A polishing liquid used for chemical mechanical polishing includes colloidal silica, in which a zeta potential of the colloidal silica measured in a state where the colloidal silica is present in the polishing liquid is −20 mV or less, an electrical conductivity is 200 μS/cm or less, a pH is 2 to 6, and a transmittance is 70% to 99%.

A polishing liquid used for chemical mechanical polishing includes colloidal silica, in which a zeta potential of the colloidal silica measured in a state where the colloidal silica is present in the polishing liquid is −20 mV or less, an electrical conductivity is 200 μS/cm or less, a pH is 2 to 6, and a transmittance is 70% to 99%.

The present invention provides a solid color film, a preparation method thereof and a display device. The solid color film includes a transparent substrate and a solid color material dispersed in the transparent substrate, and the solid color material includes a host structure formed of cucurbituril and a guest structure supported on the host structure and formed by bonding a carboxyl group-containing rhodamine-based dye and an aminoadamantane through a chemical bond, wherein the guest structure is bonded to the host structure through the adamantane to form a host-guest structure.

The present invention provides a solid color film, a preparation method thereof and a display device. The solid color film includes a transparent substrate and a solid color material dispersed in the transparent substrate, and the solid color material includes a host structure formed of cucurbituril and a guest structure supported on the host structure and formed by bonding a carboxyl group-containing rhodamine-based dye and an aminoadamantane through a chemical bond, wherein the guest structure is bonded to the host structure through the adamantane to form a host-guest structure.

The present disclosure provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise at least one population of nanostructures, at least one poly(alkylene oxide) ligand bound to the surface of the nanostructures, and optionally at least one organic resin. The present disclosure also provides nanostructure films comprising a nanostructure layer and methods of making nanostructure films.

The present disclosure provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise at least one population of nanostructures, at least one poly(alkylene oxide) ligand bound to the surface of the nanostructures, and optionally at least one organic resin. The present disclosure also provides nanostructure films comprising a nanostructure layer and methods of making nanostructure films.

A method of preparing PNVCL block polymers as the substrate for thermo-sensitive cultureware is provided. A hydrophobic polymer of poly n-butyl mathacrylate (PBMA) is obtained by atom transfer radical polymerization (ATRP) with typical haloalkane as an initiator. Further a thermo-sensitive block copolymer of poly n-vinyl caprolactam (PNVCL) is obtained by polymerization of N-vinyl caprolactam (NVCL) monomers using the hydrophobic PBMA polymer as a macroinitiator.

A thermoplastic elastomer composition includes: at least one elastomer component selected from the group consisting of elastomeric polymers each of which has a side chain containing a hydrogen-bond cross-linkable moiety having a carbonyl-containing group and/or a nitrogen-containing heterocycle and has a glass-transition point of 25° C. or below, and elastomeric polymers each of which contains a hydrogen-bond cross-linkable moiety and a covalent-bond cross-linking moiety in a side chain and has a glass-transition point of 25° C. or below; a clay, a content ratio of which is 20 parts by mass or less relative to 100 parts by mass of the elastomer component; and an α-olefin-based resin having no chemical-bond cross-linking moiety.

A thermoplastic elastomer composition includes: at least one elastomer component selected from the group consisting of elastomeric polymers each of which has a side chain containing a hydrogen-bond cross-linkable moiety having a carbonyl-containing group and/or a nitrogen-containing heterocycle and has a glass-transition point of 25° C. or below, and elastomeric polymers each of which contains a hydrogen-bond cross-linkable moiety and a covalent-bond cross-linking moiety in a side chain and has a glass-transition point of 25° C. or below; a clay, a content ratio of which is 20 parts by mass or less relative to 100 parts by mass of the elastomer component; and an α-olefin-based resin having no chemical-bond cross-linking moiety.

A polymerizable composition for an optical material includes an episulfide compound (A); an organic coloring matter (B); an UV absorber (C); and a polymerization catalyst (D), wherein the organic coloring matter (B) has a main absorption peak (P) between 565 nm and 605 nm in a visible light absorption spectrum, an absorption coefficient (ml/g.Math.cm) of a peak apex (Pmax) exhibiting a maximum absorption coefficient of (P) is equal to or greater than 0.5105, a peak width in an absorbance of of an absorbance of (Pmax) of (P) is equal to or less than 50 nm, a peak width in an absorbance of of the absorbance of (Pmax) of (P) is equal to or less than 30 nm, and a peak width in an absorbance of of the absorbance of (Pmax) of (P) is in a range of equal to or less than 20 nm.