A method of calculating a form according to an embodiment relates to a method of calculating a processed depth of a material to be etched when the material to be etched is etched using a mask material. The method comprises calculating a first opening solid angle Ω1 based on an opening of a mask pattern, the first opening solid angle Ω1 defining an incident quantity of ions contributing to etching, and calculating a second opening solid angle Ω2 based on an opening of a mask pattern, the second opening solid angle Ω2 defining an incident quantity of depositions. A processed depth at a process point where the material to be etched is etched is calculated based on a linear equation using the first opening solid angle Ω1 and the second opening solid angle Ω2 as variables.

In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.

In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.

A nano-vacuum tube (NVT) transistor comprising a source having a knife edge, a drain, and a channel formed between the source and the drain, the channel having a width to provide a pseudo-vacuum in a normal atmosphere. The NVT transistor utilizing a space charge plasma formed at the knife edge within the channel.

A system for grid control of an electromagnetic ray tube is provided. The system includes a power source, a rectifier, and a grid conductor. The power source is disposed apart from the electromagnetic ray tube and operative to generate an AC current. The rectifier is integrated into the electromagnetic ray tube and electrically coupled to a grid electrode of the electromagnetic ray tube. The grid conductor electrically couples the power source to the rectifier. The rectifier is operative to convert the AC current to a DC current that powers the grid electrode.

A target assembly for an x-ray emission apparatus, the apparatus assembly including: a vacuum chamber having at least one conductive wall; an insulating element projecting through the conductive wall; a conductive high voltage element extending along the insulating element from outside the chamber to an end portion of the insulating element furthest from the conductive wall; an x-ray-generating target arranged at the end portion of the insulating element and electrically connected to the high voltage element; and a suppressive electrode arranged at the end portion of the insulating element and configured to suppress acceleration toward the outer surface of the insulating element of electrons which are emitted from a junction between the outer surface of the insulating element and an inner surface of the conductive wall.

A wire bonded triode for amplification of electromagnetic signals that includes an electron emitter (cathode), control grid, and an electron collector (anode) and having one or more wire bonded structures. A method of making a triode for amplification of electromagnetic signals that includes wirebonding one or more wires to form a wire bonded structure corresponding with one or more of an anode, grid and/or cathode element.

An LED light bulb has a hollow LED support/heat sink (222, 602, 702, 900, 802, 1002, 1102, 1216, 1404, 1502, 1606, 1906) with fins (234, 406, 604, 706, 804, 904, 906,1008, 1106, 1620) extending internally and openings at two ends (230, 232, 1522). Heat generated by the LEDs (238, 908, 1242, 1624, 2504) is conducted through the heat sink fins and is removed by a convectively driven air flow that flows through the LED support/heat sink. LEDs are mounted on multiple external faces (236, 404, 910, 1524, 1622) of the LED support/heat sink thereby providing illumination in all directions. Lenses (1246, 2102, 2104) are provided for the LEDs to make the illumination highly uniform.

The present exemplary embodiments proposes a vacuum tube amplifier module which removes a noise caused by external shock or vibration, including a vacuum tube amplifier which includes an amplifier in a vacuum tube to increase an energy of an input signal to output the energy as an output signal, an assembly unit which fixes at least one side of the vacuum tube amplifier so as to primarily remove the noise, and a magnet which is assembled in the assembly unit to levitate the amplifier so as to secondarily remove the noise to make the noise a predetermined reference value or lower.