A waterproofing system including a functional layer S1 including 10-80 wt.-% of at least one thermoplastic polymer P1 and 10-80 wt.-% of at least one solid particulate filler F, wherein the surface of the functional layer S1 has an Auto-correlation length of waviness W(Sal) of at least 50 m. Further, a method for producing a waterproofing system and to the use of a mechanical surface treatment step to increase the waviness factor, determined as the ratio of the Root mean square roughness of waviness W(Sq) to the square of the Auto-correlation length of waviness W(Sal), of a surface of a functional layer S1.

A method of processing a ceramic matrix composite (CMC) component includes extracting silicon from a surface region of the CMC component such that free silicon is present in the surface region at a reduced amount of about 5 vol. % or less. The extraction comprises contacting the surface region with a wicking medium comprising an element reactive with silicon. The extraction is carried out at an elevated temperature prior to assembling the CMC component with a metal component.

Various embodiments for a median barrier finishing machine are described. A median barrier finishing machine may include a housing configured to encapsulate at least a portion of a median barrier, where the housing comprises a first vertical wall, a second vertical wall, and a horizontal wall. The median barrier finishing machine may include at least one adjustable member configured to couple the housing to the vehicle and retain the housing a predetermined distance relative to the vehicle while the vehicle is in motion. Further, the median barrier finishing machine may include at least one finishing device disposed within the housing, where the at least one finishing device is configured to contact a surface of a median barrier at least partially positioned within the housing and treat the surface as the vehicle moves the housing along a length of the median barrier.

Provided are a method and system for preparing a two-dimensional material by means of a gas-phase method. The method comprises a gas-phase etching step: reacting gas having an etching effect with an MAX phase material at a first predetermined temperature, and etching a component A in the MAX phase material to obtain a two-dimensional material containing MX. The method avoids requiring the steps such as repeated cleaning, ultrasonic and centrifugal separation, and drying in preparing MXene in a liquid-phase method, greatly simplifies a preparation process, reduces the preparation cost, can achieve industrial macro preparation of MXene, and lays a foundation for application of MXene in different fields.

The present invention provides a ceramic wafer with a surface shape and a manufacturing method thereof. The ceramic wafer has an upper surface and a lower surface, and at least one of the upper surface and the lower surface has an irregular surface shape. The total thickness variation (TTV) value between the two surfaces ranges from 0.1 to 100 m. The ceramic wafer with the surface shape of the present invention, by controlling the total thickness variation of the wafer, not only helps the coating, but also improves the flow of the fluid, and can improve the bonding force of the coating and reduce the surface defects in the subsequent process.

By surface roughening of CMC component via a pico-laser treatment a good adhering of a plasma sprayed coating is achieved.

A method for applying a coating 1 to a surface 2 of a mullite material 3 is specified, which comprises pretreating the surface 2 of the mullite material 3 by means of a plasma-chemical process in which molecular hydrogen is excited in such a way that plasma-activated hydrogen is produced S1, and applying an aluminum oxide-containing layer 4 by means of a PVD process to the pretreated surface 2 of the mullite material 3 S2. Furthermore, a mullite material 3 with a coating and a gas turbine component with such a mullite material 3 are specified.

Tin oxide films are used as mandrels in semiconductor device manufacturing. In one implementation the process starts by providing a substrate having a plurality of protruding tin oxide features (mandrels) residing on an exposed etch stop layer. Next, a conformal layer of spacer material is formed both on the horizontal surfaces and on the sidewalls of the mandrels. The spacer material is then removed from the horizontal surfaces exposing the tin oxide material of the mandrels, without fully removing the spacer material residing at the sidewalls of the mandrel (e.g., leaving at least 50%, such as at least 90% of initial height at the sidewall). Next, mandrels are selectively removed (e.g., using hydrogen-based etch chemistry), while leaving the spacer material that resided at the sidewalls of the mandrels. The resulting spacers can be used for patterning the etch stop layer and underlying layers.

In a method of an embodiment, a pressure sensor is selected from first and second pressure sensors according to a set flow rate. A measurable maximum pressure of the second pressure sensor is higher than a measurable maximum pressure of first pressure sensor. The target pressure of a chamber is determined according to the set flow rate. Until the pressure of the chamber reaches the target pressure after gas is started to be output from the flow rate controller to the chamber at an output flow rate according to the set flow rate and a pressure controller provided between the chamber and an exhaust apparatus is closed, the pressure of the chamber is measured by the selected pressure sensor. The output flow rate of the flow rate controller is determined from a rate of rise of the pressure of the chamber.

A waterproofing system including a functional layer S1 including 10-80 wt.-% of at least one thermoplastic polymer P1 and 10-80 wt.-% of at least one solid particulate filler F, wherein the surface of the functional layer S1 has an Auto-correlation length of waviness W(Sal) of at least 50 ?m. Further, a method for producing a waterproofing system and to the use of a mechanical surface treatment step to increase the waviness factor, determined as the ratio of the Root mean square roughness of waviness W(Sq) to the square of the Auto-correlation length of waviness W(Sal), of a surface of a functional layer S1.