Biosensor based on heterojunction bipolar transistor
09806151 · 2017-10-31
Assignee
Inventors
Cpc classification
H01L29/165
ELECTRICITY
G01N27/4145
PHYSICS
H01L29/205
ELECTRICITY
International classification
H01L29/08
ELECTRICITY
H01L29/165
ELECTRICITY
H01L29/205
ELECTRICITY
H01L29/10
ELECTRICITY
H01L29/423
ELECTRICITY
Abstract
In one example, a sensor includes a heterojunction bipolar transistor and component sensing surface coupled to the heterojunction bipolar transistor via an extended base component. In another example, a biosensor for detecting a target analyte includes a heterojunction bipolar transistor and a sensing surface. The heterojunction bipolar transistor includes a semiconductor emitter including an emitter electrode for connecting to an emitter voltage, a semiconductor collector including a collector electrode for connecting to a collector voltage, and a semiconductor base positioned between the semiconductor emitter and the semiconductor collector. The sensing surface is coupled to the semiconductor base of the heterojunction bipolar transistor via an extended base component and includes a conducting film and a reference electrode.
Claims
1. A method for sensing a target analyte in an aqueous solution, the method comprising: providing a heterojunction bipolar transistor, wherein the heterojunction bipolar transistor comprises: a semiconductor collector including a collector electrode for connecting to a collector voltage; a semiconductor base disposed on the semiconductor collector and coupled to the extended base component, wherein the semiconductor base is formed from a first semiconductor material; and a semiconductor emitter disposed on the semiconductor base and including an emitter electrode for connecting to an emitter voltage, wherein the semiconductor emitter is formed from a second semiconductor material that is different from the first semiconductor material; providing a sensing surface, external to the heterojunction bipolar transistor, and connected to a bond pad on an exterior surface of the heterojunction bipolar transistor via an extended base component, wherein the extended base component comprises a metallic conducting wire; and immersing the sensing surface in the aqueous solution.
2. The method of claim 1, wherein the sensing surface comprises: a conducting film; and a reference electrode.
3. The method of claim 1, wherein the first semiconductor material comprises P-type doped silicon germanium.
4. The method of claim 3, wherein the semiconductor collector comprises N-type doped silicon.
5. The method of claim 4, wherein the second semiconductor material comprises N-type doped polysilicon having a higher dopant concentration than the first semiconductor material and the N-type doped silicon.
6. The method of claim 1, wherein the first semiconductor material comprises P-type doped gallium arsenide.
7. The method of claim 6, wherein the semiconductor collector comprises N-type doped gallium arsenide.
8. The method of claim 7, wherein the second semiconductor material comprises N-type doped gallium arsenide having a higher dopant concentration than the first semiconductor material and the P-type doped gallium arsenide.
9. The method of claim 1, wherein the conducting film comprises titanium nitride.
10. The method of claim 9, wherein the target analyte comprises a pH of the aqueous solution.
11. The method of claim 1 wherein the conducting film comprises a functionalized conducting metal.
12. The method of claim 11, wherein the target analyte comprises a bio-molecule or ion other than a pH of the aqueous solution.
13. The method of claim 1, wherein the conducting film comprises silver coated with silver chloride, and the silver chloride is in direct contact with the aqueous solution.
14. The method of claim 13, wherein the target analyte comprises a chloride ion.
15. The method of claim 1, wherein the conducting film comprised gold.
16. The method of claim 15, wherein the target analyte comprises a thiolated bio-molecule.
17. A method for sensing a target analyte in an aqueous solution, the method comprising: providing a heterojunction bipolar transistor, the heterojunction bipolar transistor comprising: a semiconductor emitter formed from a first semiconductor material and including an emitter electrode for connecting to an emitter voltage; a semiconductor collector including a collector electrode for connecting to a collector voltage; and a semiconductor base formed from a second semiconductor material that is different from the first semiconductor material and positioned between the semiconductor emitter and the semiconductor collector; providing a sensing surface, external to the heterojunction bipolar transistor, the sensing surface comprising: a conducting film; and a reference electrode; and providing an extended base component coupling a bond pad on an exterior surface of the heterojunction bipolar transistor to the sensing surface, wherein the extended base component comprises a metallic conducting wire; and immersing the sensing surface in the aqueous solution.
