The composition includes a polyester resin comprising at least one α,β-unsaturated ester group, an epoxy resin, a compound comprising at least one hydroxyl group; and a photoinitiator that generates acid on exposure to actinic radiation. A method of repairing a damaged surface using the composition is also described.

The composition includes a polyester resin comprising at least one α,β-unsaturated ester group, an epoxy resin, a compound comprising at least one hydroxyl group; and a photoinitiator that generates acid on exposure to actinic radiation. A method of repairing a damaged surface using the composition is also described.

The present invention relates to an antimicrobial polymer coating composition including: a (meth)acrylate-based monomer or oligomer containing an alkylene oxide having 1 to 10 carbon atoms; a photosensitizer; and a photoinitiator, and an antimicrobial polymer film including a substrate layer including a polymer resin containing a (meth)acrylate-based repeating unit having an introduced alkylene oxide functional group having 1 to 10 carbon atoms, and a photosensitizer dispersed in the substrate layer, wherein the antimicrobial polymer film has surface energy of 32 mN/m or more.

The present invention relates to an antimicrobial polymer coating composition including: a (meth)acrylate-based monomer or oligomer containing an alkylene oxide having 1 to 10 carbon atoms; a photosensitizer; and a photoinitiator, and an antimicrobial polymer film including a substrate layer including a polymer resin containing a (meth)acrylate-based repeating unit having an introduced alkylene oxide functional group having 1 to 10 carbon atoms, and a photosensitizer dispersed in the substrate layer, wherein the antimicrobial polymer film has surface energy of 32 mN/m or more.

Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.

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Provided is an eyelash extension adhesive comprising the following components (a) and (b): (a) a monofunctional monomer of formula (I) wherein R.sup.1 represents a hydrogen atom or a methyl group, and R.sup.2 to R.sup.6 each independently represent a hydrogen atom or a C1 to C6 alkyl group, and (b) a photopolymerization initiator. The eyelash extension adhesive is excellent in durability and water resistance, can adhere easily to eyelashes even in a wet state, and is very useful as a photopolymerizable adhesive for eyelash extension attachment not including a cyanoacrylate compound.

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The invention relates to an ink based on near-infrared light polymerization. The method and technology of direct writing three-dimensional printing belong to the field of material processing technology area. The method is: direct writing nozzles move in three-dimensional space or stationery, the ink is squeezed out of the direct writing nozzle, receiving the near-infrared light irradiation, after curing, complete the three-dimensional object forming and curing. The solidifying time t does not exceed the ratio of near-infrared light diameter d.sub.1 and the ink extrusion speed vi, that is, t≤d.sub.1/v.sub.i. Since near-infrared light has a better medium mass penetration, can penetrate the structure during molding to promote both internal and external to a higher degree of curing, so as to achieve cross-scale structure 3D printing, and the method provided by the present invention accurately controls solidifying process of the ink and therefore achieve the DIW array 3D structure real-time curing.

The invention relates to an ink based on near-infrared light polymerization. The method and technology of direct writing three-dimensional printing belong to the field of material processing technology area. The method is: direct writing nozzles move in three-dimensional space or stationery, the ink is squeezed out of the direct writing nozzle, receiving the near-infrared light irradiation, after curing, complete the three-dimensional object forming and curing. The solidifying time t does not exceed the ratio of near-infrared light diameter d.sub.1 and the ink extrusion speed vi, that is, t≤d.sub.1/v.sub.i. Since near-infrared light has a better medium mass penetration, can penetrate the structure during molding to promote both internal and external to a higher degree of curing, so as to achieve cross-scale structure 3D printing, and the method provided by the present invention accurately controls solidifying process of the ink and therefore achieve the DIW array 3D structure real-time curing.

A photocurable composition for three-dimensional stereolithography which has a lower viscosity and from which a cured product having a high refractive index is obtained, and a three-dimensional object formed by using the composition. The composition is a photocurable composition for three-dimensional stereolithography containing a fluorene monomer, a carbazole monomer, a diluent monomer, and a photopolymerization initiator, the carbazole monomer being contained in an amount of less than 30 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer, and the diluent monomer being contained in an amount of at least 20 wt % with respect to total solids.

A photocurable composition for three-dimensional stereolithography which has a lower viscosity and from which a cured product having a high refractive index is obtained, and a three-dimensional object formed by using the composition. The composition is a photocurable composition for three-dimensional stereolithography containing a fluorene monomer, a carbazole monomer, a diluent monomer, and a photopolymerization initiator, the carbazole monomer being contained in an amount of less than 30 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer, and the diluent monomer being contained in an amount of at least 20 wt % with respect to total solids.