A composition of, and method of making, a cleaning composition and a cleaning powder is disclosed. The composition includes a desiccated surfactant, powdered vinegar, and optionally a custom essence.

A composition of, and method of making, a cleaning composition and a cleaning powder is disclosed. The composition includes a desiccated surfactant, powdered vinegar, and optionally a custom essence.

An object of the invention is to provide a cleaning liquid for semiconductor substrates having undergone a chemical mechanical polishing process, the cleaning liquid being excellent in corrosion prevention properties and defect suppression performance with respect to a metal film. Another object of the invention is to provide a method of cleaning semiconductor substrates having undergone a chemical mechanical polishing process. A cleaning liquid of the invention is used for semiconductor substrates having undergone a chemical mechanical polishing process and includes: an amine oxide compound that is a compound having an amine oxide group, or its salt; and at least one hydroxylamine compound selected from the group consisting of a hydroxylamine, a hydroxylamine derivative, and their salts, and the amine oxide compound content is 0.00001 to 0.15 mass % based on the total mass of the cleaning liquid.

An object of the invention is to provide a cleaning liquid for semiconductor substrates having undergone a chemical mechanical polishing process, the cleaning liquid being excellent in corrosion prevention properties and defect suppression performance with respect to a metal film. Another object of the invention is to provide a method of cleaning semiconductor substrates having undergone a chemical mechanical polishing process. A cleaning liquid of the invention is used for semiconductor substrates having undergone a chemical mechanical polishing process and includes: an amine oxide compound that is a compound having an amine oxide group, or its salt; and at least one hydroxylamine compound selected from the group consisting of a hydroxylamine, a hydroxylamine derivative, and their salts, and the amine oxide compound content is 0.00001 to 0.15 mass % based on the total mass of the cleaning liquid.

A surfactant composition comprising a sugar-based surfactant comprising a C8-C16 alkyl glucoside, a C8-C16 alkyl polyglucoside, or a combination of a C8-C16 alkyl glucoside and a C8-C16 alkyl polyglucoside; a C8-C18 amphodiacetate; a C8-C16 acyl sarcosinate, a C8-C16 acyl glutamate, a C8-C16 acyl glycinate, or a combination thereof; and optionally a C8-C14 acyl lactylate, wherein the composition is free of sulfated anionic surfactants.

A surfactant composition comprising a sugar-based surfactant comprising a C8-C16 alkyl glucoside, a C8-C16 alkyl polyglucoside, or a combination of a C8-C16 alkyl glucoside and a C8-C16 alkyl polyglucoside; a C8-C18 amphodiacetate; a C8-C16 acyl sarcosinate, a C8-C16 acyl glutamate, a C8-C16 acyl glycinate, or a combination thereof; and optionally a C8-C14 acyl lactylate, wherein the composition is free of sulfated anionic surfactants.

Described herein is a washing- and cleaning-active multilayer film including at least one layer including a polymer composition obtainable by free-radical polymerization of a monomer composition including at least one ,-ethylenically unsaturated carboxylic acid or a salt or an anhydride thereof, where the free-radical polymerization is effected in the presence of at least one polyether component. Also described herein is a process for producing the multilayer film, methods of using the multilayer film and a sheath or coating for a washing or cleaning composition portion including the multilayer film.

Described herein is a washing- and cleaning-active multilayer film including at least one layer including a polymer composition obtainable by free-radical polymerization of a monomer composition including at least one ,-ethylenically unsaturated carboxylic acid or a salt or an anhydride thereof, where the free-radical polymerization is effected in the presence of at least one polyether component. Also described herein is a process for producing the multilayer film, methods of using the multilayer film and a sheath or coating for a washing or cleaning composition portion including the multilayer film.

A composition of, and method of making, a cleaning composition and a cleaning powder is disclosed. The composition includes a desiccated surfactant, powdered vinegar, and optionally a custom essence.

A composition of, and method of making, a cleaning composition and a cleaning powder is disclosed. The composition includes a desiccated surfactant, powdered vinegar, and optionally a custom essence.