The invention relates to a method for producing a multi-layer sliding bearing element (1), according to which, in a chamber of a cathode sputtering installation a metal layer is deposited on a substrate by means of cathode sputtering of at least one target, said method comprising the steps: introducing a substrate into the chamber of the cathode sputtering installation; ion etching of the surface of the substrate to be coated by ion bombardment, whereby substrate particles are removed from the surface of the substrate; depositing the metal layer on the substrate, whereto target particles are produced from at least one target that is connected as the cathode, said particles being settled on the substrate. In the step of ion etching of the substrate, the target is connected as the anode and at least some of the substrate particles are deposited on the target. The polarity of the target is then reversed for the deposition of the metal layer on the surface of the substrate.

A hard carbon coating and a method to improve its adhesion on components and tools subjected to high loads or subjected to extreme friction, wear and contact with other parts. The metal carbide transition layer is situated between the adhesivepromoting layer deposited directly onto the substrate surface and a top hard carbon coating. The metal carbide transition layer has a denser microstructure and improved mechanical properties in order to resist failure by spalling.

A low friction wear film includes a chromium layer provided on a surface of a metal substrate, a tungsten carbide layer provided on a surface of the chromium layer, and a diamond-like carbon layer as a top layer provided on a surface of the tungsten carbide layer. The tungsten carbide layer includes a chromium-tungsten carbide gradient layer and a tungsten carbide uniform layer. In the tungsten carbide layer, a tungsten-concentrated layer in which a tungsten simple substance is present is not provided at a boundary between the chromium-tungsten carbide gradient layer and the tungsten carbide uniform layer.

Provided is a ZnMg alloy plated steel material comprising: a base steel material; and first to third ZnMg alloy layers sequentially formed on the base steel material, wherein the first to third ZnMg alloy layers have a Zn single phase, a Mg single phase, a MgZn.sub.2 alloy phase, and a Mg.sub.2Zn.sub.11 alloy phase, an area rate of the MgZn.sub.2 alloy phase included in the first to third ZnMg alloy layers is larger than an area rate of the Mg.sub.2Zn.sub.11 alloy phase included in the first to third ZnMg alloy layers, and an area rate of a MgZn.sub.2 alloy phase included in each of the first to third ZnMg alloy layers is larger than an area rate of a MgZn.sub.2 alloy phase included in the second ZnMg alloy layer.

A method of manufacturing an iron bus bar includes preparing an iron core and forming a copper layer having a thickness of 10 to 30 m on the iron core by coating. The manufactured iron bus bar has high strength and durability as well as excellent electrical conductivity can be manufactured at low cost.

The invention relates to a process for producing a component (10) that has a metallic substrate (14), in particular made of brass or aluminum, and an anti-corrosion coating applied to a surface of the substrate (14). The anti-corrosion coating (16) comprises a diffusion layer (20) and an anti-corrosion layer (30). The diffusion layer (20) is applied directly to the surface (18) of the substrate (14), and comprises, at least in sections, a material that generates a space-filling corrosion product (38) when it comes in contact with a corrosion agent (32). The anti-corrosion layer (30) has at least one first anti-corrosion layer (22a, 22b, 22c) and at least one second anti-corrosion layer (24a, 24b). The first anti-corrosion layer (22a, 22b, 22c) forms a barrier for the corrosion agent (32), and the second anti-corrosion layer (24a, 24b) contains a material that generate a space-filling corrosion product (38) when it comes in contact with a corrosion agent (32. The process comprises the following steps: a. provision of the metallic substrate (14), wherein the surface (18) of the substrate (14) is chemically and physically cleaned, b. application of a diffusion layer (20) to the substrate (14), c. application of a first anti-corrosion layer (22a), and d. application of the second anti-corrosion layer (24a) to the first anti-corrosion layer (22a).
The diffusion layer (20) ant the first anti-corrosion layer (22a) and second anti-corrosion layer (24a) are applied with a physical vapor deposition process, in particular an arc vaporization process or a cathode sputtering process.

The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of ZrC.sub.x can be formed in which a zirconium monocarbide is formed; and the layer consisting of ZrC.sub.x and comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.

An evaporation apparatus (100) for depositing material on a flexible substrate (160) supported by a processing drum (170) is provided. The evaporation apparatus includes: a first set (110) of evaporation crucibles aligned in a first line (120) along a first direction for generating a cloud (151) of evaporated material to be deposited on the flexible substrate (160); and a gas supply pipe (130) extending in the first direction and being arranged between an evaporation crucible of the first set (110) of evaporation crucibles and the processing drum (170), wherein the gas supply pipe (130) includes a plurality of outlets (133) for providing a gas supply directed into the cloud of evaporated material, and wherein a position of the plurality of outlets is adjustable for changing a position of the gas supply directed into the cloud of evaporated material.

Provided is a cutting tool comprising a base material and a film arranged on the base material, in which the film includes a hard carbon film on the outermost surface thereof, the hard carbon film includes a first region, the first region is a region sandwiched between the surface of the hard carbon film and an imaginary plane P at a distance of 40 nm from the surface to the base material side, and the sp2 component amount C2 and the sp3 component amount C3 in the first region exhibit a relationship of the following formula 1:

{C2/(C2+C3)}?100?2.0formula 1.

A semiconductor material emitting device is positioned such that its output flux impinges on a substrate at a non-perpendicular angle, so as to grow a first epilayer which is linearly graded in the direction perpendicular to the growth direction. The linear grading can be arranged such that, for example, each row of pixels has a different cutoff wavelength, thereby making it possible to provide a spectroscopic FPA without the use of filters. The non-perpendicular angle and/or the flux intensity can be adjusted to achieve a desired compositional grading. A spectral ellipsometer may be used to monitor the composition of the epilayer during the fabrication process, and to control the intensity of the flux.