Patent classifications
C08J7/00
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer (3) containing a block copolymer on a substrate (1); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer (3) to obtain a structure (3) containing a phase-separated structure.
Method for producing plastic element provided with fine surface roughness
A method for producing a plastic element provided with fine surface roughness is provided. In the method, etching of a surface of the plastic element is performed separately in a first step and in a second step, in the first step, fine roughness having a predetermined average value of pitch in the range from 0.05 to 1 micrometer is generated on the surface through reactive ion etching in an atmosphere of a first gas; and in the second step, an average value of depth of the fine roughness generated in the first step is adjusted to a predetermined value in the range from 0.15 to 1.5 micrometers while the predetermined average value of pitch is substantially maintained through reactive ion etching in an atmosphere of a second gas, reactivity to the plastic element of the second gas being lower than reactivity to the plastic element of the first gas.
PROCESS FOR TREATING SILICA-FILLED POLYAMIDE BY IMPREGNATION IN SUPERCRITICAL CO2
The present invention relates to a process for treating a polyamide-based material comprising silica fibers and/or fillers, by impregnation with at least one hydrophobic additive in supercritical CO.sub.2.
The invention also relates to a polyamide-based material comprising silica fibers and/or fillers and impregnated with at least one hydrophobic additive, obtained via such a process, and to the use thereof as an electrically insulating component in an electrical device, in particular in a circuit breaker.
Melt-processable perfluoropolymers having improved thermal and mechanical properties after heating treatment
The invention mainly pertains to a method for heat treating a composition [composition (C)] which contains at least one melt-processible perfluoropolymer [polymer (F)] formed of tetrafluoroethylene (TFE) copolymer with one or more perfluorinated comonomers [comonomer (F)] containing at least one unsaturation of ethylene type in amounts from 0.5% to 13% by weight, preferably from 0.6% to 11% by weight, and more preferably from 0.8% to 9% by weight; said polymer (F) possessing reactive end groups comprising at least one of the group consisting of hydrogen atoms, oxygen atoms and ethylenically unsaturated double bonds in an amount of at least 4.5 mmol/kg, the process comprising at least the step of heat-treating the composition (C) at a temperature of at least 260 C.
TUBE
The tube is stretchable. The tube is stretched by applying tension in a longitudinal direction. The tube returns to its short state by releasing the above-described tension applied in the longitudinal direction. A plurality of protrusions are formed on an inner surface of the tube. Each of the plurality of protrusions extends in a circumferential direction. The plurality of protrusions are arranged side by side in the longitudinal direction of the tube. A pitch of the protrusions is less than or equal to 1.5 m.
Polyamine Phosphorus Dendrimer Materials for Carbon Dioxide Capture
The present disclosure provides novel solid sorbents synthesized by the reaction of polyamines with polyaldehyde phosphorous dendrimer (P-dendrimer) compounds. The sorbents are highly stable and exhibit rapid reaction kinetics with carbon dioxide, making the sorbents applicable for carbon capture, and can be easily regenerated for further use. The material is stable to aqueous and organic media, as well as strong acid and bases. The sorbent maintains full capacity over extended use. The material can be used for CO.sub.2 capture from pure CO.sub.2 streams, mixed gas streams, simulated flue gas, and ambient air. Additionally, the material can be adhered to surfaces for reversible CO.sub.2 capture applications outside of bulk particle-based processes.
PROCESS FOR PRODUCING MODIFIED MOLDED ARTICLE, MOLDED ARTICLE, DIAPHRAGM, AND DIAPHRAGM VALVE
The invention provides a process for producing a modified molded article capable of providing a diaphragm that is less likely to generate particles. The process for producing a modified molded article includes: molding modified polytetrafluoroethylene containing a tetrafluoroethylene unit and a modifying monomer unit based on a modifying monomer copolymerizable with tetrafluoroethylene to provide a molded article; and irradiating the molded article with not lower than 30 kGy but lower than 70 kGy of radiation at 270 C. to 310 C. to provide a modified molded article.
Photosensitive resin composition for forming cell culture substrate
A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.
Photosensitive resin composition for forming cell culture substrate
A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.
THIN FILM COATING SYSTEM
A thin film coating system includes at least one first supporting roller, a coating device, and at least one drying device. The first supporting roller is configured to rotate based on a rotating central axis. The coating device has an opening. The opening of the coating device faces toward the first supporting roller. The coating device is configured to coat a flowable material toward the first supporting roller along a first direction through the opening. The drying device is located at a side of the rotating central axis adjacent to the coating device in the first direction and is configured to dry the flowable material.