BALANCED UNILATERAL FREQUENCY QUADRUPLER
20170288607 · 2017-10-05
Assignee
Inventors
- Naser Alijabbari (Elkridge, MD, US)
- Robert M. Weikle, II (Crozet, VA, US)
- Matthew Bauwens (Chesapeake, VA, US)
Cpc classification
H03B19/18
ELECTRICITY
H03D7/166
ELECTRICITY
International classification
H03B19/18
ELECTRICITY
Abstract
An integrated frequency quadruplet consists of a pair of balanced frequency doublers that are driven in phase quadrature using a hybrid coupler. This approach results, effectively, in a “unilateral” multiplier that presents a match to the input-driving source, irrespective of the impedance of the doubler stages. The present invention applies this architecture to implement an integrated frequency quadruplet with output frequency of 160 GHz using quasi-vertical GaAs varactors fabricated on thin silicon support membranes. The quadruplet has a balanced circuit architecture that addresses degradation issues often arising from impedance mis-matches between multiplier stages. A unique quasi-vertical diode process is used to implement the quadruplet, resulting in an integrated drop-in chip module that incorporates 18 varactors, matching networks and beamleads for mounting. The chip is tailored to fit a multiplier waveguide housing resulting in high reproducibility and consistency in manufacture and performance.
Claims
1. A frequency multiplier comprising: an input for receiving an input signal; a pair of frequency doublers in quadrature; a third frequency doubler; and a hybrid network connected to the input for feeding the pair of balanced frequency doublers so that the pair of balanced frequency doublers have output signals that are out of phase which are used to drive the third frequency doubler thus producing an output signal at a frequency four times the input signal.
2. The frequency multiplier of claim 1, wherein the frequency doublers each comprise a plurality of quasi-vertical GaAs varactors.
3. The frequency multiplier of claim 2, wherein the number of varactors in each frequency doubler is six.
4. The frequency multiplier of claim 1, wherin each of the pair of frequency doublers is balanced.
5. The frequency multiplier of claim 1, wherein each of the pair of frequency doublers is identical.
6. The frequency multiplier of claim 1, wherein the hybrid network feeds the pair of frequency doublers in phase quadrature.
7. The frequency multiplier of claim 6, wherein the pair of doublers are driven at a fundamental frequency.
8. The frequency multiplier of claim 1, wherein the output signal of the third frequency doubler is a fourth-order harmonic.
9. A frequency multiplier comprising: a first input for receiving an input signal; a first pair of balanced frequency doublers in quadrature; a third frequency doubler; a first hybrid network connected to the first input for feeding the first pair of balanced frequency doublers so that the first pair of balanced frequency doublers have output signals that am out of phase which are used to drive the third frequency doubler thus producing an output signal at a frequency four times the input signal; a second input for receiving the output signal from the third frequency doubler; a second pair of balanced frequency doublers in quadrature; a fourth frequency doubler; and a second hybrid network connected to the input for feeding the second pair of balanced frequency doublers so that the second pair of balanced frequency doublers have output signals that are out of phase which are used to drive the fourth frequency doubler thus producing an output signal at a frequency 16 times the first input signal.
10. The frequency multiplier of claim 9, wherein the frequency doublers each comprise a plurality of quasi-vertical GaAs varactors.
11. The frequency multiplier of claim 10, wherein the number of varactors in each frequency doubler is six.
12. The frequency multiplier of claim 9, wherein each of the first and second pairs of frequency doublers is balanced.
13. The frequency multiplier of claim 9, wherein each of the first and second pairs of frequency doublers is identical.
14. The frequency multiplier of claim 9, wherein the third and fourth hybrid networks respectively feeds the first and second pairs of frequency doublers in phase quadrature.
15. The frequency multiplier of claim 14, wherein the first and second pairs of doublers are driven at a fundamental frequency.
