A multi-layered coating system for a substrate and a method for preparing the multi-layered coating system are provided herein. The multi-layered coating system includes a substrate, a metallic layer disposed adjacent to at least a portion of the substrate, an adhesion layer disposed adjacent to at least a portion of the metallic layer, and a protective coating layer disposed adjacent to at least a portion of the adhesion layer. The metallic layer includes a metal, an oxide of the metal, or a combination thereof. The adhesion layer includes a silicate and latex.

A method to transfer a layer of harder thin film substrate onto a softer, flexible substrate. In particular, the present invention provides a method to deposit a layer of sapphire thin film on to a softer and flexible substrate e.g. quartz, fused silica, silicon, glass, toughened glass, PET, polymers, plastics, paper and fabrics. This combination provides the hardness of sapphire thin film to softer flexible substrates.

A method for depositing a conductive coating on a surface is provided, the method including treating the surface by depositing fullerene on the surface to produce a treated surface and depositing the conductive coating on the treated surface. The conductive coating generally includes magnesium. A product and an organic optoelectronic device produced according to the method are also provided.

To provide a sliding member comprising a coating film exhibiting constant and stable chipping resistance and wear resistance and excellent in peeling resistance (adhesion), and the coating film thereof. The above-described problem is solved by a sliding member (10) comprising a coating film (1) on a sliding surface (16) on a base material (11). The coating film (1) has, when a cross section thereof is observed by a bright-field TEM image, a total thickness within a range of 1 μm to 50 μm, in repeating units including black hard carbon layers (B), relatively shown in black, and white hard carbon layers (W), relatively shown in white, and laminated in a thickness direction (Y). In the black hard carbon layer (B) and the white hard carbon layer (W) adjacent to each other, the white hard carbon layer (W) has higher hardness and a larger [sp.sup.2/(sp.sup.2+sp.sup.3)] ratio than the black hard carbon layer (B).

Provided is a sputtering target to be used for forming a granular magnetic thin film in which FePt magnetic grains are isolated by an oxide and which constitutes a heat-assisted magnetic recording medium having enhanced uniaxial magnetic anisotropy, thermal stability, and SNR (signal-to-noise ratio).

The sputtering target for a heat-assisted magnetic recording medium contains an FePt alloy and a nonmagnetic material as main components, where the nonmagnetic material is an oxide having a melting point of 800° C. or higher and 1100° C. or lower.

A surface-coated cutting tool comprises a tool substrate comprising a cBN sinter and a hard coating layer including a lower sublayer α and an upper sublayer β on the surface of the cutting edge; wherein α satisfies (Al.sub.1-xTi.sub.x)N (0.40≤x≤0.60); β satisfies (Al.sub.1-y-zTi.sub.yB.sub.z)N (0.40≤y≤0.60 and 0.01≤z≤0.10); in the sublayer β, the variation in the concentration of the B component is repeated; the average Bmaxav of the maxima in the concentration of the B component satisfies z<Bmaxav≤2.0×z, and the average Bminav of the minima in the concentration of the B component satisfies 0≤Bminav<z; and the average thickness tα of α and the average thickness tβ of β satisfy expression: 2.0≤<tβ/tα≤6.0; and the residual stress σ of the overall hard coating layer satisfies −2.0 GPa≤σ≤−0.5 GPa.

Multi-layer metal or pseudometallic materials having engineered anisotropy are disclosed. The multi-layer materials having defined engineered grain orientations in each layer of the multi-layer material and bond layers between adjacent layers orthogonal to the grain orientations. This configuration distributes applied stress across the plurality of layers in the multi-layer metal material and around a neutral axis of the multi-layer metal material and increases the overall mechanical properties of the disclosed multi-layer metal material relative to conventional wrought metal materials of the same or similar chemical constitution. The microstructure of each layer, group of layers, or across multiple layers may be tailored to the intended application of a device made from the material. Individual layers may be tuned for property variations, such as gradients, or to adjust the bond layer characteristics. A method of making the multi-layer metal materials by physical vapor deposition to deposit each layer as crystalline grain structures and allow for layer-by-layer control over the physical, mechanical and chemical properties of each layer in the multi-layer metal as well as a bond layer between adjacent layers is disclosed.

The present application provides a fabric coloring method and a colored fabric, where the fabric coloring method includes: performing radiation drying on a base cloth; sequentially forming an adhesive layer and at least one color-generating layer on a surface of the base cloth after the radiation drying by vacuum deposition, where the adhesive layer contains at least one of Ti, Cr, Si and Ni, and a thickness of the adhesive layer ranges from 1 nm to 2000 nm; the color-generating layer contains at least one of Al, Ti, Cu, Fe, Mo, Zn, Ag, Au, and Mg, and the total thickness of the color-generating layer ranges from 1 nm to 4000 nm. The fabric coloring method can not only produce rich colors and make the colored fabric have good color fastness, but also reduce the sensitivity of color of the colored fabric to thickness of the film, thus improving the industrial operability.

A physical vapor deposition (PVD) system is disclosed. The PVD system includes a pedestal configured to hold a semiconductor wafer, a cover plate configured to hold a target, and a collimator between the pedestal and the cover plate. The collimator includes a plurality of passages configured to pass source material travelling from the cover plate toward the pedestal at an angle less than a threshold angle with respect to a line perpendicular to a surface of the pedestal facing the cover plate, where the collimator is configured to block source material travelling from the cover plate toward the pedestal at an angle greater than the threshold angle, where a first passage of the plurality of passages has a first passage length, where a second passage of the plurality of passages has a second passage length, and where the first passage length is less than the second passage length.

A method for modifying carbon fibers and a product thereof are provided. Modified carbon fibers are obtained by heating prepared carbon fibers under an inert atmosphere after magnetron sputtering treatment. The magnetron sputtering treatment takes the prepared carbon fibers as a substrate material and carbon as a target material, and sputtering conditions includes: a vacuum degree of 2×10.sup.−3 Pa, a distance from the target material to the substrate material of 4 cm, a magnetron sputtering power of 150-350 W, a magnetron sputtering pressure of 0.5-1.6 Pa, a magnetron sputtering duration of 20-60 min, a high purity argon as working gas, and an argon flow rate of 80 mL/min The heating treatment is carried out under conditions including: a heating rate of 5° C./min, a heating temperature of 200-600° C., and a heating duration of 25-40 min.