Composite wavelength converter
12389725 · 2025-08-12
Assignee
Inventors
- Yuriy Zorenko (Bydgoszcz, PL)
- Miroslaw Batentschuk (Nuremberg, DE)
- Christoph Brabec (Nuremberg, DE)
- Andres Osvet (Erlangen, DE)
- Vitalii Gorbenko (Bydgoszcz, PL)
- Ievgen Levchuk (Erlangen, DE)
- Tetiana Zorenko (Bydgoszcz, PL)
- Liudmyla Chepyga (Utrecht, NL)
- Anton Markovskyi (Bydogoszcz, PL)
- Sandra Witkiewicz-Lukaszek (Osielsko, PL)
Cpc classification
G02B5/208
PHYSICS
C30B19/04
CHEMISTRY; METALLURGY
C30B29/28
CHEMISTRY; METALLURGY
C30B31/04
CHEMISTRY; METALLURGY
International classification
C30B19/04
CHEMISTRY; METALLURGY
C30B29/28
CHEMISTRY; METALLURGY
C30B31/04
CHEMISTRY; METALLURGY
Abstract
The invention refers to a composite wavelength converter (1) for an LED (100), comprising a substrate (10) and an epitaxial film (20) formed by liquid phase epitaxy on the top and bottom of the substrate (10). Furthermore, the invention refers to a method of preparation of a composite wavelength converter (1) for an LED (100). Furthermore, the invention refers to a white LED light source comprising an LED (100) and an inventive composite wavelength converter (1) mounted on a light emitting surface of the LED (100).
Claims
1. A composite wavelength converter for an LED, comprising a substrate (10) formed by a first layer of single crystalline garnet phosphor presenting first emission and excitation spectra, having a cubic crystal structure, a first lattice parameter and oriented crystal planes, wherein the substrate (10) contains a first activator, and an epitaxial film (20) formed by liquid phase epitaxy on the top and bottom of the substrate (10) as a second layer of single crystalline garnet phosphor with the first activator, presenting second emission and excitation spectra, having a cubic crystal structure and a second lattice parameter, wherein the epitaxial film (20) is arranged directly on the top and bottom of the substrate (10) on the oriented crystalline planes of the substrate (10), wherein the second emission and excitation spectra are different from the first emission and excitation spectra, wherein the difference between the first lattice parameter and the second lattice parameter results in a lattice mismatch within a range of 2.0 to +2.0%, and wherein the thickness of the epitaxial film (20) on the top of the substrate (10) is at least 2 m and the thickness of the epitaxial film (20) on the bottom of the substrate (10) is at least 2 m.
2. The converter according to claim 1, wherein the converter (1) comprises one or two additional epitaxial films, namely a first (30) and optionally a second (40) additional epitaxial film, wherein the first additional epitaxial film (30) is formed by liquid phase epitaxy as a third layer of single crystalline garnet phosphor with the first activator, arranged directly on the epitaxial film (20) on the top and bottom side of the substrate (10), presenting third emission and excitation spectra, having a cubic crystal structure and a third lattice parameter, wherein the third emission and excitation spectra are different from the first emission and excitation spectra, wherein the difference between the third lattice parameter and the second lattice parameter results in a lattice mismatch within a range of 2.0 to +2.0%, and wherein the thickness of the first additional epitaxial film (30) on the top side of the substrate (10) is at least 2 m and the thickness of the first additional epitaxial film (30) on the bottom side of the substrate (10) is at least 2 m, wherein the second additional epitaxial film (40) is formed by liquid phase epitaxy as a fourth layer of single crystalline garnet phosphor with the first activator, arranged directly on the first additional epitaxial film (30) on the top and bottom side of the substrate (10), presenting fourth emission and excitation spectra, having a cubic crystal structure and a fourth lattice parameter, wherein the fourth emission and excitation spectra are different from the first emission and excitation spectra, and wherein the difference between the fourth lattice parameter and the third lattice parameter results in a lattice mismatch within a range of 2.0 to +2.0%, and wherein the thickness of the second additional epitaxial film (40) on the top side of the substrate (10) is at least 2 m and the thickness of the second additional epitaxial film (40) on the bottom side of the substrate (10) is at least 2 m.
3. The converter according to claim 1, wherein the first activator is Ce.sup.3+ ions.
4. The converter according to claim 1, wherein the second activator is one from Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ and Mn.sup.2+ ions.