16. The frequency multiplier of claim 9, wherein the output signal of the third frequency doubler is a fourth-order harmonic and the output signal of the fourth frequency doubler is a fourth-order harmonic.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] The invention is better understood by reading the following Detailed Description of the Invention with references to the accompanying drawing figures, in which like reference numerals refer to like elements throughout, and in which:
[0015]
[0016]
[0017]
[0018]
[0019]
[0020]
[0021]
[0022]
[0023]
[0024]
[0025]
[0026]
[0027]
[0028]
[0029]
DETAILED DESCRIPTION OF THE INVENTION
[0030] In describing preferred embodiments of the present invention illustrated in the drawings, specific terminology is employed for the sake of clarity. However, the invention is not intended to be limited to the specific terminology so selected, and it is to be understood that each specific element includes all technical equivalents that operate in a similar manner to accomplish a similar purpose.
[0031] The present invention presents a frequency multiplier architecture that is intended to address a number of the issues noted above that are frequently encountered in cascaded multipliers. The circuit topology consists of a pair of balanced frequency doublers that are driven in phase quadrature using a hybrid coupler. This approach results, effectively, in a “unilateral” multiplier that presents a match to the input-driving source, irrespective of the impedance of the doubler stages. The present invention applies this architecture to implement an integrated frequency quadrupler with output frequency of 160 GHz using quasi-vertical GaAs varactors fabricated on thin silicone support membranes. Such quasi-vertical varactors and methods of making same are presented in copending U.S. Patent Application No. (Attorney Docket Number 151093), filed even date herewith and incorporated by reference in its entirety.
[0032]
[0033] Design of the quadrupler circuit consists essentially of two steps: determining the proper embedding impedances to present to the varactors of the input balanced doubler driven at the fundamental input frequency of fo (40 GHz) and, similarly, determining the impedances to present to the diodes of the output doubler stage driven at a frequency of 2fo (80 GHz).
[0034]
[0035] The input stage of the quadrupler 10 consists of a pair of identical balanced frequency doublers 12, 14, driven by the TE.sub.10 mode of an input WR-22 (33-50 GHz) waveguide. Design of the doubler is based on an array of anti-series oriented varactors 11, 13 extending across a reduced-height waveguide to suppress excitation of the undesired TM.sub.11 mode which has a field distribution that can couple to the opposing currents generated by the diodes at the second harmonic.
[0036]
[0037] The optimum embedding impedances to present to the diodes in the input-stage doubler were 10+j70Ω for the source impedance 21 at 40 Ghz and 20+j35Ω for the output load at 80 Ghz. The stepped-impedance waveguide transformer of
[0038]
[0039]
[0040] The geometry of the intermediate seed(n of the multiplier, extending from the output of the first-stage doubler 12, 14 to the input of the second-stage doubler 24, it shown in
[0041] As with the input doubler stage, optimum impedances for the diodes of the output doubler stage (10+j50Ω at 80 GHz and 20+j25Ω at 160 GHz) are found using harmonic balance analysis with ADS. The varactor diodes for the output stage make use of the same epitaxy as the input doubter, but the anode diameter is sealed to 8 μm to provide a zero-bias junction capacitance of 75 fF.
[0042] The final step of the quadrupler design consists of transforming the output impedance of the second-stage doubler 24 to the TE 10 mode impedance of the output waveguide, maximizing power coupled to the output WR-5.1 waveguide at 160 GHz. The output-matching network (
[0043] Final design and optimization of the quadrupler 10 is accomplished with a modular approach where the circuit is partitioned into its primary sections, as described above, and each analyzed using HFSS. Scattering parameters obtained for the matching networks from HFSS are imported into ADS to perform harmonic balance analysis and determine the resulting multiplier performance. This process is iterated, adjusting the geometry of the circuit each time, to bring the impedances presented to the varactors close to their optimum values.
[0044]
[0045] The beamlead tabs 74, 74′ and 80, 80′ protruding from the circuit at the two input-stage doublers 12 and 14 and the beamlead tab 72 protruding from WR-5.1 output probe 102 provide grounding and support the circuit as it is clamped in the split-block seam 104 of the housing 100 (
[0046] Fabrication of the multiplier chip shown in
[0047] This quasi-vertical diode geometry has an integrated bottom ride ohmic contact that is bonded to a host substrate. More specifically, its geometry includes a topside anode contact that connects to external circuitry through an airbridge finger, a thin (1 μm or less) mesa of semiconductor material (e.g., GaAs) with appropriate epilayers for the diode application, including a bottomside highly-doped layer, a bottomside ohmic contact that lies directly below the anode, a thin bonding layer below the ohmic contact, and a host substrate (such as high-resistivity silicon or diamond) onto which the diode material has been attached.
