An actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator A that generates an acid represented by General Formula (I), the acid having a pKa of 1.00 or more; one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and an acid-decomposable resin, in which in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator D that generates an acid having a pKa of less than 1.00, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the composition, is 1.0 or more.

##STR00001##

A method suitable for large-scale production of buagafuran active pharmaceutical ingredient. A buagafuran active pharmaceutical ingredient (API) with a high purity prepared by the method includes an active ingredient of buagafuran, an impurity A, and an impurity B. In the buagafuran API, a content of the active ingredient of buagafuran is higher than 97.5%, and a total content of the impurity A and the impurity B is less than 0.04%. The buagafuran API can be applied to new drug development processes such as clinical research, pharmaceutical research and quality control research.

A method suitable for large-scale production of buagafuran active pharmaceutical ingredient. A buagafuran active pharmaceutical ingredient (API) with a high purity prepared by the method includes an active ingredient of buagafuran, an impurity A, and an impurity B. In the buagafuran API, a content of the active ingredient of buagafuran is higher than 97.5%, and a total content of the impurity A and the impurity B is less than 0.04%. The buagafuran API can be applied to new drug development processes such as clinical research, pharmaceutical research and quality control research.

The present invention is a sulfonium salt represented by the following formula (1),

##STR00001##

wherein p represents an integer of 1 to 3; R.sup.11 represents a hydrocarbyl group having 1 to 20 carbon atoms; R.sup.f represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; q represents an integer of 1 to 4; R.sup.ALU represents an acid-labile group; r represents an integer of 1 to 4; R.sup.12 represents a hydrocarbyl group having 1 to 20 carbon atoms; s represents an integer of 0 to 4; t represents an integer of 0 to 2; R.sup.f and OR.sup.ALU are bonded to adjacent carbon atoms; and X.sup. represents a non-nucleophilic counterion having no polymerizable group. This provides a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing the sulfonium salt as a photoacid generator; and a patterning process using the resist composition.

The present invention is a sulfonium salt represented by the following formula (1),

##STR00001##

wherein p represents an integer of 1 to 3; R.sup.11 represents a hydrocarbyl group having 1 to 20 carbon atoms; R.sup.f represents a fluorine atom or a fluorine-atom-containing C1 to C6 group selected from alkyl, alkoxy, and sulfide; q represents an integer of 1 to 4; R.sup.ALU represents an acid-labile group; r represents an integer of 1 to 4; R.sup.12 represents a hydrocarbyl group having 1 to 20 carbon atoms; s represents an integer of 0 to 4; t represents an integer of 0 to 2; R.sup.f and OR.sup.ALU are bonded to adjacent carbon atoms; and X.sup. represents a non-nucleophilic counterion having no polymerizable group. This provides a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing the sulfonium salt as a photoacid generator; and a patterning process using the resist composition.

Provided herein are methods and dose packs for the monitoring of medication adherence. In one aspect, the dose pack comprises comprise a multiplicity of doses of an agent and a multiplicity of doses of a marker and be configured to isolate a pair of at least one of the multiplicity of doses of the agent and at least one of the multiplicity of doses of the marker for co-administration of the pair to the subject according to the dosing schedule. In another aspect, the method comprises obtaining a sample from the subject subsequent to the conclusion of a monitoring window and analyzing the sample for the presence or absence of a marker or a degradation product thereof.

Provided herein are methods and dose packs for the monitoring of medication adherence. In one aspect, the dose pack comprises comprise a multiplicity of doses of an agent and a multiplicity of doses of a marker and be configured to isolate a pair of at least one of the multiplicity of doses of the agent and at least one of the multiplicity of doses of the marker for co-administration of the pair to the subject according to the dosing schedule. In another aspect, the method comprises obtaining a sample from the subject subsequent to the conclusion of a monitoring window and analyzing the sample for the presence or absence of a marker or a degradation product thereof.

Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I):

##STR00001##

In formula (I), R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R.sup.6, R.sup.7 and R.sup.8 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and CH.sub.2 included in the alkyl group may be replaced by O or CO, m5 represents an integer of 1 to 5, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, m8 represents an integer of 0 to 4, and AI.sup. represents an organic anion.

This invention relates to a process for preparing ()-2-exo-(2-Methylbenzyloxy)-1-methyl-4-isopropyl-7-oxabicyclo[2.2.1]heptane of the formula (I) ##STR00001##
any of its individual enantiomers or any non-racemic mixture thereof, comprising the steps of (a) reacting ()-2-exo-hydroxy-1-methyl-4-isopropyl-7-oxabicyclo[2.2.1]heptane of the formula (II) ##STR00002## any of its individual enantiomers or any non-racemic mixture thereof with a 2-Methylbenzyl compound of the formula (III) ##STR00003## wherein X is a leaving group in the presence of at least one base capable of forming water or a C.sub.1-C.sub.4 alkyl alcohol under the reaction conditions, and at least one inert organic solvent, and (b) simultaneously removing water, the C.sub.1-C.sub.4 alkyl alcohol or any mixture thereof from the reaction mixture.

This invention relates to a process for preparing ()-2-exo-(2-Methylbenzyloxy)-1-methyl-4-isopropyl-7-oxabicyclo[2.2.1]heptane of the formula (I) ##STR00001##
any of its individual enantiomers or any non-racemic mixture thereof, comprising the steps of (a) reacting ()-2-exo-hydroxy-1-methyl-4-isopropyl-7-oxabicyclo[2.2.1]heptane of the formula (II) ##STR00002## any of its individual enantiomers or any non-racemic mixture thereof with a 2-Methylbenzyl compound of the formula (III) ##STR00003## wherein X is a leaving group in the presence of at least one base capable of forming water or a C.sub.1-C.sub.4 alkyl alcohol under the reaction conditions, and at least one inert organic solvent, and (b) simultaneously removing water, the C.sub.1-C.sub.4 alkyl alcohol or any mixture thereof from the reaction mixture.