5. The converter according to claim 4, wherein the epitaxial film (20), first additional epitaxial film (30) and/or second additional epitaxial film (40) is/are formed by a mixed garnet compound having a composition represented by a formula X=A.sup.1.sub.3B.sup.1.sub.2C.sup.1.sub.3O.sub.12:Ce,R, wherein A.sup.1 is Ca.sup.2+ ions; B.sup.1 is Sc.sup.3+ or Al.sup.3+ or Ga.sup.3+ ions, C.sup.1 is Si.sup.4+ or Ge.sup.4+ ions and R is the second dopant, or represented by a formula Y=A.sup.1.sub.3-xA.sup.2.sub.xB.sup.1.sub.2-yB.sup.2.sub.yC.sup.1.sub.3-zC.sup.2.sub.zO.sub.12:Ce,R, wherein A.sup.1 is Ca.sup.2+ ions; A.sup.2 is Y.sup.3+, Lu.sup.3+, La.sup.3+, Tb.sup.3+ and Gd.sup.3+ ions; B.sup.1 is Mg.sup.2+ ions, B.sup.2 is Sc.sup.3+ or Al.sup.3+ or Ga.sup.3+ ions, C.sup.1 is Si.sup.4+ ions, C.sup.2 is Ge.sup.4+ ions and R is the second dopant, wherein 0<x<1.0, 0<y<2, and 0<z<3.
6. The converter according to claim 1, wherein the substrate (10) is Y.sub.3Al.sub.5O.sub.12:Ce garnet, Lu.sub.3Al.sub.5-sGa.sub.sO.sub.12:Ce garnet or Gd.sub.3Al.sub.5-sGa.sub.sO.sub.12:Ce garnet, wherein s is between 2.5 and 3.
7. The converter according to claim 1, wherein the thickness of the substrate (10) is between 0.3 and 1 mm.
8. The converter according to claim 1, wherein the thickness of the epitaxial film (20) on the top side of the substrate (10) is at most 200 m, and/or the thickness of the epitaxial film (20) on the on the bottom side of the substrate (10) is at most 200 m, wherein the thickness of the first additional epitaxial film (30) on the top side of the substrate (10) is at most 200 m, and/or the thickness of the epitaxial film (30) on the bottom side of the substrate (10) is at most 200 m, and/or wherein the thickness of the second additional epitaxial film (40) on the top side of the substrate (10) is at most 200 m, and/or the thickness of the second additional epitaxial film (40) on the bottom side of the substrate (10) is at most 200 m.
9. A white LED light source comprising an LED (100) and a composite wavelength converter (1) mounted on a light emitting surface of the LED (100), the converter (1) converting at least a portion of light having a wavelength lying within a first range emitted by the LED (100) into light having a wavelength lying in a second range, wherein the wavelength lying within the second range is higher than the wavelength lying within the first range the composite wavelength converter comprising a substrate (10) formed by a first layer of single crystalline garnet phosphor presenting first emission and excitation spectra, having a cubic crystal structure, a first lattice parameter and oriented crystal planes, wherein the substrate (10) contains a first activator, and an epitaxial film (20) formed by liquid phase epitaxy on the top and bottom of the substrate (10) as a second layer of single crystalline garnet phosphor with the first activator, presenting second emission and excitation spectra, having a cubic crystal structure and a second lattice parameter, wherein the epitaxial film (20) is arranged directly on the top and bottom of the substrate (10) on the oriented crystalline planes of the substrate (10), wherein the second emission and excitation spectra are different from the first emission and excitation spectra, wherein the difference between the first lattice parameter and the second lattice parameter results in a lattice mismatch within a range of 2.0 to +2.0%, and wherein the thickness of the epitaxial film (20) on the top of the substrate (10) is at least 2 m, and the thickness of the epitaxial film (20) on the bottom of the substrate (10) is at least 2 m.
10. The white LED light source according to claim 9, wherein the wavelength lying within the first range belongs to the blue wavelength range, and wherein the converter (1) is adapted to convert an appropriate portion of the light having the wavelength lying within the first range into light having the wavelength lying within the second range for creating a white light spectrum comprising the remaining portion of the light having the wavelength lying within the first range and the portion converted into light having the wavelength lying within the second range, or wherein the wavelength lying within the first range belongs to the UV wavelength range, wherein the wavelength lying within the second range belongs to the visible wavelength range, and wherein the converter (1) is adapted to convert essentially 100% of the light having the wavelength lying within the first range into light having the wavelength lying within the second range.
Description
(1) The invention is now explained in more detail with reference to embodiment examples. There are shown in
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
(10)
(11)
(12)
(13)
(14) The
(15) The active layer 103 preferably emits blue light. In this case, the composite wavelength converter 1 is adapted to convert a portion (preferably about 60%) of the blue light into green, yellow, orange and red light such that, as a result of mixing the light emitted by the LED 100 and the light converted the composite wavelength converter 1, a spectrum of white light is emitted by the WLED.
