Patent classifications
C01G15/00
Near-infrared light-emitting phosphor, phosphor mixture, light-emitting element, and light-emitting device
An object is to provide a new type of near-infrared ray-emitting phosphor which exhibits excellent emission intensity. A near-infrared ray-emitting phosphor is represented by a general formula, (Y, Lu, Gd).sub.3-x-y (Ga,Al,Sc).sub.5O.sub.12:(Cr.sub.x,(Yb,Nd).sub.y) (0.05<x<0.3, 0≤y<0.3).
Battery with acidified cathode and lithium anode
A battery comprising an acidified metal oxide (“AMO”) material, preferably in monodisperse nanoparticulate form 20 nm or less in size, having a pH <7 when suspended in a 5 wt % aqueous solution and a Hammett function H.sub.0 >−12, at least on its surface.
Battery with acidified cathode and lithium anode
A battery comprising an acidified metal oxide (“AMO”) material, preferably in monodisperse nanoparticulate form 20 nm or less in size, having a pH <7 when suspended in a 5 wt % aqueous solution and a Hammett function H.sub.0 >−12, at least on its surface.
MIXED METAL OXIDE
In an aspect, a mixed metal oxide comprises or consists essentially of: a mixture comprises or consisting essentially of 0.30 to 0.69 parts by mole Mg, 0.20 to 0.69 parts by mole Zn, 0.01 to 0.30 parts by mole of a third element selected from Al and Ga, and, either, when the third element is Al, 0.00 to 0.31 parts by mole of other elements selected from metals and metalloids, or, when the third element is Ga, 0.00 to 0.15 parts by mole of other elements selected from metals and metalloids, wherein the sum of all parts by mole of Mg, Zn, the third element, and the other elements amounts to 1.00, wherein the amount in parts by mole of the other elements is lower than the amount in parts by mole of Mg and is lower than the amount in parts by mole of Zn; oxygen; and less than 0.01 parts by mole of non-metallic and non-metalloid impurities.
GaN-on-Si SEMICONDUCTOR DEVICE STRUCTURES FOR HIGH CURRENT/ HIGH VOLTAGE LATERAL GaN TRANSISTORS AND METHODS OF FABRICATION THEREOF
A GaN-on-Si device structure and a method of fabrication are disclosed for improved die yield and device reliability of high current/high voltage lateral GaN transistors. A plurality of conventional GaN device structures comprising GaN epi-layers are fabricated on a silicon substrate (GaN-on-Si die). After processing of on-chip interconnect layers, a trench structure is defined around each die, through the GaN epi-layers and into the silicon substrate. A trench cladding is provided on proximal sidewalls, comprising at least one of a passivation layer and a conductive metal layer. The trench cladding extends over exposed surfaces of the GaN epi-layers, over the interface region with the substrate, and over the exposed surfaces of the interconnect layers. This structure reduces risk of propagation of dicing damage and defects or cracks in the GaN epi-layers into active device regions. A metal trench cladding acts as a barrier for electro-migration of mobile ions.
LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING LAMINATE
A mist-CVD apparatus contains a first atomizer for atomizing a first metal oxide precursor and generating a first mist of the first metal oxide precursor; a second atomizer for atomizing a second metal oxide precursor and generating a second mist of the second metal oxide precursor; a carrier-gas supplier for supplying a carrier gas to convey the first and second mists; a film-forming unit for forming a film on a substrate by subjecting the first and second mists to a thermal reaction; and a first conveyance pipe through which the first mist and the carrier gas are conveyed to the film forming chamber, a second conveyance pipe through which the second mist and the carrier gas are conveyed to the film forming chamber.
System and method for making quantum dots
Embodiments of the present disclosure provide for methods of making quantum dots (QDs) (passivated or unpassivated) using a continuous flow process, systems for making QDs using a continuous flow process, and the like. In one or more embodiments, the QDs produced using embodiments of the present disclosure can be used in solar photovoltaic cells, bio-imaging, IR emitters, or LEDs.
Layered group III-V compound including additive elements and having ferroelectric-like properties, and nanosheet using the same
Proposed are a layered Group III-V compound having ferroelectric properties, a Group III-V compound nanosheet that may be prepared using the same, and an electrical device including the materials. Proposed is a layered compound represented by [Formula 1] M.sub.x−mA.sub.yB.sub.z (M is at least one of Group I or Group II elements, A is at least one of Group III elements, B is at least one of Group V elements, x, y, and z are positive numbers which are determined according to stoichiometric ratios to ensure charge balance when m is 0, and 0<m<x), and having ferroelectric-like properties.
Method for producing metal oxide dispersion liquid and method for producing infrared-radiation-shielding film
According to this method, a fatty acid of CnH.sub.2nO.sub.2 (n=5 to 14) is mixed with a plurality of metal sources selected from Zn, In, Sn, Sb, and Al, thereby fatty acid metal salts are obtained, subsequently the fatty acid metal salts are heated at 130° C. to 250° C., and a metal soap that is a precursor is obtained. This precursor is heated at 200° C. to 350° C., and metal oxide primary particles are dispersed in the precursor melt. To this dispersion liquid, a washing solvent having a δP value higher by 5 to 12 than the δP value of the Hansen solubility parameter of the final dispersing solvent is added, thereby the metal oxide primary particles are washed and agglomerated, metal oxide secondary particles are obtained, and then washing is repeated.
SWIR pcLED and perovskite type and garnet type phosphors emitting in the 1000-1700 nm range
A wavelength converting structure is disclosed, the wavelength converting structure including an SWIR phosphor material having emission wavelengths in the range of 1000 to 1700 nm, the SWIR phosphor material including at least one of a perovskite type phosphor doped with Ni.sup.2+, a perovskite type phosphor doped with Ni.sup.2+ and Cr.sup.3+, and a garnet type phosphor doped with Ni.sup.2+ and Cr.sup.3+.