The present disclosure provides a front panel for a display device comprising a substrate layer, an A layer, an impact absorbing layer, and a B layer, in this order, wherein a shear storage elastic modulus of the A layer and the B layer, at frequency of 950 Hz and temperature of 23° C., is 20 MPa or less, and in the impact absorbing layer, a tensile storage elastic modulus at frequency of 950 Hz and temperature of 23° C. is 200 MPa or more and 5000 MPa or less, and a glass transition temperature is 50° C. or more.

An article includes a polymer. The polymer includes a product of a crosslinking reaction including at least one cross-linker selected from the group consisting of: a) di-acrylates, tri-acrylates, and tetra-acrylates; b) modified tri-acrylates and tetra-acrylates; c) silanes and siloxanes; and d) triazinane-triones.

An article includes a polymer. The polymer includes a product of a crosslinking reaction including at least one cross-linker selected from the group consisting of: a) di-acrylates, tri-acrylates, and tetra-acrylates; b) modified tri-acrylates and tetra-acrylates; c) silanes and siloxanes; and d) triazinane-triones.

A composite film may include a first transparent substrate and a first anti-reflective coating overlying a first surface of the first transparent substrate. The first anti-reflective coating may include a first UV curable acrylate binder, a photo initiator component, and silica nanoparticles dispersed within the first anti-reflective coating. The first anti-reflective coating may further include a ratio AC1.sub.SiO2/AC1.sub.B of at least about 0.01 and not greater than about 1.3. The composite film may further have a VLT of at least about 93.0% and a haze value of not greater than about 3%.

A composite film may include a first transparent substrate and a first anti-reflective coating overlying a first surface of the first transparent substrate. The first anti-reflective coating may include a first UV curable acrylate binder, a photo initiator component, and silica nanoparticles dispersed within the first anti-reflective coating. The first anti-reflective coating may further include a ratio AC1.sub.SiO2/AC1.sub.B of at least about 0.01 and not greater than about 1.3. The composite film may further have a VLT of at least about 93.0% and a haze value of not greater than about 3%.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention provides a resin composition for stereolithography that excels in strength, toughness, and water resistance in the form of a shaped article. The present invention relates to a resin composition for stereolithography that comprises a urethanized (meth)acrylic compound (A), a (meth)acrylate compound (B) containing no urethane bond, and a photopolymerization initiator (C), the compound (A) being a urethanized (meth)acrylic compound (A-1) having a polymer structure, and/or a urethanized (meth)acrylic compound (A-2) having no polymer structure, the compound (A-1) having a weight-average molecular weight of less than 1,000, the compound (A-2) having a molecular weight of less than 1,000, the compound (B) comprising at least one selected from the group consisting of a (meth)acrylate compound (b-I) represented by general formula (I), and a (meth)acrylate compound (b-II) represented by general formula (II).

##STR00001##

The present invention provides a resin composition for stereolithography that excels in strength, toughness, and water resistance in the form of a shaped article. The present invention relates to a resin composition for stereolithography that comprises a urethanized (meth)acrylic compound (A), a (meth)acrylate compound (B) containing no urethane bond, and a photopolymerization initiator (C), the compound (A) being a urethanized (meth)acrylic compound (A-1) having a polymer structure, and/or a urethanized (meth)acrylic compound (A-2) having no polymer structure, the compound (A-1) having a weight-average molecular weight of less than 1,000, the compound (A-2) having a molecular weight of less than 1,000, the compound (B) comprising at least one selected from the group consisting of a (meth)acrylate compound (b-I) represented by general formula (I), and a (meth)acrylate compound (b-II) represented by general formula (II).

##STR00001##

A coloring composition is a coloring composition including a black colorant, a polymerizable compound, and a photopolymerization initiator, in which the photopolymerization initiator includes a photopolymerization initiator a in which a light absorption coefficient at 365 nm in methanol is more than 1.0×10.sup.2 mL/gcm and a photopolymerization initiator b in which a light absorption coefficient at 365 nm in methanol is 1.0×10.sup.2 mL/gcm or less and a light absorption coefficient at 254 nm is 1.0×10.sup.3 mL/gcm or more, a content of the photopolymerization initiator b is 45.0 to 200.0 parts by mass with respect to 100.0 parts by mass of a content of the photopolymerization initiator a, and a ratio of a maximum absorbance to a minimum absorbance of a coloring cured film obtained by curing the coloring composition at a wavelength of 400 to 700 nm is 1.0 to 2.5.