The present disclosure provides a crack detection unit (CDU), a semiconductor die, and a method of detecting a crack of a semiconductor die. The CDU comprises a switching circuit, a crack sensor, and a logic circuit. The switching circuit is configured to enable the crack sensor. The crack sensor is configured to be electrically connected to the switching circuit, the ground, and an operating voltage. The logic circuit is configured to be electrically connected to the switching circuit and the crack sensor, wherein the CDU is enabled based on an input of the logic circuit. The output of the logic circuit indicates whether the crack sensor contains a crack.

A semiconductor device includes: a substrate including a main chip area and a scribe lane area, wherein chip circuits are disposed in the main chip area, and the scribe lane area surrounds the main chip area; a first insulating layer disposed on the substrate; a second insulating layer disposed on the first insulating layer and in which a plurality of guard rings are embedded; a dielectric layer disposed on the second insulating layer; and a third insulating layer disposed on the dielectric layer, wherein the scribe lane area includes a first area and a second area, wherein the first area is adjacent to the main chip area based on a decreasing point of a thickness of the third insulating layer, wherein the plurality of guard rings includes a first guard ring disposed in the first area and a second guard ring disposed in the second area.

An electrode structure includes a plurality of FLR electrodes, each having, in at least one of four corner portions, an electrode curve portion defined by an inner edge and an outer edge that are circular arcs in plan view. The inner and outer edges of each electrode curve portion have different centers of curvature and different curvatures. For two mutually adjacent electrode curve portions, the relative magnitudes of the curvatures of the inner and outer edges are opposite. Each electrode curve portion thereby includes a region of large width and a region of narrow width between the inner and outer edges. A part of the region of large width in each electrode curve portion is electrically connected to a corresponding FLR through an FLR connection electrode that penetrates an insulating film.

A multi-die packaging structure includes: a first die, comprising at least a second conductive layer; a second core; and an isolation structure, located on the first die and electrically connected to the second die, wherein the isolation structure comprises: an insulating dielectric layer; the first conductive layer located above the insulating dielectric layer; and an adhesive layer located below the insulating dielectric layer, the first conductive layer in the isolation structure and the second conductive layers in the first die forms at least one of the isolation inductance, isolation capacitor, and isolation transformer. By setting an isolation structure electrically connected to the second die on the first die, the first conductive layer in the isolation structure is separated from the second conductive layer in the first die by an insulating dielectric layer in the isolation structure.

A semiconductor chip includes: a photonic integrated circuit (PIC) comprising an active component electrically connected to a first landing pad at a surface of the PIC, wherein the first landing pad is configured to receive a copper pillar, which, when installed, provides at least a portion of a first electrical interconnect between the active photonic component and a second integrated circuit to be stacked on the surface of the PIC, and wherein, when viewed from above the PIC towards the PIC, a center of the active photonic component on the PIC is offset from a nearest edge of the first landing pad by about a distance less than 10 m.

A semiconductor wafer comprising a first die including a first integrated circuit having a trimmable or programmable component. The trimmable or programmable component is configured to be trimmed or permanently altered in response to an electrical signal. The semiconductor wafer also includes a saw street arranged adjacent to the first die, and at least one probe pad electrically connected to the trimmable or programmable component. The at least one probe pad is arranged in the saw street.

The present disclosure provides a semiconductor structure. The semiconductor structure includes a substrate; and a seal ring region enclosing a circuit region disposed over the substrate. The seal ring region further includes a fin ring protruding from the substrate having a first width; an isolation ring disposed over the substrate and adjacent to the fin ring; a gate ring disposed over the fin ring having a second width, wherein the second width is less than the first width; an epitaxial ring disposed between the fin ring and the isolation ring; and a contact ring lands on the epitaxial ring and the isolation ring. Each of the fin ring, the isolation ring, the epitaxial ring, and the contact ring extends parallel to each other and fully surrounds the circuit region to form a closed loop.

A system and method for a highly integrated environmental sensor and process for manufacturing said sensor is disclosed. Examples of the present disclosure may include an integrated sensor. The integrated sensor may include a redistribution layer (RDL). The integrated sensor may also include a control circuit coupled to the RDL. The integrated sensor may additionally include an analog front-end circuit coupled to the RDL and the control circuit. The integrated sensor may further include an environmental sensor coupled to the analog front-end circuit. The environmental sensor may include a first sensing element deposited in a first trench etched on the RDL using inkjet material deposition.

The present disclosure relates to a flip-chip based moisture-resistant module, which includes a substrate with a top surface, a flip-chip die, a sheet-mold film, and a barrier layer. The flip-chip die has a die body and a number of interconnects, each of which extends outward from a bottom surface of the die body and is attached to the top surface of the substrate. The sheet-mold film directly encapsulates sides of the die body, extends towards the top surface of the substrate, and directly adheres to the top surface of the substrate, such that an air-cavity with a perimeter defined by the sheet-mold film is formed between the bottom surface of the die body and the top surface of the substrate. The barrier layer is formed directly over the sheet-mold film, fully covers the sides of the die body, and extends horizontally beyond the flip-chip die.

A chip includes a semiconductor substrate, integrated circuits with at least portions in the semiconductor substrate, and a surface dielectric layer over the integrated circuits. A plurality of metal pads is distributed substantially uniformly throughout substantially an entirety of a surface of the chip. The plurality of metal pads has top surfaces level with a top surface of the surface dielectric layer. The plurality of metal pads includes active metal pads and dummy metal pads. The active metal pads are electrically coupled to the integrated circuits. The dummy metal pads are electrically decoupled from the integrated circuits.