18. The method of claim 17, wherein the second semiconductor material comprises P-type doped silicon germanium, and the semiconductor collector comprises N-type doped silicon.
19. A sensor, comprising: a heterojunction bipolar transistor, comprising: a semiconductor collector including a collector electrode for connecting to a collector voltage; a semiconductor base disposed on the semiconductor collector and coupled to an extended base component, wherein the semiconductor base is formed from a first semiconductor material; and a semiconductor emitter disposed on the semiconductor base and including an emitter electrode for connecting to an emitter voltage, wherein the semiconductor emitter is formed from a second semiconductor material different from the first semiconductor material; a sensing surface, external to the heterojunction bipolar transistor; and to the extended base component connecting a bond pad on an exterior surface of the heterojunction bipolar transistor to the sensing surface, wherein the extended base component comprises: a metallic conducting wire.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The teachings of the present disclosure can be readily understood by considering the following detailed description in conjunction with the accompanying drawings, in which:
(2)
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(4)
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(6) To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the Figures.
DETAILED DESCRIPTION
(7) Examples of the present disclosure provide a biosensor based on a heterojunction bipolar transistor. In one example, the biosensor comprises a heterojunction bipolar transistor (HBT) having a silicon germanium (SiGe) base that is connected, via an extended base component (e.g., a base bond pad and wire), to a sensing surface formed from a conducting film and a reference electrode. Like biosensors based on other types of transistors, the disclosed biosensor is capable of simultaneous temperature measurement and is compatible with complementary metal-oxide-semiconductor (CMOS) fabrication. However, the disclosed biosensor also provides additional advantages including improved long-term reliability of the sensing surface (due to decreased electrochemical reactions that degrade the sensing surface over time) and a lower limit of detection (due to higher signal-to-noise ratio).
(8)
(9) The HBT device 102 is fabricated upon a substrate 106, which in one example comprises doped silicon (Si). For example, the substrate 106 may comprise P-type doped (P) silicon.
(10) A semiconductor collector (or “collector”) 108 is formed on the substrate 106. In one example, the collector 108 also comprises silicon; however, the silicon is heavily doped (i.e., more heavily doped than the substrate 106, which may not be doped at all) and has a dopant polarity that is opposite to that of the substrate 106. For example, if the substrate 106 comprises P-type silicon, then the collector 108 comprises N-type heavily doped (N.sup.+) silicon. Alternatively, the collector could comprise N-type heavily doped gallium arsenide (GaAs). The collector 108 includes a collector electrode 110 that can be connected to a collector voltage, V.sub.C.
(11) The semiconductor base (or “base”) 112 of the HBT device 102 is formed on the collector 108. In one example, the base 112 comprises silicon germanium (SiGe). In a further example, the silicon germanium is heavily doped (i.e., more heavily doped than the substrate 106, but having a dopant concentration that may be similar to the doping concentration of the collector 108) and has a dopant polarity that is opposite to that of the collector 108. For example, if the collector 108 comprises N-type heavily doped silicon, then the base 112 comprises P-type heavily doped (P.sup.+) silicon germanium.
(12) The semiconductor emitter (or “emitter”) 116 of the HBT device 102 is formed on the base 112. In one example, the emitter 116 comprises polysilicon or gallium arsenide. In a further example, the polysilicon is very heavily doped (i.e., doped more heavily than the collector 108 or the base 112) and has a dopant polarity that is opposite to that of the base 112. For example, if the base 112 comprises P-type heavily doped silicon germanium, then the emitter 116 comprises N-type very heavily doped (N.sup.++) polysilicon. Alternatively, if the collector 108 comprises N-type heavily doped gallium arsenide and the base comprises P-type heavily doped gallium arsenide, then the emitter could comprise N-type very heavily doped gallium arsenide. The emitter 116 includes an emitter electrode 118 that can be connected to an emitter voltage V.sub.E.
(13) In one example, the extended base 104 comprises a base bond pad 114 and a conducting wire 126. For example, if the base 112 comprises P-type heavily doped (P.sup.+) silicon germanium, then the base bond pad 114 may comprise P-type heavily doped (P.sup.+) silicon which is silicided at the top. In an alternative example, the conducting film 120 is connected to the base bond pad 114 via a conducting wire.
