Embodiments of the present application are directed to procatalysts, and catalyst systems including procatalysts, including a metal-ligand complex having the structure of formula (I): [Formula I]

The present disclosure relates to novel metal-organic frameworks (MOFs) comprising tetratopic ligands with small pore apertures. The present disclosure further relates to methods of utilizing the MOFs of the disclosure to separate hydrocarbons through adsorptive processes.

Compounds are synthesized with bicyclic amidinate ligands attached to one or more metal atoms. These compounds are useful for the synthesis of materials containing metals. Examples include pure metals, metal alloys, metal oxides, metal nitrides, metal phosphides, metal sulfides, metal selenides, metal tellurides, metal borides, metal carbides, metal silicides and metal germanides. Techniques for materials synthesis include vapor deposition (chemical vapor deposition and atomic layer deposition), liquid solution methods (sol-gel and precipitation) and solid-state pyrolysis. Copper metal films are formed on heated substrates by the reaction of copper(I) bicyclic amidinate vapor and hydrogen gas, whereas reaction with water vapor produces copper oxide. Silver and gold films were deposited on surfaces by reaction of their respective bicyclic amidinate vapors with hydrogen gas. Reaction of cobalt(II) bis(bicyclic amidinate) vapor, ammonia gas and hydrogen gas deposits cobalt metal films on heated substrates, while reaction with ammonia produces cobalt nitride and reaction with water vapor produces cobalt oxide. Ruthenium metal films are deposited by reaction of ruthenium(II) bis(bicyclic amidinate) or ruthenium(III) tris(bicyclic amidinate) at a heated surface either with or without a co-reactant such as hydrogen gas or ammonia or oxygen. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices. Hafnium oxide films are deposited by reaction of hafnium(IV) tetrakis(bicyclic amidinate) with oxygen sources such as water, hydrogen peroxide or ozone. The HfO.sub.2 films have high dielectric constant and low leakage current, suitable for applications as an insulator in microelectronics. The films have very uniform thickness and complete step coverage in narrow holes.

Embodiments of the present disclosure relate to articles, coated articles and methods of coating such articles with a rare earth metal containing oxide coating. A method of co-depositing a rare earth metal containing oxide coating on a surface of an article is disclosed. The method includes contacting the article surface with a first or second metal containing precursor to form a partial metal adsorption layer of a first metal or a second metal. The method further includes contacting the partial metal adsorption layer with the first or second metal containing precursor to form a co-adsorption layer of the first metal and the second metal. The method further includes contacting the co-adsorption layer with a reactant to form the rare earth metal containing oxide coating.

The present disclosure relates to a novel Group 4 metal element-containing compound having excellent thermal stability, a precursor composition including the compound, and a method for manufacturing a thin film using the precursor composition. The novel Group 4 metal element-containing compound according to the present disclosure and the vapor deposition precursor composition including the compound can have excellent thermal stability, realize thin film deposition in a wide temperature range, and reduce residues caused by heat loss, thereby preventing side reactions in a process. Additionally, the vapor deposition precursor composition according to the present disclosure can realize uniform thin film deposition, thereby securing excellent physical properties of the thin film.

The present disclosure relates to a novel Group 4 metal element-containing compound having excellent thermal stability, a precursor composition including the compound, and a method for manufacturing a thin film using the precursor composition. The novel Group 4 metal element-containing compound according to the present disclosure and the vapor deposition precursor composition including the compound can have excellent thermal stability, realize thin film deposition in a wide temperature range, and reduce residues caused by heat loss, thereby preventing side reactions in a process. Additionally, the vapor deposition precursor composition according to the present disclosure can realize uniform thin film deposition, thereby securing excellent physical properties of the thin film.

Zr-based metal-organic frameworks (Zr-MOFs) independently comprising the following formula and/or structure: Zr.sub.6O.sub.4(OH).sub.4(polycarboxylate).sub.6, and methods of making and using same. In various examples, a method produces a Zr-MOF or Zr-MOFs. In various examples, a Zr-MOF is a hydrogen sulfide (H.sub.2S)-loaded Zr-MOF. In various examples, a method produces a (H.sub.2S)-loaded Zr-MOF or (H.sub.2S)-loaded Zr-MOF. In various examples, a Zr-MOF or Zr-MOFs is/are used to deliver H.sub.2S to an aqueous environment, a solvent, or the like. In various examples, a Zr-MOF or Zr-MOFs is/are used to deliver H.sub.2S to an aqueous environment, a solvent, or the like. In various examples, a Zr-MOF or Zr-MOFs is/are used to deliver H.sub.2S to an individual, such as, for example, an individual suffering from or at risk of an ischemia-reperfusion injury, inflammation, a wound, or the like, or any combination thereof.

Modified metal-organic framework (MOFs) are described that have surfaces with enhanced ability to coordinatively bond to or electrostatically interact with therapeutic agents, such as nucleic acids and small molecules and proteins with phosphate or carboxylate groups. Methods of providing the modified MOFs are described that include replacing strongly coordinating metal oxo cluster capping groups with weakly coordinating capping groups and/or incorporating organic bridging ligands with electron-withdrawing groups. MOFs with surface attached therapeutic agents (e.g., immunotherapeutic agents) prepared from the modified MOFs are also described, along with methods of using the MOFs as to treat cancer, e.g., via radiotherapy-radiodynamic therapy (RT-RDT), either with or without the co-administration of another therapeutic agent, such as a chemotherapeutic agent or an immunomodulator. Thus, the described methods can involve cancer immunotherapy and in situ cancer vaccination.

Organically modified metal oxide nanoparticles containing two or more cores including a plurality of metal atoms and a plurality of oxygen atoms covalently bonded to the plurality of metal atoms; a first modifying group that is a ligand coordinated to each of the cores and selected from the group consisting of a carboxylic acid carboxylate, a sulfonic acid sulfonate, and a phosphonic acid phosphonate; and a second modifying group that is coordinated to each of the cores and is a ligand having a structure different from that of the first modifying group and/or an inorganic anion, in which organically modified metal oxide nanoparticles have a structure in which the cores are crosslinked through a coordinate bond by at least the first modifying group.

Provided is a method for preparing a (meth)acryloyl group-containing organopolysiloxane having a step of transesterification between the components (a1) and (a2) in the presence of the components (a3) and (a4) to obtain the (meth)acryloyl group-containing organopolysiloxane, wherein component (a1) is an organopolysiloxane represented by the average composition formula (1) which has a hydroxy group-containing group, component (a2) is a (meth)acrylic acid ester represented by the general formula (2), component (a3) is a zirconium metal complex in an amount such that a molar ratio of component (a3) to the hydroxy group of component (a1) is 0.001 to 0.1, and component (a4) is a hydroxy group-containing amine represented by HON(R.sup.4).sub.2 in an amount such that a molar ratio of component (a4) to component (a3) is 0.10 to 1.5, wherein R.sup.4 is, independently of each other, a linear or branched aliphatic hydrocarbon group having 1 to 6 carbon atoms.