them both on a fused Silica substrate.

[0010] As shown in FIG. 1 a preferred embodiment of this device is constructed by coating the Dichroic Balancing filter (shown at bottom of FIG. 1) on the opposite side of the Variable Longpass Order-Sorting filter substrate (shown at top of FIG. 1), or, in an alternate embodiment, by combining the two filters using two substrates. The substrates are made of fused silica to avoid any attenuation of signal in the UV regions.

[0011] As shown in FIG. 2 the device of this disclosure suppresses the more intense light output in the range from 400-600 nm from the Pulsed Xenon light source.

[0012] Since certain changes may be made in the above described Xenon suppression filter without departing from the scope of the invention herein involved, it is intended that all matter contained in the description thereof or shown in the accompanying figures shall be interpreted as illustrative and not in a limiting sense.