Patent classifications
C03B2201/23
Perforated quartz glass tube and method for manufacturing perforated quartz glass tube
A perforated quartz glass tube includes a jacket tube containing a quartz glass material, a plurality of cylindrical glass tubes which are inserted into a pore region of the jacket tube along an axial direction of the jacket tube, and contain a quartz glass material having a softening point higher than a softening point of the jacket tube, and a gap member which is inserted into a gap between the cylindrical glass tubes and a gap between the jacket tube and the cylindrical glass tube, and contains a quartz glass material having a softening point lower than a softening point of the cylindrical glass tube.
Synthetic quartz glass substrate and making method
A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250 C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450 C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400 C. for 5-10 hours.
Synthetic opaque quartz glass and method for producing the same
Provided is a method for producing a synthetic opaque quartz glass where flame processing can be performed in high purity with a simple way and even a large sized one can be produced, and the synthetic opaque quartz glass. A method for producing a synthetic opaque quartz glass which comprises the step of heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200 C. The quartz glass porous body is prepared by depositing quartz glass particles which are produced by hydrolyzing a silicon compound with an oxyhydrogen flame.
METHOD FOR MANUFACTURING OPTICAL FIBER PARENT MATERIAL, AND METHOD FOR MANUFACTURING OPTICAL FIBER
A method for manufacturing an optical fiber preform including a core part and a cladding part is disclosed. The method includes: adding an alkali metal to an inner surface of a silica-based glass pipe; etching the inner surface of the silica-based glass pipe to which the alkali metal is added; making a glass rod by collapsing the silica-based glass pipe after the etching; and making an optical fiber preform using the glass rod. The silica-based glass pipe is heated in the adding such that a surface temperature of the silica-based glass pipe falls within a temperature range of 1500 C. or higher to lower than 2000 C.
Method to Reduce Darkening in Phosphor in Glass (PIG) Made by SPS
A method for preparing a glass composite wavelength converter comprising the steps of providing at least one phosphor material, providing a powder of glass components, mixing the phosphor material and the powder of glass components, thereby preparing a first mixture, adding at least one oxidizing agent to the first mixture, mixing the oxidizing agent with the first mixture, thereby preparing a second mixture, applying pressure and current to the second mixture, thereby preparing a glass composite wavelength converter is described. Furthermore, a glass component wavelength converter and a light source are described.
Mirror blank for EUV lithography without expansion under EUV radiation
A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.
Ultraviolet-Resistant Quartz Glass and Method of Producing the Same
The present invention pertains to: a method for manufacturing an ultraviolet-resistant quartz glass, said method including melting a synthetic silica powder; and a method for manufacturing an ultraviolet-resistant quartz glass, said method including performing arc plasma melting of a silica powder. Provided is an ultraviolet-resistant quartz glass having an ultraviolet-resistance of 2500 seconds, wherein, taking the initial transmittance during irradiation of a quadruple higher harmonic (266 nm) of a YAG laser (irradiation performed at a YAG laser output of 180 mW, pulse width of 20 nsec, and frequency of 80 kHz) at an optical path length of 30 mm to be 100%, the irradiation period until the transmittance falls to 3% is defined as resistance to ultraviolet rays (referred to as ultraviolet-resistance). Also provided is an optical member for YAG-laser higher harmonics, said optical member comprising this quartz glass.
HOMOGENOUS SILICA-TITANIA GLASS
A glass including silica and titania is disclosed. An average hydroxyl concentration of a plurality segments of the glass is in a range from about 20 ppm to about 450 ppm, an average titania concentration of the plurality of segments is in a range from about 6 wt. % to about 12 wt. %, and each segment of the plurality of segments has a length of about 12.7 mm, a width of about 12.7 mm, and a height of about 7.62 mm. The hydroxyl concentration of each segment is measured using a Fourier transform infrared spectroscopy in transmission, the refractive index is measured using an optical interferometer with a 633 nm operating wavelength and a resolution of 270 microns270 microns pixel size, and the average titania concentration is determined based upon the measured refractive index.
SYNTHETIC QUARTZ GLASS SUBSTRATE AND MAKING METHOD
A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250 C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450 C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400 C. for 5-10 hours.
Discharge lamp
A discharge lamp includes a discharge vessel. A xenon gas is sealed within the discharge vessel so as to serve as a light emitting gas, the discharge vessel is made from quartz glass, a pair of electrodes are arranged so as to face each other in the discharge vessel, and the discharge vessel has a chip portion. The chip portion is made from a glass member that has a composition different from that of the discharge vessel, and the glass member has a transmittance of 50% or more over a wavelength range from 170 nm to 300 nm.