(16) Alternatively, the active layer 103 emits UV-light. In this case, the composite wavelength converter 1 is adapted to convert essentially 100% of the UV-light into visible light such that, as a result, a spectrum of white light is emitted by the WLED.
(17) The
(18) The
EXAMPLE 1
(19) TABLE-US-00001 Ca.sub.3Sc.sub.2Si.sub.3O.sub.12:Ce, R epitaxial film 20 Gd.sub.3Al.sub.2.5Ga.sub.2.5O.sub.12:Ce (GAGG:Ce) substrate 10 Ca.sub.3Sc.sub.2Si.sub.3O.sub.12:Ce, R epitaxial film 20 R=Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ or Mn.sup.2+ lattice parameter of the substrate a=12.228
EXAMPLE 2
(20) TABLE-US-00002 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce, R (CYMSSG:Ce, R) epitaxial film 20 Y.sub.3Al.sub.5O.sub.12:Ce (YAG:Ce) substrate 10 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce, R (CYMSSG:Ce, R) epitaxial film 20 R=Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ or Mn.sup.2+ lattice parameter of the substrate a=12.0005
EXAMPLE 3
(21) TABLE-US-00003 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce, R (CYMSSG:Ce, R) epitaxial film 20 Lu.sub.3Al.sub.2Ga.sub.3O.sub.12:Ce (LuAG:Ce) substrate 10 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce, R (CYMSSG:Ce, R) epitaxial film 20 R=Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ or Mn.sup.2+ lattice parameter of the substrate a=12.088
(22) The
EXAMPLE 4
(23) TABLE-US-00004 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce first additional epitaxial film 30 Tb.sub.3Al.sub.5O.sub.12:Ce epitaxial film 20 Y.sub.3Al.sub.5O.sub.12:Ce (YAG:Ce) substrate 10 Tb.sub.3Al.sub.5O.sub.12:Ce epitaxial film 20 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce first additional epitaxial film 30
(24) In this example, the epitaxial film 20 at the top side of the substrate 10 and at the bottom side of the substrate 10 can alternatively be Tb.sub.3Al.sub.5O.sub.12:Ce, R, wherein R=Eu.sup.3+, Pr.sup.3+ or Mn.sup.2+.
EXAMPLE 5
(25) TABLE-US-00005 Tb.sub.3Al.sub.5O.sub.12:Ce first additional epitaxial film 30 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce (CYMSSG:Ce) epitaxial film 20 Y.sub.3Al.sub.5O.sub.12:Ce (YAG:Ce) substrate 10 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce (CYMSSG:Ce) epitaxial film 20 Tb.sub.3Al.sub.5O.sub.12:Ce first additional epitaxial film 30
(26) In this example, the first additional epitaxial film 30 at both sides can alternatively be Tb.sub.3Al.sub.5O.sub.12:Ce, R, wherein R=Eu.sup.3+, Pr.sup.3+ or Mn.sup.2+.
EXAMPLE 6
(27) TABLE-US-00006 Tb.sub.2GdGa.sub.2Al.sub.3O.sub.12:Ce first additional epitaxial film 30 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce (CYMSSG:Ce) epitaxial film 20 Y.sub.3Al.sub.5O.sub.12:Ce (YAG:Ce) substrate 10 Ca.sub.2YMgScSi.sub.3O.sub.12:Ce (CYMSSG:Ce) epitaxial film 20 Tb.sub.2GdGa.sub.2Al.sub.3O.sub.12:Ce first additional epitaxial film 30
(28) In this example, the first additional epitaxial film 30 at both sides can alternatively be Tb.sub.2GdGa.sub.2Al.sub.3O.sub.12:Ce, R, wherein R=Eu.sup.3+, Pr.sup.3+ or Mn.sup.2+.
(29) The
(30) The WLED of
(31) The
(32) In the first example (
(33) In the second example (
(34) The
(35) According to the excitation spectra (
(36) According to the emission spectra (
(37) The
(38) The excitation spectrum of CYMSSG:Ce (1) has been detected by a respective emission at 550 nm. The emission spectrum of CYMSSG:Ce (3) has been excited by a respective excitation at 445 nm. The PL measurements were performed at room temperature.
(39) It is observed that the excitation band (1) of CYMSSG:Ce is broader than the excitation band (2) of YAG:Ce. Furthermore, it is observed that the emission band (3) of CYMSSG:Ce is broader than the emission band (4) of YAG:Ce.
