A rotary table includes: a stage; a rotary base configured to be rotated around a rotation center axis; a support mechanism that is disposed on the rotary base and supports the stage; a leveling adjustment mechanism configured to perform a leveling adjustment of the stage; and a transfer mechanism configured to transfer a rotative force of the rotary base to the stage. The transfer mechanism includes: an annular transfer member configured to receive the support mechanism therethrough; a first connecting mechanism that connects the transfer member and the rotary base and is rotatable around the first axis; and a second connecting mechanism that connects the transfer member and the stage and is rotatable around a second axis defined in a direction intersecting the first axis.

A rotary table includes: a stage; a rotary base configured to be rotated around a rotation center axis; a support mechanism that is disposed on the rotary base and supports the stage; a leveling adjustment mechanism configured to perform a leveling adjustment of the stage; and a transfer mechanism configured to transfer a rotative force of the rotary base to the stage. The transfer mechanism includes: an annular transfer member configured to receive the support mechanism therethrough; a first connecting mechanism that connects the transfer member and the rotary base and is rotatable around the first axis; and a second connecting mechanism that connects the transfer member and the stage and is rotatable around a second axis defined in a direction intersecting the first axis.

A positioning system includes a body, a flexible band disposed at least partially in the body, and a plurality of rollers in contact with the flexible band, wherein at least one of the rollers is constrained from translation both axially and radially.

A positioning system includes a body, a flexible band disposed at least partially in the body, and a plurality of rollers in contact with the flexible band, wherein at least one of the rollers is constrained from translation both axially and radially.

A rotary table includes: a stage; a rotary base configured to be rotated around a rotation center axis; a support mechanism that is disposed on the rotary base and supports the stage; a leveling adjustment mechanism configured to perform a leveling adjustment of the stage; and a transfer mechanism configured to transfer a rotative force of the rotary base to the stage. The transfer mechanism includes: an annular transfer member configured to receive the support mechanism therethrough; a first connecting mechanism that connects the transfer member and the rotary base and is rotatable around the first axis; and a second connecting mechanism that connects the transfer member and the stage and is rotatable around a second axis defined in a direction intersecting the first axis.

A rotary table includes: a stage; a rotary base configured to be rotated around a rotation center axis; a support mechanism that is disposed on the rotary base and supports the stage; a leveling adjustment mechanism configured to perform a leveling adjustment of the stage; and a transfer mechanism configured to transfer a rotative force of the rotary base to the stage. The transfer mechanism includes: an annular transfer member configured to receive the support mechanism therethrough; a first connecting mechanism that connects the transfer member and the rotary base and is rotatable around the first axis; and a second connecting mechanism that connects the transfer member and the stage and is rotatable around a second axis defined in a direction intersecting the first axis.

The present invention relates to a charged particle beam device capable of suppressing table deformation caused by movement of a rolling element of a guide with a simple configuration, and a strain isolation guide structure, a stage using the guide structure, and a charged particle beam device using the stage are proposed, the strain isolation guide structure being characterized in that, in a sample stage including a linear guide including a carriage (201), a rolling element, and a guide rail (202), and a table (105), the carriage (201) and the table (105) are connected via an adapter (401) as an elastically deformable member.

The present invention relates to a charged particle beam device capable of suppressing table deformation caused by movement of a rolling element of a guide with a simple configuration, and a strain isolation guide structure, a stage using the guide structure, and a charged particle beam device using the stage are proposed, the strain isolation guide structure being characterized in that, in a sample stage including a linear guide including a carriage (201), a rolling element, and a guide rail (202), and a table (105), the carriage (201) and the table (105) are connected via an adapter (401) as an elastically deformable member.

Provided is a compact stage mechanism entailing little backlash and little play in a direction along the axis of a feed screw.

A stage mechanism 10 includes a feed screw 11, a fixed stage 13 having a space portion 13a incorporating the feed screw, a movable stage 15, and a backlash absorbing portion 17. The feed screw has a first end portion 11d and a second end portion 11e. The stage mechanism further includes a deviation preventing portion 19 preventing the feed screw from deviating in a direction toward the first end portion and a pressing force adjusting portion 21 adjusting the pressing force by which the feed screw is pressed in a direction from the second end portion side to the first end portion. The deviation preventing portion is in contact with a wall 13b of the space portion on the first end portion side. The pressing force adjusting portion is in line contact with and presses the second end portion.

An example metrology device can include a first stage including a microelectromechanical (MEMS) device having a probe, and a second stage configured to hold a sample. The metrology device can also include a kinematic coupler for constraining the first stage in a fixed position relative to the second stage. The probe of the MEMS device can be aligned with a portion of the sample when the first stage is constrained in the fixed position relative to the second stage.