An apparatus for the implementation of a process for the continuous manufacturing of steel strips for packaging coated with a passivation layer is provided. An apparatus contains a transfer roller; a coating roller contacting the transfer roller, a surface of the coating roller having a plurality of hexagonally shaped cells with a line count being from 50 to 200 lines per centimeter and a volume being from 5.Math.10.sup.?6 to 10.Math.10.sup.?6 m.sup.3 per square meter of the coating roller surface; and a tank containing an aqueous passivation solution, the tank providing the aqueous passivation solution to the coating roller.

An apparatus for the implementation of a process for the continuous manufacturing of steel strips for packaging coated with a passivation layer is provided. An apparatus contains a transfer roller; a coating roller contacting the transfer roller, a surface of the coating roller having a plurality of hexagonally shaped cells with a line count being from 50 to 200 lines per centimeter and a volume being from 5.Math.10.sup.?6 to 10.Math.10.sup.?6 m.sup.3 per square meter of the coating roller surface; and a tank containing an aqueous passivation solution, the tank providing the aqueous passivation solution to the coating roller.

The present invention relates to a method for the serial surface treatment of metal components that have zinc surfaces, wherein the method comprises an alkaline pretreatment, and a method for the selective removal of zinc ions from an alkaline bath solution for the serial surface treatment of metal surfaces that have zinc surfaces. According to the invention, in order to perform each method, part of the alkaline aqueous bath solution is brought in contact with an ion exchange resin that bears functional groups selected from OPO.sub.3X.sub.2/n and/or PO.sub.3X.sub.2/n, wherein X is either a hydrogen atom or an alkali metal and/or alkaline-earth metal atom to be exchanged having the particular valency n.

The present invention relates to a method for the serial surface treatment of metal components that have zinc surfaces, wherein the method comprises an alkaline pretreatment, and a method for the selective removal of zinc ions from an alkaline bath solution for the serial surface treatment of metal surfaces that have zinc surfaces. According to the invention, in order to perform each method, part of the alkaline aqueous bath solution is brought in contact with an ion exchange resin that bears functional groups selected from OPO.sub.3X.sub.2/n and/or PO.sub.3X.sub.2/n, wherein X is either a hydrogen atom or an alkali metal and/or alkaline-earth metal atom to be exchanged having the particular valency n.

A highly reactive conversion coating chemistry is used during CAVF processing of high hardness steel alloys such as AMS 6509 and AMS 6517 steel alloys. This chemistry produces a hard, thin, black conversion coating that is not fully rubbed off by the media during the CAVF process. Distressed material regions on the surface of the alloys are not susceptible to forming the conversion coating and remain white. Visual inspection for the presence of such regions is facilitated.

A highly reactive conversion coating chemistry is used during CAVF processing of high hardness steel alloys such as AMS 6509 and AMS 6517 steel alloys. This chemistry produces a hard, thin, black conversion coating that is not fully rubbed off by the media during the CAVF process. Distressed material regions on the surface of the alloys are not susceptible to forming the conversion coating and remain white. Visual inspection for the presence of such regions is facilitated.

The present invention relates to a method for adjusting a passivation composition by determining the redox potential of a passivation composition as well as to a method for passivating metallic substrates by treatment with a passivation composition.

Methods of patterning semiconductor devices comprising selective deposition methods are described. A blocking layer is deposited on a metal surface of a semiconductor device before deposition of a dielectric material on a dielectric surface. Methods include exposing a substrate surface including a metal surface and a dielectric surface to a heterocyclic reactant comprising a headgroup and a tailgroup in a processing chamber and selectively depositing the heterocyclic reactant on the metal surface to form a passivation layer, wherein the heterocyclic headgroup selectively reacts and binds to the metal surface.

Methods of patterning semiconductor devices comprising selective deposition methods are described. A blocking layer is deposited on a metal surface of a semiconductor device before deposition of a dielectric material on a dielectric surface. Methods include exposing a substrate surface including a metal surface and a dielectric surface to a heterocyclic reactant comprising a headgroup and a tailgroup in a processing chamber and selectively depositing the heterocyclic reactant on the metal surface to form a passivation layer, wherein the heterocyclic headgroup selectively reacts and binds to the metal surface.

A surface treatment apparatus includes a treatment vessel including a treatment space in which a metal component is disposed, a spray nozzle that supplies mist of a non-chromate conversion treatment liquid to the treatment space, and a circulation device that collects the non-chromate conversion treatment liquid from the treatment space and supplies the non-chromate conversion treatment liquid to the spray nozzle.