(40) The reason for the broader bands of CYMSSG:Ce is the formation of Ce.sup.3+ multicenters in CYMSSG:Ce. Accordingly, a Ceca-center is formed in the position of Ca.sup.2+, and a Ce.sub.Y-center is formed in the position of Y.sup.3+. The formation of these centers causes an elongation of the PL emission spectrum into the orange and red wavelength range.
(41) Furthermore, in the
(42) The
(43) The excitation spectra (1, 2) are detected by a respective emission at 580 nm. The emission spectra (3, 4) are excited by a respective excitation at 450 nm. Accordingly, a blue LED is used for exciting (see Blue LED). The PL measurements were performed at room temperature.
(44) Again, the emission band (3) of the CYMSSG:Ce+YAG:Ce composite wavelength converter is broader than the emission band (4) of the YAG:Ce substrate due to the formation of Ce.sup.3+ multicenters in CYMSSG:Ce. Accordingly, a Ceca-center is formed in the position of Ca.sup.2+, and a Ce.sub.Y-center is formed in the position of Y.sup.3+. The formation of these centers causes an elongation of the PL emission spectrum into the orange and red wavelength range.
(45) The
(46) The excitation spectra (1, 2) have been detected by a respective emission at 580 nm. The emission spectra (3, 4) have been excited by a respective excitation at 450 nm. Accordingly, a blue LED is used for exciting (see Blue LED). The PL measurements were performed at room temperature.
(47) The comparison of
(48) Again, the emission band (3) of the CYMSSG:Ce, Mn+YAG:Ce composite wavelength converter is broader than the emission band (4) of the YAG:Ce substrate due to the formation of Ce.sup.3+ multicenters in CYMSSG:Ce. Accordingly, a Ceca-center is formed in the position of Ca.sup.2+, and a Ce.sub.Y-center is formed in the position of Y.sup.3+. The formation of these centers causes an elongation of the emission spectrum into the orange and red wavelength range.
(49) Furthermore, an effective energy transfer from the Ce.sup.3+ ions to the Mn.sup.2+ ions causes a further elongation of the emission spectrum (3) of the CYMSSG:Ce, Mn+YAG:Ce composite wavelength converter into the orange and partly red wavelength range.
(50) Thus, advantageously, Ce.sup.3+ doped and Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ and Mn.sup.2+ co-doped Ca.sub.2YMgScSi.sub.3O.sub.12 and Ca.sub.3Sc.sub.2Si.sub.3O.sub.12 SCFs are grown using the LPE method onto Ce.sup.3+ doped YAG:Ce or LuAG:Ce and GAGG:Ce substrates, respectively.
(51) Advantageously, the substrate emits mainly in the yellow range, and the Ce.sup.3+ doped and rare-earth or transition metal doped Ca.sub.2YMgScSi.sub.3O.sub.12 and Ca.sub.3Sc.sub.2Si.sub.3O.sub.12 epitaxial films emit in the orange-red ranges. Accordingly, a high-power white LED can be realized.
(52) By the mixing of the emissions coming from the substrate and the epitaxial film, the CRI coordinates and the color temperature resulting by the inventive composite wavelength converter and/or the CRI coordinates and the color temperature of the inventive WLED can be easily tuned.
(53) The
(54) A 464 nm LED emitting light in the blue wavelength range (see Diode in
(55) It is observed from the
(56) The
(57) In a first step S1, a substrate 10 is provided. For example, the substrate is Y.sub.3Al.sub.5O.sub.12:Ce garnet (YAG:Ce), Lu.sub.3Al.sub.2Ga.sub.3O.sub.12:Ce garnet (LuAG:Ce) or Gd.sub.3Al.sub.2.5Ga.sub.2.5O.sub.12:Ce garnet (GAGG:Ce) with Ce.sup.3+ ions being the first activator. In particular, the Ce.sup.3+ ions are provided as the first dopant. The Ce.sup.3+ ions have a concentration of for example 0.1 mole %.