[0048] The bottom ohmic contact is characterized in that it (1) can be placed in close proximity to the anode contact, (2) allows current to flow through the bulk semiconducting material rather than along the surface, (3) can be bonded to a variety of substrate materials to address thermal grounding or loss issues, and (4) remains compatible with integration into planar circuit architectures.
[0049] In broad terms, the fabrication process includes the following steps (1) preparation of a semiconductor wafer for processing (including initial etching of material to expose a highly-doped (n++) epilayer, (2) deposition of metals and annealing to form the ohmic contact art the bottom side of the semiconductor wafer to create a diode wafer, (3) application of an adhesive bonding layer (such as spin-on-glass) to the host substrate, (4) thermal compression bonding of the diode wafer 300 and host substrate wafer, with the ohmic contact side of the diode wafer 300 facing the host substrate wafer to form a composite wafer, (5) etching and formation of diode mesas to isolate devices on the host substrate, (6) lithography and formation of topside anode contact and external circuitry on the host substrate wafer.
[0050] A keys step of the process is transfer of the GaAs epitaxy to a silicon-on-insulator (SOI) substrate that serves as the final carrier chip for the diodes and their associated circuitry. After initial formation of the device ohmic contacts, the diode epitaxy is bonded, ohmic contact-side-down, to the SOI substrate. Following this step, most of the GaAs is etched from the wafer, leaving only mesas for fabrication of the diodes. The remaining features of the diodes and multiplier circuits (anode, contact finger and cathode metallization) are fabricated using standard lithographic, metal deposition, and etching processes.
[0051] Following the diode processing steps, the wafer is bonded topside-down to a temporary carrier wafer, revealing the backside silicon handle of the SOI. This “handle” silicon is removed through reactive ion etching to the buried oxide layer, which acts as an etch stop. Buffered hydrofluoric (HF) acid is used to etch the oxide, leaving the multiplier circuits on a thin (15 μm) high-resistivity silicon membrane bonded to the carrier. A backside reactive-ion “extents” etch is used to separate the multiplier chips and define their geometry. The final step in the process is removal of the temporary carrier wafer, releasing the individual chips.
[0052] With reference to
[0053] Beamlead tabs protruding from the chip at the two input-stage doublers and the output provide grounding and support the circuit as it is clamped in the split-block seam of the housing during assembly. Two additional beamleads protrude from hairpin bias chokes and are bonded to quartz-supported filters to provide DC bias to the diode arrays. The multiplier 10 can be implemented in either planar circuit, quasi-optical, or waveguide media (as illustrated in the previous figures) and is amenable to integrated fabrication technology.
[0054] Measurement of the quadrupler 10 was done at the University of Virginia and repeated at Virginia Diodes, Inc., to ensure consistent results were obtained.
[0055]
[0056]
[0057] The RF performance of the doubler is summarized in
[0058] To estimate the operating temperature of the varactors comprising the doubler, the current-voltage characteristic of the diodes was used as an in-situ thermometer. Initially, a set of DC current-voltage measurements of the six-element diode array were taken at temperatures ranging from 25° C. to 90° C. These measurements were done with the doubler chip placed on a temperature-controllable hot plate, after the diodes were allowed to reach thermal equilibrium. Data taken from these measurements served as a calibration to permit the temperature of the diodes to be estimated when subjected to RF power.
[0059] An aspect of various embodiments of the present invention may provide a number of novel and nonobvious features, elements and characteristics, such as but not limited thereto: (1) incorporation of a hybrid coupler 16 to drive a pair of balanced doublers 12, 14 in phase quadrature combined with (2) integration of an output balanced doubler 24 that bridges the output nodes 15, 17 of the pair of input balanced doublers.
[0060] An aspect of various embodiments of the present invention may be utilized for a number of products and services. Frequency multipliers are currently the most widely used and important technology for realizing solid-state frequent sources above 100 GHz. Multipliers are used as local oscillators for high-frequency receivers, frequency upconverters in commercial network analyzer extension modules (currently marked by a number of companies), and as sources for spectroscopic measurements.
