A bicycle gear having a first coating layer obtained by a plasma electrolytic oxidation treatment and a second coating layer, overlapped on the first coating layer, that is a lubricating substance, preferably a fluoropolymer.

A modified electrode, manufacturing method thereof and use thereof are provided. The manufacturing method includes steps of soaking a copper substrate in a solution to obtain a BiOI/copper(I) iodide, BiOI/copper(I) iodide/metallic bismuth, and copper(I) iodide/metallic bismuth composite modified electrodes by electroless plating method. The obtained electrodes, designated as bismuth-based modified electrode, can be used for the electrohydrodimerization of acrylonitrile to synthesize adiponitrile.

A modified electrode, manufacturing method thereof and use thereof are provided. The manufacturing method includes steps of soaking a copper substrate in a solution to obtain a BiOI/copper(I) iodide, BiOI/copper(I) iodide/metallic bismuth, and copper(I) iodide/metallic bismuth composite modified electrodes by electroless plating method. The obtained electrodes, designated as bismuth-based modified electrode, can be used for the electrohydrodimerization of acrylonitrile to synthesize adiponitrile.

A station for localized surface treatment of an industrial workpiece to be treated includes: at least one treatment chamber having a cell or two half-cells, each cell or half-cell delimiting a tight space between walls of the cell or half-cell and a respective portion or face of the industrial workpiece, the cell or each half-cell having a wall having an opening for covering a corresponding portion or face of the industrial workpiece, the opening of the cell or half-cell being delimited by a continuous sealing gasket, the cell or each half-cell including positioning means, the at least one treatment chamber having a supply and emptying circuit; and a plurality of storage vats each containing a treatment fluid, the supply and emptying circuit connecting each storage vat to the at least one treatment chamber so as to supply the at least one treatment chamber with respective treatment fluids.

Structures, devices and methods are provided for forming nanowires on a substrate. A first protruding structure is formed on a substrate. The first protruding structure is placed in an electrolytic solution. Anodic oxidation is performed using the substrate as part of an anode electrode. One or more nanowires are formed in the protruding structure. The nanowires are surrounded by a first dielectric material formed during the anodic oxidation.

Provided is an implant having a controlled generation rate of reactive oxygen species and a method of controlling generation of reactive oxygen species using the same. The implant having a controlled generation rate of reactive oxygen species according to the present invention includes a body formed of a metallic material and having a groove, a first filling metal filling one region of the groove, and a second filling metal filling the groove on the first filling metal, wherein the second filling metal has an ionization tendency different from that of the first filling metal.

A part-carrier for electrolytically treating geometrically complex parts includes a reinforcement vertically supporting supports that are movable in rotation and designed to carry the parts to be treated, and a control member which, when activated, pivots the movable supports in sequence to either side of a neutral initial position. Application to electroplating.

The present invention relates to a device for anodized oxidation of an anode element for a curved X-ray grating, the device (10) comprising: an anode element (12); a cathode element (14); an electrolytic medium (16); a conductor element (18); and a carrier element (20); wherein the anode element (12) comprises a first side (11) and a second side (13), wherein the second side (13) faces opposite to the first side (11); wherein the carrier element (20) comprises a curved surface section (21) that extends along a curvature around a center of curvature (30); wherein the carrier element (20) is configured to receive the second side (13) of the anode element (12) for attaching the conductor element (18) to the first side (11) of the anode element (12); wherein the curved surface section (21) is configured to receive the conductor element (18) after detaching the second side (13) of the anode element (12) from the carrier element (20); wherein the electrolytic medium (16) is configured to connect the anode element (12) and the cathode element (14); wherein the cathode element (14) in conjunction with the anode element (12) and the electrolyte medium (16) is configured to generate at least one group of electric field lines (26) that define a plane (31, 33, 35, 37, 39), wherein at least a straight extrapolation (32) of the group of electric field lines intersect the center of curvature, wherein the generation of the at least one group of electric field lines (26) results in an anodized oxidation of the anode element (12) on the curved surface section (21). The invention provides a device (10) that avoids the risk of damaging the grating structures and getting a low yield.

An applicator for no-bath plasma gel electrolytic oxidation of a workpiece made of a valve metal or an alloy thereof; the applicator movable over a surface of a workpiece to be treated. The applicator including an electrode connectable to a power supply and configured for applying electric voltage to a gap between the electrode and a workpiece. A gel electrolytic medium body is mounted in a holder being in an electric contact with the electrode.

This disclosure enables high-productivity controlled fabrication of uniform porous semiconductor layers (made of single layer or multi-layer porous semiconductors such as porous silicon, comprising single porosity or multi-porosity layers). Some applications include fabrication of MEMS separation and sacrificial layers for die detachment and MEMS device fabrication, membrane formation and shallow trench isolation (STI) porous silicon (using porous silicon formation with an optimal porosity and its subsequent oxidation). Further, this disclosure is applicable to the general fields of photovoltaics, MEMS, including sensors and actuators, stand-alone, or integrated with integrated semiconductor microelectronics, semiconductor microelectronics chips and optoelectronics.