(58) In a step S2, an epitaxial film 20 is deposited onto both sides of the oriented planes of the substrate 10 using the liquid phase epitaxy method. Accordingly, the substrate 10 is embedded in a melt-solution containing flux oxides and garnet crystal forming components. The melt-solution, for example, contains PbO and B.sub.2O.sub.3 as flux oxides. The thickness of the epitaxial film 20 on each side of the substrate 10 is for example 100 m. The epitaxial film 20 is provided with Ce.sup.3+ ions as first activator (first dopant). The Ce.sup.3+ ions have a concentration of for example 0.1 mole %. Furthermore, the epitaxial film 20 is provided with a second activator selected from one of Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ and Mn.sup.2+ ions. The second activator can be a second dopant or a substituent (garnet constituent). The second activator has a concentration for example 2% of Eu.sup.3+, Pr.sup.3+ or Tb.sup.3+ ions per mole, or 0.7% of Mn.sup.2+ ions per mole. The epitaxial film 20, for example, could have one of the following compositions: Tb.sub.3Al.sub.5O.sub.12:Ce,Eu, Tb.sub.3Al.sub.5O.sub.12:Ce,Pr or Tb.sub.3Al.sub.5O.sub.12:Ce,Mn; Ca.sub.2YMgScSi.sub.3O.sub.12:Ce,Mn, Ca.sub.2YMgScSi.sub.3O.sub.12:Ce,Eu or Ca.sub.3Sc.sub.2Si.sub.3O.sub.12:Ce,Pr.
(59) In an optional step S3, a first additional epitaxial film 30 is deposited directly onto the epitaxial film 20 on both sides of the substrate 10 using the liquid phase epitaxy method. The thickness of the first additional epitaxial film 30 on each side of the substrate is for example 100 m. Further optionally, a second additional epitaxial film 40 can be deposited directly onto the first additional epitaxial film 30 on both sides of the substrate 10 using the liquid phase epitaxy method. The thickness of the second additional epitaxial film 40 on each side of the substrate 10 is for example 100 m. Advantageously, the first additional epitaxial film 30 (and optionally the second additional epitaxial film 40) is provided with Ce.sup.3+ ions as first activator (first dopant). The Ce.sup.3+ ions have a concentration of for example 0.1 mole %. Furthermore, the first additional epitaxial film 30 is provided with a second activator selected from one of Eu.sup.3+ Pr.sup.3+, Tb.sup.3+ and Mn.sup.2+ ions. Optionally, the second additional epitaxial film 40 is provided with a second activator selected from one of Eu.sup.3+, Pr.sup.3+, Tb.sup.3+ and Mn.sup.2+ ions. The second activator can be a second dopant or a substituent (garnet constituent). The second activator has a concentration for example 2% of Eu.sup.3+ Pr.sup.3+ or Tb.sup.3+ ions per mole, or 0.7% of Mn.sup.2+ ions per mole. The first additional epitaxial film 30, for example, could have one of the following compositions: Tb.sub.3Al.sub.5O.sub.12:Ce,Eu, Tb.sub.3Al.sub.5O.sub.12:Ce,Pr or Tb.sub.3Al.sub.5O.sub.12:Ce,Mn; Ca.sub.2YMgScSi.sub.3O.sub.12:Ce,Mn, Ca.sub.2YMgScSi.sub.3O.sub.12:Ce,Eu or Ca.sub.3Sc.sub.2Si.sub.3O.sub.12:Ce,Pr. Optionally, the second additional epitaxial film 40 could have one of the following compositions: Tb.sub.3Al.sub.5O.sub.12:Ce,Eu, Tb.sub.3Al.sub.5O.sub.12:Ce,Pr or Tb.sub.3Al.sub.5O.sub.12:Ce,Mn, Ca.sub.2YMgScSi.sub.3O.sub.12:Ce,Mn, Ca.sub.2YMgScSi.sub.3O.sub.12:Ce,Eu or Ca.sub.3Sc.sub.2Si.sub.3O.sub.12:Ce,Pr.
(60) The step S2 (and optionally S3), i.e. the deposition of the epitaxial film 20, first additional epitaxial film 30 and/or second additional epitaxial film 40, occurs at growth temperatures of about 1000 C., at an overcooling rate of the melt-solution of about 20 C., and at a growth rate of about 0.3 m/min.
(61) The substrate 10 having the epitaxial film 20, first additional epitaxial film 30 and/or second additional epitaxial film 40 deposited thereon forms an epitaxial structure. The epitaxial structure is for example a wafer of a diameter of 3 inch. The epitaxy is performed in a crucible having a diameter of about 6 inch.
(62) In a step S4, the epitaxial structure is cut in a plurality of individual samples, each having identical optical properties. Preferably, the epitaxial structure is cut in 4000 individual samples being rectangular cuboids, each having a square base plane of 2 mm*2 mm. The cutting is for example performed by a laser device.
REFERENCE SIGNS
(63) 1 composite wavelength converter 10 substrate 20 epitaxial film 30 first additional epitaxial film 40 second additional epitaxial film 100 LED 101 carrier 102 n-doped layer of GaN 103 active layer of (AlGaIn)N 104 p-doped layer of GaN 105 adhesive and mirror layer 106 electroplating metal layer 107 ohmic contact