[0061] Modifications and variations of the above-described embodiments of the present invention are possible, as appreciated by those skilled in the art in light of the above teachings. It is therefore to be understood that, within the scope of the appended claims and their equivalents, the invention may be practiced otherwise than as specifically described. For example, as with the 40/160 GHz quadrupler, the input of cascaded balanced multipliers, such as that shown in
[0062] The devices, systems, compositions and computer readable medium, and methods of various embodiments of the invention disclosed herein may utilize aspects disclosed in the following references, applications, publications and patents and which are hereby incorporated by reference herein in their entireties (and which are not admitted to be prior art with respect to the present invention by inclusion in this section):
PUBLICATIONS
[0063] J. W. Gewartowski, “Unilateral Frequency Multiplier Circuit” Proceedings of the IEEE pp. 1749-1750, December 1964.
[0064] R. D. Brooks, J. W. Gewartiowski, “Unilateral 6-GHz 2 ½-Watt Varactor Quadrupler,” IEEE Trans. Solid-State Circuits VOL. SC-3, NO. 2, JUNE 1968, pp. 182-189.
[0065] N. Erickson, “High efficiency submillimeter frequency multipliers,” in IEEE MTT-S Int. Microwave Symp. Dig., 1990, pp. 1301-1304,
[0066] N. Erickson, B. Rizzi, and T. Crowe, “A high-power doubler for 174 GHz using a planar diode array,” in Proc. 4th Int. Space THz Tech. Symp., March 1993, pp. 287-296.
[0067] D. W. Porterfield, et al, “A High-Power Fixed-Tuned Millimeter-Wave Balanced Frequency Doubler,” IEEE Trans. Microwave Theory and Tech. vol. 47, no. 4, pp. 419-425, 1999.
ADDITIONAL REFERENCES
[0068] U.S. patent application Ser. No. 13/699,255 entitled “MICROMACHINED ONWAFER PROBES AND RELATED METHOD,” filed Nov. 20, 2012; Patent Application Publication No. 2013/0106456, May 2, 2013.
[0069] International Patent Application No. PCT/US2011/037473 entitled “MICROMACHINED ON-WAFER PROBES AND RELATED METHOD,” filed May 20, 2011.
[0070] U.S. patent application Ser. No. 12/530,304 entitled “Method of Local Electro-Magnetic Field
[0071] U.S. patent application Ser. No. 13/699,255 entitled “MICROMACHINED ON-WAFER PROBES AND RELATED METHOD,” filed Nov. 20, 2012; U.S. Patent Application Publication No. 2013/0106456 May 2, 2013.
[0072] International Patent Application No. PCT/US2011/037473, entitled “MICROMACHINED ON-WAFER PROBES AND RELATED METHOD,” filed May 20, 2011.
[0073] U.S. patent application Ser. No. 09/988,203 entitled “INTEGRATION OF HOLLOW WAVEGUIDES CHANNELS AND HORNS BY LITHOGRAPHIC AND ETCHING TECHNIQUES,” filed Nov. 19, 2001.
[0074] U.S. patent application Ser. No. 09/381,744 entitled “Integration of Hollow Waveguides, Channels and Horns by Lithographic and Etching Techniques,” filed Apr. 6 2000.
[0075] International Patent Application. No. US98/05828, entitled “INTEGRATION OF HOLLOW WAS WAVEGUIDES, CHANNELS AND HORNS BY LITHOGRAPHIC AND ETCHING TECHNIQUES,” filed Mar. 25, 1998.
[0076] International Patent Application No. PCT/US1998/05830, entitled “METHOD OF FABRICATING A MILLIMETER OR SUBMILLIMETER WAVELENGTH COMPONENT,” filed Mar. 25, 1998.
[0077] U.S. patent application Ser. No. 09/381,746 entitled “Preferential Crystal Etching Technique for the Fabrication of Millimeter and Submillimeter Wavelength Horn Antennas,” filed Mar. 25, 1998.
[0078] International Patent Application No. US98/05831, entitled “A PREFERENTIAL CRYSTAL ETCHING TECHNIQUE FOR THE FABRICATION OF MILLIMETER AND SUBMILLIMETER WAVELENGTH HORN ANTENNAS,” filed Mar. 25, 1998.