A sealant composition with which a decrease in voltage holding rate is less likely to occur in a liquid crystal cell for a scanning antenna, the sealant composition according to the present invention includes a photo-radical polymerization initiator that generates a radical through application of light with a wavelength of 450 nm or greater and a polymerization component that contains a polymerizable functional group that is polymerizable using the radical.

A sealant composition with which a decrease in voltage holding rate is less likely to occur in a liquid crystal cell for a scanning antenna, the sealant composition according to the present invention includes a photo-radical polymerization initiator that generates a radical through application of light with a wavelength of 450 nm or greater and a polymerization component that contains a polymerizable functional group that is polymerizable using the radical.

The present invention relates to an acrylic adhesive composition, and a polarizing plate and a display device manufactured using the same, wherein the acrylic adhesive composition includes an acrylic copolymer formed by polymerizing a monomer mixture including a (meth)acrylic monomer and a (meth)acrylic monomer containing a hydroxy group, an isocyanate-based multi-functional curing agent, a curing retarder including a first curing retarder having a deblocking temperature of 110° C. or lower and a second curing retarder having a deblocking temperature of 130° C. or higher, and a silane coupling agent.

The present invention relates to an acrylic adhesive composition, and a polarizing plate and a display device manufactured using the same, wherein the acrylic adhesive composition includes an acrylic copolymer formed by polymerizing a monomer mixture including a (meth)acrylic monomer and a (meth)acrylic monomer containing a hydroxy group, an isocyanate-based multi-functional curing agent, a curing retarder including a first curing retarder having a deblocking temperature of 110° C. or lower and a second curing retarder having a deblocking temperature of 130° C. or higher, and a silane coupling agent.

A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.

A coating composition including at least one solvent, at least one resin, at least one drier, and an anti-skinning agent is provided, an anti-skinning composition, wherein the anti-skinning composition comprises at least 92 wt. %, or more particularly at least 98 wt. %, of an alkyl oxime having five carbon atoms selected from 2-pentanone oxime and 3-methyl-2-butanone oxime. In some embodiments, the high-purity 2-pentanone oxime includes less than 0.5 wt. % methyl isobutyl ketoxime. In some embodiments, the composition includes less than 0.006 wt. % methyl isobutyl ketoxime. A method for the preparation of a purified 2-pentanone stream suitable for oximation to a high-purity 2-pentanone oxime is also provided.

A coating composition including at least one solvent, at least one resin, at least one drier, and an anti-skinning agent is provided, an anti-skinning composition, wherein the anti-skinning composition comprises at least 92 wt. %, or more particularly at least 98 wt. %, of an alkyl oxime having five carbon atoms selected from 2-pentanone oxime and 3-methyl-2-butanone oxime. In some embodiments, the high-purity 2-pentanone oxime includes less than 0.5 wt. % methyl isobutyl ketoxime. In some embodiments, the composition includes less than 0.006 wt. % methyl isobutyl ketoxime. A method for the preparation of a purified 2-pentanone stream suitable for oximation to a high-purity 2-pentanone oxime is also provided.

An object of the invention is to provide a cured film which is high in sensitivity, capable of forming a pattern in a low-taper shape after development, capable of the change in pattern opening width between before and after thermal curing, an excellent in light-blocking property, and a negative photosensitive resin composition that forms the film. The negative photosensitive resin composition contains an (A) alkali-soluble resin, a (C1) photo initiator, and a (Da) black colorant, where the (A) alkali-soluble resin contains a (A1) first resin including one or more selected from the group consisting of a (A1-1) polyimide, a (A1-2) polyimide precursor, a (A1-3) polybenzoxazole, and a (A1-4) polybenzoxazole precursor, and has a structural unit having a fluorine atom at a specific ratio, and the (C1) photo initiator contains an (C1-1) oxime ester-based photo initiator that has a specific structure.

An object of the invention is to provide a cured film which is high in sensitivity, capable of forming a pattern in a low-taper shape after development, capable of the change in pattern opening width between before and after thermal curing, an excellent in light-blocking property, and a negative photosensitive resin composition that forms the film. The negative photosensitive resin composition contains an (A) alkali-soluble resin, a (C1) photo initiator, and a (Da) black colorant, where the (A) alkali-soluble resin contains a (A1) first resin including one or more selected from the group consisting of a (A1-1) polyimide, a (A1-2) polyimide precursor, a (A1-3) polybenzoxazole, and a (A1-4) polybenzoxazole precursor, and has a structural unit having a fluorine atom at a specific ratio, and the (C1) photo initiator contains an (C1-1) oxime ester-based photo initiator that has a specific structure.

The present disclosure relates to a photosensitive composition comprising a photoinitiator and a bismaleimide component, photopolymers comprising the photosensitive composition and their use, especially in electronic devices. The bismaleimide component includes a bismaleimide compound or a bismaleimide oligomer.