A method for evaluating concentration of defect in silicon single crystal substrate, defect being formed by particle beam irradiation in silicon single crystal substrate, including the steps of: measuring a resistivity of silicon single crystal substrate, followed by irradiating silicon single crystal substrate with particle beam, re-measuring resistivity of silicon single crystal substrate after irradiation; determining each carrier concentration in silicon single crystal substrate before and after irradiation on basis of measured results of resistivity before and after particle beam irradiation to calculate rate of change of carrier concentration; and evaluating concentration of VV defect on basis of rate of change of carrier concentration, VV defect being made of a silicon atom vacancy and being formed by particle beam irradiation in silicon single crystal substrate. The method can simply evaluate concentration of VV defect formed in silicon single crystal substrate by particle beam irradiation.

A sensor of volatile substances includes: a first electrode structure and a second electrode structure capacitively coupled, comb-fingered, and arranged coplanar in a plane; and a sensitive layer, of a sensitive material that is permeable to a volatile substance and has electrical permittivity depending upon a concentration of the volatile substance absorbed by the sensitive material. The sensitive layer extends from opposite sides of the plane.

A sensor of volatile substances includes: a first electrode structure and a second electrode structure capacitively coupled, comb-fingered, and arranged coplanar in a plane; and a sensitive layer, of a sensitive material that is permeable to a volatile substance and has electrical permittivity depending upon a concentration of the volatile substance absorbed by the sensitive material. The sensitive layer extends from opposite sides of the plane.

In a biological information measurement device, the ingress of biological sample is detected even when a sensor is mounted, which reduces measurement error. The biological information measurement device comprises a voltage supply component that supplies voltage between first and second connectors, between second and third connectors, and between first and third connectors, a current measurement component that measures a first current that flows between the first and second connectors, a second current that flows between the second and third connectors, and a third current that flows between the first and third connectors, and a controller that is connected to the current measurement component and the voltage supply component. The controller compares two or more of the currents and thereby determines whether a foreign substance has adhered between two or more connectors out of the first, second, and third connectors.

In a biological information measurement device, the ingress of biological sample is detected even when a sensor is mounted, which reduces measurement error. The biological information measurement device comprises a voltage supply component that supplies voltage between first and second connectors, between second and third connectors, and between first and third connectors, a current measurement component that measures a first current that flows between the first and second connectors, a second current that flows between the second and third connectors, and a third current that flows between the first and third connectors, and a controller that is connected to the current measurement component and the voltage supply component. The controller compares two or more of the currents and thereby determines whether a foreign substance has adhered between two or more connectors out of the first, second, and third connectors.

A method of assembling a remote sensor system to detect a gas or chemical and a remote sensor system are described. The method includes fabricating a sensor, the sensor outputting a sensor signal that changes upon contact of the sensor with the gas or chemical and the sensor having an input port for a clock signal, coupling a capacitor to the sensor, the capacitor output voltage resulting from the sensor signal output by the sensor, and coupling a mixer to the capacitor and a low frequency oscillator, the mixer configured to mix the capacitor output voltage with the low frequency oscillator output to generate an output signal. The method also includes coupling an antenna to the mixer, the antenna configured to transmit the output signal indicating detection of the gas or chemical.

A processing apparatus includes a processing quality prediction unit capable of outputting workpiece surface processing signal, a storage unit capable of storing workpiece surface processing signal, and a workpiece surface information management unit capable of interpreting workpiece surface processing signal. The workpiece surface information management unit can convert the surface processing signal into data of workpiece surface quality. The workpiece surface information management unit can be utilized to respectively interpret the surface processing signals provided by the processing quality prediction unit and to convert them into data of the roughness degree of the workpiece surface texture, so as to clearly provide information regarding the quality of the workpiece surface and completely utilize the signals detected during the processing for increasing the value added of the processing apparatus and enhancing the efficiency of use of the processing apparatus.

A processing apparatus includes a processing quality prediction unit capable of outputting workpiece surface processing signal, a storage unit capable of storing workpiece surface processing signal, and a workpiece surface information management unit capable of interpreting workpiece surface processing signal. The workpiece surface information management unit can convert the surface processing signal into data of workpiece surface quality. The workpiece surface information management unit can be utilized to respectively interpret the surface processing signals provided by the processing quality prediction unit and to convert them into data of the roughness degree of the workpiece surface texture, so as to clearly provide information regarding the quality of the workpiece surface and completely utilize the signals detected during the processing for increasing the value added of the processing apparatus and enhancing the efficiency of use of the processing apparatus.

A processing apparatus includes a processing unit for processing the workpiece, a processing quality prediction unit connected with the processing unit electrically, a signal interpretation unit connected with the processing quality prediction unit electrically, and a control unit connected with both the processing unit and the signal interpretation unit electrically, wherein when the processing unit is processing the workpiece, the processing quality prediction unit detects the processing signal and sends the signal to the signal interpretation unit, wherein when the signal interpretation unit interprets the processing signal, if there is abnormality in the processing signal, the signal interpretation unit will immediately notify the control unit to stop the processing unit from operating. Therefore, by real-time monitoring the abnormality of the processing signal and stopping suspicious operation during processing, it allows operating personnel to deal with the abnormal condition, so as to greatly reduce the defect rate of the workpiece processing.

A processing apparatus includes a processing unit for processing the workpiece, a processing quality prediction unit connected with the processing unit electrically, a signal interpretation unit connected with the processing quality prediction unit electrically, and a control unit connected with both the processing unit and the signal interpretation unit electrically, wherein when the processing unit is processing the workpiece, the processing quality prediction unit detects the processing signal and sends the signal to the signal interpretation unit, wherein when the signal interpretation unit interprets the processing signal, if there is abnormality in the processing signal, the signal interpretation unit will immediately notify the control unit to stop the processing unit from operating. Therefore, by real-time monitoring the abnormality of the processing signal and stopping suspicious operation during processing, it allows operating personnel to deal with the abnormal condition, so as to greatly reduce the defect rate of the workpiece processing.