(14) As discussed above, the extended base 104 couples the HBT device 102 to a sensing surface comprised of a conducting film 120. The conducting film 120 is immersed in an aqueous solution 122 containing the target analyte. In one example, the aqueous solution further comprises water and dissolved salts (e.g., sodium chloride). In one example, the aqueous solution covers more than seventy percent of the conducting film's area. In one example, the conducting film 120 has a thickness of greater than one hundred nanometers. In a further example, the area of the conducting film 120 is much larger than the area of the emitter 116.
(15) The conducting film 120 may comprise one or more of a variety of materials, where the materials are selected based upon the analyte that the biosensor 100 is designed to detect. For instance, if the biosensor 100 is designed to sense pH, then, then the conducting film 120 might be formed from titanium nitride (TiN) that is stoichiometric and contains no impurities (e.g., carbon); if the biosensor 100 is designed to detect bio-molecules and/or ions other than pH, then the conducting film 120 might be formed from functionalized conducting metal (e.g., such as titanium nitride, gold, or platinum); if the biosensor 100 is designed to sense chloride ions, then the conducting film 120 might be formed from a silver (Ag) film coated with one or more monolayers of silver chloride (AgCl) (e.g., such that the silver chloride is in direct contact with the aqueous solution); or if the biosensor 100 is designed to detect thiolated bio-molecules, then the conducting film 120 might be formed from gold (Au). The conducting film 120 can have a planar shape or a three-dimensional shape.
(16) The sensing surface also includes a reference electrode 124 immersed in the aqueous solution, which can be connected to a reference voltage V.sub.B.
(17) As discussed above, the conducting film 120 may be connected to the base bond pad 114 via a wire 126. However, in an alternative example, the conducting film 120 is directly deposited over the base bond pad 114 (i.e., in this case, the extended base 104 comprises only the base bond pad 114). In this case, the conducting film 120 can be the same size or larger than the base bond pad 114. The conducting film 120 can also have a wire shape, a planar shape (e.g., flat), or a three-dimensional shape (e.g., pillar or surface of a trench).
(18) The example biosensor 100 of
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(20) The charts presented in
(21) For instance, the lower base current results in more accurate sensing and a wider sensing range. Consider that I.sub.BR is the voltage drop in the aqueous solution, due to the base current I.sub.B flowing through the solution during a measurement. The voltage drop I.sub.BR impacts the sensing signal (i.e., collector current I.sub.C) as shown by the following transfer curve equation:
I.sub.C=I.sub.oexp{q(V.sub.B+ψ.sub.s−I.sub.BR−V.sub.E)/kt} (EQN. 1)
where ψ.sub.s is the sensing surface potential due to the bound analyte, is a measure of the target analyte concentration, and can be accurately measured provided (I.sub.BR)<<kT/q (˜1 mV). I.sub.o is a constant, V.sub.B is the base voltage, V.sub.E is the emitter voltage, q=1.6×10.sup.−19 is the electronic charge, k=1.38×10.sup.−23 is the Boltzmann's constant, and T is Kelvin temperature. Lower voltage drops result in more accurate sensing (less error) over a wider dynamic range relative to sensors based on other types of transistors.
(22) Additionally, lower base current results in better long-term chemical stability of the conducting film portion of the extended base. The base current causes electrochemically-induced changes in the conducting film, particularly after repeated use. More specifically, degradation of the conducting film depends on the base current density and can negatively impact the reliability of the sensor's readings. Thus, a lower base current slows degradation of the conducting film and improves the long-term reliability of the sensor.
(23) As discussed above, the biosensor 100 of
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(25) The charts presented in
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(27) As discussed above, the collector current I.sub.C is the sensing current. The base-to-emitter voltage, V.sub.BE, is defined as V.sub.BE=V.sub.B−V.sub.E, where V.sub.B is the voltage applied to the base or reference electrode (e.g., electrode 124 in
(28)
(29) Although various embodiments which incorporate the teachings of the present invention have been shown and described in detail herein, those skilled in the art can readily devise many other varied embodiments that still incorporate these teachings.